| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A Calculation Method of Deposition Profiles in CVD Reactors Using Genetic Algorithms
|
Takahashi, Takahiro
|
|
2013
|
46 |
C |
p. 219-229
11 p.
|
artikel
|
| 2 |
A Comparative Study of a Series of Dimethylgold(III) Complexes with S,S Chelating Ligands Used as MOCVD Precursors
|
Turgambaeva, Asiya
|
|
2013
|
46 |
C |
p. 167-173
7 p.
|
artikel
|
| 3 |
Bis(trimethylsilyl)Ethylamine: Synthesis, Properties and its use as CVD Precursor
|
Ermakova, Evgeniya
|
|
2013
|
46 |
C |
p. 209-218
10 p.
|
artikel
|
| 4 |
Contents
|
|
|
2013
|
46 |
C |
p. iii-iv
nvt p.
|
artikel
|
| 5 |
Design of Ordered Wrinkled Patterns with Dynamically Tuned Properties
|
Yagüe, Jose Luis
|
|
2013
|
46 |
C |
p. 40-45
6 p.
|
artikel
|
| 6 |
Development of the Automatic Modeling System for Reaction Mechanisms Using REX+JGG
|
Takahashi, Takahiro
|
|
2013
|
46 |
C |
p. 239-247
9 p.
|
artikel
|
| 7 |
Editorial
|
|
|
2013
|
46 |
C |
p. 1-2
2 p.
|
artikel
|
| 8 |
Effect of Spatial Image Transfer in a Pulse МОCVD Process
|
Shevtsov, Yuri V.
|
|
2013
|
46 |
C |
p. 27-32
6 p.
|
artikel
|
| 9 |
Electric and Ferro-Electric Behaviour of Polymer-Coated Graphene-Oxide Thin Film
|
Ray, Sekhar C.
|
|
2013
|
46 |
C |
p. 62-70
9 p.
|
artikel
|
| 10 |
Growth of Boron Nitride on (0001) AlN Templates by High Temperature-Hydride Vapor Phase Epitaxy (HT-HVPE)
|
Coudurier, Nicolas
|
|
2013
|
46 |
C |
p. 102-106
5 p.
|
artikel
|
| 11 |
High Power Pulsed Plasma Enhanced Chemical Vapor Deposition: A Brief Overview of General Concepts and Early Results
|
Lundin, Daniel
|
|
2013
|
46 |
C |
p. 3-11
9 p.
|
artikel
|
| 12 |
In Situ Deposition Monitoring by a Tilted Fiber Bragg Grating Optical Probe: Probing Nucleation in Chemical Vapour Deposition of Gold
|
Mandia, David J.
|
|
2013
|
46 |
C |
p. 12-20
9 p.
|
artikel
|
| 13 |
Low Pressure Chemical Vapour Deposition of Crystalline Ga2Te3 and Ga2Se3 Thin Films from Single Source Precursors Using Telluroether and Selenoether Complexes
|
George, Kathryn
|
|
2013
|
46 |
C |
p. 142-148
7 p.
|
artikel
|
| 14 |
Multifunctional Manganese Single Source Precursor for the Selective Deposition of MnF2 or Mn3O4
|
Catalano, Maria R.
|
|
2013
|
46 |
C |
p. 118-126
9 p.
|
artikel
|
| 15 |
New Heteroleptic Copper(II) Complexes as MOCVD Precursors
|
Krisyuk, V.V.
|
|
2013
|
46 |
C |
p. 174-182
9 p.
|
artikel
|
| 16 |
N,N- and O,N- Coordinated Co(II) β – Diketonate Derivatives: Synthesis, Structures, Thermal Properties and MOCVD Application
|
Dorovskikh, S.I.
|
|
2013
|
46 |
C |
p. 193-199
7 p.
|
artikel
|
| 17 |
On the Concentration Unsteadiness of Chemical Vapour Deposition with a Precursor Sublimated from Packed Bed of Solid Source. Problems with Multicomponent Coatings
|
Peev, Georgi
|
|
2013
|
46 |
C |
p. 183-192
10 p.
|
artikel
|
| 18 |
Patterned PPy Polymer and PPy/Ag Nanocomposites Thin Films by Photo-DLICVD
|
Manole, C.C.
|
|
2013
|
46 |
C |
p. 46-55
10 p.
|
artikel
|
| 19 |
Pulsed Direct liquid Injection ALD of TiO2 Films Using Titanium Tetraisopropoxide Precursor
|
Avril, L.
|
|
2013
|
46 |
C |
p. 33-39
7 p.
|
artikel
|
| 20 |
Raman Characterisation of Diamond Coatings Using Different Laser Wavelengths
|
Haubner, Roland
|
|
2013
|
46 |
C |
p. 71-78
8 p.
|
artikel
|
| 21 |
Reactive Chemical Vapour Deposition of Titanium Carbide from H2-TiCl4 Gas Mixture on Pyrocarbon: A Comprehensive Study
|
Ledain, O.
|
|
2013
|
46 |
C |
p. 79-87
9 p.
|
artikel
|
| 22 |
Sсandium(III) Beta-diketonate Derivatives as Precursors for Oxide Film Deposition by CVD
|
Zherikova, Kseniya V.
|
|
2013
|
46 |
C |
p. 200-208
9 p.
|
artikel
|
| 23 |
SiCN Film Quality Characterization by Etch Pit Measurement Method
|
Izumi, Akira
|
|
2013
|
46 |
C |
p. 107-110
4 p.
|
artikel
|
| 24 |
Silicon Chemical Vapor Deposition Process Using a Half-Inch Silicon Wafer for Minimal Manufacturing System
|
Li, Ning
|
|
2013
|
46 |
C |
p. 230-238
9 p.
|
artikel
|
| 25 |
Super-Hydrophobic and Oloephobic Crystalline Coatings by Initiated Chemical Vapor Deposition
|
Coclite, Anna Maria
|
|
2013
|
46 |
C |
p. 56-61
6 p.
|
artikel
|
| 26 |
Technology and Application of Transition Metal Oxide of W-V-O as Functional Layers and NiO Thin Films as Counter Electrode Material in Electrochromic “Smart Windows”
|
Bodurov, Georgi
|
|
2013
|
46 |
C |
p. 149-158
10 p.
|
artikel
|
| 27 |
The Influence of F-Doping in SnO2 Thin Films
|
Yates, H.M.
|
|
2013
|
46 |
C |
p. 159-166
8 p.
|
artikel
|
| 28 |
Thermochromic Vanadium Oxide Coatings Grown by APCVD at Low Temperatures
|
Louloudakis, Dimitris
|
|
2013
|
46 |
C |
p. 137-141
5 p.
|
artikel
|
| 29 |
Thermodynamic Analysis and Growth of Zirconium Carbide by Chemical Vapor Deposition
|
Wei, Sun
|
|
2013
|
46 |
C |
p. 88-101
14 p.
|
artikel
|
| 30 |
The Use of Additives to Control the Morphology of Thin Films Synthesized Using Aerosol Assisted Chemical Vapour Deposition
|
Kaye, Karl
|
|
2013
|
46 |
C |
p. 21-26
6 p.
|
artikel
|
| 31 |
Thin Film Optical Coatings of Vanadium Oxide and Mixed Tungsten/Vanadium Oxide Deposited by APCVD Employing Precursors of Vanadyl Acetylacetonate and a Mixture with Tungsten Hexacarbonyl
|
Bodurov, Georgi
|
|
2013
|
46 |
C |
p. 127-136
10 p.
|
artikel
|
| 32 |
Titania Coated Mica via Chemical Vapour Deposition, Post N-doped by Liquid Ammonia Treatment
|
Powell, Michael J.
|
|
2013
|
46 |
C |
p. 111-117
7 p.
|
artikel
|
| 33 |
Upscaling the Chemical Vapor Infiltration Process of Activated Carbon with TMS
|
Curdts, B.
|
|
2013
|
46 |
C |
p. 248-254
7 p.
|
artikel
|
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