| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Author index of volume 163
|
|
|
1993
|
163 |
2 |
p. 219-
1 p.
|
artikel
|
| 2 |
Comparative study of the interface composition of TiN and TiCN hard coatings on high speed steel substrates obtained by arc discharge
|
Román, E.
|
|
1993
|
163 |
2 |
p. 197-200
4 p.
|
artikel
|
| 3 |
Creation of thin TaC or TiC layers on steels
|
Wendler, Bogdan
|
|
1993
|
163 |
2 |
p. 215-217
3 p.
|
artikel
|
| 4 |
CrN x — a hard coating for corrosion and wear resistance
|
Ballhause, P.
|
|
1993
|
163 |
2 |
p. 193-196
4 p.
|
artikel
|
| 5 |
Evaluation of properties of aluminum films deposited using an ultrahigh vacuum sputtering system
|
Toyoda, S.
|
|
1993
|
163 |
2 |
p. 167-170
4 p.
|
artikel
|
| 6 |
Ion-assisted deposition in unbalanced-magnetron sputtering systems
|
Sproul, William D.
|
|
1993
|
163 |
2 |
p. 187-192
6 p.
|
artikel
|
| 7 |
LaB6 coating to reduce the outgassing rate of a vacuum wall
|
Mushiaki, Motoi
|
|
1993
|
163 |
2 |
p. 177-179
3 p.
|
artikel
|
| 8 |
Morphology of TiN films deposited by arc-like plasma-enhanced ion plating
|
Kajioka, H.
|
|
1993
|
163 |
2 |
p. 201-205
5 p.
|
artikel
|
| 9 |
Organizing committee
|
|
|
1993
|
163 |
2 |
p. x-
1 p.
|
artikel
|
| 10 |
Plasma-activated high-rate electron-beam evaporation for coating metal strips
|
Schiller, S.
|
|
1993
|
163 |
2 |
p. 149-156
8 p.
|
artikel
|
| 11 |
Plasma nitriding of sputtered Ti films
|
Musil, J.
|
|
1993
|
163 |
2 |
p. 181-186
6 p.
|
artikel
|
| 12 |
Prepace
|
Kleyn, Aart W.
|
|
1993
|
163 |
2 |
p. ix-
1 p.
|
artikel
|
| 13 |
Preparation of W and Mo thin films by r.f.-d.c. coupled magnetron sputtering
|
Kawabata, K.
|
|
1993
|
163 |
2 |
p. 163-165
3 p.
|
artikel
|
| 14 |
Properties of TiN, ZrN and ZrTiN coatings prepared by cathodic arc evaporation
|
Musil, J.
|
|
1993
|
163 |
2 |
p. 211-214
4 p.
|
artikel
|
| 15 |
Subject index of volume 163
|
|
|
1993
|
163 |
2 |
p. 221-223
3 p.
|
artikel
|
| 16 |
Synthesis of β-SiC thin films for high temperature sensors by the activated reactive evaporation process
|
Cha, Y.H.C.
|
|
1993
|
163 |
2 |
p. 207-210
4 p.
|
artikel
|
| 17 |
The microstructural and thickness uniformity of zirconia coatings produced by r.f. ion plating
|
Fancey, K.S.
|
|
1993
|
163 |
2 |
p. 171-175
5 p.
|
artikel
|
| 18 |
The use of nanoparticles as coatings
|
Hayashi, Chikara
|
|
1993
|
163 |
2 |
p. 157-161
5 p.
|
artikel
|
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