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                             18 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Author index 1990
185 2 p. 374-
1 p.
artikel
2 Characteristics of neutralized indium tin oxide-polycrystalline silicon Mudrik, M.
1990
185 2 p. 257-264
8 p.
artikel
3 Contents of vol. 185 1990
185 2 p. 375-377
3 p.
artikel
4 Corrigendum 1990
185 2 p. 373-
1 p.
artikel
5 Deposition of carbon films by bias magnetron sputtering in neon and argon Petrov, I.
1990
185 2 p. 247-256
10 p.
artikel
6 Device applications of Langmuir-Blodgett films: Electrophotographic photoreceptors incorporating multilayers of fluorenylidene and carbazole-containing surfactants as charge-blocking elements Taylor, Joseph W.
1990
185 2 p. 321-334
14 p.
artikel
7 Effects of borophosilicate film post-growth treatments on the flow angle Tsai, Y.H.
1990
185 2 p. 363-371
9 p.
artikel
8 Infrared and Raman spectra of reactively sputtered amorphous GeNxH film Guanghua, Chen
1990
185 2 p. 231-234
4 p.
artikel
9 Laser-induced geometrical change of fluorescent traps in cast thin films of ω-(1-pyrenyl) alkanoic acids Itaya, Akira
1990
185 2 p. 307-320
14 p.
artikel
10 On the breakdown statistics of very thin SiO2 films Suñé, J.
1990
185 2 p. 347-362
16 p.
artikel
11 Preparation of surfactant multilayer films on solid substrates by deposition from organic solution Seul, M.
1990
185 2 p. 287-305
19 p.
artikel
12 Real-time microfluorescence studies of Langmuir-Blodgett deposition: Monolayer adsorption and desorption Riegler, H.
1990
185 2 p. 335-340
6 p.
artikel
13 Spray pyrolysis elecrochromic WO3 films: Electrical and X-ray diffraction measurements Zhang, Jianping
1990
185 2 p. 265-277
13 p.
artikel
14 The influence of iron on properties of deposited NiCrSi resistors Chang, Fan Bai
1990
185 2 p. 341-346
6 p.
artikel
15 The morphology and orientation of CrN films deposited by reactive ion plating Wang, Dongdong
1990
185 2 p. 219-230
12 p.
artikel
16 Thermodynamic investigation of selective molybdenum chemical vapour deposition: Influence of growth conditions and gas additives on the selectivity of the process HÅrsta, Anders
1990
185 2 p. 235-246
12 p.
artikel
17 The structure of thin films deposited from a sintered tungsten carbide with a high cobalt content (15 wt.%) Cavaleiro, A.
1990
185 2 p. 199-217
19 p.
artikel
18 Thin film thickness measurement using the energy-dispersive spectroscopy technique in a scanning electron microscope Pascual, R.
1990
185 2 p. 279-286
8 p.
artikel
                             18 gevonden resultaten
 
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