nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Comments on “Stress in vapor-deposited nickel film”
|
Klokholm, E. |
|
1969 |
4 |
1 |
p. R9-R10 nvt p. |
artikel |
2 |
Correlation between Hall effect changes due to gas chemisorption and the thickness dependence of the Hall coefficient in thin metallic films
|
Comşa, Gerda |
|
1969 |
4 |
1 |
p. 1-14 14 p. |
artikel |
3 |
Editorial Board
|
|
|
1969 |
4 |
1 |
p. v- 1 p. |
artikel |
4 |
Effect of deposition rate on basic properties of thin CdSe films
|
Kubový, A. |
|
1969 |
4 |
1 |
p. 35-40 6 p. |
artikel |
5 |
Effect of ion bombardment on the adhesion of aluminium films on glass
|
Collins, L.E. |
|
1969 |
4 |
1 |
p. 41-45 5 p. |
artikel |
6 |
Eine neue messmethode von diffusionsprozessen dünner metallschichten im dielektrischen medium
|
Hamerský, J. |
|
1969 |
4 |
1 |
p. 15-23 9 p. |
artikel |
7 |
Forthcoming meetings
|
|
|
1969 |
4 |
1 |
p. 80- 1 p. |
artikel |
8 |
Optical absorption and dispersion in evaporated films of cobalt difluoride
|
Young, P.A. |
|
1969 |
4 |
1 |
p. 25-33 9 p. |
artikel |
9 |
Oxidation behaviour of metal at its allotropic transformation temperature
|
Chattopadhyay, B. |
|
1969 |
4 |
1 |
p. R5-R8 nvt p. |
artikel |
10 |
Pseudomorphism in the (100) Ni-Cu system
|
Kuntze, R. |
|
1969 |
4 |
1 |
p. 47-60 14 p. |
artikel |
11 |
Range of validity of the WKB tunnel probability, and comparison of experimental data and theory
|
Gundlach, K.H. |
|
1969 |
4 |
1 |
p. 61-79 19 p. |
artikel |
12 |
Surface “melting” or supercooling?
|
Fisher, J.H. |
|
1969 |
4 |
1 |
p. R1-R3 nvt p. |
artikel |