| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Annealing behaviour of vapour-deposited AlRh thin films
|
Chaudhury, Zariff A.
|
|
1982
|
98 |
3 |
p. 233-239
7 p.
|
artikel
|
| 2 |
Crystallization of amorphous antimony films deposited onto glass substrates in ultrahigh vacuum
|
Hashimoto, Mituru
|
|
1982
|
98 |
3 |
p. 197-201
5 p.
|
artikel
|
| 3 |
Crystallization of substrate-confined liquid indium
|
Ueda, Masaaki
|
|
1982
|
98 |
3 |
p. 241-247
7 p.
|
artikel
|
| 4 |
Electron microscopy investigation of structure and morphology of small supported metal particles of palladium
|
Robinson, F.
|
|
1982
|
98 |
3 |
p. 179-196
18 p.
|
artikel
|
| 5 |
Growth of tellurium films evaporated on NaCl, KBr and KCl substrates
|
Okuyama, K.
|
|
1982
|
98 |
3 |
p. 203-210
8 p.
|
artikel
|
| 6 |
Microdiffraction patterns of icosahedral particles
|
Gómez, A.
|
|
1982
|
98 |
3 |
p. L95-L97
nvt p.
|
artikel
|
| 7 |
Modified flash evaporation technique for the preparation of thin amorphous semiconductor films
|
Kahnt, Hanno
|
|
1982
|
98 |
3 |
p. 211-214
4 p.
|
artikel
|
| 8 |
Réalisation et études des couches minces évaporées de SnSe2
|
Tran Quan, Dang
|
|
1982
|
98 |
3 |
p. 165-177
13 p.
|
artikel
|
| 9 |
The fabrication of both n-type and p-type GaAs thin films deposited by troide sputtering
|
Mosher, D.M.
|
|
1982
|
98 |
3 |
p. 215-228
14 p.
|
artikel
|
| 10 |
The formation of SiO2 films on silicon by high dose oxygen ion implantation
|
Kreissig, U.
|
|
1982
|
98 |
3 |
p. 229-232
4 p.
|
artikel
|
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