| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A study of the absolute photoabsorption cross section and the photionization quantum efficiency of nitrogen from the ionization threshold to 485 Å
|
Shaw, D.A.
|
|
1992
|
166 |
3 |
p. 379-391
13 p.
|
artikel
|
| 2 |
Author index to volume 166
|
|
|
1992
|
166 |
3 |
p. 440-444
5 p.
|
artikel
|
| 3 |
Computer-simulation of the multiple-quantum dynamics of one-, two- and three-dimensional spin distributions
|
Scruggs, Bruce E.
|
|
1992
|
166 |
3 |
p. 367-378
12 p.
|
artikel
|
| 4 |
Electronic properties of the SF5Cl molecule: a comparison with SF6. I. Photoabsorption spectra near the sulphur K and chlorine K edges
|
Reynaud, C.
|
|
1992
|
166 |
3 |
p. 411-424
14 p.
|
artikel
|
| 5 |
Inertial and inertialess vibrational modes in charge transfer: a simple model
|
Kuznetsov, Alexander M.
|
|
1992
|
166 |
3 |
p. 303-310
8 p.
|
artikel
|
| 6 |
Intermolecular potential function for methanol dimer interactions from ab initio calculations
|
Anwander, Eugen H.S.
|
|
1992
|
166 |
3 |
p. 341-360
20 p.
|
artikel
|
| 7 |
Low frequency excitations of aromatic molecules in the solid state
|
Williams, Jeffrey
|
|
1992
|
166 |
3 |
p. 425-439
15 p.
|
artikel
|
| 8 |
Many-body symmetry-adapted perturbation theory study of the He⋯F− interaction
|
Moszynski, Robert
|
|
1992
|
166 |
3 |
p. 329-339
11 p.
|
artikel
|
| 9 |
Model study of the primary H/D isotope effects on the NMR chemical shift in strong hydrogen-bonded systems
|
Vener, M.V.
|
|
1992
|
166 |
3 |
p. 311-316
6 p.
|
artikel
|
| 10 |
MRSDCI studies of four low-lying electronic states of the OF+ 2 ion
|
Cai, Z.-L.
|
|
1992
|
166 |
3 |
p. 361-365
5 p.
|
artikel
|
| 11 |
Spin-orbit splitting and Jahn-Teller effect in rare gas matrix-isolated Ag and Au atoms: a magnetic circular dichroism study
|
Roser, Dennis
|
|
1992
|
166 |
3 |
p. 393-409
17 p.
|
artikel
|
| 12 |
Subject index to volume 166
|
|
|
1992
|
166 |
3 |
p. 445-455
11 p.
|
artikel
|
| 13 |
The dynamics of hot F atoms in low pressure plasma etching reactors
|
Shizgal, Bernie
|
|
1992
|
166 |
3 |
p. 317-328
12 p.
|
artikel
|
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