| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
About the self-consistence condition in the electron-exchange theory of the secondary ion emission of metals
|
Veksler, VI
|
|
1996
|
47 |
2 |
p. 177-178
2 p.
|
artikel
|
| 2 |
A molybdenum metallorganic complex: an XPS investigation to confirm its identity
|
Bianchi, CL
|
|
1996
|
47 |
2 |
p. 179-182
4 p.
|
artikel
|
| 3 |
An ion source for solid elements with mechanical sputtering
|
Meldizon, Jerzy
|
|
1996
|
47 |
2 |
p. 209-210
2 p.
|
artikel
|
| 4 |
Auger and energy loss spectroscopy analysis of silicon carbide (SiC) surfaces
|
Ghamnia, M
|
|
1996
|
47 |
2 |
p. 141-143
3 p.
|
artikel
|
| 5 |
Balzers-Pfeiffer
|
|
|
1996
|
47 |
2 |
p. iii-
1 p.
|
artikel
|
| 6 |
Calculations of isosteric heats of adsorption of neon and hydrogen adsorbed on charcoal in the temperature range 22–90 K
|
Yanik, R
|
|
1996
|
47 |
2 |
p. 205-207
3 p.
|
artikel
|
| 7 |
Ceramic to metal assemblies
|
|
|
1996
|
47 |
2 |
p. v-
1 p.
|
artikel
|
| 8 |
DC conduction through UHV deposited tellurium films
|
Swan, R
|
|
1996
|
47 |
2 |
p. 129-131
3 p.
|
artikel
|
| 9 |
Deposition of highly supersaturated metastable aluminium-molybdenum alloys by closed field unbalanced magnetron sputtering
|
Bates, RI
|
|
1996
|
47 |
2 |
p. 107-111
5 p.
|
artikel
|
| 10 |
Deposition of thin films using microwave plasmas: present status and trends
|
Musil, J
|
|
1996
|
47 |
2 |
p. 145-155
11 p.
|
artikel
|
| 11 |
Edwards press information
|
|
|
1996
|
47 |
2 |
p. ii-
1 p.
|
artikel
|
| 12 |
Electron energy and angular distribution of electrons in a helium DC glow discharge cathode sheath with transverse magnetic fields
|
Wei, Helin
|
|
1996
|
47 |
2 |
p. 167-172
6 p.
|
artikel
|
| 13 |
Hiden analytical Ltd
|
|
|
1996
|
47 |
2 |
p. ii-
1 p.
|
artikel
|
| 14 |
Hiden 3F/PIC series quadrupole mass spectrometers
|
|
|
1996
|
47 |
2 |
p. i-
1 p.
|
artikel
|
| 15 |
Investigation of Se molecular beams used for MBE
|
Minchev, GM
|
|
1996
|
47 |
2 |
p. 157-165
9 p.
|
artikel
|
| 16 |
Kinetics of the growth of Al-oxidized films in a high-frequency oxygen plasma
|
Sun, Da-Ming
|
|
1996
|
47 |
2 |
p. 113-117
5 p.
|
artikel
|
| 17 |
Kurt J Lesker
|
|
|
1996
|
47 |
2 |
p. i-
1 p.
|
artikel
|
| 18 |
Magnetic and magneto-optical properties of sputtered high Bi-substituted Al/BiGaDylG double layer thin films
|
Zhang, Huai-Wu
|
|
1996
|
47 |
2 |
p. 201-204
4 p.
|
artikel
|
| 19 |
MKS expands Massachusetts manufacturing capabilities
|
|
|
1996
|
47 |
2 |
p. ii-
1 p.
|
artikel
|
| 20 |
New range of compact piezo gauges from Balzers-Pfeiffer UK
|
|
|
1996
|
47 |
2 |
p. iv-
1 p.
|
artikel
|
| 21 |
News from Morgan Matroc
|
|
|
1996
|
47 |
2 |
p. iii-
1 p.
|
artikel
|
| 22 |
Plasma polymerized hexamethyldisiloxane: discharge and film studies
|
Durrant, SF
|
|
1996
|
47 |
2 |
p. 187-192
6 p.
|
artikel
|
| 23 |
P-polarized reflectance spectroscopy: A highly sensitive real-time monitoring technique to study surface kinetics under steady state epitaxial deposition conditions
|
Dietz, N
|
|
1996
|
47 |
2 |
p. 133-140
8 p.
|
artikel
|
| 24 |
Reliability and performance ATP turbomolecular pumps
|
|
|
1996
|
47 |
2 |
p. iv-
1 p.
|
artikel
|
| 25 |
Rotational temperature measurements in hydrogen discharges
|
Laimer, J
|
|
1996
|
47 |
2 |
p. 183-186
4 p.
|
artikel
|
| 26 |
Schott product update
|
|
|
1996
|
47 |
2 |
p. ii-
1 p.
|
artikel
|
| 27 |
Secondary ion emission from silicon under 8 keV O2 + and Ar+ ion bombardment
|
Huan, CHA
|
|
1996
|
47 |
2 |
p. 119-127
9 p.
|
artikel
|
| 28 |
Surface phenomena and isotope effects in the process of titanium hydrides (deuterides) formation
|
Nowicka, E
|
|
1996
|
47 |
2 |
p. 193-199
7 p.
|
artikel
|
| 29 |
Techware systems introduces the CONTROLPower 7800 advanced controls upgrade for applied materials 7800 series epi reactors
|
|
|
1996
|
47 |
2 |
p. iv-
1 p.
|
artikel
|
| 30 |
The deduction of continuously distributed activation energy populations from the moments of thermal evolution spectra
|
Carter, G
|
|
1996
|
47 |
2 |
p. 103-106
4 p.
|
artikel
|
| 31 |
The deduction of initial concentration profiles from sputter depth sectioning measurements
|
Carter, G
|
|
1996
|
47 |
2 |
p. 97-102
6 p.
|
artikel
|
| 32 |
The effects of a quadrupole mass analyser on measurement of UHV residual gas composition
|
Jirsàk, Tomàš
|
|
1996
|
47 |
2 |
p. 173-176
4 p.
|
artikel
|
| 33 |
Tosoh SMD offers cost fo ownership for sputtering targets on the market today
|
|
|
1996
|
47 |
2 |
p. v-
1 p.
|
artikel
|
| 34 |
Vacuum diary
|
|
|
1996
|
47 |
2 |
p. vii-viii
nvt p.
|
artikel
|
| 35 |
Vacuum product news
|
|
|
1996
|
47 |
2 |
p. i-
1 p.
|
artikel
|
| 36 |
X-TRONIX scientific and industrial technologies
|
|
|
1996
|
47 |
2 |
p. vi-
1 p.
|
artikel
|
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