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                             135 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Abar furnace users choose Torvac for servicing Croker, Mike
 1988
 38 8-10 p. 961-
1 p.
 artikel
2 A comparison of ion and fast atom beam reduction in TiO2 Saied, SO
 1988
 38 8-10 p. 917-922
6 p.
 artikel
3 A comparison of ion plated and ion assisted coating of aluminium 1988
 38 8-10 p. 943-
1 p.
 artikel
4 A control process for stable operation of a high rate dc reactive planar magnetron sputtering system 1988
 38 8-10 p. 947-
1 p.
 artikel
5 Activation of reactive sputtering by a plasma beam from an unbalanced magnetron Spencer, AG
 1988
 38 8-10 p. 857-859
3 p.
 artikel
6 A dry forevacuum pump capable of very high compression ratio 1988
 38 8-10 p. 948-
1 p.
 artikel
7 AES studies of surface phenomena on liquid indium solder 1988
 38 8-10 p. 946-
1 p.
 artikel
8 Afterglow and decaying plasma CVD systems Bárdoš, L.
 1988
 38 8-10 p. 637-642
6 p.
 artikel
9 A measurement technique for checking the net refrigeration capacity of cryopumps under operating conditions Häfner, H-U
 1988
 38 8-10 p. 771-775
5 p.
 artikel
10 A microprocessor-controlled respiratory gas monitor Holme, AE
 1988
 38 8-10 p. 787-789
3 p.
 artikel
11 A modular vacuum gauge calibration system for routine use 1988
 38 8-10 p. 947-
1 p.
 artikel
12 A new approach to freeze preparation from Balzers Bussell, Alan
 1988
 38 8-10 p. 957-
1 p.
 artikel
13 A new type of vacuum pump for corrosive and condensable gases Cole, Michael
 1988
 38 8-10 p. 647-649
3 p.
 artikel
14 Apparatus for HREEL and molecular beam spectroscopy of surfaces 1988
 38 8-10 p. 950-
1 p.
 artikel
15 Application of Taguchi analysis to PECVD of tungsten onto gallium arsenide 1988
 38 8-10 p. 943-
1 p.
 artikel
16 A retarding-potential/time-of-flight mass spectrometer for residual gas analysis 1988
 38 8-10 p. 951-
1 p.
 artikel
17 A special refrigerator cooled cryopump for operation into the rf cavities of the Milan Superconducting cyclotron Michelato, P
 1988
 38 8-10 p. 831-834
4 p.
 artikel
18 A study of the altered layer produced by oxygen bombardment of silicon Clark, EA
 1988
 38 8-10 p. 937-941
5 p.
 artikel
19 A study of the residual gas atmosphere during operational life of 20″ 110° CCRTs as a function of bake-out temperature during processing Sciuccati, F
 1988
 38 8-10 p. 847-851
5 p.
 artikel
20 Author index 1988
 38 8-10 p. 953-955
3 p.
 artikel
21 A versatile in situ apparatus for X-ray absorption spectroscopy Greaves, G Neville
 1988
 38 8-10 p. 929-932
4 p.
 artikel
22 Balzers advances in measurement at Vacuum 88 Bussell, Alan
 1988
 38 8-10 p. 963-
1 p.
 artikel
23 Balzers launch new concept in vacuum measuring instruments Willkinson, Colin
 1988
 38 8-10 p. 957-
1 p.
 artikel
24 British vacuum council annual address—1988 Madey, Theodore E.
 1988
 38 8-10 p. 579-583
5 p.
 artikel
25 Calibration of vacuum gauges 1988
 38 8-10 p. 948-
1 p.
 artikel
26 Cascade cooling/heating systems for vacuum chambers Mitchell, Ian
 1988
 38 8-10 p. 960-
1 p.
 artikel
27 Characteristics of tungsten substrate with Al2O3 coatings under UHV conditions Mousa, MS
 1988
 38 8-10 p. 835-838
4 p.
 artikel
28 Computational models of dry etching 1988
 38 8-10 p. 948-
1 p.
 artikel
29 Computerised gas analysis from Balzers advances IC quality control Henderson, Neil
 1988
 38 8-10 p. 958-
1 p.
 artikel
30 Computer supported design of vacuum systems: calculation of pumping speed and simulation of pump down 1988
 38 8-10 p. 946-
1 p.
 artikel
31 Construction of magnetron sputtering sources for producing films with good thickness uniformity 1988
 38 8-10 p. 949-
1 p.
 artikel
32 Dc-etching of poly-silicon with fluorine chemistry Blom, H-O
 1988
 38 8-10 p. 813-816
4 p.
 artikel
33 Decoupling of processes in coating systems by pumped buffers Weisweiler, H
 1988
 38 8-10 p. 677-681
5 p.
 artikel
34 Design and operation of planar magnetron sources to deposit magnetic materials at high rates from thick targets and powders 1988
 38 8-10 p. 950-
1 p.
 artikel
35 Developments in vacuum pumping systems based on mechanical pumps with an oil free swept volume Zakrzewski, E
 1988
 38 8-10 p. 757-760
4 p.
 artikel
36 Diffusion leak artifacts as a secondary standard for gas flow Jitschin, W
 1988
 38 8-10 p. 883-886
4 p.
 artikel
37 Digital control of ZnS and ZnSe vapour sources in a MBE system Gregory, R.P.
 1988
 38 8-10 p. 737-740
4 p.
 artikel
38 Dry etch development for silicon processing within a teaching institution Carter, MA
 1988
 38 8-10 p. 873-876
4 p.
 artikel
39 Dry etching process transfer using plasma diagnostic techniques 1988
 38 8-10 p. 948-
1 p.
 artikel
40 Enhanced failure mechanism in a titanium based contact to silicon Nygren, S
 1988
 38 8-10 p. 741-744
4 p.
 artikel
41 Enhanced rate reactive ion etching utilising a multipolar magnetic electrode 1988
 38 8-10 p. 950-
1 p.
 artikel
42 Evaluation of damage to MOS devices fabricated on dry etched substrates 1988
 38 8-10 p. 950-
1 p.
 artikel
43 EVC—1: European vacuum conference/ vacuum 88 Fitch, R.Keith
 1988
 38 8-10 p. 573-
1 p.
 artikel
44 Film thickness distribution in magnetron sputtering Swann, S
 1988
 38 8-10 p. 791-794
4 p.
 artikel
45 Fundamental plasma reactions and phenomena related to thin-film technology 1988
 38 8-10 p. 945-
1 p.
 artikel
46 Gas analysis by mass spectrometry: calibration techniques and applications 1988
 38 8-10 p. 950-
1 p.
 artikel
47 Gas analysis of metallurgical degassing processes: an application of quadrupole mass spectrometry 1988
 38 8-10 p. 947-
1 p.
 artikel
48 Gas evolution in DCPEL panels during forming process Nemanič, V
 1988
 38 8-10 p. 853-855
3 p.
 artikel
49 High rate dc magnetron sputtering—a review 1988
 38 8-10 p. 947-
1 p.
 artikel
50 High temperature failure of protective layers on silicon substrates in vacuum Maydell, EA
 1988
 38 8-10 p. 745-747
3 p.
 artikel
51 In situ pumping with NEG (non-evaporable getters) during vacuum processing Sciuccati, F
 1988
 38 8-10 p. 765-769
5 p.
 artikel
52 Instabilities in crossed-field discharges at low pressures Redhead, PA
 1988
 38 8-10 p. 901-906
6 p.
 artikel
53 Integration of Temescal into Edwards high vacuum Edwards High Vacuum,
 1988
 38 8-10 p. 963-
1 p.
 artikel
54 Investigation of arc parameters in discharge with a hollow cathode 1988
 38 8-10 p. 949-
1 p.
 artikel
55 Investigation of etching Al and AlSi x in the discharge of Cl-containing gases 1988
 38 8-10 p. 949-
1 p.
 artikel
56 Ion assisted selective deposition of thin films Berg, S.
 1988
 38 8-10 p. 621-625
5 p.
 artikel
57 Ion beam processing of III-V semiconductors 1988
 38 8-10 p. 948-
1 p.
 artikel
58 Ionisation gauge refurbishment Nicholson, K
 1988
 38 8-10 p. 962-
1 p.
 artikel
59 Ion plated aluminium on carbon fibres 1988
 38 8-10 p. 946-
1 p.
 artikel
60 Jobin Yvon S-300 Raman triple spectrograph John Wilkinson,
 1988
 38 8-10 p. 959-
1 p.
 artikel
61 Low temperature pulsed plasma deposition. Part I—a new technique for thin film deposition with complete gas dissociation Scarsbrook, G.
 1988
 38 8-10 p. 627-631
5 p.
 artikel
62 Magnetic properties of sputter-deposited amorphous rare earth-transition metal thin films Davies, C.E.
 1988
 38 8-10 p. 797-800
4 p.
 artikel
63 Mass spectrometer demos at Berkhamsted Henderson, Neil
 1988
 38 8-10 p. 961-
1 p.
 artikel
64 Mass spectrometric contamination control of process gases Hasler, E
 1988
 38 8-10 p. 777-781
5 p.
 artikel
65 Microwave etching processes 1988
 38 8-10 p. 950-
1 p.
 artikel
66 Mimas vacuum system and modification of SATURNE synchrotron vacuum system 1988
 38 8-10 p. 945-
1 p.
 artikel
67 Modern control and data acquisition systems for large vacuum plants Cuttone, G
 1988
 38 8-10 p. 727-730
4 p.
 artikel
68 Modifications to the JET vacuum vessel as a result of plasma operation Dietz, K.J.
 1988
 38 8-10 p. 591-595
5 p.
 artikel
69 More and more from less and less and how it happens—some considerations of the preparation of thin films by chemical vapour deposition under reduced pressure 1988
 38 8-10 p. 945-
1 p.
 artikel
70 Multi-chamber dry etching of aluminium Hussla, I
 1988
 38 8-10 p. 877-881
5 p.
 artikel
71 New catalogue of uhv components from RIBER essential information source for uhv workers 1988
 38 8-10 p. 962-
1 p.
 artikel
72 New electron cyclotron resonance (ECR) source for plasma processing applications Tarth, John M.
 1988
 38 8-10 p. 960-
1 p.
 artikel
73 New furnaces from Torvac exceptional versatility Mike Croker,
 1988
 38 8-10 p. 959-
1 p.
 artikel
74 New thermal pulse vacuum gauge Cole, Michael
 1988
 38 8-10 p. 897-899
3 p.
 artikel
75 New vacuum process diagnostic system from Chell has eight modes Mitchell, Ron
 1988
 38 8-10 p. 959-
1 p.
 artikel
76 Observation of anomalous high resistance to implanted areas caused by reactive ion etching (RIE) Norström, H
 1988
 38 8-10 p. 801-812
12 p.
 artikel
77 Oil-free vacuum pumps of compact design Berges, Hans-Peter
 1988
 38 8-10 p. 761-763
3 p.
 artikel
78 Oil reservoir evacuation for pumping condensable vapours through oil sealed rotary vane pumps Lachenmann, Rudolf
 1988
 38 8-10 p. 659-663
5 p.
 artikel
79 Optically transparent PtSi Schottky contacts on silicon—structure and electrical properties Solt, K
 1988
 38 8-10 p. 703-705
3 p.
 artikel
80 Palletising as a one-man process Atkinson, Craig
 1988
 38 8-10 p. 962-
1 p.
 artikel
81 Photon desorption processes in tokamaks Sutherland, GS
 1988
 38 8-10 p. 913-916
4 p.
 artikel
82 Plasma diagnostic studies for reactive ion etching systems Al-Assadi, K.F.
 1988
 38 8-10 p. 633-636
4 p.
 artikel
83 Plasma-enhanced chemical vapour deposited SiN films: bulk charge, interface trapping and polarization Ling, CH
 1988
 38 8-10 p. 865-868
4 p.
 artikel
84 Preliminary report into the effects of nitrogen ion bombardment treatment on mustard seeds Smith, CW
 1988
 38 8-10 p. 735-736
2 p.
 artikel
85 Preparation and characteristics of diamond-like carbon films Franks, J
 1988
 38 8-10 p. 749-751
3 p.
 artikel
86 Pressure generation in the ultrahigh vacuum region 1988
 38 8-10 p. 951-
1 p.
 artikel
87 Primary pressure measurements down to 10−6 Pa Bergoglio, M
 1988
 38 8-10 p. 887-891
5 p.
 artikel
88 Problems in pumping aggressive, poisonous and explosive gases Duval, P.
 1988
 38 8-10 p. 651-658
8 p.
 artikel
89 Process gas monitor at life science exhibition Bussell, Alan
 1988
 38 8-10 p. 962-
1 p.
 artikel
90 Publications received 1988
 38 8-10 p. 963-
1 p.
 artikel
91 Pumping speed of sputter ion pumps Audi, M.
 1988
 38 8-10 p. 669-671
3 p.
 artikel
92 PVD techniques for optical coatings and integrated optical devices 1988
 38 8-10 p. 947-
1 p.
 artikel
93 Quadrupole mass spectrometer monitored and controlled thin film deposition processes under ultrahigh vacuum conditions Koprio, J.A.
 1988
 38 8-10 p. 783-786
4 p.
 artikel
94 Removal of corrosive exhaust gases in RIE system by a chemical trap 1988
 38 8-10 p. 945-
1 p.
 artikel
95 Reverse pillar—a self-aligned and self- planarised metallisation scheme for submicron technology Yeh, JL
 1988
 38 8-10 p. 817-821
5 p.
 artikel
96 Scanning tunnelling microscopy of ion etched silicon Bestwick, Tim D
 1988
 38 8-10 p. 823-826
4 p.
 artikel
97 Simple approach to thermal vacuum testing of spacecraft equipment Farquhar, J.F.
 1988
 38 8-10 p. 843-846
4 p.
 artikel
98 Some comments on the stability of spinning-rotor gauges Redgrave, FJ
 1988
 38 8-10 p. 839-842
4 p.
 artikel
99 Some issues in plasma-assisted etching 1988
 38 8-10 p. 947-
1 p.
 artikel
100 Spectral and spatial distributions of electron traps on semiconductor surfaces 1988
 38 8-10 p. 951-
1 p.
 artikel
101 Sputtering under ultrahigh vacuum environment Peter, G
 1988
 38 8-10 p. 795-796
2 p.
 artikel
102 Studies of the reaction mechanisms for the chemical vapour deposition of tungsten from tungsten hexafluoride in a plasma environment Wood, J
 1988
 38 8-10 p. 683-688
6 p.
 artikel
103 Study of surface damage in ITO/InP solar cells Dhere, Neelkanth G
 1988
 38 8-10 p. 753-755
3 p.
 artikel
104 Study of the adsorption of H2O+H2 on oxygen contaminated Nb (110) surfaces at 110 K by ESD, AES and ELS Rey, S
 1988
 38 8-10 p. 907-911
5 p.
 artikel
105 Synchrotron radiation induced neutral gas desorption from samples of vacuum chambers Andritschky, M
 1988
 38 8-10 p. 933-936
4 p.
 artikel
106 The British vacuum council annual address 1988
 38 8-10 p. 575-
1 p.
 artikel
107 The British vacuum council prize and medal 1988
 38 8-10 p. 577-
1 p.
 artikel
108 The effect of discharge conditions on the inductively coupled plasma oxidation of silicon Taylor, S.
 1988
 38 8-10 p. 643-646
4 p.
 artikel
109 The effect of rotor acceleration on the zero stability of spinning rotor gauges Lindenau, BE
 1988
 38 8-10 p. 893-896
4 p.
 artikel
110 The electron stimulated interaction of water with a silicon surface Bennett, SL
 1988
 38 8-10 p. 923-927
5 p.
 artikel
111 The ESRF vacuum system Trickett, B.A.
 1988
 38 8-10 p. 607-612
6 p.
 artikel
112 The performance of a multistage dry pump operating under non-standard conditions Laurenson, L.
 1988
 38 8-10 p. 665-668
4 p.
 artikel
113 The performance of residual gas analysers when used in high vacuum systems 1988
 38 8-10 p. 951-
1 p.
 artikel
114 Thermal conductivity vacuum gauges suitable for use with very long cable lengths 1988
 38 8-10 p. 948-
1 p.
 artikel
115 The role of layer growth on interface roughness in Ni-C multilayer X-ray mirrors Puik, EJ
 1988
 38 8-10 p. 707-709
3 p.
 artikel
116 The series expansion method for vacuum gauge calibration 1988
 38 8-10 p. 951-
1 p.
 artikel
117 The sputter deposition of precision metal multilayers Somekh, R.E.
 1988
 38 8-10 p. 693-697
5 p.
 artikel
118 The UHV system of the CELSIUS storage ring in Uppsala Westerberg, L.
 1988
 38 8-10 p. 585-589
5 p.
 artikel
119 The use of programmable logic controllers for vacuum plant Nuttall, JD
 1988
 38 8-10 p. 719-725
7 p.
 artikel
120 The vacuum properties of doped tungsten filaments Dancs, É
 1988
 38 8-10 p. 827-830
4 p.
 artikel
121 The vacuum system of the Milan superconducting cyclotron cryostat 1988
 38 8-10 p. 945-
1 p.
 artikel
122 The warm sections of the HERA proton ring vacuum system Römer, J.G.M.
 1988
 38 8-10 p. 613-615
3 p.
 artikel
123 Thickness uniformity of vacuum deposited layers Todorova, S
 1988
 38 8-10 p. 869-872
4 p.
 artikel
124 Thin films of plasma polymerised organic materials and ion beam assisted deposition Al-Hashmi, SAR
 1988
 38 8-10 p. 861-864
4 p.
 artikel
125 Thin films sputtering and evaporation Mihill, EG
 1988
 38 8-10 p. 962-
1 p.
 artikel
126 Thin film systems for low TCR resistors Razborsek, A
 1988
 38 8-10 p. 689-692
4 p.
 artikel
127 Torvac Furnaces appoints new product manager Croker, Mike
 1988
 38 8-10 p. 961-
1 p.
 artikel
128 Turbomolecular vacuum pumps with a new magnetic bearing concept Kabelitz, H-P
 1988
 38 8-10 p. 673-676
4 p.
 artikel
129 Undergraduate experiments in vacuum physics: a contribution 1988
 38 8-10 p. 949-
1 p.
 artikel
130 Vacuum apparatus for a photovoltaic device fabrication laboratory Beavis, LC
 1988
 38 8-10 p. 699-702
4 p.
 artikel
131 Vacuum brazing of titanium using eddy current heating Brown, KB
 1988
 38 8-10 p. 731-733
3 p.
 artikel
132 Vacuum considerations and systems for gas-phase experiments with synchrotron radiation Becker, U
 1988
 38 8-10 p. 597-605
9 p.
 artikel
133 Vacuum measurements in small sealed systems 1988
 38 8-10 p. 946-
1 p.
 artikel
134 Vacuum system for a space simulation facility Nuss, H.E.
 1988
 38 8-10 p. 617-620
4 p.
 artikel
135 Vacuum systems and processes from the viewpoint of software engineering Hagemans, KL
 1988
 38 8-10 p. 711-718
8 p.
 artikel
                             135 gevonden resultaten
 
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