nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Author index
|
|
|
1990 |
185 |
2 |
p. 374- 1 p. |
artikel |
2 |
Characteristics of neutralized indium tin oxide-polycrystalline silicon
|
Mudrik, M. |
|
1990 |
185 |
2 |
p. 257-264 8 p. |
artikel |
3 |
Contents of vol. 185
|
|
|
1990 |
185 |
2 |
p. 375-377 3 p. |
artikel |
4 |
Corrigendum
|
|
|
1990 |
185 |
2 |
p. 373- 1 p. |
artikel |
5 |
Deposition of carbon films by bias magnetron sputtering in neon and argon
|
Petrov, I. |
|
1990 |
185 |
2 |
p. 247-256 10 p. |
artikel |
6 |
Device applications of Langmuir-Blodgett films: Electrophotographic photoreceptors incorporating multilayers of fluorenylidene and carbazole-containing surfactants as charge-blocking elements
|
Taylor, Joseph W. |
|
1990 |
185 |
2 |
p. 321-334 14 p. |
artikel |
7 |
Effects of borophosilicate film post-growth treatments on the flow angle
|
Tsai, Y.H. |
|
1990 |
185 |
2 |
p. 363-371 9 p. |
artikel |
8 |
Infrared and Raman spectra of reactively sputtered amorphous GeNxH film
|
Guanghua, Chen |
|
1990 |
185 |
2 |
p. 231-234 4 p. |
artikel |
9 |
Laser-induced geometrical change of fluorescent traps in cast thin films of ω-(1-pyrenyl) alkanoic acids
|
Itaya, Akira |
|
1990 |
185 |
2 |
p. 307-320 14 p. |
artikel |
10 |
On the breakdown statistics of very thin SiO2 films
|
Suñé, J. |
|
1990 |
185 |
2 |
p. 347-362 16 p. |
artikel |
11 |
Preparation of surfactant multilayer films on solid substrates by deposition from organic solution
|
Seul, M. |
|
1990 |
185 |
2 |
p. 287-305 19 p. |
artikel |
12 |
Real-time microfluorescence studies of Langmuir-Blodgett deposition: Monolayer adsorption and desorption
|
Riegler, H. |
|
1990 |
185 |
2 |
p. 335-340 6 p. |
artikel |
13 |
Spray pyrolysis elecrochromic WO3 films: Electrical and X-ray diffraction measurements
|
Zhang, Jianping |
|
1990 |
185 |
2 |
p. 265-277 13 p. |
artikel |
14 |
The influence of iron on properties of deposited NiCrSi resistors
|
Chang, Fan Bai |
|
1990 |
185 |
2 |
p. 341-346 6 p. |
artikel |
15 |
The morphology and orientation of CrN films deposited by reactive ion plating
|
Wang, Dongdong |
|
1990 |
185 |
2 |
p. 219-230 12 p. |
artikel |
16 |
Thermodynamic investigation of selective molybdenum chemical vapour deposition: Influence of growth conditions and gas additives on the selectivity of the process
|
HÅrsta, Anders |
|
1990 |
185 |
2 |
p. 235-246 12 p. |
artikel |
17 |
The structure of thin films deposited from a sintered tungsten carbide with a high cobalt content (15 wt.%)
|
Cavaleiro, A. |
|
1990 |
185 |
2 |
p. 199-217 19 p. |
artikel |
18 |
Thin film thickness measurement using the energy-dispersive spectroscopy technique in a scanning electron microscope
|
Pascual, R. |
|
1990 |
185 |
2 |
p. 279-286 8 p. |
artikel |