| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Desorption energy distribution and the degree of surface coverage
|
Wittkopf, H
|
|
1988
|
38 |
6 |
p. 475-477
3 p.
|
artikel
|
| 2 |
Effect of post-deposition vacuum annealing on properties of ITO layers
|
Libra, M
|
|
1988
|
38 |
6 |
p. 455-457
3 p.
|
artikel
|
| 3 |
Fundamental irradiation processes relevant to plasma-surface technology
|
Carter, G
|
|
1988
|
38 |
6 |
p. 479-486
8 p.
|
artikel
|
| 4 |
Further improvements in end point detection using a wide angle ion beam source
|
Dean, AB
|
|
1988
|
38 |
6 |
p. 499-500
2 p.
|
artikel
|
| 5 |
Influence of deposition rate on properties of reactively sputtered TiN x films
|
Musil, J
|
|
1988
|
38 |
6 |
p. 459-461
3 p.
|
artikel
|
| 6 |
Integrated thermal vacuum sensor with extended range
|
van Herwaarden, AW
|
|
1988
|
38 |
6 |
p. 449-453
5 p.
|
artikel
|
| 7 |
New microwave ion source for multiply charged ion beam production
|
Tokiguchi, K
|
|
1988
|
38 |
6 |
p. 487-490
4 p.
|
artikel
|
| 8 |
Performance of a planar magnetron sputtering apparatus with complex targets
|
Chen, Qing-Ming
|
|
1988
|
38 |
6 |
p. 491-495
5 p.
|
artikel
|
| 9 |
Preparation of titanium nitride films by reactive ion plating and the influence of discharge current density on the film properties
|
Rousseau, A
|
|
1988
|
38 |
6 |
p. 443-448
6 p.
|
artikel
|
| 10 |
Rf oscillations in dc planar sputtering magnetrons
|
Spencer, AG
|
|
1988
|
38 |
6 |
p. 497-498
2 p.
|
artikel
|
| 11 |
The angular distribution of thermal molecular beams formed by single capillaries in the molecular flow regime
|
Adamson, S
|
|
1988
|
38 |
6 |
p. 463-467
5 p.
|
artikel
|
| 12 |
The development and use of a time-of-flight system to analyse energy spectra produced by a fast atom beam source
|
Saied, SO
|
|
1988
|
38 |
6 |
p. 469-473
5 p.
|
artikel
|
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