nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A controller for automated and normalized data recording—Applied to measurement of line shape of spectral emission during ion beam sputteringfn2 fn2 Dedicated to Prof. Hans o Lutz on the occasion of his 60th birthday.
|
Saha, SK |
|
1998 |
51 |
3 |
p. 457-461 5 p. |
artikel |
2 |
Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma
|
Yoon, SF |
|
1998 |
51 |
3 |
p. 445-451 7 p. |
artikel |
3 |
A study of the complete dynamic balance of the rotor inertial forces in the rotary piston vacuum pump
|
Li, Zhiyuan |
|
1998 |
51 |
3 |
p. 427-431 5 p. |
artikel |
4 |
A study of the interface of CeO2⧹Si heterostructure grown by ion beam deposition
|
Wu, Zhenglong |
|
1998 |
51 |
3 |
p. 397-401 5 p. |
artikel |
5 |
Book review
|
|
|
1998 |
51 |
3 |
p. 473-474 2 p. |
artikel |
6 |
Calculation of sputtering yields under high-fluence bombardment of a CuxNi1-x alloy
|
Zheng, Li-Ping |
|
1998 |
51 |
3 |
p. 413-416 4 p. |
artikel |
7 |
Characterisation of DC unbalanced magnetron deposition of Ni⧹C : H composite films
|
Zeuner, Michael |
|
1998 |
51 |
3 |
p. 417-426 10 p. |
artikel |
8 |
Characterization of TiN films prepared by rf sputtering using metal and compound targets
|
Kawamura, Midori |
|
1998 |
51 |
3 |
p. 377-380 4 p. |
artikel |
9 |
Charge state of alkali atoms scattered by Mo and W surfaces
|
Aliev, AA |
|
1998 |
51 |
3 |
p. 393-396 4 p. |
artikel |
10 |
Effect of deposition conditions and substrate position on the properties of superconducting YBa2Cu3Oδ thin films prepared in a facing-target sputtering system
|
Zeng, XT |
|
1998 |
51 |
3 |
p. 323-327 5 p. |
artikel |
11 |
Effect of oxygen content on the electrochromic properties of sputtered tungsten oxide films with Li+ insertion
|
Hutchins, MG |
|
1998 |
51 |
3 |
p. 433-439 7 p. |
artikel |
12 |
Experimental investigation of weld pool formation in electron beam welding
|
Petrov, Peter |
|
1998 |
51 |
3 |
p. 339-343 5 p. |
artikel |
13 |
High crystalline quality titanium disilicides formed by sputter deposition of Ti⧹Si multilayers and annealing
|
Revva, P |
|
1998 |
51 |
3 |
p. 335-337 3 p. |
artikel |
14 |
Influence of microwave plasma parameters on the nitriding of T-304 stainless steel
|
Camps, Enrique |
|
1998 |
51 |
3 |
p. 385-392 8 p. |
artikel |
15 |
Influence of preparation technique on the structural, optical and electrical properties of polycrystalline CdS films
|
Kuhaimi, S A Al |
|
1998 |
51 |
3 |
p. 349-355 7 p. |
artikel |
16 |
Ionization of clusters produced in a hollow-cathode source
|
Xenoulis, AC |
|
1998 |
51 |
3 |
p. 357-362 6 p. |
artikel |
17 |
Microwave near-field plasma probe
|
Law, V.J. |
|
1998 |
51 |
3 |
p. 463-468 6 p. |
artikel |
18 |
Photodarkening in amorphous GeSnSe4Cu0.5 films
|
Sedeek, K. |
|
1998 |
51 |
3 |
p. 453-455 3 p. |
artikel |
19 |
RF plasma cleaning of the oxide surface as a possibility for contamination control in mos structures
|
Alexandrova, S |
|
1998 |
51 |
3 |
p. 469-472 4 p. |
artikel |
20 |
Roughness and deposition mechanism of DLC films prepared by r.f. plasma glow discharge
|
Ali, Alanazi |
|
1998 |
51 |
3 |
p. 363-368 6 p. |
artikel |
21 |
Tests and analysis of the source of shock-cell noise from a rotary piston vacuum pump
|
Li, Zhiyuan |
|
1998 |
51 |
3 |
p. 345-348 4 p. |
artikel |
22 |
The dependence of the pumping speed of N2 and He for a vapour stream (Diffstak) pump on heater power and backing pressure
|
Sharma, DR |
|
1998 |
51 |
3 |
p. 403-412 10 p. |
artikel |
23 |
The effect of Te isoelectronic substitution on the electrical and optical properties of the Ge—S—Se amorphous chalcogenide system studied in thin films
|
Sedeek, K |
|
1998 |
51 |
3 |
p. 329-333 5 p. |
artikel |
24 |
The influence of the tribological properties of the crystallographic match of TiC⧹Ti(CxN1-x)⧹TiN multi-layers
|
Smolik, Jerzy |
|
1998 |
51 |
3 |
p. 441-444 4 p. |
artikel |
25 |
The surface segregation of Ti–Nb composite film and its application to a smart getter material
|
Yoshitake, Michiko |
|
1998 |
51 |
3 |
p. 369-376 8 p. |
artikel |
26 |
X-ray profile analysis on dislocations and hardness of Copper films
|
Shan, FL |
|
1998 |
51 |
3 |
p. 381-383 3 p. |
artikel |