nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments
|
Olson, James M |
|
2002 |
5 |
1 |
p. 51-60 10 p. |
artikel |
2 |
Characterization of TiAl alloy films for potential application in MEMS bimorph actuators
|
Qu, X.X |
|
2002 |
5 |
1 |
p. 35-38 4 p. |
artikel |
3 |
Colour sensor for (bio)chemical/biological discrimination and detection
|
Poenar, Daniel Puiu |
|
2002 |
5 |
1 |
p. 17-22 6 p. |
artikel |
4 |
Enhancement and stability of luminescence in thin-film light-emitting devices based on heterostructure of ladder-type poly (p-phenylene)
|
Wang, S.X. |
|
2002 |
5 |
1 |
p. 27-30 4 p. |
artikel |
5 |
Hall and photoluminescence studies of effects of the thickness of an additional In0.3Ga0.7As layer in the center of In0.15Ga0.85As/Al0.25Ga0.75As/GaAs high electron mobility transistors
|
Zhao, Feng |
|
2002 |
5 |
1 |
p. 23-26 4 p. |
artikel |
6 |
IFC-ED board
|
|
|
2002 |
5 |
1 |
p. IFC- 1 p. |
artikel |
7 |
Journal select April 19, 2002
|
|
|
2002 |
5 |
1 |
p. I- 1 p. |
artikel |
8 |
Phase separation in Zn-doped InGaN grown by metalorganic chemical vapor deposition
|
Feng, Z.C |
|
2002 |
5 |
1 |
p. 39-43 5 p. |
artikel |
9 |
Residual free reactive ion etching of the Bell contact Ti/Pt/Au
|
Franz, Gerhard |
|
2002 |
5 |
1 |
p. 45-50 6 p. |
artikel |
10 |
Structure of ZnO films prepared by oxidation of metallic Zinc
|
Gupta, Rohit Kumar |
|
2002 |
5 |
1 |
p. 11-15 5 p. |
artikel |
11 |
Suppression of oxidation-induced stacking fault generation in argon ambient annealing with controlled oxygen and the effect upon bulk defects
|
Suzuki, Toshiharu |
|
2002 |
5 |
1 |
p. 5-10 6 p. |
artikel |
12 |
The development of Ti silicide on poly gate structures with oxidized sidewall and application in a novel RF LDMOSFET
|
Qu, X.X |
|
2002 |
5 |
1 |
p. 1-4 4 p. |
artikel |
13 |
The effect of deposition conditions on structure properties of radio frequency reactive sputtered polycrystalline ZnO films
|
Gong, Hengxiang |
|
2002 |
5 |
1 |
p. 31-34 4 p. |
artikel |