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                             31 results found
no title author magazine year volume issue page(s) type
1 A novel thermal-aware structure of TSV cluster in 3D IC Hou, Ligang
 2016
 153 C p. 110-116
7 p.
 article
2 Author Index 2016
 153 C p. 142-144
3 p.
 article
3 A virtual lateral standard for AFM calibration Koops, Richard
 2016
 153 C p. 29-36
8 p.
 article
4 Development of InSb dry etch for mid-IR applications Pusino, Vincenzo
 2016
 153 C p. 11-14
4 p.
 article
5 Editorial Bol, A.A.
 2016
 153 C p. A1-
1 p.
 article
6 Editorial Board 2016
 153 C p. IFC-
1 p.
 article
7 Effect of annealing on mechanical properties of nickel electrodeposited using supercritical CO2 emulsion evaluated by micro-compression test Nagoshi, Takashi
 2016
 153 C p. 101-104
4 p.
 article
8 Enhancing re-detection efficacy of defects on blank wafers using stealth fiducial markers Bouwens, M.A.J.
 2016
 153 C p. 48-54
7 p.
 article
9 Fabrication and microanalysis of 3D-shell-like chiral nanostructure based on micro-sphere assembled technology Chen, Junyi
 2016
 153 C p. 137-141
5 p.
 article
10 Fabrication of antireflection structures on the surface of optical lenses by using a liquid transfer imprint technique Uchida, Tomoya
 2016
 153 C p. 43-47
5 p.
 article
11 Fabrication of chiral-molecular@ nanoparticle complex materials with great chiroptical effect in visible region Xie, Duan
 2016
 153 C p. 24-28
5 p.
 article
12 Fabrication of high-aspect ratio GaN nanostructures for advanced photonic devices Le Boulbar, E.D.
 2016
 153 C p. 132-136
5 p.
 article
13 Fabrication of high-resolution, self-aligned palladium electrodes Jenni, Laura Vera
 2016
 153 C p. 105-109
5 p.
 article
14 Fabrication of nanocone arrays by two step metal assisted chemical etching method Shimizu, Tomohiro
 2016
 153 C p. 55-59
5 p.
 article
15 Fabrication of narrow-gap nanostructures using electron-beam induced deposition etch masks Weppelman, I.G.C.
 2016
 153 C p. 77-82
6 p.
 article
16 From random to order: Colloidal crystals on non-flat surfaces Coll, Arnau
 2016
 153 C p. 20-23
4 p.
 article
17 High voltage insulation properties of DLC-Parylene multilayer films for microsurgery instruments Banghard, Michael
 2016
 153 C p. 126-131
6 p.
 article
18 Hybrid layering scanning-projection micro-stereolithography for fabrication of conical microlens array and hollow microneedle array Kim, Haeryung
 2016
 153 C p. 15-19
5 p.
 article
19 Low-cost top-down zinc oxide nanowire sensors through a highly transferable ion beam etching for healthcare applications Sun, K.
 2016
 153 C p. 96-100
5 p.
 article
20 Manipulating mimicked magnetosome chains produced Using superparamagnetic microbeads in a confined space Li, Yan-Hom
 2016
 153 C p. 37-42
6 p.
 article
21 Manipulating the switching in modulated iron nanowires grown by focused electron beam induced deposition Córdoba, R.
 2016
 153 C p. 60-65
6 p.
 article
22 Metallization of polyimide films with enlarged area by conducting the catalyzation in supercritical carbon dioxide Chang, Tso-Fu Mark
 2016
 153 C p. 1-4
4 p.
 article
23 Metallization of textile by Pt catalyzation in supercritical carbon dioxide and Pt electroless plating for applications in wearable devise Sano, Mitsuo
 2016
 153 C p. 92-95
4 p.
 article
24 Real-time measurement of replication degree in thermal roller nanoimprinting Hishiki, Kenta
 2016
 153 C p. 117-120
4 p.
 article
25 Scalable fabrication of high performance absorber based on colloid sphere lithography technology Su, Yarong
 2016
 153 C p. 121-125
5 p.
 article
26 Self-relaxation characteristics of roll-to-roll imprinted nanogratings on plastic film Unno, Noriyuki
 2016
 153 C p. 83-87
5 p.
 article
27 Stamp degradation for high volume UV enhanced substrate conformal imprint lithography (UV-SCIL) Haslinger, M.J.
 2016
 153 C p. 66-70
5 p.
 article
28 Supercritical carbon dioxide etching of transition metal (Cu, Ni, Co, Fe) thin films Rasadujjaman, Md
 2016
 153 C p. 5-10
6 p.
 article
29 Table of Contents 2016
 153 C p. v-vi
nvt p.
 article
30 Top–down SiGe nanostructures on Ge membranes realized by e-beam lithography and wet etching Mondiali, V.
 2016
 153 C p. 88-91
4 p.
 article
31 ZEP520A — A resist for electron-beam grayscale lithography and thermal reflow Kirchner, R.
 2016
 153 C p. 71-76
6 p.
 article
                             31 results found
 
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