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                             26 results found
no title author magazine year volume issue page(s) type
1 Acknowledgment of Reviewers 2007 2007
84 12 p. I-
1 p.
article
2 A pixel-based regularization approach to inverse lithography Poonawala, Amyn
2007
84 12 p. 2837-2852
16 p.
article
3 A study on the correlation between electrochemical corrosion and chemical mechanical polishing performance of W and Ti film Seo, Yong-Jin
2007
84 12 p. 2769-2774
6 p.
article
4 Chemical mechanical planarization operation via dynamic programming Lin, Chia-Shui
2007
84 12 p. 2817-2831
15 p.
article
5 Controlling resist thickness and etch depth for fabrication of 3D structures in electron-beam grayscale lithography Kim, J.
2007
84 12 p. 2859-2864
6 p.
article
6 Dependence of electrical properties on interfacial layer of Ta2O5 films Lee, Jae-Woong
2007
84 12 p. 2865-2868
4 p.
article
7 Dielectric constant of barium titanate/cyanoethyl ester of polyvinyl alcohol composite in comparison with the existing theoretical models Kota, Ravikiran
2007
84 12 p. 2853-2858
6 p.
article
8 Direct stamp fabrication for NIL and hot embossing using HSQ Gadegaard, N.
2007
84 12 p. 2785-2789
5 p.
article
9 Effect of organic acids on copper chemical mechanical polishing Wu, Yung-Fu
2007
84 12 p. 2790-2798
9 p.
article
10 Erratum to: “Temperature effects of pad conditioning process on oxide CMP: Polishing pad, slurry characteristics, and surface reactions” [Microelect. Eng. 83 (2006) 362–370] Kim, Nam-Hoon
2007
84 12 p. 2927-
1 p.
article
11 Evaluation of electrical and optical properties of indium tin oxide thin film using chemical mechanical polishing technique Seo, Yong-Jin
2007
84 12 p. 2896-2900
5 p.
article
12 Fabrication of microfluidic channels derived from a UV/thermally cured preceramic polymer via a soft lithographic technique Lee, Hong-Joo
2007
84 12 p. 2892-2895
4 p.
article
13 Fabrication of SiO2 microdisk arrays for optics and light trapping experiments Saraf, L.V.
2007
84 12 p. 2799-2803
5 p.
article
14 Improved double-recessed 4H-SiC MESFETs structure with recessed source/drain drift region Zhang, Jinping
2007
84 12 p. 2888-2891
4 p.
article
15 Inside Front Cover - Editorial Board 2007
84 12 p. IFC-
1 p.
article
16 Integration of Hf x Ta y N metal gate with SiO2 and HfO x N y gate dielectrics for MOS device applications Yang, Chang-Ta
2007
84 12 p. 2916-2920
5 p.
article
17 Lateral SbTeN based multi-layer phase change memory for multi-state storage Yin, You
2007
84 12 p. 2901-2906
6 p.
article
18 MOS capacitors obtained by wet oxidation of n-type 4H–SiC pre-implanted with nitrogen Poggi, A.
2007
84 12 p. 2804-2809
6 p.
article
19 New materials of spin-on organic hardmask for sub-70nm devices Choi, Sang-Jun
2007
84 12 p. 2832-2836
5 p.
article
20 Simulation and fabrication of high voltage AlGaN/GaN based Schottky diodes with field plate edge termination Remashan, K.
2007
84 12 p. 2907-2915
9 p.
article
21 Source/drain extension region engineering in nanoscale double gate SOI MOSFETs: Novel design methodology for low-voltage analog applications Kranti, Abhinav
2007
84 12 p. 2775-2784
10 p.
article
22 Statistical constraints in nanocrystal memory scaling Gusmeroli, Riccardo
2007
84 12 p. 2869-2874
6 p.
article
23 The electrical characteristics of Sn/methyl-red/p-type Si/Al contacts Aydın, M.E.
2007
84 12 p. 2875-2882
8 p.
article
24 Tuning the dielectric properties of hafnium silicate films Fachmann, Christian
2007
84 12 p. 2883-2887
5 p.
article
25 Vertical poly-Si select pn-diodes for emerging resistive non-volatile memories Golubović, D.S.
2007
84 12 p. 2921-2926
6 p.
article
26 Wavelet monitoring of spatial surface roughness for plasma diagnosis Kim, Byungwhan
2007
84 12 p. 2810-2816
7 p.
article
                             26 results found
 
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