| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Advances in plasma-enhanced chemical vapor deposition of silicon films at low temperatures
|
Collins, R.W.
|
|
2002
|
6 |
5 |
p. 425-437
13 p.
|
artikel
|
| 2 |
An approach to device grade amorphous and microcrystalline silicon thin films fabricated at higher deposition rates
|
Kondo, Michio
|
|
2002
|
6 |
5 |
p. 445-453
9 p.
|
artikel
|
| 3 |
Chemical vapor deposition of silicon thin films
|
Schropp, Ruud E.I
|
|
2002
|
6 |
5 |
p. 423-424
2 p.
|
artikel
|
| 4 |
Design and development of titanium oxide photocatalysts operating under visible and UV light irradiation.
|
Anpo, Masakazu
|
|
2002
|
6 |
5 |
p. 381-388
8 p.
|
artikel
|
| 5 |
Detecting reactive species in hot wire chemical vapor deposition
|
Duan, H.L
|
|
2002
|
6 |
5 |
p. 471-477
7 p.
|
artikel
|
| 6 |
Editorial Board
|
|
|
2002
|
6 |
5 |
p. i-
1 p.
|
artikel
|
| 7 |
Growth chemistry of amorphous silicon and amorphous silicon–germanium alloys
|
Dalal, Vikram L
|
|
2002
|
6 |
5 |
p. 455-464
10 p.
|
artikel
|
| 8 |
Neutron scattering methods for the study of zeolites
|
Jobic, Hervé
|
|
2002
|
6 |
5 |
p. 415-422
8 p.
|
artikel
|
| 9 |
Plasma enhanced chemical vapor deposition of silicon thin films for large area electronics
|
Roca i Cabarrocas, P
|
|
2002
|
6 |
5 |
p. 439-444
6 p.
|
artikel
|
| 10 |
Processes in silicon deposition by hot-wire chemical vapor deposition
|
van Veenendaal, P.A.T.T
|
|
2002
|
6 |
5 |
p. 465-470
6 p.
|
artikel
|
| 11 |
Reaction kinetics in silicon chemical vapor deposition
|
Tonokura, Kenichi
|
|
2002
|
6 |
5 |
p. 479-485
7 p.
|
artikel
|
| 12 |
Recent advances in nanocatalysis research
|
Gai, Pratibha L.
|
|
2002
|
6 |
5 |
p. 401-406
6 p.
|
artikel
|
| 13 |
Review of fuel processing catalysts for hydrogen production in PEM fuel cell systems
|
Faur Ghenciu, Anca
|
|
2002
|
6 |
5 |
p. 389-399
11 p.
|
artikel
|
| 14 |
Solid catalysts and porous solids
|
Gai, Pratibha L
|
|
2002
|
6 |
5 |
p. 379-
1 p.
|
artikel
|
| 15 |
Templated inorganic networks: recent developments
|
Harrison, William T.A
|
|
2002
|
6 |
5 |
p. 407-413
7 p.
|
artikel
|
| 16 |
The International Technology Roadmap for Semiconductors—Perspectives and challenges for the next 15 years
|
M. Arden, Wolfgang
|
|
2002
|
6 |
5 |
p. 371-377
7 p.
|
artikel
|
Tijdschrift beschrijving