nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
An investigation of electron energy loss spectroscopy used for composition analysis of crystalline and amorphous silicides
|
Barbour, J.C. |
|
1984 |
14 |
1-2 |
p. 79-84 6 p. |
artikel |
2 |
Bonding geometries at semiconductor surfaces and interfaces
|
Schluter, M. |
|
1984 |
14 |
1-2 |
p. 89-96 8 p. |
artikel |
3 |
Diffraction and microscopy studies of the atomic structure of grain boundaries
|
Lamarre, P. |
|
1984 |
14 |
1-2 |
p. 11-26 16 p. |
artikel |
4 |
Editorial Board
|
|
|
1984 |
14 |
1-2 |
p. IFC- 1 p. |
artikel |
5 |
Electronic structure and the properties of interfaces
|
Harrison, Walter A. |
|
1984 |
14 |
1-2 |
p. 85-87 3 p. |
artikel |
6 |
Electron microscopy of interfacial dislocations
|
Clark, William A.T. |
|
1984 |
14 |
1-2 |
p. 47-50 4 p. |
artikel |
7 |
Electron microscopy study of the AuGe/Ni/Au contacts on GaAs and GaAlAs
|
Liliental, Z. |
|
1984 |
14 |
1-2 |
p. 135-144 10 p. |
artikel |
8 |
Foreword
|
Krivanek, Ondrej |
|
1984 |
14 |
1-2 |
p. IX-X nvt p. |
artikel |
9 |
Grain boundary-solute interactions in polycrystalline silicon and germanium
|
Smith, D.A. |
|
1984 |
14 |
1-2 |
p. 131-134 4 p. |
artikel |
10 |
High resolution electron microscopy of interfaces between epitaxial thin films and semiconductors
|
Gibson, J.M. |
|
1984 |
14 |
1-2 |
p. 1-10 10 p. |
artikel |
11 |
HREM imaging and microanalysis of a III-V semiconductor/oxide interface
|
Krivanek, O.L. |
|
1984 |
14 |
1-2 |
p. 121-126 6 p. |
artikel |
12 |
HREM of SiP precipitates at the (111) silicon surface during phosphorus predeposition
|
Bourret, A. |
|
1984 |
14 |
1-2 |
p. 97-106 10 p. |
artikel |
13 |
Ion scattering analysis of interfaces
|
Feldman, L.C. |
|
1984 |
14 |
1-2 |
p. 51-54 4 p. |
artikel |
14 |
Microdiffraction and stem of interfaces
|
Cowley, J.M. |
|
1984 |
14 |
1-2 |
p. 27-35 9 p. |
artikel |
15 |
On the study of the structure of grain boundaries in metals
|
Balluffi, R.W. |
|
1984 |
14 |
1-2 |
p. 155-160 6 p. |
artikel |
16 |
On the use of secondary ion mass spectrometry in semiconductor device materials and process development
|
Magee, Charles W. |
|
1984 |
14 |
1-2 |
p. 55-63 9 p. |
artikel |
17 |
Resolving composition variations at interfaces by STEM
|
Vander Sande, John B. |
|
1984 |
14 |
1-2 |
p. 65-74 10 p. |
artikel |
18 |
Silicide/silicon interface bonding
|
Rubloff, G.W. |
|
1984 |
14 |
1-2 |
p. 107-119 13 p. |
artikel |
19 |
Structure of grain boundaries in ceramics
|
Rühle, M. |
|
1984 |
14 |
1-2 |
p. 37-46 10 p. |
artikel |
20 |
The depth resolution of sputter profiling
|
King, B.V. |
|
1984 |
14 |
1-2 |
p. 75-78 4 p. |
artikel |
21 |
The measurement of boundary displacements in metals
|
Stobbs, W.M. |
|
1984 |
14 |
1-2 |
p. 145-154 10 p. |
artikel |
22 |
Theory of Si/transition-metal silicide schottky barriers
|
Sankey, Otto F. |
|
1984 |
14 |
1-2 |
p. 127-130 4 p. |
artikel |