| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Analysis of thin layers by total-reflection X-ray fluorescence spectrometry
|
Hoffmann, P.
|
|
1989
|
44 |
5 |
p. 471-476
6 p.
|
artikel
|
| 2 |
Application of total reflection X-ray fluorescence analysis for the determination of trace metals in the North Sea
|
Freimann, Peter
|
|
1989
|
44 |
5 |
p. 505-510
6 p.
|
artikel
|
| 3 |
Application of total reflection X-ray fluorescence in semiconductor surface analysis
|
Penka, V.
|
|
1989
|
44 |
5 |
p. 483-490
8 p.
|
artikel
|
| 4 |
Determination of the critical thickness and the sensitivity for thin-film analysis by total reflection X-ray fluorescence spectrometry
|
Klockenkämper, R.
|
|
1989
|
44 |
5 |
p. 461-469
9 p.
|
artikel
|
| 5 |
Determination of trace elements in high-purity aluminium by total reflection X-ray fluorescence after their separation on cellulose loaded with hexamethylenedithiocarbamates
|
Burba, Peter
|
|
1989
|
44 |
5 |
p. 525-532
8 p.
|
artikel
|
| 6 |
Einsatz der totalreflexions-röntgenfluoreszenzanalyse in der analytik von nuklearen wiederaufarbeitungsanlagen
|
Haarich, M.
|
|
1989
|
44 |
5 |
p. 543-549
7 p.
|
artikel
|
| 7 |
Extension of the analytical range of total reflection X-ray fluorescence spectrometry to lighter elements (11 ⩽ Z < 16) and increase in sensitivity by excitation with tungsten L α radiation
|
Freitag, K.
|
|
1989
|
44 |
5 |
p. 499-504
6 p.
|
artikel
|
| 8 |
Preface
|
Klockenkämper, R.
|
|
1989
|
44 |
5 |
p. 433-435
3 p.
|
artikel
|
| 9 |
Quantification in total reflection X-ray fluorescence analysis of microtome sections
|
Klockenkämper, R.
|
|
1989
|
44 |
5 |
p. 511-517
7 p.
|
artikel
|
| 10 |
The determination of atmospheric trace metal concentrations by collection of aerosol particles on sample holders for total-reflection X-ray fluorescence
|
Schneider, B.
|
|
1989
|
44 |
5 |
p. 519-523
5 p.
|
artikel
|
| 11 |
Total reflection X-ray fluorescence analysis of low-Z elements
|
Streli, C.
|
|
1989
|
44 |
5 |
p. 491-497
7 p.
|
artikel
|
| 12 |
Total reflection X-ray fluorescence analysis with polarized X-rays, a compact attachment unit, and high energy X-rays
|
wobrauschek, Peter
|
|
1989
|
44 |
5 |
p. 453-460
8 p.
|
artikel
|
| 13 |
Total reflection X-ray fluorescence spectrometry for surface analysis
|
Knoth, J.
|
|
1989
|
44 |
5 |
p. 477-481
5 p.
|
artikel
|
| 14 |
Total reflection X-ray fluorescence spectrometry: matrix removal procedures for trace analysis of high-purity silicon, quartz and sulphuric acid
|
Reus, Ulrich
|
|
1989
|
44 |
5 |
p. 533-541
9 p.
|
artikel
|
| 15 |
Total reflection X-ray spectrometry: method and applications
|
Prange, Andreas
|
|
1989
|
44 |
5 |
p. 437-452
16 p.
|
artikel
|
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