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                             27 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Adhesion of Polytetrafluorethylene modified by an ion beam Mesyats, G.
1999
52 3 p. 285-289
5 p.
artikel
2 Book review 1999
52 3 p. 372-
1 p.
artikel
3 Book review 1999
52 3 p. 371-
1 p.
artikel
4 Book review 1999
52 3 p. 372-373
2 p.
artikel
5 Book review 1999
52 3 p. 369-370
2 p.
artikel
6 Contact-reactive welding of titanium via a copper layer Dimitrov Uzunov, Tzanko
1999
52 3 p. 365-368
4 p.
artikel
7 Dominance of electron-stimulated desorption neutral species in ultra-high vacuum pressure measurements Watanabe, Fumio
1999
52 3 p. 333-338
6 p.
artikel
8 Electron impact study of carbon disulphide micro-clusters Pelc, Andrzej
1999
52 3 p. 261-268
8 p.
artikel
9 Four pole electromagnet for in situ magneto-optical measurements Boukari, S.
1999
52 3 p. 327-331
5 p.
artikel
10 Hydrogen affinity at Cr/α–Cr2O3 metal/oxide interfaces studied by the 1H(15N, αγ)12C nuclear resonance reaction Hjörvarsson, B.
1999
52 3 p. 291-294
4 p.
artikel
11 Investigation of the properties of an anodic vacuum arc Wang, Ruiguang
1999
52 3 p. 315-319
5 p.
artikel
12 Ion generation from the interaction of focused photon and effusing molecular beams Markowski, A.
1999
52 3 p. 225-242
18 p.
artikel
13 Mechanism for the N–Ni(100) clock reconstruction Sun, Chang Q
1999
52 3 p. 347-351
5 p.
artikel
14 Modification of metallic materials and hard coatings using metal ion implantation Sharkeev, Yurii P
1999
52 3 p. 247-254
8 p.
artikel
15 Numerical simulation of plasma flow downstream in an ECR plasma deposition apparatus Ning, Z.Y.
1999
52 3 p. 219-223
5 p.
artikel
16 Numerical simulation on vacuum pressure distribution inside a rotating cylinder Suetsugu, Yusuke
1999
52 3 p. 339-345
7 p.
artikel
17 On the preferential emission of heavy isotopes in sputtering Shutthanandan, V.
1999
52 3 p. 353-357
5 p.
artikel
18 Optical properties of Ag–MgF2 cermet films Zhao-Qi, Sun
1999
52 3 p. 243-246
4 p.
artikel
19 Optimization of multi-tip field emission electron source Egorov, N.V.
1999
52 3 p. 295-300
6 p.
artikel
20 Reactively DC magnetron sputtered thin AlN films studied by X-ray photoelectron spectroscopy and polarised infrared reflection Manova, D.
1999
52 3 p. 301-305
5 p.
artikel
21 Selective deposition of amorphous hydrogenated carbon films used as masks for reactive ion etching of Si using CF4 Alves, Marco AR
1999
52 3 p. 313-314
2 p.
artikel
22 Structure and microhardness of magnetron sputtered ZrCu and ZrCu-N films Musil, J.
1999
52 3 p. 269-275
7 p.
artikel
23 Studies on the optimisation of unbalanced magnetron sputtering cathodes Komath, Manoj
1999
52 3 p. 307-311
5 p.
artikel
24 The effect of the Sb content on the physical properties of amorphous Se0.75Ge0.25−y thin films Fadel, M.
1999
52 3 p. 277-284
8 p.
artikel
25 The influence of coatings and the surface state on the electric strength of vacuum insulated electrodes used with a 50Hz supply Opydo, Władysław
1999
52 3 p. 255-259
5 p.
artikel
26 Thin films of intermetallic Cu/Ti compounds and their possible uses Uzunov, Tzanko Dimitrov
1999
52 3 p. 321-325
5 p.
artikel
27 Topological consideration of thallium on glassy arsenous selenide Fayek, S.A.
1999
52 3 p. 359-363
5 p.
artikel
                             27 gevonden resultaten
 
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