| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
An ion source for low energy ion scattering spectrometry
|
Su, Ching-shen
|
|
1990
|
40 |
5 |
p. 467-469
3 p.
|
artikel
|
| 2 |
1989 C R Burch prize
|
McCash, EM
|
|
1990
|
40 |
5 |
p. 423-427
5 p.
|
artikel
|
| 3 |
Development of a diode/triode (D/T) ion pump
|
Bance, UR
|
|
1990
|
40 |
5 |
p. 457-460
4 p.
|
artikel
|
| 4 |
Effects of electron bombardment on the characteristics of the FMR spectra of single crystal nickel films
|
Hussain, AA
|
|
1990
|
40 |
5 |
p. 477-482
6 p.
|
artikel
|
| 5 |
Measurement of ionic species in a low temperature deuterium plasma
|
Fujii, Yasuhiko
|
|
1990
|
40 |
5 |
p. 453-456
4 p.
|
artikel
|
| 6 |
Measurements of the far ultraviolet reflectivity of evaporated aluminum films under exposure to O2, H2O, CO and CO2
|
Edmends, JS
|
|
1990
|
40 |
5 |
p. 471-475
5 p.
|
artikel
|
| 7 |
Neutral gas flow velocity profiles in the jet plasma-chemical reactor
|
Bárdoš, L
|
|
1990
|
40 |
5 |
p. 449-452
4 p.
|
artikel
|
| 8 |
New Patent
|
|
|
1990
|
40 |
5 |
p. i-iv
nvt p.
|
artikel
|
| 9 |
Reactive sputtering of TiN films at large substrate to target distances
|
Musil, J
|
|
1990
|
40 |
5 |
p. 435-444
10 p.
|
artikel
|
| 10 |
Some effects of ionization gauge pumping phenomena in the calibration of vacuum chambers
|
Lawson, RPW
|
|
1990
|
40 |
5 |
p. 429-433
5 p.
|
artikel
|
| 11 |
The formation of excited secondary Si ions
|
Urazgil'din, IF
|
|
1990
|
40 |
5 |
p. 461-466
6 p.
|
artikel
|
| 12 |
The stability of the amorphous phase in an Sb layer vacuum-deposited on the air- and vacuum-cleaved NaCl and the effects of Sb thickness and overdeposits of Ag, Au, Sn and Pb
|
Hashimoto, Mituru
|
|
1990
|
40 |
5 |
p. 445-448
4 p.
|
artikel
|
Tijdschrift beschrijving