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                             136 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A broad chemical and structural characterization of the damaged region of carbon implanted alumina González, M.
2009
267 8-9 p. 1468-1471
4 p.
artikel
2 Amorphization of Ge nanocrystals embedded in amorphous silica under ion irradiation Djurabekova, Flyura
2009
267 8-9 p. 1235-1238
4 p.
artikel
3 Amorphous pocket model based on the modified heat transport equation and local lattice collapse Kovač, D.
2009
267 8-9 p. 1229-1231
3 p.
artikel
4 Analysis of Si crystal irradiated by highly-charged Ar ions using RBS-channeling technique Momota, S.
2009
267 8-9 p. 1412-1414
3 p.
artikel
5 Annealing behavior of lithium niobate irradiated with He-ions at 100K Gischkat, Th.
2009
267 8-9 p. 1492-1495
4 p.
artikel
6 Assessment of swift-ion damage by RBS/C: Determination of the amorphization threshold Rivera, A.
2009
267 8-9 p. 1460-1463
4 p.
artikel
7 Atomic flows, coronas and cratering in Au, Si and SiO 2 Nordlund, Kai
2009
267 8-9 p. 1420-1423
4 p.
artikel
8 Au implantation into various types of silicate glasses Malinský, P.
2009
267 8-9 p. 1575-1578
4 p.
artikel
9 Author Index Proceedings 2009
267 8-9 p. 1748-1760
13 p.
artikel
10 Characterisation of Ni+ implanted PEEK, PET and PI Mackova, A.
2009
267 8-9 p. 1549-1552
4 p.
artikel
11 Characteristics of poly(vinylidene difluoride) modified by plasma-based ion implantation Okuji, S.
2009
267 8-9 p. 1557-1560
4 p.
artikel
12 Committees and sponsors Möller, Wolfhard
2009
267 8-9 p. vi-vii
nvt p.
artikel
13 Contents 2009
267 8-9 p. xi-xvi
nvt p.
artikel
14 Controlled localised melting in silicon by high dose germanium implantation and flash lamp annealing Voelskow, Matthias
2009
267 8-9 p. 1269-1272
4 p.
artikel
15 Controlling nickel silicide phase formation by Si implantation damage Guihard, M.
2009
267 8-9 p. 1285-1289
5 p.
artikel
16 Control of cell behavior on PTFE surface using ion beam irradiation Kitamura, Akane
2009
267 8-9 p. 1638-1641
4 p.
artikel
17 Control of the first-order antiferromagnetic–ferrimagnetic phase transition in Cr-modified Mn2Sb thin films by energetic ion irradiation Madono, K.
2009
267 8-9 p. 1604-1607
4 p.
artikel
18 Corrections to the Walker–Thompson estimate of the cascade volume Swaminarayan, S.
2009
267 8-9 p. 1713-1716
4 p.
artikel
19 Corrosion resistance of magnesium treated by hydrocarbon plasma immersion ion implantation Yekehtaz, M.
2009
267 8-9 p. 1666-1669
4 p.
artikel
20 Damage analysis of benzene induced by keV fullerene bombardment Czerwinski, B.
2009
267 8-9 p. 1440-1443
4 p.
artikel
21 Defect engineering in the MOSLED structure by ion implantation Prucnal, S.
2009
267 8-9 p. 1311-1313
3 p.
artikel
22 Development of CrN precipitates during the initial stages of PIII nitriding of stainless steel thin films Manova, D.
2009
267 8-9 p. 1536-1539
4 p.
artikel
23 Distribution of carbon in polycrystalline copper surfaces treated by methane plasma immersion ion implantation Flege, S.
2009
267 8-9 p. 1531-1535
5 p.
artikel
24 Early stage of the crystallization in amorphous Fe–Si layers: Formation and growth of metastable α-FeSi2 Naito, Muneyuki
2009
267 8-9 p. 1290-1293
4 p.
artikel
25 Editorial Möller, Wolfhard
2009
267 8-9 p. v-
1 p.
artikel
26 Editorial board 2009
267 8-9 p. IFC-
1 p.
artikel
27 Effect of collision cascade density on radiation damage in SiC Azarov, A.Yu.
2009
267 8-9 p. 1247-1250
4 p.
artikel
28 Effect of fluence on the lattice site of implanted Er and implantation induced strain in GaN Wahl, U.
2009
267 8-9 p. 1340-1344
5 p.
artikel
29 Effect of ion energy and chemistry on layer growth processes during nitriding of CoCr alloys Lutz, J.
2009
267 8-9 p. 1522-1525
4 p.
artikel
30 Effects of ion irradiation in metallic glasses Carter, Jesse
2009
267 8-9 p. 1518-1521
4 p.
artikel
31 Effects of working pressure on the deposition of diamond-like carbon films prepared by bipolar-type plasma based ion implantation Nakao, Setsuo
2009
267 8-9 p. 1684-1687
4 p.
artikel
32 Electrical and photoluminescence properties of carbon implanted ZnO bulk single crystals Matsumoto, K.
2009
267 8-9 p. 1568-1570
3 p.
artikel
33 Electrical and structural characterization of ion implanted GaN Usman, M.
2009
267 8-9 p. 1561-1563
3 p.
artikel
34 Endotaxial growth of InSb nanocrystals at the bonding interface of the In+ and Sb+ ion implanted SOI structure Tyschenko, I.E.
2009
267 8-9 p. 1360-1363
4 p.
artikel
35 Enhanced sputtering yields of carbon due to accumulation of low-energy Xe ions Kenmotsu, T.
2009
267 8-9 p. 1717-1720
4 p.
artikel
36 Enhancement of the corrosion resistance of a Ti-based alloy by ion beam deposition methods Noli, F.
2009
267 8-9 p. 1670-1674
5 p.
artikel
37 Epitaxial 3C-SiC nanocrystal formation at the SiO2/Si interface after carbon implantation and subsequent annealing in CO atmosphere Voelskow, M.
2009
267 8-9 p. 1364-1367
4 p.
artikel
38 Er+ implantation in SnO2:SiO2 layers: Structure changes and light emission Gaiduk, P.I.
2009
267 8-9 p. 1336-1339
4 p.
artikel
39 Er+ medium energy ion implantation into lithium niobate Svecova, B.
2009
267 8-9 p. 1332-1335
4 p.
artikel
40 Evolution of surface morphology of nano and micro structures during focused ion beam induced growth Tripathi, Sarvesh K.
2009
267 8-9 p. 1381-1385
5 p.
artikel
41 Fabrication of Si–C–N compounds in silicon carbide by ion implantation Suvorova, Alexandra A.
2009
267 8-9 p. 1294-1298
5 p.
artikel
42 Fabrication of Total-Dose-Radiation-Hardened (TDRH) SOI wafer with embedded silicon nanoclusters Wu, Aimin
2009
267 8-9 p. 1489-1491
3 p.
artikel
43 Far-infrared spectroscopy of Au-implanted lithium niobate (LiNbO3) Ogiso, Hisato
2009
267 8-9 p. 1579-1582
4 p.
artikel
44 Formation of germanium nanoparticles in silica glass studied by optical absorption and X-ray absorption fine structure analysis Yoshida, Tomoko
2009
267 8-9 p. 1368-1371
4 p.
artikel
45 Formation of the dendrite structure at ion beam synthesis in the external magnetic field Gumarov, G.G.
2009
267 8-9 p. 1307-1310
4 p.
artikel
46 Generation of RF plasma assisted high power pulsed sputtering glow discharge without using a magnetic field Yukimura, Ken
2009
267 8-9 p. 1701-1704
4 p.
artikel
47 Gettering layer for oxygen accumulation in the initial stage of SIMOX processing Ou, Xin
2009
267 8-9 p. 1273-1276
4 p.
artikel
48 Graphitization behavior of the implanted furan-resin-derived carbon Teranishi, Yoshikazu
2009
267 8-9 p. 1259-1263
5 p.
artikel
49 He implantation induced microstructure- and hardness-modification of the intermetallic γ-TiAl Pouchon, Manuel A.
2009
267 8-9 p. 1500-1504
5 p.
artikel
50 High concentration Mn ion implantation in Si Peng, Nianhua
2009
267 8-9 p. 1623-1625
3 p.
artikel
51 High energy Si ions bombardment effects on the properties of nano-layers of SiO2/SiO2 +Ag Güner, S.
2009
267 8-9 p. 1353-1355
3 p.
artikel
52 High-speed processing with Cl2 cluster ion beam Seki, T.
2009
267 8-9 p. 1444-1446
3 p.
artikel
53 Hydrogen retention induced by ion implantation in tungsten trioxide films Inouye, Aichi
2009
267 8-9 p. 1480-1483
4 p.
artikel
54 Impact of implantation on the properties of N2O-nitrided oxides of p+- and n+-gate MOS devices Naumova, O.V.
2009
267 8-9 p. 1564-1567
4 p.
artikel
55 Impact of Ni co-implantation on Si nanocrystals formation and luminescence Desjardins, J.F.
2009
267 8-9 p. 1317-1320
4 p.
artikel
56 Improved bio-tribology of biomedical alloys by ion implantation techniques Díaz, C.
2009
267 8-9 p. 1630-1633
4 p.
artikel
57 Improvement of corrosion protection property of Mg-alloy by DLC and Si–DLC coatings with PBII technique and multi-target DC–RF magnetron sputtering Masami, Ikeyama
2009
267 8-9 p. 1675-1679
5 p.
artikel
58 Infrared analysis of ion beam irradiated polymers Delgado, A.O.
2009
267 8-9 p. 1546-1548
3 p.
artikel
59 Inverse spinel ZnFe 2 O 4 nanoparticles synthesized by ion implantation and post-annealing: An investigation using X-ray spectroscopy and magneto-transport Zhou, Shengqiang
2009
267 8-9 p. 1620-1622
3 p.
artikel
60 Investigation of nucleation and phase formation of photocatalytically active TiO2 films by MePBIID Gjevori, A.
2009
267 8-9 p. 1658-1661
4 p.
artikel
61 Investigation of plasma potential and pulsed discharge characteristics in enhanced glow discharge plasma immersion ion implantation and deposition Li, Liuhe
2009
267 8-9 p. 1696-1700
5 p.
artikel
62 Investigation of the magnetic anisotropy of silicide films ion-beam synthesized in the external magnetic field Gumarov, G.G.
2009
267 8-9 p. 1600-1603
4 p.
artikel
63 Ion beam figuring for lithography optics Weiser, Martin
2009
267 8-9 p. 1390-1393
4 p.
artikel
64 Ion beam induced luminescence of polyethylene terephthalate foils under MeV H and He ion bombardment Nagata, S.
2009
267 8-9 p. 1553-1556
4 p.
artikel
65 Ion beam modification of chitosan and cellulose membranes for simulation of ion bombardment of plant cell envelope Prakrajang, K.
2009
267 8-9 p. 1645-1649
5 p.
artikel
66 ION BEAM MODIFICATION OF MATERIALS Möller, Wolfhard
2009
267 8-9 p. iii-
1 p.
artikel
67 Ion beam synthesis of SiC by C implantation into SIMOX(111) dos Reis, R.M.S.
2009
267 8-9 p. 1281-1284
4 p.
artikel
68 Ion implantation effects in single crystal Si investigated by Raman spectroscopy Harriman, T.A.
2009
267 8-9 p. 1232-1234
3 p.
artikel
69 Ion implantation studies on VO x films prepared by pulsed dc reactive sputtering Venkatasubramanian, Chandrasekaran
2009
267 8-9 p. 1476-1479
4 p.
artikel
70 Ion induced structural modification and nano-crystalline formation of Zr–Al–Ni–Cu metallic glasses Nagata, S.
2009
267 8-9 p. 1514-1517
4 p.
artikel
71 Ion-irradiation-induced damage of steels characterized by means of nanoindentation Heintze, C.
2009
267 8-9 p. 1505-1508
4 p.
artikel
72 Irradiation induced clustering in low copper or copper free ferritic model alloys Radiguet, B.
2009
267 8-9 p. 1496-1499
4 p.
artikel
73 Kinetic electron emission from metal surfaces by slow Na+ ions Pisarra, M.
2009
267 8-9 p. 1721-1724
4 p.
artikel
74 Lattice location and annealing studies of Hf implanted CaF2 Geruschke, Thomas
2009
267 8-9 p. 1472-1475
4 p.
artikel
75 Low temperature formation of luminescent Si nanocrystals with combined process of excimer UV-light irradiation and RTA Iwayama, T.S.
2009
267 8-9 p. 1328-1331
4 p.
artikel
76 Mapping of ion beam induced current changes in FinFETs Weis, C.D.
2009
267 8-9 p. 1222-1225
4 p.
artikel
77 Mechanical and electrical properties of diamond-like carbon films deposited by plasma source ion implantation Baba, K.
2009
267 8-9 p. 1688-1691
4 p.
artikel
78 Mechanisms of ion-induced GaN thin layer splitting Moutanabbir, O.
2009
267 8-9 p. 1264-1268
5 p.
artikel
79 Memory effect of magnetic nanoparticle systems originating from particle size distribution Zhang, Gufei
2009
267 8-9 p. 1596-1599
4 p.
artikel
80 MeV Si ion beam modification effects on the thermoelectric generator from Er0.1Fe1.9SbGe0.4 thin film Budak, S.
2009
267 8-9 p. 1592-1595
4 p.
artikel
81 MeV Si ions bombardment effects on the thermoelectric properties of Co0.1Sb x Ge y thin films Güner, S.
2009
267 8-9 p. 1588-1591
4 p.
artikel
82 Micro and nano patterning by focused ion beam enhanced adhesion Shukla, Neeraj
2009
267 8-9 p. 1376-1380
5 p.
artikel
83 Micro-Raman depth profile investigations of beveled Al+-ion implanted 6H-SiC samples Żuk, J.
2009
267 8-9 p. 1251-1254
4 p.
artikel
84 Microstructural and mechanical characterization of nitrogen ion implanted layer on 316L stainless steel Öztürk, O.
2009
267 8-9 p. 1526-1530
5 p.
artikel
85 Microstructure of ion-implanted region in TiNi alloy Ikenaga, Noriaki
2009
267 8-9 p. 1509-1513
5 p.
artikel
86 Microstructure of Ti thin films formed by energetic physical vapour deposition processes Manova, D.
2009
267 8-9 p. 1680-1683
4 p.
artikel
87 Mn-implanted, polycrystalline indium tin oxide and indium oxide films Scarlat, Camelia
2009
267 8-9 p. 1616-1619
4 p.
artikel
88 Modification of atomic solids via electronic subsystem probed by spectroscopic methods Savchenko, E.V.
2009
267 8-9 p. 1733-1736
4 p.
artikel
89 Modification of magnetic properties of FeRh intermetallic compounds by energetic ion beam bombardment Kosugi, S.
2009
267 8-9 p. 1612-1615
4 p.
artikel
90 Modification of the magnetic and the structural properties of Pt/Cr/Co multilayers by He+-ion irradiation Tripathi, J.K.
2009
267 8-9 p. 1608-1611
4 p.
artikel
91 Molecular dynamics simulations of argon cluster impacts on a nickel film surface Cheng, Y.Y.
2009
267 8-9 p. 1428-1431
4 p.
artikel
92 Molecular dynamics simulations of the structure of latent tracks in quartz and amorphous SiO2 Pakarinen, Olli H.
2009
267 8-9 p. 1456-1459
4 p.
artikel
93 Morphological evolution of films composed of energetic and size-selected silver nanocluster ions Bhattacharyya, S.R.
2009
267 8-9 p. 1432-1435
4 p.
artikel
94 Nanometer-thick SGOI structures produced by Ge+ ion implantation of SiO2 films and subsequent hydrogen transfer of Si layers Tyschenko, I.E.
2009
267 8-9 p. 1277-1280
4 p.
artikel
95 Nanostructured carbide surfaces prepared by surfactant sputtering Hofsäss, H.
2009
267 8-9 p. 1398-1402
5 p.
artikel
96 Nano-structures for sensors on SOI by writing FIB implantation and subsequent anisotropic wet chemical etching Bischoff, L.
2009
267 8-9 p. 1372-1375
4 p.
artikel
97 N ion irradiation enhancement of photocatalytic activity of TiO2 Matsunami, N.
2009
267 8-9 p. 1654-1657
4 p.
artikel
98 Ohmic contacts on n-type layers formed in GaN/AlGaN/GaN by dual-energy Si ion implantation Shiino, Tomohisa
2009
267 8-9 p. 1571-1574
4 p.
artikel
99 Optical contrast formation in amorphous silicon carbide with high-energy focused ion beams Tsvetkova, T.
2009
267 8-9 p. 1583-1587
5 p.
artikel
100 Patterning of insulating surfaces by electronic excitation Akcöltekin, S.
2009
267 8-9 p. 1386-1389
4 p.
artikel
101 Photo gallery 2009
267 8-9 p. viii-x
nvt p.
artikel
102 Photoluminescence induced by Si implantation into Si3N4 matrix Bregolin, F.L.
2009
267 8-9 p. 1314-1316
3 p.
artikel
103 Photoluminescence induced from hot Ge implantation into SiO2 Bregolin, F.L.
2009
267 8-9 p. 1321-1323
3 p.
artikel
104 Point defects induced in ion irradiated 4H–SiC probed by exciton lines Litrico, G.
2009
267 8-9 p. 1243-1246
4 p.
artikel
105 Radiation suppressed oxide growth in the system Ni–Ti–O Lutz, J.
2009
267 8-9 p. 1634-1637
4 p.
artikel
106 Radiation tolerance of fluorite-structured oxides subjected to swift heavy ion irradiation Garrido, Frédérico
2009
267 8-9 p. 1451-1455
5 p.
artikel
107 Regular surface patterns by local swelling induced by He implantation into silicon through nanosphere lithography masks Lindner, J.K.N.
2009
267 8-9 p. 1394-1397
4 p.
artikel
108 Response of materials to single ion events Zhang, Yanwen
2009
267 8-9 p. 1705-1712
8 p.
artikel
109 Self-organized formation of layered carbon–copper nanocomposite films by ion deposition Zutz, Hayo
2009
267 8-9 p. 1356-1359
4 p.
artikel
110 Simulation and fitting of high resolution Rutherford backscattering spectra Borschel, Christian
2009
267 8-9 p. 1737-1739
3 p.
artikel
111 Size effects of gas cluster ions on beam transport, amorphous layer formation and sputtering Toyoda, Noriaki
2009
267 8-9 p. 1415-1419
5 p.
artikel
112 Sputtering of thin benzene films by large noble gas clusters Rzeznik, L.
2009
267 8-9 p. 1436-1439
4 p.
artikel
113 Strain-driven defect evolution in Sn+ implanted Si/SiGe multilayer structure Gaiduk, P.I.
2009
267 8-9 p. 1239-1242
4 p.
artikel
114 Structural and magnetic characterization of plasma ion nitrided layer on 316L stainless steel alloy Öztürk, O.
2009
267 8-9 p. 1540-1545
6 p.
artikel
115 Structural changes of Si surfaces by nitrogen implantation using plasma based ion implantation Nakao, Setsuo
2009
267 8-9 p. 1303-1306
4 p.
artikel
116 Structural study of Co and Au nanoclusters landed onto Cu Jiménez-Sáez, J.C.
2009
267 8-9 p. 1447-1450
4 p.
artikel
117 Study of crater formation and sputtering process with large gas cluster impact by molecular dynamics simulations Aoki, Takaaki
2009
267 8-9 p. 1424-1427
4 p.
artikel
118 Study of selected differential cross-sections of the 28Si(d,p0,p1,p2,p3) reactions for NRA purposes Kokkoris, M.
2009
267 8-9 p. 1744-1747
4 p.
artikel
119 Study of the damage produced in silicon carbide by high energy heavy ions Benyagoub, A.
2009
267 8-9 p. 1255-1258
4 p.
artikel
120 Study of the d+ 11B system differential cross-sections for NRA purposes Kokkoris, M.
2009
267 8-9 p. 1740-1743
4 p.
artikel
121 Surface modification behaviors of glass-like carbon by oxygen ion implantation Nakamura, Kazumasa
2009
267 8-9 p. 1642-1644
3 p.
artikel
122 Surfactant Sputtering: Theory of a new method of surface nanostructuring by ion beams Kree, R.
2009
267 8-9 p. 1403-1406
4 p.
artikel
123 Swift heavy ion induced modifications of optical and microstructural properties of silver–fullerene C60 nanocomposite Singhal, R.
2009
267 8-9 p. 1349-1352
4 p.
artikel
124 Swift-heavy-ion-induced shaping of spherical Ge nanoparticles into disks and rods Schmidt, B.
2009
267 8-9 p. 1345-1348
4 p.
artikel
125 Temperature behavior of damage in sapphire implanted with light ions Alves, E.
2009
267 8-9 p. 1464-1467
4 p.
artikel
126 The correlation between electroluminescence properties and the microstructure of Europium-implanted MOS light emitting diodes Rebohle, L.
2009
267 8-9 p. 1324-1327
4 p.
artikel
127 The effects of energy-loss straggling and elastic scattering models on Monte Carlo calculations of dose distribution functions for 10keV to 1MeV incident electrons in water Bousis, C.
2009
267 8-9 p. 1725-1732
8 p.
artikel
128 The halogen effect for Ni-base alloys – A new method for increasing the oxidation protection at high temperatures Zschau, Hans-Eberhard
2009
267 8-9 p. 1662-1665
4 p.
artikel
129 The influence of annealing on manganese implanted GaAs films Bürger, Danilo
2009
267 8-9 p. 1626-1629
4 p.
artikel
130 The influence of beam divergence on ion-beam induced surface patterns Kree, R.
2009
267 8-9 p. 1407-1411
5 p.
artikel
131 Thermal and irradiation induced interdiffusion in Fe3O4/MgO(001) thin film Kim-Ngan, N.-T.H.
2009
267 8-9 p. 1484-1488
5 p.
artikel
132 Thirtieth Anniversary of Biannual International Conference on Ion Beam Modification of Materials, IBMM – From “Ion Implantation” to “Ion Beam Modification” Gyulai, J.
2009
267 8-9 p. 1217-1221
5 p.
artikel
133 Very low-energy and low-fluence ion beam bombardment of naked plasmid DNA Norarat, R.
2009
267 8-9 p. 1650-1653
4 p.
artikel
134 Voltage–current characteristics of a high-power pulsed sputtering (HPPS) glow discharge and plasma density estimation Yukimura, Ken
2009
267 8-9 p. 1692-1695
4 p.
artikel
135 What is the significance of nitrogen-vacancy centers in the doping into diamond? Nakagawa, S.T.
2009
267 8-9 p. 1226-1228
3 p.
artikel
136 XPS and NRA depth profiling of nitrogen and carbon simultaneously implanted into copper to synthesize C3N4 like compounds Colaux, J.L.
2009
267 8-9 p. 1299-1302
4 p.
artikel
                             136 gevonden resultaten
 
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