nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
An optimization method for nonequiradial electrostatic deflection systems
|
Grigorov, Grigor Nikolov |
|
1988 |
38 |
11 |
p. 1025-1028 4 p. |
artikel |
2 |
Author index of articles
|
|
|
1988 |
38 |
11 |
p. 1057- 1 p. |
artikel |
3 |
Background in Auger electron spectroscopy
|
|
|
1988 |
38 |
11 |
p. 1054- 1 p. |
artikel |
4 |
Computer simulated and channelling studies of damage distributions in phosphorus implanted silicon
|
Budinov, H |
|
1988 |
38 |
11 |
p. 995-997 3 p. |
artikel |
5 |
Correlation between secondary ion and ion-photon emissions
|
|
|
1988 |
38 |
11 |
p. 1051- 1 p. |
artikel |
6 |
Electron beam evaporation and welding: plasma formation and liquid pool instabilities
|
Stefanov, B |
|
1988 |
38 |
11 |
p. 1029-1033 5 p. |
artikel |
7 |
Electronically stimulated desorption
|
|
|
1988 |
38 |
11 |
p. 1051-1052 2 p. |
artikel |
8 |
Electron-laser-ion technology for treatment of semiconductor structures
|
|
|
1988 |
38 |
11 |
p. 1054-1055 2 p. |
artikel |
9 |
Improvement of the corrosion properties of metals by ion implantation
|
Radjabov, TD |
|
1988 |
38 |
11 |
p. 979-985 7 p. |
artikel |
10 |
Introduction
|
Karpuzov, D.S. |
|
1988 |
38 |
11 |
p. 965- 1 p. |
artikel |
11 |
Ion beam exposure of PMMA polymer resist
|
Mühle, R |
|
1988 |
38 |
11 |
p. 1005-1006 2 p. |
artikel |
12 |
Ion beam mixing in Al/Fe multilayered thin films
|
Rauschenbach, B |
|
1988 |
38 |
11 |
p. 987-990 4 p. |
artikel |
13 |
Ion bombardment as a tool to modify surface properties of different materials
|
Braun, M |
|
1988 |
38 |
11 |
p. 973-977 5 p. |
artikel |
14 |
Ion implantation and annealing
|
|
|
1988 |
38 |
11 |
p. 1053- 1 p. |
artikel |
15 |
Ion implantation in metals—structure investigations and applications
|
Reuther, H |
|
1988 |
38 |
11 |
p. 967-971 5 p. |
artikel |
16 |
Ion microbeam technique
|
|
|
1988 |
38 |
11 |
p. 1054- 1 p. |
artikel |
17 |
Modern trends in secondary ion mass spectroscopy
|
|
|
1988 |
38 |
11 |
p. 1054- 1 p. |
artikel |
18 |
Oxygen incorporation in Al thin films during deposition by dc magnetron sputtering
|
Popov, DN |
|
1988 |
38 |
11 |
p. 1015-1017 3 p. |
artikel |
19 |
Range and range profile calculations for MeV phosphorus implantation into silicon
|
Posselt, M |
|
1988 |
38 |
11 |
p. 991-993 3 p. |
artikel |
20 |
Reactive ion etching of deep trenches in silicon with CF2Cl2 and O2
|
Wöhl, G |
|
1988 |
38 |
11 |
p. 1011-1014 4 p. |
artikel |
21 |
Role of ion/surface interactions in nucleation kinetics and elemental incorporation probabilities during film growth from the vapour phase
|
|
|
1988 |
38 |
11 |
p. 1053- 1 p. |
artikel |
22 |
Role of ion/surface interactions on film growth kinetics: applications to hard coatings
|
|
|
1988 |
38 |
11 |
p. 1053- 1 p. |
artikel |
23 |
Scanning electron microscopy in submicron structure diagnostics
|
Aristov, VV |
|
1988 |
38 |
11 |
p. 1045-1050 6 p. |
artikel |
24 |
Simulation of erosion induced surface evolution in temporally and spatially dependent systems
|
Katardjiev, IV |
|
1988 |
38 |
11 |
p. 999-1004 6 p. |
artikel |
25 |
Structural properties of coatings prepared by flash evaporation and magnetron sputtering of Cu-15% Sn and Cu-20% Sn alloys
|
Tzaneva, DV |
|
1988 |
38 |
11 |
p. 1019-1024 6 p. |
artikel |
26 |
Studies of ion beam sputtering and deposition processes and their influence on surface topography
|
|
|
1988 |
38 |
11 |
p. 1053-1054 2 p. |
artikel |
27 |
Technological capabilities of plasma electron beam sources
|
|
|
1988 |
38 |
11 |
p. 1055- 1 p. |
artikel |
28 |
The effect of ion implantation on polymer mask resistance to ion beam etching
|
Borzenko, TB |
|
1988 |
38 |
11 |
p. 1007-1009 3 p. |
artikel |
29 |
The influence of electron beam energy on defect density in MOS device quality oxides
|
Balasiński, A |
|
1988 |
38 |
11 |
p. 1041-1043 3 p. |
artikel |
30 |
UHV apparatus for electron-stimulated desorption: experimental procedure and characteristics
|
Kasabov, SG |
|
1988 |
38 |
11 |
p. 1035-1039 5 p. |
artikel |