| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Ceramaseal
|
Testbourne Ltd,
|
|
1986
|
36 |
6 |
p. 361-
1 p.
|
artikel
|
| 2 |
Chell instruments cleanroom
|
Chell Instruments Ltd,
|
|
1986
|
36 |
6 |
p. 362-
1 p.
|
artikel
|
| 3 |
Compact system for multi-purpose sputtering
|
Edwards High Vacuum,
|
|
1986
|
36 |
6 |
p. 359-
1 p.
|
artikel
|
| 4 |
Conference notice—MBE-IV
|
British Telecom Research Laboratories,
|
|
1986
|
36 |
6 |
p. 364-
1 p.
|
artikel
|
| 5 |
Dynamic interaction of floating substrates with an ion beam from a three grid microtech system operated without neutralizer
|
Nir, Dan
|
|
1986
|
36 |
6 |
p. 317-321
5 p.
|
artikel
|
| 6 |
Editorial: Software survey section
|
|
|
1986
|
36 |
6 |
p. I-IV
nvt p.
|
artikel
|
| 7 |
Edwards equipment helps Volkswagen
|
Edwards High Vacuum,
|
|
1986
|
36 |
6 |
p. 362-
1 p.
|
artikel
|
| 8 |
Effects of backstreaming and real or virtual leaks on the vacuum contamination in a turned-off turbomolecular pumped uhv system
|
Venkataramani, N.
|
|
1986
|
36 |
6 |
p. 341-347
7 p.
|
artikel
|
| 9 |
Engineering brochure explains planar plasma deposition system
|
Electrotech,
|
|
1986
|
36 |
6 |
p. 363-
1 p.
|
artikel
|
| 10 |
Guide to cryopumping from Edwards
|
Edwards High Vacuum,
|
|
1986
|
36 |
6 |
p. 363-
1 p.
|
artikel
|
| 11 |
HAL quadrupole gas analyser
|
HAL,
|
|
1986
|
36 |
6 |
p. 359-
1 p.
|
artikel
|
| 12 |
High precision manipulators
|
Vacuum Generators Ltd,
|
|
1986
|
36 |
6 |
p. 362-
1 p.
|
artikel
|
| 13 |
Interface structure between reactively ion plated TiO2 films and PET substrate
|
Suzuki, K
|
|
1986
|
36 |
6 |
p. 323-328
6 p.
|
artikel
|
| 14 |
Interfinish 88
|
SEPIC (INTERFINISH),
|
|
1986
|
36 |
6 |
p. 364-
1 p.
|
artikel
|
| 15 |
Ion energy distributions in a special glow-discharge ion source
|
Wroński, Z
|
|
1986
|
36 |
6 |
p. 329-335
7 p.
|
artikel
|
| 16 |
IPAT 87—6th international conference—Ion & plasma assisted techniques, Brighton May 1987
|
IPAT Secretariat, CEP Consultants Ltd,
|
|
1986
|
36 |
6 |
p. 363-
1 p.
|
artikel
|
| 17 |
Latest pump literature from Edwards
|
Edwards High Vacuum,
|
|
1986
|
36 |
6 |
p. 363-
1 p.
|
artikel
|
| 18 |
Lion announces a breakthrough in capacitance gauging for silicon and gallium arsenide
|
|
|
1986
|
36 |
6 |
p. 357-
1 p.
|
artikel
|
| 19 |
Multichamber, fully automatic single wafer etching system available in plasma, reactive ion and triode configurations
|
Electrotech Customer Service,
|
|
1986
|
36 |
6 |
p. 360-
1 p.
|
artikel
|
| 20 |
New cryopumps—from Edwards—feature high capacity
|
Edwards High Vacuum,
|
|
1986
|
36 |
6 |
p. 357-
1 p.
|
artikel
|
| 21 |
New patents
|
|
|
1986
|
36 |
6 |
p. 367-396
30 p.
|
artikel
|
| 22 |
New rotary pump size
|
Edwards High Vacuum,
|
|
1986
|
36 |
6 |
p. 358-
1 p.
|
artikel
|
| 23 |
Oxford's first giant magnet for research
|
Oxford Instruments Ltd,
|
|
1986
|
36 |
6 |
p. 360-
1 p.
|
artikel
|
| 24 |
Oxford's magnets for NMR
|
Oxford Instruments Ltd,
|
|
1986
|
36 |
6 |
p. 361-
1 p.
|
artikel
|
| 25 |
Parameter optimization for film homogenization during ion assisted deposition
|
Carter, G
|
|
1986
|
36 |
6 |
p. 337-340
4 p.
|
artikel
|
| 26 |
Rochester instrument systems acquires Terra companies—new products added to RIS range for power and process industries
|
Rochester Instrument Systems,
|
|
1986
|
36 |
6 |
p. 361-
1 p.
|
artikel
|
| 27 |
Space charge effects and dynamic interactions in the case of a broad and intense ion beam bombarding an insulated substrate
|
Nir, D
|
|
1986
|
36 |
6 |
p. 311-315
5 p.
|
artikel
|
| 28 |
Structural modifications of ion plated Al/AlxOy in argon-oxygen gas mixtures
|
Ahmed, NAG
|
|
1986
|
36 |
6 |
p. 355-356
2 p.
|
artikel
|
| 29 |
Symposium on sputtering, spitz a d Donau/Vienna, Austria, 2–6 June, 1986
|
|
|
1986
|
36 |
6 |
p. 364-
1 p.
|
artikel
|
| 30 |
Target profile change during magnetron sputtering
|
Nyaiesh, AR
|
|
1986
|
36 |
6 |
p. 307-309
3 p.
|
artikel
|
| 31 |
Tegal introduces new generation of plasma etch systems
|
Tegal UK,
|
|
1986
|
36 |
6 |
p. 358-
1 p.
|
artikel
|
| 32 |
The IUVSTA joins with the AVS for an international congress in Baltimore, Maryland, USA, 27–31 October 1986
|
|
|
1986
|
36 |
6 |
p. 364-365
2 p.
|
artikel
|
| 33 |
Thickness distribution of films fabricated by the molecular beam epitaxy technique
|
Nanbu, K.
|
|
1986
|
36 |
6 |
p. 349-354
6 p.
|
artikel
|
| 34 |
Time-of-flight mass spectrometry
|
VG Scientific Ltd,
|
|
1986
|
36 |
6 |
p. 358-
1 p.
|
artikel
|
| 35 |
Turbopump packages have compact look
|
Edwards High Vacuum,
|
|
1986
|
36 |
6 |
p. 357-
1 p.
|
artikel
|
| 36 |
Vacation school on ‘plasma and plasma related etching of semiconductor materials’, to be held at the University of Liverpool, 1–5 September 1986
|
Science, Education and Technology Division,
|
|
1986
|
36 |
6 |
p. 364-
1 p.
|
artikel
|
| 37 |
Vacseal—vacuum leak sealant
|
Schaefer Instruments,
|
|
1986
|
36 |
6 |
p. 360-
1 p.
|
artikel
|
| 38 |
World wide directory of manufacturers of vacuum plant, components and associated equipment—1985
|
Busch(UK)Ltd,
|
|
1986
|
36 |
6 |
p. 362-363
2 p.
|
artikel
|
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