| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A continuous-flow helium cryostat and sample holder with unrestricted manipulation for ion-scattering experiments in uhv
|
Huussen, Frank
|
|
1986
|
36 |
5 |
p. 259-262
4 p.
|
artikel
|
| 2 |
A low cost vacuum leak detector
|
Sharma, JKN
|
|
1986
|
36 |
5 |
p. 279-280
2 p.
|
artikel
|
| 3 |
A modified ion source for semiconductor implantation purposes
|
Latuszyński, A
|
|
1986
|
36 |
5 |
p. 263-265
3 p.
|
artikel
|
| 4 |
An algorithm to calculate secondary sputtering by the reflection of ions in two dimensions
|
Smith, R.
|
|
1986
|
36 |
5 |
p. 285-288
4 p.
|
artikel
|
| 5 |
A self-focused multichannel electron beam source for annealing of ion-implanted semiconductors
|
Lue, Juh-Tzeng
|
|
1986
|
36 |
5 |
p. 275-278
4 p.
|
artikel
|
| 6 |
Electrons, photons and ions at Daresbury
|
Tait, N.R.S.
|
|
1986
|
36 |
5 |
p. 289-292
4 p.
|
artikel
|
| 7 |
Investigation and interpretation of adsorption on silicon surfaces
|
Kleint, Ch
|
|
1986
|
36 |
5 |
p. 267-273
7 p.
|
artikel
|
| 8 |
New patent
|
|
|
1986
|
36 |
5 |
p. 295-305
11 p.
|
artikel
|
| 9 |
Plasma etching in semiconductor fabrication
|
L Hitchman, Michael
|
|
1986
|
36 |
5 |
p. 293-
1 p.
|
artikel
|
| 10 |
Software survey section
|
|
|
1986
|
36 |
5 |
p. I-IV
nvt p.
|
artikel
|
| 11 |
Turbomolecular pumps with hysteresis motor for nuclear physics accelerators
|
Duval, P
|
|
1986
|
36 |
5 |
p. 281-283
3 p.
|
artikel
|
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