nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Author index
|
|
|
1980 |
2 |
4 |
p. 461- 1 p. |
artikel |
2 |
Dopant concentration measurements in hydrogenated amorphous silicon films by glow discharge optical spectroscopy
|
Zesch, J.C. |
|
1980 |
2 |
4 |
p. 377-383 7 p. |
artikel |
3 |
Electron spin resonance measurements on amorphous silicon
|
Biegelsen, D.K. |
|
1980 |
2 |
4 |
p. 421-430 10 p. |
artikel |
4 |
Investigation of the hydrogen and impurity contents of amorphous silicon by secondary ion mass spectrometry
|
Magee, Charles |
|
1980 |
2 |
4 |
p. 365-376 12 p. |
artikel |
5 |
Optical emission spectroscopy: Toward the identification of species in the plasma deposition of hydrogenated amorphous silicon alloys
|
Kampas, F.J. |
|
1980 |
2 |
4 |
p. 385-400 16 p. |
artikel |
6 |
Photoluminescence assessment of solar cell materials
|
Pankove, J.I. |
|
1980 |
2 |
4 |
p. 443-449 7 p. |
artikel |
7 |
Session III
|
Carlson, D.E. |
|
1980 |
2 |
4 |
p. 349-350 2 p. |
artikel |
8 |
Session IV
|
Mahan, H. |
|
1980 |
2 |
4 |
p. 407-408 2 p. |
artikel |
9 |
Structural studies of hydrogenated amorphous silicon
|
Knights, J.C. |
|
1980 |
2 |
4 |
p. 409-419 11 p. |
artikel |
10 |
Studies of hydrogenated amorphous silicon by xerographic discharge techniques
|
Mort, J. |
|
1980 |
2 |
4 |
p. 451-459 9 p. |
artikel |
11 |
Subject index
|
|
|
1980 |
2 |
4 |
p. 463-466 4 p. |
artikel |
12 |
Thickness-dependent conductivity and photoconductivity of hydrogenated amorphous silicon
|
Brodsky, M.H. |
|
1980 |
2 |
4 |
p. 401-406 6 p. |
artikel |
13 |
Use of nuclear reaction analysis to characterize the elemental composition and density of thin film amorphous silicon
|
Lanford, W.A. |
|
1980 |
2 |
4 |
p. 351-363 13 p. |
artikel |
14 |
Vibrational spectroscopy of hydrogenated amorphous silicon alloys
|
Lucovsky, G. |
|
1980 |
2 |
4 |
p. 431-442 12 p. |
artikel |