| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Analysis of LPCVD process conditions for the deposition of low stress silicon nitride. Part I: preliminary LPCVD experiments
|
Olson, James M
|
|
2002
|
5 |
1 |
p. 51-60
10 p.
|
artikel
|
| 2 |
Characterization of TiAl alloy films for potential application in MEMS bimorph actuators
|
Qu, X.X
|
|
2002
|
5 |
1 |
p. 35-38
4 p.
|
artikel
|
| 3 |
Colour sensor for (bio)chemical/biological discrimination and detection
|
Poenar, Daniel Puiu
|
|
2002
|
5 |
1 |
p. 17-22
6 p.
|
artikel
|
| 4 |
Enhancement and stability of luminescence in thin-film light-emitting devices based on heterostructure of ladder-type poly (p-phenylene)
|
Wang, S.X.
|
|
2002
|
5 |
1 |
p. 27-30
4 p.
|
artikel
|
| 5 |
Hall and photoluminescence studies of effects of the thickness of an additional In0.3Ga0.7As layer in the center of In0.15Ga0.85As/Al0.25Ga0.75As/GaAs high electron mobility transistors
|
Zhao, Feng
|
|
2002
|
5 |
1 |
p. 23-26
4 p.
|
artikel
|
| 6 |
IFC-ED board
|
|
|
2002
|
5 |
1 |
p. IFC-
1 p.
|
artikel
|
| 7 |
Journal select April 19, 2002
|
|
|
2002
|
5 |
1 |
p. I-
1 p.
|
artikel
|
| 8 |
Phase separation in Zn-doped InGaN grown by metalorganic chemical vapor deposition
|
Feng, Z.C
|
|
2002
|
5 |
1 |
p. 39-43
5 p.
|
artikel
|
| 9 |
Residual free reactive ion etching of the Bell contact Ti/Pt/Au
|
Franz, Gerhard
|
|
2002
|
5 |
1 |
p. 45-50
6 p.
|
artikel
|
| 10 |
Structure of ZnO films prepared by oxidation of metallic Zinc
|
Gupta, Rohit Kumar
|
|
2002
|
5 |
1 |
p. 11-15
5 p.
|
artikel
|
| 11 |
Suppression of oxidation-induced stacking fault generation in argon ambient annealing with controlled oxygen and the effect upon bulk defects
|
Suzuki, Toshiharu
|
|
2002
|
5 |
1 |
p. 5-10
6 p.
|
artikel
|
| 12 |
The development of Ti silicide on poly gate structures with oxidized sidewall and application in a novel RF LDMOSFET
|
Qu, X.X
|
|
2002
|
5 |
1 |
p. 1-4
4 p.
|
artikel
|
| 13 |
The effect of deposition conditions on structure properties of radio frequency reactive sputtered polycrystalline ZnO films
|
Gong, Hengxiang
|
|
2002
|
5 |
1 |
p. 31-34
4 p.
|
artikel
|
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