| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Air introduce hand-held digital pressure meter range
|
|
|
1986
|
36 |
1-3 |
p. 171-
1 p.
|
artikel
|
| 2 |
Analysis of TiC and TiN coatings exposed to fusion plasmas
|
Taglauer, E
|
|
1986
|
36 |
1-3 |
p. 23-25
3 p.
|
artikel
|
| 3 |
Applications of ionized cluster beam to anti-reflection coating of transmission windows
|
Yamanishi, K
|
|
1986
|
36 |
1-3 |
p. 157-160
4 p.
|
artikel
|
| 4 |
A range of ion pump controls and accessories
|
|
|
1986
|
36 |
1-3 |
p. 171-
1 p.
|
artikel
|
| 5 |
Characterization of conducting diamond films
|
Fujimori, N
|
|
1986
|
36 |
1-3 |
p. 99-102
4 p.
|
artikel
|
| 6 |
China orders Edwards' freeze dryers
|
|
|
1986
|
36 |
1-3 |
p. 176-
1 p.
|
artikel
|
| 7 |
Compact turbomolecular vacuum pumping packages
|
|
|
1986
|
36 |
1-3 |
p. 176-
1 p.
|
artikel
|
| 8 |
Computer-controlled test equipment for vacuum switches
|
|
|
1986
|
36 |
1-3 |
p. 172-
1 p.
|
artikel
|
| 9 |
Conferences and group activities
|
|
|
1986
|
36 |
1-3 |
p. 177-178
2 p.
|
artikel
|
| 10 |
‘Cool sputtering’ unit from Balzers
|
|
|
1986
|
36 |
1-3 |
p. 175-176
2 p.
|
artikel
|
| 11 |
Development of modern analysis techniques for characterization and testing of coatings
|
Ramaekers, PPJ
|
|
1986
|
36 |
1-3 |
p. 19-22
4 p.
|
artikel
|
| 12 |
Doulton industrial announce new applications for the vacuband filter
|
|
|
1986
|
36 |
1-3 |
p. 173-
1 p.
|
artikel
|
| 13 |
Editorial
|
|
|
1986
|
36 |
1-3 |
p. 1-
1 p.
|
artikel
|
| 14 |
Editorial Board
|
|
|
1986
|
36 |
1-3 |
p. IFC-
1 p.
|
artikel
|
| 15 |
Editorial: Software survey section
|
|
|
1986
|
36 |
1-3 |
p. I-IV
nvt p.
|
artikel
|
| 16 |
Extra fine control features with new MKS mass flow controllers
|
|
|
1986
|
36 |
1-3 |
p. 171-
1 p.
|
artikel
|
| 17 |
Hastings mini-flo provides a primary calibration standard for less than £900
|
|
|
1986
|
36 |
1-3 |
p. 171-172
2 p.
|
artikel
|
| 18 |
Hollow cathode ion source for application to an implanter
|
Tonegawa, A
|
|
1986
|
36 |
1-3 |
p. 15-18
4 p.
|
artikel
|
| 19 |
Improvement of cold forming and form cutting tools by PVD Tin coating
|
Navinšek, B
|
|
1986
|
36 |
1-3 |
p. 111-115
5 p.
|
artikel
|
| 20 |
Introducing KRYTOX high performance vacuum pump fluids from Du Pont
|
|
|
1986
|
36 |
1-3 |
p. 175-
1 p.
|
artikel
|
| 21 |
Introduction
|
Colligon, John S
|
|
1986
|
36 |
1-3 |
p. 3-
1 p.
|
artikel
|
| 22 |
Ion and plasma assisted etching of holographic gratings
|
Darbyshire, DA
|
|
1986
|
36 |
1-3 |
p. 55-60
6 p.
|
artikel
|
| 23 |
Ion beam etching InP at elevated temperatures
|
Webb, AP
|
|
1986
|
36 |
1-3 |
p. 47-49
3 p.
|
artikel
|
| 24 |
Ionized cluster beam technique
|
Takagi, T
|
|
1986
|
36 |
1-3 |
p. 27-31
5 p.
|
artikel
|
| 25 |
Ion-plated metal/ceramic interfaces
|
Rigsbee, JM
|
|
1986
|
36 |
1-3 |
p. 71-74
4 p.
|
artikel
|
| 26 |
Ion plating with an arc source
|
Hatto, PW
|
|
1986
|
36 |
1-3 |
p. 67-69
3 p.
|
artikel
|
| 27 |
Major advance in high temperature technology—£2 million manufacturing plant now in production at Bellshil, Scotland
|
|
|
1986
|
36 |
1-3 |
p. 173-
1 p.
|
artikel
|
| 28 |
Major launch at semiconductor international
|
|
|
1986
|
36 |
1-3 |
p. 174-
1 p.
|
artikel
|
| 29 |
Microwave plasma: its characteristics and applications in thin film technology
|
Musil, J
|
|
1986
|
36 |
1-3 |
p. 161-169
9 p.
|
artikel
|
| 30 |
Multilayer X-ray mirrors prepared by triode sputtering using a new method of film thickness monitoring
|
Sella, C
|
|
1986
|
36 |
1-3 |
p. 121-123
3 p.
|
artikel
|
| 31 |
New literature
|
|
|
1986
|
36 |
1-3 |
p. 177-
1 p.
|
artikel
|
| 32 |
New maglev turbomolecular pumps offer high performance
|
|
|
1986
|
36 |
1-3 |
p. 172-
1 p.
|
artikel
|
| 33 |
New patents
|
|
|
1986
|
36 |
1-3 |
p. 179-205
27 p.
|
artikel
|
| 34 |
New precision thermometer from ASL
|
|
|
1986
|
36 |
1-3 |
p. 175-
1 p.
|
artikel
|
| 35 |
New range of side channel blowers
|
|
|
1986
|
36 |
1-3 |
p. 174-
1 p.
|
artikel
|
| 36 |
New range of vacum/compressor pumps
|
|
|
1986
|
36 |
1-3 |
p. 174-
1 p.
|
artikel
|
| 37 |
New two-stage rotary vacuum pump
|
|
|
1986
|
36 |
1-3 |
p. 172-
1 p.
|
artikel
|
| 38 |
Non-mass analysed ion implantation using microwave ion source
|
Tokiguchi, K
|
|
1986
|
36 |
1-3 |
p. 11-14
4 p.
|
artikel
|
| 39 |
On the adhesion of nitride coatings on HSS substrates
|
Kopacz, Uwe
|
|
1986
|
36 |
1-3 |
p. 81-84
4 p.
|
artikel
|
| 40 |
On the mechanism of carbon transfer in carburizing technique of iron-base alloys under glow discharge conditions
|
Casadesus, P
|
|
1986
|
36 |
1-3 |
p. 51-53
3 p.
|
artikel
|
| 41 |
On the mechanism of deposition of hard a-C:H films by rf-plasma decomposition of hydrocarbons
|
Wendler, B
|
|
1986
|
36 |
1-3 |
p. 107-109
3 p.
|
artikel
|
| 42 |
Oxidation mechanism in rf CO2 plasma
|
Nekano, Junichi
|
|
1986
|
36 |
1-3 |
p. 85-88
4 p.
|
artikel
|
| 43 |
Plasma-assisted deposition and epitaxy of ZnSe
|
Sato, H
|
|
1986
|
36 |
1-3 |
p. 133-137
5 p.
|
artikel
|
| 44 |
Plasma assisted ion plating deposition of optical thin films for coatings and integrated optical applications
|
Varasi, M
|
|
1986
|
36 |
1-3 |
p. 143-147
5 p.
|
artikel
|
| 45 |
Plasma cleaning in an a-Si:H deposition chamber
|
Primig, R
|
|
1986
|
36 |
1-3 |
p. 75-80
6 p.
|
artikel
|
| 46 |
Plasma deposition of metal oxide films for integrated optics
|
Bailey, AH
|
|
1986
|
36 |
1-3 |
p. 139-142
4 p.
|
artikel
|
| 47 |
Plasma filament ion source
|
Yabe, E
|
|
1986
|
36 |
1-3 |
p. 43-45
3 p.
|
artikel
|
| 48 |
PtAl2O3 selective absorber coatings for photothermal conversion up to 600°C
|
Lafait, J
|
|
1986
|
36 |
1-3 |
p. 125-127
3 p.
|
artikel
|
| 49 |
Rf sputtered Ce3+ activated SiO2 glass films as scintillators for alpha particles detection
|
Sella, C
|
|
1986
|
36 |
1-3 |
p. 117-119
3 p.
|
artikel
|
| 50 |
Site demos for the ‘intelligent’ partial pressure gauge
|
|
|
1986
|
36 |
1-3 |
p. 173-
1 p.
|
artikel
|
| 51 |
Soldering glass to glass?
|
|
|
1986
|
36 |
1-3 |
p. 174-
1 p.
|
artikel
|
| 52 |
Structure and density of sputtered MoS2-films
|
Buck, Volker
|
|
1986
|
36 |
1-3 |
p. 89-94
6 p.
|
artikel
|
| 53 |
Substrate temperature monitoring in plasma assisted processes
|
Korotchenko, V
|
|
1986
|
36 |
1-3 |
p. 61-65
5 p.
|
artikel
|
| 54 |
Superconducting magnet for Canada—highest magnetic field made available for research
|
|
|
1986
|
36 |
1-3 |
p. 173-
1 p.
|
artikel
|
| 55 |
The deposition of molybdenum and tungsten coatings on gun steel substrates by a plasma assisted CVD technique
|
Sheward, JA
|
|
1986
|
36 |
1-3 |
p. 37-41
5 p.
|
artikel
|
| 56 |
The development and application of an ion implanter based on ion thruster technology
|
Wilbur, Paul J
|
|
1986
|
36 |
1-3 |
p. 5-9
5 p.
|
artikel
|
| 57 |
The growth and interface study of PECVD SiO x N y on III–V semiconductors
|
Lin, Min-Shyong
|
|
1986
|
36 |
1-3 |
p. 129-132
4 p.
|
artikel
|
| 58 |
The new prethinning instrument for TEM specimen preparation
|
|
|
1986
|
36 |
1-3 |
p. 172-173
2 p.
|
artikel
|
| 59 |
The properties of magnetron sputtered CoNi thin films
|
Spencer, AG
|
|
1986
|
36 |
1-3 |
p. 103-105
3 p.
|
artikel
|
| 60 |
The use of optical emission spectroscopy for process control in triode ion plating with ZrN
|
Salmenoja, K
|
|
1986
|
36 |
1-3 |
p. 33-35
3 p.
|
artikel
|
| 61 |
Transparent conducting oxides of metals and alloys made by reactive magnetron sputtering from elemental targets
|
Lewin, R
|
|
1986
|
36 |
1-3 |
p. 95-98
4 p.
|
artikel
|
| 62 |
Turbomolecular pumping systems from Balzers feature ‘B’ series pumps
|
|
|
1986
|
36 |
1-3 |
p. 173-
1 p.
|
artikel
|
| 63 |
Variations in the colour of group IV B nitride films
|
Perry, AJ
|
|
1986
|
36 |
1-3 |
p. 149-155
7 p.
|
artikel
|
| 64 |
Veeco announces DV-40 system sales
|
|
|
1986
|
36 |
1-3 |
p. 176-
1 p.
|
artikel
|
| 65 |
Veeco announces wafer fab automation systems orders and plant expansion
|
|
|
1986
|
36 |
1-3 |
p. 176-
1 p.
|
artikel
|
| 66 |
Veeco's new MS-2OUFT high production leak detectors for semiconductor devices
|
|
|
1986
|
36 |
1-3 |
p. 173-
1 p.
|
artikel
|
| 67 |
Vickers instruments takes over Bausch & Lomb's Canadian business
|
|
|
1986
|
36 |
1-3 |
p. 176-
1 p.
|
artikel
|
| 68 |
Working instructions for MCP 120 when used to solder glass to glass etc
|
|
|
1986
|
36 |
1-3 |
p. 174-
1 p.
|
artikel
|
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