nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
Advances in testing LSI populated boards
|
|
|
|
12 |
1 |
p. 42-43 |
artikel |
2 |
Aging of solder connection to Ti-Pd-Au films
|
|
|
|
12 |
1 |
p. 42 |
artikel |
3 |
A low-cost thin-film mocrocircuit process
|
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|
12 |
1 |
p. 41 |
artikel |
4 |
Analysis of the effects of mechanical stress on the properties of p-channel MOS structures. Part I. Choice of the theoretical model. The effect of stress on the valence band structure in silicon
|
|
|
|
12 |
1 |
p. 42 |
artikel |
5 |
Annealing of ion implanted layers by laser beam
|
|
|
|
12 |
1 |
p. 41 |
artikel |
6 |
Application of the ZBA-10 electron-beam exposure system in the production of precision photomasks with pattern element dimensions in the submicron range
|
|
|
|
12 |
1 |
p. 41 |
artikel |
7 |
Applied Circuit Theory (Matrix and Computer Methods)
|
|
|
|
12 |
1 |
p. 44 |
artikel |
8 |
Ar-ion implant damage gettering of generation impurities in silicon employing voltage ramping and nitrogen back-scattering
|
|
|
|
12 |
1 |
p. 43 |
artikel |
9 |
A simple method of analysing distributed RC notch-filters
|
Ahmad, S. |
|
|
12 |
1 |
p. 18-22 |
artikel |
10 |
A user's performance profile of a thick-film resistor system
|
|
|
|
12 |
1 |
p. 39 |
artikel |
11 |
Basis sets for the study of point defects in solids using Green's-function methods
|
|
|
|
12 |
1 |
p. 43 |
artikel |
12 |
Book Review
|
Mander, H.F. |
|
|
12 |
1 |
p. 44 |
artikel |
13 |
Coding and decoding of Wafers
|
|
|
|
12 |
1 |
p. 40 |
artikel |
14 |
Compensation for inefficiency in charge transfer device transversal filters
|
Dutta Roy, S.C. |
|
|
12 |
1 |
p. 5-7 |
artikel |
15 |
Computer aids for reliability prediction and spares provisioning
|
|
|
|
12 |
1 |
p. 43 |
artikel |
16 |
Design considerations for molecular beam epitaxy systems
|
|
|
|
12 |
1 |
p. 40 |
artikel |
17 |
Detection and identification of potential impurities activated by neutron irradiation of Czochraiski silicon
|
|
|
|
12 |
1 |
p. 40 |
artikel |
18 |
Digital communication devices
|
Williams, Eric Ll. |
|
|
12 |
1 |
p. 8-17 |
artikel |
19 |
Direct wafer exposure
|
|
|
|
12 |
1 |
p. 41 |
artikel |
20 |
Editorial
|
Butcher, John |
|
|
12 |
1 |
p. 3 |
artikel |
21 |
Editorial Board
|
|
|
|
12 |
1 |
p. 1 |
artikel |
22 |
Effect of structural defects on degradation of diffused GaAs LED's
|
|
|
|
12 |
1 |
p. 40 |
artikel |
23 |
Electron-beam-induced-current investigations on MOS and MNOS devices
|
|
|
|
12 |
1 |
p. 43 |
artikel |
24 |
Experience gathered with the application of the special-type ZRM-12 scanning electron microscope in the semiconductor industry
|
|
|
|
12 |
1 |
p. 42 |
artikel |
25 |
Experimental verification of the model of silicon epitaxy
|
|
|
|
12 |
1 |
p. 42 |
artikel |
26 |
Innovations which reduce costs and turn around time of integrated circuit production for small electronic engineering companies
|
Poole, K.F. |
|
|
12 |
1 |
p. 33-38 |
artikel |
27 |
Investigations of gold surface-state energy levels in gold-doped MOS transistors
|
|
|
|
12 |
1 |
p. 41 |
artikel |
28 |
Memory testing: characterisation, timing and patterns
|
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|
12 |
1 |
p. 43 |
artikel |
29 |
Microfiltration of high purity deionised water
|
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|
12 |
1 |
p. 41 |
artikel |
30 |
Micromechanical membrane switches on silicon
|
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12 |
1 |
p. 43 |
artikel |
31 |
Model of 1/f noise in ion-implanted resistors as a function of the resistance, determined by a reverse bias voltage
|
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|
12 |
1 |
p. 43 |
artikel |
32 |
Monemolecular resists: a new class of high resolution resists for electron beam microlithography
|
|
|
|
12 |
1 |
p. 42 |
artikel |
33 |
Optical switching in metal tunnel-insulator n-p + silicon devices
|
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|
|
12 |
1 |
p. 43 |
artikel |
34 |
Radiation hardened MOS technology
|
|
|
|
12 |
1 |
p. 42 |
artikel |
35 |
Recent advances in liquid crystal materials
|
Sage, I. |
|
|
12 |
1 |
p. 30-32 |
artikel |
36 |
Semiconductor superlattices by MBE and their characterisation
|
|
|
|
12 |
1 |
p. 40 |
artikel |
37 |
Semiconductor surface and crystal physics studies by MBE
|
|
|
|
12 |
1 |
p. 41 |
artikel |
38 |
Silicon epitaxial films of submicrometer thickness
|
|
|
|
12 |
1 |
p. 39 |
artikel |
39 |
Silicon epitaxy
|
|
|
|
12 |
1 |
p. 42 |
artikel |
40 |
Simplified relations for determining flat-band capacitance and impurity concentration in MOS structures
|
|
|
|
12 |
1 |
p. 39 |
artikel |
41 |
Solar-grade silicon by directional solidification in carbon crucibles
|
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|
12 |
1 |
p. 40 |
artikel |
42 |
Some annealing properties of low-energy-antimony-implanted silicon resistors
|
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|
12 |
1 |
p. 39-40 |
artikel |
43 |
Standardisation
|
|
|
|
12 |
1 |
p. 40 |
artikel |
44 |
Study of the surface properties of thermally oxidised silicon using surface acoustic wave attenuation
|
|
|
|
12 |
1 |
p. 42 |
artikel |
45 |
Surface-acoustic-wave filters prove versatile in vhf applications
|
|
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|
12 |
1 |
p. 43 |
artikel |
46 |
Surface state study of ion implanted GaAs (Se) from photoreflectance
|
|
|
|
12 |
1 |
p. 41 |
artikel |
47 |
Temperature aging of external connections condensation soldered to Ti-Pol-Au thin films
|
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|
|
12 |
1 |
p. 41 |
artikel |
48 |
The adherence of chromium and titanium films deposited on alumina, quartx, and glass — testing and improvement of electron-beam-deposition techniques
|
|
|
|
12 |
1 |
p. 40 |
artikel |
49 |
The effect of RF annealing upon electon-beam irradiated MIS structures
|
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|
|
12 |
1 |
p. 41 |
artikel |
50 |
The electon beam: a better way to make semiconductor masks
|
|
|
|
12 |
1 |
p. 41 |
artikel |
51 |
The limitations of reactively-bonded thick film gold conductors
|
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|
|
12 |
1 |
p. 40 |
artikel |
52 |
The MPUR mask projection and alignment repeater of VEB Carl Zeiss JENA
|
|
|
|
12 |
1 |
p. 42 |
artikel |
53 |
Thick film resistors at liquid nitrogen temperature and at microwave frequencies
|
|
|
|
12 |
1 |
p. 43 |
artikel |
54 |
Trends in packaging and interconnection of integrated circuits
|
Saunders, A.G. |
|
|
12 |
1 |
p. 23-29 |
artikel |
55 |
Vibration, shock and intense noise testing for reliability
|
|
|
|
12 |
1 |
p. 42 |
artikel |