nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
An investigation of the possibility of Bose condensation of excitons in semiconducting films
|
Haroutyunian, V.A. |
|
1984 |
115 |
3 |
p. 245-251 7 p. |
artikel |
2 |
Deposition of transparent conducting indium tin oxide thin films by reactive ion plating
|
Yuanri, Cui |
|
1984 |
115 |
3 |
p. 195-201 7 p. |
artikel |
3 |
Influence of oxygen on the behaviour of diodes fabricated from sputtered TiO2 films on gold
|
Jérisian, R. |
|
1984 |
115 |
3 |
p. 229-235 7 p. |
artikel |
4 |
Internal stress and structure of evaporated chromium and MgF2 films and their dependence on substrate temperature
|
Abermann, R. |
|
1984 |
115 |
3 |
p. 185-194 10 p. |
artikel |
5 |
Preferential ionization in reactive sputtering discharges
|
Hecq, M. |
|
1984 |
115 |
3 |
p. L45-L48 nvt p. |
artikel |
6 |
Roughness contributions to resolution in ion sputter depth profiles of polycrystalline metal films
|
Seah, M.P. |
|
1984 |
115 |
3 |
p. 203-216 14 p. |
artikel |
7 |
Selected area, stationary beam cratering for high sensitivity depth profiling with a computerized Auger microprobe
|
Poppa, Helmut |
|
1984 |
115 |
3 |
p. 217-228 12 p. |
artikel |
8 |
Structured selective coatings
|
Patel, R.D. |
|
1984 |
115 |
3 |
p. 169-184 16 p. |
artikel |
9 |
The simultaneous growth of monocrystalline and polycrystalline silicon films with controlled parameters
|
Abdullayev, A.G. |
|
1984 |
115 |
3 |
p. 237-243 7 p. |
artikel |