nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Activity and surface composition of sputter-deposited Pt⋎γ-Al2O3 catalysts
|
Licciardello, Antonino |
|
1989 |
116 |
C |
p. 65-70 6 p. |
artikel |
2 |
A newly developed linear ion implanter for industrial applications
|
Körber, F.J. |
|
1989 |
116 |
C |
p. 205-208 4 p. |
artikel |
3 |
Anodic oxidation of nitrogen-implanted aluminium
|
Terwagne, G |
|
1989 |
116 |
C |
p. 59-63 5 p. |
artikel |
4 |
Argon ion beam effects upon photoemissive thin films
|
Dolizy, P. |
|
1989 |
116 |
C |
p. 161-166 6 p. |
artikel |
5 |
A universal high-current implanter for surface modification of materials
|
Nielsen, B.R. |
|
1989 |
116 |
C |
p. 193-196 4 p. |
artikel |
6 |
Author index
|
|
|
1989 |
116 |
C |
p. 227- 1 p. |
artikel |
7 |
Corrosion studies in hot acids of titanium modified by refractory metals by ion beam techniques
|
Ensinger, W. |
|
1989 |
116 |
C |
p. 35-40 6 p. |
artikel |
8 |
Editorial Board
|
|
|
1989 |
116 |
C |
p. iii- 1 p. |
artikel |
9 |
Effect of cerium implantation on the corrosion of alloy 800H in an S-O-C environment
|
Stroosnijder, M.F. |
|
1989 |
116 |
C |
p. 103-110 8 p. |
artikel |
10 |
Effect of ion implantation and ion beam mixing and their combined effect on aqueous corrosion resistance
|
Tian, Wei |
|
1989 |
116 |
C |
p. 15-19 5 p. |
artikel |
11 |
Effects of N2 + ion implantation on the oxidation of polycrystalline copper
|
Kothari, D.C |
|
1989 |
116 |
C |
p. 135-142 8 p. |
artikel |
12 |
Electrocatalytic properties of ion-implanted oxide films
|
Elfenthal, L. |
|
1989 |
116 |
C |
p. 71-77 7 p. |
artikel |
13 |
Electrochemical and corrosion behaviour pf BN-coated aluminum alloy surfaces
|
Fedrizzi, L |
|
1989 |
116 |
C |
p. 47-52 6 p. |
artikel |
14 |
Electrochemical study of multiple-energy nitrogen-ion-implanted aluminium alloys
|
Massiani, Y |
|
1989 |
116 |
C |
p. 53-57 5 p. |
artikel |
15 |
High current density, broad beam ion implantation
|
Wilbur, P.J |
|
1989 |
116 |
C |
p. 215-220 6 p. |
artikel |
16 |
High-current metal-ion beams with energies up to 45 keV u −1
|
Emig, H |
|
1989 |
116 |
C |
p. 209-213 5 p. |
artikel |
17 |
Improved high temperature oxidation behaviour of alloys by ion implantation
|
Bennett, M.J. |
|
1989 |
116 |
C |
p. 79-87 9 p. |
artikel |
18 |
Improvement in friction and wear of hard chromium layers by ion implantation
|
Lohmann, W. |
|
1989 |
116 |
C |
p. 177-181 5 p. |
artikel |
19 |
Improvement of a microwave ion source for surface modification
|
Sakudo, N. |
|
1989 |
116 |
C |
p. 221-225 5 p. |
artikel |
20 |
Ion-beam-assisted coatings for corrosion protection studies
|
Ensinger, W. |
|
1989 |
116 |
C |
p. 1-14 14 p. |
artikel |
21 |
Ion beam processing for industrial applications
|
Hirvonen, J.K. |
|
1989 |
116 |
C |
p. 167-175 9 p. |
artikel |
22 |
Ion implantation in WC-Co: Analysis of treated surfaces and testing of industrial tools
|
Guzman, L |
|
1989 |
116 |
C |
p. 183-191 9 p. |
artikel |
23 |
Localized corrosion behavior of aluminum surface alloys produced by ion implantation and ion beam mixing
|
Natishan, P.M. |
|
1989 |
116 |
C |
p. 41-46 6 p. |
artikel |
24 |
Oxidation resistance studies of Ar+- and N2 +-implanted 304 stainless steel
|
Kothari, D.C. |
|
1989 |
116 |
C |
p. 89-95 7 p. |
artikel |
25 |
Phosphorus implantation of 304L stainless steel
|
Cooney, E.C |
|
1989 |
116 |
C |
p. 27-34 8 p. |
artikel |
26 |
Plasma source ion implantation: A new approach to ion beam modification of materials
|
Conrad, J.R. |
|
1989 |
116 |
C |
p. 197-203 7 p. |
artikel |
27 |
Properties of oxide and nitride layers in aluminium produced by high dose ion implantation
|
Ohira, Shigeo |
|
1989 |
116 |
C |
p. 153-160 8 p. |
artikel |
28 |
Relationship between corrosion properties and structures of titanium-deposited iron bombarded with ions at different target temperatures
|
Tian, Wei |
|
1989 |
116 |
C |
p. 21-25 5 p. |
artikel |
29 |
Subject index
|
|
|
1989 |
116 |
C |
p. 229-230 2 p. |
artikel |
30 |
Surface oxidation of copper observed by perturbed angular correlation and Rutherford backscattering
|
Uhrmacher, M |
|
1989 |
116 |
C |
p. 129-133 5 p. |
artikel |
31 |
The current status of metallization in integrated circuit applications
|
Holwill, R.J |
|
1989 |
116 |
C |
p. 143-151 9 p. |
artikel |
32 |
The effect of ion-implanted yttrium on the oxidation of nickel
|
Hampikian, J.M |
|
1989 |
116 |
C |
p. 119-127 9 p. |
artikel |
33 |
The effects of ion implantation upon nickel oxidation investigated by secondary ion mass spectrometry
|
George, P.J. |
|
1989 |
116 |
C |
p. 111-117 7 p. |
artikel |
34 |
Yttrium ion implantation into Austenitic stainless steel: Evidence for Martensite formation
|
Laursen, T |
|
1989 |
116 |
C |
p. 97-101 5 p. |
artikel |