nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Advanced key technologies for magnetron sputtering and PECVD of inorganic and hybrid transparent coatings
|
Frach, Peter |
|
2010 |
518 |
11 |
p. 3105-3108 4 p. |
artikel |
2 |
Advances in chromogenic materials and devices
|
Granqvist, C.G. |
|
2010 |
518 |
11 |
p. 3046-3053 8 p. |
artikel |
3 |
Al-doped ZnO (AZO) films deposited by reactive sputtering with unipolar-pulsing and plasma-emission control systems
|
Hirohata, Kento |
|
2010 |
518 |
11 |
p. 2980-2983 4 p. |
artikel |
4 |
Analysis of carrier modulation in channel of ferroelectric-gate transistors having polar semiconductor
|
Fukushima, Tadahiro |
|
2010 |
518 |
11 |
p. 3026-3029 4 p. |
artikel |
5 |
Application of hydrogen-doped In2O3 transparent conductive oxide to thin-film microcrystalline Si solar cells
|
Koida, Takashi |
|
2010 |
518 |
11 |
p. 2930-2933 4 p. |
artikel |
6 |
A study of deposition of ITO films on organic layer using facing target sputtering in Ar and Kr gases
|
Lei, Hao |
|
2010 |
518 |
11 |
p. 2926-2929 4 p. |
artikel |
7 |
Blue PL and EL emissions from Bi-activated binary oxide thin-film phosphors
|
Fukada, Haruki |
|
2010 |
518 |
11 |
p. 3067-3070 4 p. |
artikel |
8 |
Characteristics of laser-annealed ZnO thin film transistors
|
Kim, Jun-Je |
|
2010 |
518 |
11 |
p. 3022-3025 4 p. |
artikel |
9 |
Characterization of MgZnO films grown by plasma enhanced metal-organic chemical vapor deposition
|
Asahara, Hirokazu |
|
2010 |
518 |
11 |
p. 2953-2956 4 p. |
artikel |
10 |
Characterization of Zn1− x Mg x O transparent conducting thin films fabricated by multi-cathode RF-magnetron sputtering
|
Maejima, K. |
|
2010 |
518 |
11 |
p. 2949-2952 4 p. |
artikel |
11 |
Comparative study of resistivity characteristics between transparent conducting AZO and GZO thin films for use at high temperatures
|
Nomoto, Jun-ichi |
|
2010 |
518 |
11 |
p. 2937-2940 4 p. |
artikel |
12 |
Comprehensive studies on the stabilities of a-In-Ga-Zn-O based thin film transistor by constant current stress
|
Nomura, Kenji |
|
2010 |
518 |
11 |
p. 3012-3016 5 p. |
artikel |
13 |
Contents
|
|
|
2010 |
518 |
11 |
p. iii-v nvt p. |
artikel |
14 |
Control of carrier concentration of p-type transparent conducting CuScO2(0001) epitaxial films
|
Kakehi, Yoshiharu |
|
2010 |
518 |
11 |
p. 3097-3100 4 p. |
artikel |
15 |
Control of cathodic potential for deposition of ZnO by constant-current electrochemical method
|
Nouzu, Naoya |
|
2010 |
518 |
11 |
p. 2957-2960 4 p. |
artikel |
16 |
DC sputter deposition of amorphous indium–gallium–zinc–oxide (a-IGZO) films with H2O introduction
|
Aoi, Takafumi |
|
2010 |
518 |
11 |
p. 3004-3007 4 p. |
artikel |
17 |
Development of new transparent conductors and device applications utilizing a multidisciplinary approach
|
Szyszka, Bernd |
|
2010 |
518 |
11 |
p. 3109-3114 6 p. |
artikel |
18 |
Device characteristics improvement of a-In–Ga–Zn–O TFTs by low-temperature annealing
|
Kikuchi, Yutomo |
|
2010 |
518 |
11 |
p. 3017-3021 5 p. |
artikel |
19 |
Discharge characteristics of a plasma display panel with hump-shape electrodes
|
Song, In Cheol |
|
2010 |
518 |
11 |
p. 3122-3125 4 p. |
artikel |
20 |
Effect of sublayer surface treatments on ZnO transparent conductive oxides using dc magnetron sputtering
|
Imanishi, Yasuo |
|
2010 |
518 |
11 |
p. 2945-2948 4 p. |
artikel |
21 |
Electronic structural analysis of transparent In2O3–ZnO films by hard X-ray photoelectron spectroscopy
|
Shibuya, Tadao |
|
2010 |
518 |
11 |
p. 3008-3011 4 p. |
artikel |
22 |
Enhanced characterization of ITO films deposited on PET by RF superimposed DC magnetron sputtering
|
Kim, S.I. |
|
2010 |
518 |
11 |
p. 3085-3088 4 p. |
artikel |
23 |
Fabrication of GaN epitaxial thin film on InGaZnO4 single-crystalline buffer layer
|
Shinozaki, Tomomasa |
|
2010 |
518 |
11 |
p. 2996-2999 4 p. |
artikel |
24 |
Fabrication of highly conductive Ta-doped SnO2 polycrystalline films on glass using seed-layer technique by pulse laser deposition
|
Nakao, Shoichiro |
|
2010 |
518 |
11 |
p. 3093-3096 4 p. |
artikel |
25 |
Fabrication of Tb–Mg codoped CaSnO3 perovskite thin films and electroluminescence devices
|
Ueda, Kazushige |
|
2010 |
518 |
11 |
p. 3063-3066 4 p. |
artikel |
26 |
Growth process observation of homoepitaxial ZnO thin films using optical emission spectra during pulsed laser deposition
|
Nakamura, Tatsuru |
|
2010 |
518 |
11 |
p. 2971-2974 4 p. |
artikel |
27 |
Highly flexible indium zinc oxide electrode grown on PET substrate by cost efficient roll-to-roll sputtering process
|
Park, Yong-Seok |
|
2010 |
518 |
11 |
p. 3071-3074 4 p. |
artikel |
28 |
Highly sensitive ultraviolet detector using a ZnO/Si layered SAW oscillator
|
Wei, Ching-Liang |
|
2010 |
518 |
11 |
p. 3059-3062 4 p. |
artikel |
29 |
Improvements of spatial resistivity distribution in transparent conducting Al-doped ZnO thin films deposited by DC magnetron sputtering
|
Oda, Jun-ichi |
|
2010 |
518 |
11 |
p. 2984-2987 4 p. |
artikel |
30 |
Influence of VI/II ratios on the growth of ZnO thin films on sapphire substrates by low temperature MOCVD
|
Kong, Bo Hyun |
|
2010 |
518 |
11 |
p. 2975-2979 5 p. |
artikel |
31 |
Investigation of brittle failure in transparent conductive oxide and permeation barrier oxide multilayers on flexible polymers
|
Lee, Gun-Hwan |
|
2010 |
518 |
11 |
p. 3075-3080 6 p. |
artikel |
32 |
Microstructure of a-plane ZnO grown on LaAlO3 (001)
|
Wang, Wei-Lin |
|
2010 |
518 |
11 |
p. 2967-2970 4 p. |
artikel |
33 |
[No title]
|
Hosono, Hideo |
|
2010 |
518 |
11 |
p. 2925- 1 p. |
artikel |
34 |
OLED manufacturing for large area lighting applications
|
Eritt, M. |
|
2010 |
518 |
11 |
p. 3042-3045 4 p. |
artikel |
35 |
Optical on-line monitoring for the long-term stabilization of a reactive mid-frequency sputtering process of Al-doped zinc oxide films
|
Sittinger, V. |
|
2010 |
518 |
11 |
p. 3115-3118 4 p. |
artikel |
36 |
Plastic substrate with gas barrier layer and transparent conductive oxide thin film for flexible displays
|
Hanada, Toru |
|
2010 |
518 |
11 |
p. 3089-3092 4 p. |
artikel |
37 |
Polycrystalline ZnO: B grown by LPCVD as TCO for thin film silicon solar cells
|
Faÿ, Sylvie |
|
2010 |
518 |
11 |
p. 2961-2966 6 p. |
artikel |
38 |
Potential of thin-film silicon solar cells by using high haze TCO superstrates
|
Krc, J. |
|
2010 |
518 |
11 |
p. 3054-3058 5 p. |
artikel |
39 |
Properties of Ce-doped ITO films deposited on polymer substrate by DC magnetron sputtering
|
Kang, Y.M. |
|
2010 |
518 |
11 |
p. 3081-3084 4 p. |
artikel |
40 |
Review of pulmonary toxicity of indium compounds to animals and humans
|
Tanaka, Akiyo |
|
2010 |
518 |
11 |
p. 2934-2936 3 p. |
artikel |
41 |
Role of high-k gate insulators for oxide thin film transistors
|
Lee, Sang Yeol |
|
2010 |
518 |
11 |
p. 3030-3032 3 p. |
artikel |
42 |
Steady-state photoconductivity of amorphous In–Ga–Zn–O
|
Lee, Dong Hee |
|
2010 |
518 |
11 |
p. 3000-3003 4 p. |
artikel |
43 |
Substrate engineering of LaAlO3 for non-polar ZnO growth
|
Ho, Yen-Teng |
|
2010 |
518 |
11 |
p. 2988-2991 4 p. |
artikel |
44 |
Surface-oxidized tungsten for energy-storable dye-sensitized solar cells
|
Saito, Yosuke |
|
2010 |
518 |
11 |
p. 3033-3036 4 p. |
artikel |
45 |
The effect of annealing on Al-doped ZnO films deposited by RF magnetron sputtering method for transparent electrodes
|
Cho, Hyung Jun |
|
2010 |
518 |
11 |
p. 2941-2944 4 p. |
artikel |
46 |
The effects of permittivity and thickness of dielectric layers on micro dielectric barrier discharges
|
Shim, Seung Bo |
|
2010 |
518 |
11 |
p. 3037-3041 5 p. |
artikel |
47 |
Thermal crystallization kinetics and crystallite size distribution of amorphous ITO film deposited in the presence or absence of water vapor
|
Wang, Meihan |
|
2010 |
518 |
11 |
p. 2992-2995 4 p. |
artikel |
48 |
Thermophysical properties of aluminum oxide and molybdenum layered films
|
Oka, Nobuto |
|
2010 |
518 |
11 |
p. 3119-3121 3 p. |
artikel |
49 |
Transparent conducting Nb-doped anatase TiO2 (TNO) thin films sputtered from various oxide targets
|
Yamada, Naoomi |
|
2010 |
518 |
11 |
p. 3101-3104 4 p. |
artikel |