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                             26 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A controller for automated and normalized data recording—Applied to measurement of line shape of spectral emission during ion beam sputteringfn2 fn2 Dedicated to Prof. Hans o Lutz on the occasion of his 60th birthday. Saha, SK
1998
51 3 p. 457-461
5 p.
artikel
2 Amorphous carbon film deposition using a DC-biased screen-grid in an electron cyclotron resonance plasma Yoon, SF
1998
51 3 p. 445-451
7 p.
artikel
3 A study of the complete dynamic balance of the rotor inertial forces in the rotary piston vacuum pump Li, Zhiyuan
1998
51 3 p. 427-431
5 p.
artikel
4 A study of the interface of CeO2⧹Si heterostructure grown by ion beam deposition Wu, Zhenglong
1998
51 3 p. 397-401
5 p.
artikel
5 Book review 1998
51 3 p. 473-474
2 p.
artikel
6 Calculation of sputtering yields under high-fluence bombardment of a CuxNi1-x alloy Zheng, Li-Ping
1998
51 3 p. 413-416
4 p.
artikel
7 Characterisation of DC unbalanced magnetron deposition of Ni⧹C : H composite films Zeuner, Michael
1998
51 3 p. 417-426
10 p.
artikel
8 Characterization of TiN films prepared by rf sputtering using metal and compound targets Kawamura, Midori
1998
51 3 p. 377-380
4 p.
artikel
9 Charge state of alkali atoms scattered by Mo and W surfaces Aliev, AA
1998
51 3 p. 393-396
4 p.
artikel
10 Effect of deposition conditions and substrate position on the properties of superconducting YBa2Cu3Oδ thin films prepared in a facing-target sputtering system Zeng, XT
1998
51 3 p. 323-327
5 p.
artikel
11 Effect of oxygen content on the electrochromic properties of sputtered tungsten oxide films with Li+ insertion Hutchins, MG
1998
51 3 p. 433-439
7 p.
artikel
12 Experimental investigation of weld pool formation in electron beam welding Petrov, Peter
1998
51 3 p. 339-343
5 p.
artikel
13 High crystalline quality titanium disilicides formed by sputter deposition of Ti⧹Si multilayers and annealing Revva, P
1998
51 3 p. 335-337
3 p.
artikel
14 Influence of microwave plasma parameters on the nitriding of T-304 stainless steel Camps, Enrique
1998
51 3 p. 385-392
8 p.
artikel
15 Influence of preparation technique on the structural, optical and electrical properties of polycrystalline CdS films Kuhaimi, S A Al
1998
51 3 p. 349-355
7 p.
artikel
16 Ionization of clusters produced in a hollow-cathode source Xenoulis, AC
1998
51 3 p. 357-362
6 p.
artikel
17 Microwave near-field plasma probe Law, V.J.
1998
51 3 p. 463-468
6 p.
artikel
18 Photodarkening in amorphous GeSnSe4Cu0.5 films Sedeek, K.
1998
51 3 p. 453-455
3 p.
artikel
19 RF plasma cleaning of the oxide surface as a possibility for contamination control in mos structures Alexandrova, S
1998
51 3 p. 469-472
4 p.
artikel
20 Roughness and deposition mechanism of DLC films prepared by r.f. plasma glow discharge Ali, Alanazi
1998
51 3 p. 363-368
6 p.
artikel
21 Tests and analysis of the source of shock-cell noise from a rotary piston vacuum pump Li, Zhiyuan
1998
51 3 p. 345-348
4 p.
artikel
22 The dependence of the pumping speed of N2 and He for a vapour stream (Diffstak) pump on heater power and backing pressure Sharma, DR
1998
51 3 p. 403-412
10 p.
artikel
23 The effect of Te isoelectronic substitution on the electrical and optical properties of the Ge—S—Se amorphous chalcogenide system studied in thin films Sedeek, K
1998
51 3 p. 329-333
5 p.
artikel
24 The influence of the tribological properties of the crystallographic match of TiC⧹Ti(CxN1-x)⧹TiN multi-layers Smolik, Jerzy
1998
51 3 p. 441-444
4 p.
artikel
25 The surface segregation of Ti–Nb composite film and its application to a smart getter material Yoshitake, Michiko
1998
51 3 p. 369-376
8 p.
artikel
26 X-ray profile analysis on dislocations and hardness of Copper films Shan, FL
1998
51 3 p. 381-383
3 p.
artikel
                             26 gevonden resultaten
 
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