nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A mass-spectroscopical study of the decomposition of Ti(NMe2)4 in a mixed Ar–H2–N2 pulsed d.c. plasma
|
Driessen, J.P.A.M. |
|
1998 |
110 |
3 |
p. 173-183 11 p. |
artikel |
2 |
Composite TiN–Ni thin films deposited by reactive magnetron sputter ion-plating
|
Mišina, M |
|
1998 |
110 |
3 |
p. 168-172 5 p. |
artikel |
3 |
Enhancement of the properties of pulsed laser-deposited carbon nitride by the synchronisation of laser and N2 gas jet pulses 1 This paper was first presented at the ICMCTF'98 Conference held in San Diego, CA, in April 1998. 1
|
Alexandrou, I. |
|
1998 |
110 |
3 |
p. 147-152 6 p. |
artikel |
4 |
High-resolution electron microscopy analysis of microstructural changes in WO x electrochromic films
|
Wang, X.-G |
|
1998 |
110 |
3 |
p. 184-187 4 p. |
artikel |
5 |
Index
|
|
|
1998 |
110 |
3 |
p. 200- 1 p. |
artikel |
6 |
Index
|
|
|
1998 |
110 |
3 |
p. 201-203 3 p. |
artikel |
7 |
Morphology and characterization of the anodic coating on galvanized steels prepared by alternating currents
|
Tan, T.R. |
|
1998 |
110 |
3 |
p. 194-199 6 p. |
artikel |
8 |
Plasma electrolytic fabrication of oxide ceramic surface layers for tribotechnical purposes on aluminium alloys
|
Yerokhin, A.L. |
|
1998 |
110 |
3 |
p. 140-146 7 p. |
artikel |
9 |
Preparation of thin film resistors with low resistivity and low TCR by heat treatment of multilayered Cu/Ni deposits
|
Ishikawa, Masami |
|
1998 |
110 |
3 |
p. 121-127 7 p. |
artikel |
10 |
Room-temperature growth of high-purity titanium nitride by laser ablation of titanium in a nitrogen atmosphere
|
Gu, H.D |
|
1998 |
110 |
3 |
p. 153-157 5 p. |
artikel |
11 |
Rutile-type titanium oxide films synthesized by filtered arc deposition
|
Zhang, Feng |
|
1998 |
110 |
3 |
p. 136-139 4 p. |
artikel |
12 |
Surface discharge characteristics of MgO thin films prepared by RF reactive magnetron sputtering
|
Park, Chung-Hoo |
|
1998 |
110 |
3 |
p. 128-135 8 p. |
artikel |
13 |
Tribological properties and hardness of silicon nitride ceramics after ion implantation and subsequent annealing
|
Brenscheidt, F. |
|
1998 |
110 |
3 |
p. 188-193 6 p. |
artikel |
14 |
Use of a theoretical model to investigate RF and DC reactive sputtering of titanium and chromium oxide coatings
|
Martin, Nicolas |
|
1998 |
110 |
3 |
p. 158-167 10 p. |
artikel |