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                             26 results found
no title author magazine year volume issue page(s) type
1 A comprehensive sequence for the electron beam exposure system
16 3 p. 44
 article
2 Advanced step and repeat aligner for VLSI Dey, Jim
16 3 p. 23-33
 article
3 A fully-scaled NMOS technology for VLSI circuits Lee, J.Y.
16 3 p. 34-40
 article
4 An approach to ensure stability of precision laser trimmed thick film resistors
16 3 p. 45
 article
5 A simulative approach to electron conduction is thick-film resistors
16 3 p. 45
 article
6 Ceramic on metal substrates produced by plasma spraying for thick film technology
16 3 p. 44
 article
7 Contents No. 6 January 1985
16 3 p. 42
 article
8 Current noise is thick and thin film resistors
16 3 p. 45
 article
9 Design for testability—a survey
16 3 p. 44-45
 article
10 Developments in crystal growth from high-temperature solutions
16 3 p. 44
 article
11 Dictionary of Microprocessor Systems Wilson, Ken
16 3 p. 41
 article
12 Editorial Butcher, John
16 3 p. 3
 article
13 Engineering Research Centres Howson, Mark
16 3 p. 41
 article
14 Evaluation of Du Pont copper-compatible resistor system
16 3 p. 45
 article
15 Float-zoning of semiconductor silicon: a perspective
16 3 p. 43-44
 article
16 Forthcoming events
16 3 p. 47-48
 article
17 Interfacing multi-processors using devices with dual-port RAM Gonzales, David Ruimy
16 3 p. 5-12
 article
18 New bubble-memory packaging cuts board space and manufacturing costs
16 3 p. 43
 article
19 On discrete hazard functions
16 3 p. 45
 article
20 ROMs to bubbles: non-volatile memories which—when—why? Duthie, Ian
16 3 p. 13-22
 article
21 Self-consistent theory of diagonal and off-diogonal disorder in the screened impurity band of doped semiconductors
16 3 p. 44
 article
22 The ageing behaviour of commercial thick-film resistors
16 3 p. 45
 article
23 The application of GaAIAs lasers to high-resolution liquid-crystal projection displays
16 3 p. 43
 article
24 VLSI metallization using aluminium and its alloys. Part I
16 3 p. 43
 article
25 VLSI metallization using aluminium and its alloys. Part II
16 3 p. 43
 article
26 ZRM 20—an electron-beam mask and wafer measuring and inspection system
16 3 p. 44
 article
                             26 results found
 
 Koninklijke Bibliotheek - National Library of the Netherlands