| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Adhesion of metal coatings on ceramics deposited by different techniques
|
Schmidbauer, S.
|
|
1993
|
59 |
1-3 |
p. 325-329
5 p.
|
artikel
|
| 2 |
A microstructural and morphological study of diamond crystals and films elaborated by microwave plasma assisted chemical vapour deposition
|
Barrat, S.
|
|
1993
|
59 |
1-3 |
p. 330-337
8 p.
|
artikel
|
| 3 |
A plasma-based technique for controlled low energy ion bombardment of dielectric surfaces
|
Martin, D.
|
|
1993
|
59 |
1-3 |
p. 239-243
5 p.
|
artikel
|
| 4 |
A practical model to enable the prediction of coating thickness variations across a flat surface
|
James, A.S.
|
|
1993
|
59 |
1-3 |
p. 48-53
6 p.
|
artikel
|
| 5 |
Arc-enhanced glow discharge in vacuum arc machines
|
Vetter, Jörg
|
|
1993
|
59 |
1-3 |
p. 152-155
4 p.
|
artikel
|
| 6 |
Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputtering
|
Frach, P.
|
|
1993
|
59 |
1-3 |
p. 177-182
6 p.
|
artikel
|
| 7 |
Attempted modelling of thickness and chemical heterogeneity in coatings prepared by d.c. reactive magnetron sputtering
|
Billard, A.
|
|
1993
|
59 |
1-3 |
p. 41-47
7 p.
|
artikel
|
| 8 |
Behaviour of a steered cathodic arc as a function of steering magnetic field
|
Walke, P.J.
|
|
1993
|
59 |
1-3 |
p. 126-128
3 p.
|
artikel
|
| 9 |
Broad range variation in surface tension by plasma-polymerized coatings on polymethyl methacrylate
|
Michaeli, W.
|
|
1993
|
59 |
1-3 |
p. 338-341
4 p.
|
artikel
|
| 10 |
Calculation of ion energy distributions in low frequency r.f. glow discharges
|
James, A.S.
|
|
1993
|
59 |
1-3 |
p. 86-90
5 p.
|
artikel
|
| 11 |
Characterization of a TiN deposition process based on structural studies, plasma diagnostics and mathematical modelling
|
Czerwiec, T.
|
|
1993
|
59 |
1-3 |
p. 91-96
6 p.
|
artikel
|
| 12 |
Coating thickness fall-off with source to substrate distance in PVD processes
|
Fancey, K.S.
|
|
1993
|
59 |
1-3 |
p. 113-116
4 p.
|
artikel
|
| 13 |
Comparison of microwave and r.f. plasmas: fundamentals and applications
|
Moisan, M.
|
|
1993
|
59 |
1-3 |
p. 1-13
13 p.
|
artikel
|
| 14 |
Control of mechanical and structural properties of coatings deposited using unbalanced magnetrons
|
Arnell, R.D.
|
|
1993
|
59 |
1-3 |
p. 105-109
5 p.
|
artikel
|
| 15 |
Control of reactive d.c. magnetron sputtering of SnO2 by means of optical emission
|
Kirchhoff, V.
|
|
1993
|
59 |
1-3 |
p. 101-104
4 p.
|
artikel
|
| 16 |
Deposition and characterization of non-conducting silicon nitride, aluminum nitride and titanium-aluminum nitride thin films
|
Baumvol, I.J.R.
|
|
1993
|
59 |
1-3 |
p. 187-192
6 p.
|
artikel
|
| 17 |
Deposition of graded alloy nitride films by closed field unbalanced magnetron sputtering
|
Monaghan, D.P.
|
|
1993
|
59 |
1-3 |
p. 21-25
5 p.
|
artikel
|
| 18 |
Deposition of Me-C: H coatings from metal organic precursors using a plasma-activated r.f. process
|
Benndorf, C.
|
|
1993
|
59 |
1-3 |
p. 345-349
5 p.
|
artikel
|
| 19 |
Determination of mass and energy distribution of ions in glow discharges
|
Peter, S.
|
|
1993
|
59 |
1-3 |
p. 97-100
4 p.
|
artikel
|
| 20 |
Diagnostics of a d.c. pulsed-plasma-assisted nitriding process
|
Hugon, R.
|
|
1993
|
59 |
1-3 |
p. 82-85
4 p.
|
artikel
|
| 21 |
Direct plasma beam deposition of TiN x layers with an r.f. plasma beam source
|
Weber, F.R.
|
|
1993
|
59 |
1-3 |
p. 234-238
5 p.
|
artikel
|
| 22 |
Editorial Board
|
|
|
1993
|
59 |
1-3 |
p. iii-
1 p.
|
artikel
|
| 23 |
Experimental and theoretical study of the electrical properties of a triode reactor
|
Seeböck, R.J.
|
|
1993
|
59 |
1-3 |
p. 54-58
5 p.
|
artikel
|
| 24 |
Factors influencing the hydrophobic recovery of oxygen-plasma-treated polyethylene
|
Behnisch, J.
|
|
1993
|
59 |
1-3 |
p. 356-358
3 p.
|
artikel
|
| 25 |
High rate deposition of alumina films by reactive gas flow sputtering
|
Jung, T.
|
|
1993
|
59 |
1-3 |
p. 171-176
6 p.
|
artikel
|
| 26 |
Improvement in polymer adhesivity by low and normal pressure plasma surface modification
|
Friedrich, J.F.
|
|
1993
|
59 |
1-3 |
p. 371-378
8 p.
|
artikel
|
| 27 |
Influence of plasma surface treatment on the adhesion of thin films on metals
|
Petasch, W.
|
|
1993
|
59 |
1-3 |
p. 301-305
5 p.
|
artikel
|
| 28 |
Influence of plasma treatment conditions on growth and electrical properties of oxides on InP
|
Bouziane, A.
|
|
1993
|
59 |
1-3 |
p. 121-125
5 p.
|
artikel
|
| 29 |
Influence of the reactive gas flow on chromium nitride sputtering
|
Jensen, H.
|
|
1993
|
59 |
1-3 |
p. 135-139
5 p.
|
artikel
|
| 30 |
In-situ monitoring of electron cyclotron resonance plasma chemical vapour deposition of hydrogenated silicon nitride films
|
Boumerzoug, Mohamed
|
|
1993
|
59 |
1-3 |
p. 77-81
5 p.
|
artikel
|
| 31 |
Investigations concerning the role of hydrogen in the deposition of diamond films
|
Joeris, P.
|
|
1993
|
59 |
1-3 |
p. 310-315
6 p.
|
artikel
|
| 32 |
Ion-assisted modification of the condensation of thermal carbon atoms
|
Ullmann, J.
|
|
1993
|
59 |
1-3 |
p. 255-260
6 p.
|
artikel
|
| 33 |
Ion nitriding of Armco iron in various glow discharge regions
|
Michalski, Jerzy
|
|
1993
|
59 |
1-3 |
p. 321-324
4 p.
|
artikel
|
| 34 |
Laser induced plasma: a source of control of the properties of thin films
|
Kreutz, E.W.
|
|
1993
|
59 |
1-3 |
p. 26-31
6 p.
|
artikel
|
| 35 |
Layers of high speed steel with microstructures characteristics of heat-treated materials
|
Michalski, A.
|
|
1993
|
59 |
1-3 |
p. 287-289
3 p.
|
artikel
|
| 36 |
Microstructure, corrosion and tribological behaviour of plasma immersion ion-implanted austenitic stainless steel
|
Samandi, M.
|
|
1993
|
59 |
1-3 |
p. 261-266
6 p.
|
artikel
|
| 37 |
Modelling of a microwave postdischarge nitriding reactor
|
Malvos, H.
|
|
1993
|
59 |
1-3 |
p. 59-66
8 p.
|
artikel
|
| 38 |
Modelling of discharges and non-thermal plasmas—applications to plasma processing
|
Boeuf, J.P.
|
|
1993
|
59 |
1-3 |
p. 32-40
9 p.
|
artikel
|
| 39 |
Modification of near-surface regions in Si by low energy particles
|
Klose, Heinz A.
|
|
1993
|
59 |
1-3 |
p. 221-225
5 p.
|
artikel
|
| 40 |
Modification of the mechanical surface properties and tribochemistry of structural ceramics by ion beam techniques
|
Fischer, W.
|
|
1993
|
59 |
1-3 |
p. 249-254
6 p.
|
artikel
|
| 41 |
New flexible reactor design for R&D PECVD deposition systems
|
Arendt, R.
|
|
1993
|
59 |
1-3 |
p. 148-151
4 p.
|
artikel
|
| 42 |
Optical properties of plasma polymer films
|
Poll, H.-U.
|
|
1993
|
59 |
1-3 |
p. 365-370
6 p.
|
artikel
|
| 43 |
Oxidation resistance of PVD Cr, Cr-N and Cr-N-O hard coatings
|
Navinšek, B.
|
|
1993
|
59 |
1-3 |
p. 244-248
5 p.
|
artikel
|
| 44 |
PC system for improving the control of reactive gas dosage in sputtering processes for film deposition
|
Pedersen, G.N.
|
|
1993
|
59 |
1-3 |
p. 110-112
3 p.
|
artikel
|
| 45 |
Plasma-assisted deposition of hard material layers from organometallic precursors
|
Täschner, Ch.
|
|
1993
|
59 |
1-3 |
p. 207-211
5 p.
|
artikel
|
| 46 |
Plasma-enhanced chemical vapour deposition of thin insulator films and reactor cleaning
|
Vogt, M.
|
|
1993
|
59 |
1-3 |
p. 306-309
4 p.
|
artikel
|
| 47 |
Plasma immersion ion implantation—the role of diffusion
|
Collins, G.A.
|
|
1993
|
59 |
1-3 |
p. 267-273
7 p.
|
artikel
|
| 48 |
Plasma polymerization of silicon organic membranes for gas separation
|
Weichart, J.
|
|
1993
|
59 |
1-3 |
p. 342-344
3 p.
|
artikel
|
| 49 |
Plasma treatment for cleaning of metal parts
|
Fessmann, J.
|
|
1993
|
59 |
1-3 |
p. 290-296
7 p.
|
artikel
|
| 50 |
Preface
|
Oechsner, Hans
|
|
1993
|
59 |
1-3 |
p. v-
1 p.
|
artikel
|
| 51 |
Preparation and performance of (Cr, Ti) N coatings deposited by a combined hollow cathode and cathodic arc technique
|
Ebersbach, G.
|
|
1993
|
59 |
1-3 |
p. 160-165
6 p.
|
artikel
|
| 52 |
Process and advantage of multicomponent and multilayer PVD coatings
|
Knotek, O.
|
|
1993
|
59 |
1-3 |
p. 14-20
7 p.
|
artikel
|
| 53 |
Process control of plasma nitriding and plasma nitrocarburizing in industry
|
Rembges, W.
|
|
1993
|
59 |
1-3 |
p. 129-134
6 p.
|
artikel
|
| 54 |
Pulsed barrier discharges for thin film production at atmospheric pressure
|
Reitz, U.
|
|
1993
|
59 |
1-3 |
p. 144-147
4 p.
|
artikel
|
| 55 |
Reactive magnetron sputtering of zirconium carbide films using Ar-CH4 gas mixtures
|
Brückner, J.
|
|
1993
|
59 |
1-3 |
p. 166-170
5 p.
|
artikel
|
| 56 |
Remote plasma-enhanced chemical vapour deposition with metal organic source gases: principles and applications
|
Kulisch, Wilhelm
|
|
1993
|
59 |
1-3 |
p. 193-201
9 p.
|
artikel
|
| 57 |
RFe2 (R=rare earth) thin film formation by an ion beam sputtering system with a plasma filament type ion source
|
Matsumura, Y.
|
|
1993
|
59 |
1-3 |
p. 156-159
4 p.
|
artikel
|
| 58 |
R.f. magnetron sputter deposition of Cr2O3 layers on ceramic Al2O3 substrates
|
Rothhaar, U.
|
|
1993
|
59 |
1-3 |
p. 183-186
4 p.
|
artikel
|
| 59 |
Some technical aspects of ion implantation as an industrial process for surface modification of metal
|
Körber, Franz-Josef
|
|
1993
|
59 |
1-3 |
p. 226-233
8 p.
|
artikel
|
| 60 |
Spectroscopy of flowing discharges and post-discharges in reactive gases
|
Ricard, A.
|
|
1993
|
59 |
1-3 |
p. 67-76
10 p.
|
artikel
|
| 61 |
Sputter coating on high speed steel tube using a hybrid plasma produced by coaxial ECR and magnetron discharges
|
Fujiyama, Hiroshi
|
|
1993
|
59 |
1-3 |
p. 140-143
4 p.
|
artikel
|
| 62 |
Superimposed pulse bias voltage used in arc and sputter technology
|
Olbrich, W.
|
|
1993
|
59 |
1-3 |
p. 274-280
7 p.
|
artikel
|
| 63 |
Surface etching of three-dimensional carbon-fibre-reinforced plastics in a dual-frequency mode plasma (40 kHz and 2.45 GHz)
|
Meyer, M.
|
|
1993
|
59 |
1-3 |
p. 297-300
4 p.
|
artikel
|
| 64 |
Surface modification of polypropylene in oxygen and nitrogen plasmas
|
Harth, K.
|
|
1993
|
59 |
1-3 |
p. 350-355
6 p.
|
artikel
|
| 65 |
Synthesis of Al2O3 condensates from impulse plasma
|
Zdunek, Krzysztof
|
|
1993
|
59 |
1-3 |
p. 281-286
6 p.
|
artikel
|
| 66 |
Synthesis of thin coatings by plasma-assisted chemical vapour deposition using metallo-organic compounds as precursors
|
Rie, K.-T.
|
|
1993
|
59 |
1-3 |
p. 202-206
5 p.
|
artikel
|
| 67 |
The formation of Ti(OCN) layers produced from metal—organic compounds using plasma-assisted chemical vapour deposition
|
Wierzchoń, T.
|
|
1993
|
59 |
1-3 |
p. 217-220
4 p.
|
artikel
|
| 68 |
The influence of additive rare earths on ion carburization
|
Li, Guoqing
|
|
1993
|
59 |
1-3 |
p. 117-120
4 p.
|
artikel
|
| 69 |
Thin conductive coatings formed by plasma polymerization of 2-iodothiophene
|
Kruse, A.
|
|
1993
|
59 |
1-3 |
p. 359-364
6 p.
|
artikel
|
| 70 |
Thin copper films deposited by low temperature plasma-enhanced metal organic chemical vapour deposition using copper-acetylacetonate
|
Hamerich, A.
|
|
1993
|
59 |
1-3 |
p. 212-216
5 p.
|
artikel
|
| 71 |
Topological effects regarding trench structures covered with LPCVD and PECVD thin films
|
Schlote, J.
|
|
1993
|
59 |
1-3 |
p. 316-320
5 p.
|
artikel
|
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