| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Analysis of outgassing characteristics of metals
|
Moraw, Michal
|
|
1986
|
36 |
7-9 |
p. 523-525
|
artikel
|
| 2 |
Appearance potential spectroscopic studies of the electron interactions in some metals—a simple model
|
Eckertová, Ludmila
|
|
1986
|
36 |
7-9 |
p. 561
|
artikel
|
| 3 |
Application of ion beam techniques for amorphization and analysis of thin films
|
Linker, G
|
|
1986
|
36 |
7-9 |
p. 493-501
|
artikel
|
| 4 |
Automated recognition of Auger electron spectra
|
Frank, Luděk
|
|
1986
|
36 |
7-9 |
p. 437-440
|
artikel
|
| 5 |
Carbon contamination of ion implanted layers
|
Král, J
|
|
1986
|
36 |
7-9 |
p. 555-557
|
artikel
|
| 6 |
Comparative mass spectrometric study of AIII-BV compounds covered with a gold layer
|
Veresegyházy, R
|
|
1986
|
36 |
7-9 |
p. 547-549
|
artikel
|
| 7 |
Correction of Auger peak-to-peak height distortions caused by a difference in the values of coordination number of atoms
|
Siuda, R
|
|
1986
|
36 |
7-9 |
p. 441-443
|
artikel
|
| 8 |
Depth profiling of microelectronic structures by SIMS and AES
|
Maier, M
|
|
1986
|
36 |
7-9 |
p. 409-412
|
artikel
|
| 9 |
Developments in the measurement of total and partial pressure
|
Hůlek, Z
|
|
1986
|
36 |
7-9 |
p. 509-513
|
artikel
|
| 10 |
Discharge transfer in a photoluminescent dc plasma display
|
Szlenk, K
|
|
1986
|
36 |
7-9 |
p. 539-541
|
artikel
|
| 11 |
Editorial: Software survey section
|
|
|
1986
|
36 |
7-9 |
p. I-IV
|
artikel
|
| 12 |
Effect of molecular oxygen on the stability of multi-alkali photocathodes
|
Pancíř, J
|
|
1986
|
36 |
7-9 |
p. 483-484
|
artikel
|
| 13 |
High resistivity layer formation in InP by ion implantation for ohmic contact characterization
|
Jakabovič, J
|
|
1986
|
36 |
7-9 |
p. 489-491
|
artikel
|
| 14 |
Hot filament ionization gauges for high pressures in the vacuum range
|
Edelmann, C
|
|
1986
|
36 |
7-9 |
p. 503-507
|
artikel
|
| 15 |
Introduction
|
Buch, J
|
|
1986
|
36 |
7-9 |
p. 397
|
artikel
|
| 16 |
Local density of states of the Si(111) surface with vacancies and its reconstruction
|
Tomášek, M
|
|
1986
|
36 |
7-9 |
p. 445-446
|
artikel
|
| 17 |
Macroscopic measurements and microscopic information in surface science
|
Knor, Z
|
|
1986
|
36 |
7-9 |
p. 427-432
|
artikel
|
| 18 |
Molecular beam epitaxy of semiconductor, dielectric and metal films
|
Stenin, SI
|
|
1986
|
36 |
7-9 |
p. 419-426
|
artikel
|
| 19 |
New patents
|
|
|
1986
|
36 |
7-9 |
p. 575-581
|
artikel
|
| 20 |
New products and developments
|
|
|
1986
|
36 |
7-9 |
p. 569-573
|
artikel
|
| 21 |
Photocathodes-contemporary state and trends
|
Jedlička, M
|
|
1986
|
36 |
7-9 |
p. 515-521
|
artikel
|
| 22 |
Probe measurements in a 380 kHz CHF3 plasma in a planar reactor
|
Brčka, Jozef
|
|
1986
|
36 |
7-9 |
p. 535-537
|
artikel
|
| 23 |
Quantification and measurement by Auger electron spectroscopy and X-ray photoelectron spectroscopy
|
Seah, MP
|
|
1986
|
36 |
7-9 |
p. 399-407
|
artikel
|
| 24 |
Quantitative Auger analysis of silicides
|
Wirth, T
|
|
1986
|
36 |
7-9 |
p. 433-435
|
artikel
|
| 25 |
Rf reactive sputtering of indium-tin-oxide films
|
Tvaroěk, V
|
|
1986
|
36 |
7-9 |
p. 479-482
|
artikel
|
| 26 |
Seventh Czechoslovak Conference on Electronics and Vacuum Physics
|
|
|
1986
|
36 |
7-9 |
p. 567
|
artikel
|
| 27 |
Seventh Czechoslovak Conference on Electronics and Vacuum Physics—list of presented papers
|
|
|
1986
|
36 |
7-9 |
p. 563-565
|
artikel
|
| 28 |
Some new possibilities in non-destructive depth profiling using secondary emission spectroscopy: REELS and EPES
|
Gergely, G
|
|
1986
|
36 |
7-9 |
p. 471-475
|
artikel
|
| 29 |
Spectral ellipsometric TEM and electron spectroscopic investigations on oxidized aluminium thin films
|
Barna, PB
|
|
1986
|
36 |
7-9 |
p. 465-469
|
artikel
|
| 30 |
Subtraction of satellites in XPS
|
Hricovíni, K
|
|
1986
|
36 |
7-9 |
p. 453-454
|
artikel
|
| 31 |
Surface modification by ion beams
|
Colligon, JS
|
|
1986
|
36 |
7-9 |
p. 413-418
|
artikel
|
| 32 |
The electrical and optical properties of Cdln2O4 thin films prepared by dc reactive sputtering
|
Zakrzewska, K
|
|
1986
|
36 |
7-9 |
p. 485-487
|
artikel
|
| 33 |
The measurement of very low pressures by the compression method
|
Češpíro, Zdeněk
|
|
1986
|
36 |
7-9 |
p. 543-545
|
artikel
|
| 34 |
The residual current of the modulated Bayard-Alpert gauge
|
Řepa, Petr
|
|
1986
|
36 |
7-9 |
p. 559-560
|
artikel
|
| 35 |
Thermal and plasma models of pulsed heating of thin films
|
Aleksandrov, LN
|
|
1986
|
36 |
7-9 |
p. 455-463
|
artikel
|
| 36 |
The selectivity of poly Si and SiO2 etching using a negative dc biasing of powered electrode
|
Brčka, Jozef
|
|
1986
|
36 |
7-9 |
p. 531-533
|
artikel
|
| 37 |
Ti-W-alloy interaction with polycrystalline silicon
|
Buch, J
|
|
1986
|
36 |
7-9 |
p. 561
|
artikel
|
| 38 |
TPD and static SIMS investigation of CO adsorption on Pd(111) during catalytic oxidation
|
Matolín, V
|
|
1986
|
36 |
7-9 |
p. 449-452
|
artikel
|
| 39 |
Utilization of zeolite NaY for analysis of hydrocarbons in vacuum systems
|
Miertušová, J
|
|
1986
|
36 |
7-9 |
p. 551-553
|
artikel
|
| 40 |
Vacuum system of the multipurpose 14 MeV neutron source in Bratislava: design and status
|
Pivarč, J
|
|
1986
|
36 |
7-9 |
p. 527-529
|
artikel
|
| 41 |
X-ray photoelectron spectroscopy of supported metal particles
|
Bastl, Zdeněk
|
|
1986
|
36 |
7-9 |
p. 447-448
|
artikel
|
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