| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Effects of the solvent plasma load of various solvents on the excitation conditions in medium power inductively coupled plasmas
|
Kreuning, G.
|
|
1989
|
44 |
4 |
p. 367-384
18 p.
|
artikel
|
| 2 |
Excitation and kinetic equilibrium in an argon inductively coupled plasma—II
|
Miller, G.P.
|
|
1989
|
44 |
4 |
p. 395-410
16 p.
|
artikel
|
| 3 |
Flow-injection analysis utilizing a spectrally segmented photodiode-array inductively coupled plasma emission spectrometer—I
|
Furuta, N.
|
|
1989
|
44 |
4 |
p. 349-358
10 p.
|
artikel
|
| 4 |
Glass substrate chemical analysis using electron-induced X-ray emission in sputter deposition
|
Hecq, M.
|
|
1989
|
44 |
4 |
p. 419-425
7 p.
|
artikel
|
| 5 |
Improvement of the energy transfer with added-hydrogen in inductively coupled plasma atomic emission spectrometry
|
Murillo, M.
|
|
1989
|
44 |
4 |
p. 359-366
8 p.
|
artikel
|
| 6 |
News on fundamental reference data
|
Scheeline, Alexander
|
|
1989
|
44 |
4 |
p. 427-430
4 p.
|
artikel
|
| 7 |
On the influence of water on the electron density in an argon inductively coupled plasma
|
Nowak, S.
|
|
1989
|
44 |
4 |
p. 411-418
8 p.
|
artikel
|
| 8 |
Studies on the mechanism of atom formation and loss from the ATOM-SOURCE cathodic sputtering atomizer for atomic absorption spectrometry
|
Chakrabarti, C.L.
|
|
1989
|
44 |
4 |
p. 385-394
10 p.
|
artikel
|
| 9 |
9th International symposium on plasma chemistry Pugnochiuso, Italy, September 4–8, 1989
|
|
|
1989
|
44 |
4 |
p. 431-
1 p.
|
artikel
|
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