| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Applications of focused ion beam microscopy to materials science specimens
|
Phaneuf, M.W
|
|
1999
|
30 |
3 |
p. 277-288
12 p.
|
artikel
|
| 2 |
A review of focused ion beam milling techniques for TEM specimen preparation
|
Giannuzzi, L.A.
|
|
1999
|
30 |
3 |
p. 197-204
8 p.
|
artikel
|
| 3 |
Defects caused by high-energy ion beams, as measured by scanning probe methods
|
Biró, L.P
|
|
1999
|
30 |
3 |
p. 245-254
10 p.
|
artikel
|
| 4 |
Dual-column (FIB–SEM) wafer applications
|
Krueger, Robert
|
|
1999
|
30 |
3 |
p. 221-226
6 p.
|
artikel
|
| 5 |
High-depth-resolution Auger depth profiling/atomic mixing
|
Menyhard, M
|
|
1999
|
30 |
3 |
p. 255-265
11 p.
|
artikel
|
| 6 |
Ion beam induced formation of metastable fcc-Ti phase in the epitaxial Ti/Cu/(111)Si structures
|
Lai, J.B
|
|
1999
|
30 |
3 |
p. 205-211
7 p.
|
artikel
|
| 7 |
Microfabrication techniques using focused ion beams and emergent applications
|
Vasile, M.J
|
|
1999
|
30 |
3 |
p. 235-244
10 p.
|
artikel
|
| 8 |
Special issue on Ion Beam Techniques
|
Lábár, J.L
|
|
1999
|
30 |
3 |
p. 195-196
2 p.
|
artikel
|
| 9 |
TEM sample preparation by ion milling/amorphization
|
Barna, Á
|
|
1999
|
30 |
3 |
p. 267-276
10 p.
|
artikel
|
| 10 |
The use of a focused-ion-beam machine to prepare transmission electron microscopy samples of residual photoresist
|
De Veirman, A
|
|
1999
|
30 |
3 |
p. 213-220
8 p.
|
artikel
|
| 11 |
The use of Auger spectroscopy and a quadrupole SIMS build on a focused ion beam to examine focused ion beam made cross-sections
|
Verkleij, D.
|
|
1999
|
30 |
3 |
p. 227-234
8 p.
|
artikel
|
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