| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
A new low-energy ion implanter for bombardment of cylindrical surfaces
|
Renier, M.
|
|
1985
|
35 |
12 |
p. 577-578
2 p.
|
artikel
|
| 2 |
Angular distributions of molecular flux from orifices of various thickness
|
Nanbu, K.
|
|
1985
|
35 |
12 |
p. 573-576
4 p.
|
artikel
|
| 3 |
An improved mass spectrometer inlet system for the analysis of air sensitive materials
|
Pilkington, R.D.
|
|
1985
|
35 |
12 |
p. 617-
1 p.
|
artikel
|
| 4 |
An investigation of silver diffusion through gold films by Auger electron spectroscopy
|
Liu, You-ying
|
|
1985
|
35 |
12 |
p. 537-538
2 p.
|
artikel
|
| 5 |
Application of quadrupole mass spectrometry as a process control technique in plasma processes
|
|
|
1985
|
35 |
12 |
p. 635-
1 p.
|
artikel
|
| 6 |
A simple/universal rf-generator module system for use in plasma processing
|
Eriksson, Sven-Åke
|
|
1985
|
35 |
12 |
p. 539-541
3 p.
|
artikel
|
| 7 |
Atomic absorption evaporation flow rate measurements of alkali metal dispensers
|
Succi, M.
|
|
1985
|
35 |
12 |
p. 579-582
4 p.
|
artikel
|
| 8 |
A very short response time electronic system for the measurement of surface potential changes by means of a static capacitor method
|
Bachtin, A.J.
|
|
1985
|
35 |
12 |
p. 519-521
3 p.
|
artikel
|
| 9 |
Background of the workshop on residual gas analyzer calibration
|
Tilford, Charles R
|
|
1985
|
35 |
12 |
p. 629-
1 p.
|
artikel
|
| 10 |
Calibration of a gas-analytical MS by defined gas bursts
|
|
|
1985
|
35 |
12 |
p. 630-631
2 p.
|
artikel
|
| 11 |
Calibration of ultra sensitive helium leak dectectors
|
|
|
1985
|
35 |
12 |
p. 631-
1 p.
|
artikel
|
| 12 |
Characteristics of time-of-flight mass spectrometers
|
|
|
1985
|
35 |
12 |
p. 630-
1 p.
|
artikel
|
| 13 |
Coatings on glass
|
Steckelmacher, W.
|
|
1985
|
35 |
12 |
p. 637-
1 p.
|
artikel
|
| 14 |
Directional effects in kinetic ion-electron emission
|
Brusilovsky, B.A.
|
|
1985
|
35 |
12 |
p. 595-615
21 p.
|
artikel
|
| 15 |
Editorial
|
|
|
1985
|
35 |
12 |
p. 515-
1 p.
|
artikel
|
| 16 |
Editorial: Software survey section
|
|
|
1985
|
35 |
12 |
p. I-IV
nvt p.
|
artikel
|
| 17 |
EFSA—a new evaluation method of the depth resolution in depth profiling of multilayer structures
|
Marton, D.
|
|
1985
|
35 |
12 |
p. 523-526
4 p.
|
artikel
|
| 18 |
Experiences in the use of magnetic-sector and quadrupole-field mass spectrometers
|
|
|
1985
|
35 |
12 |
p. 632-633
2 p.
|
artikel
|
| 19 |
Experience with several quadrupole residual gas analysers
|
|
|
1985
|
35 |
12 |
p. 633-
1 p.
|
artikel
|
| 20 |
Few collisions approach for threshold sputtering
|
Yamamura, Y.
|
|
1985
|
35 |
12 |
p. 561-571
11 p.
|
artikel
|
| 21 |
Formation of buried insulating layers by high dose oxygen implantation under controlled temperature conditions
|
Bruel, M.
|
|
1985
|
35 |
12 |
p. 589-593
5 p.
|
artikel
|
| 22 |
Fragmentation and isotopic abundance as a means for identifying vacuum gaseous species and for monitoring partial pressure analyser operation
|
|
|
1985
|
35 |
12 |
p. 630-
1 p.
|
artikel
|
| 23 |
Limitation of Ti/TiN diffusion barrier layers in silicon technology
|
Norström, H.
|
|
1985
|
35 |
12 |
p. 547-553
7 p.
|
artikel
|
| 24 |
Long-term changes in the sensitivity of quadrupole mass spectrometers
|
|
|
1985
|
35 |
12 |
p. 632-
1 p.
|
artikel
|
| 25 |
Mass spectrometer measurement of moisture in semiconductor devices—calibration and procedures
|
|
|
1985
|
35 |
12 |
p. 635-
1 p.
|
artikel
|
| 26 |
Mass spectrometry as a quantitative diagnostic for plasma discharges in fusion research
|
|
|
1985
|
35 |
12 |
p. 633-
1 p.
|
artikel
|
| 27 |
Mass spectrometry of atmospheric gases
|
|
|
1985
|
35 |
12 |
p. 634-
1 p.
|
artikel
|
| 28 |
Multiple head RGA installation on an electron storage ring
|
|
|
1985
|
35 |
12 |
p. 633-
1 p.
|
artikel
|
| 29 |
New patents
|
|
|
1985
|
35 |
12 |
p. 639-658
20 p.
|
artikel
|
| 30 |
Obituary
|
|
|
1985
|
35 |
12 |
p. 659-
1 p.
|
artikel
|
| 31 |
Oxygen-ion-assisted deposition of thin gold films
|
Martin, P.J.
|
|
1985
|
35 |
12 |
p. 621-624
4 p.
|
artikel
|
| 32 |
Performance of vacuum transfer standards
|
|
|
1985
|
35 |
12 |
p. 631-632
2 p.
|
artikel
|
| 33 |
Present status of quantitative residual gas analysis in Japan
|
|
|
1985
|
35 |
12 |
p. 634-
1 p.
|
artikel
|
| 34 |
Problems on computer processing of SIMS spectra
|
Antal, J.
|
|
1985
|
35 |
12 |
p. 583-587
5 p.
|
artikel
|
| 35 |
Quadrupole mass spectrometers: design considerations and performance
|
|
|
1985
|
35 |
12 |
p. 629-
1 p.
|
artikel
|
| 36 |
RGA calibration methods and experience
|
|
|
1985
|
35 |
12 |
p. 634-
1 p.
|
artikel
|
| 37 |
RGA experience with NSLS
|
|
|
1985
|
35 |
12 |
p. 634-
1 p.
|
artikel
|
| 38 |
Sector mass spectrometer calibration methods applied to residual gas analysers
|
|
|
1985
|
35 |
12 |
p. 631-
1 p.
|
artikel
|
| 39 |
Special series on irradiation enhanced adhesion—part I
|
Colligon, J.S.
|
|
1985
|
35 |
12 |
p. 619-
1 p.
|
artikel
|
| 40 |
Structural peculiarities in high-dose Ar+ implanted silicon
|
Simov, S.
|
|
1985
|
35 |
12 |
p. 527-529
3 p.
|
artikel
|
| 41 |
Surface science applications of residual gas analyzers
|
|
|
1985
|
35 |
12 |
p. 635-
1 p.
|
artikel
|
| 42 |
The limitations of the quadrupole mass spectrometer when used for gas analysis
|
|
|
1985
|
35 |
12 |
p. 629-630
2 p.
|
artikel
|
| 43 |
The spinning rotor viscosity gauge as a basis for the calibration of residual gas analysers and mass spectromers
|
|
|
1985
|
35 |
12 |
p. 631-
1 p.
|
artikel
|
| 44 |
The use of quadrupole mass spectrometers for investigation of surface reactions
|
|
|
1985
|
35 |
12 |
p. 634-635
2 p.
|
artikel
|
| 45 |
The use of Schottky barrier diodes for the detection of surface contamination and damage in the fabrication of GaAs MESFETS
|
Allan, D.A.
|
|
1985
|
35 |
12 |
p. 543-546
4 p.
|
artikel
|
| 46 |
Thin film adhesion improvement under photon irradiation
|
Kellock, A.J.
|
|
1985
|
35 |
12 |
p. 625-628
4 p.
|
artikel
|
| 47 |
Thin films prepared by sputtering MgF2 in an rf planar magnetron
|
Martinů, L.
|
|
1985
|
35 |
12 |
p. 531-535
5 p.
|
artikel
|
| 48 |
Transmission electron microscopy of Li+ implanted Al films
|
Singh, Amarjit
|
|
1985
|
35 |
12 |
p. 555-559
5 p.
|
artikel
|
| 49 |
UK requirements for small mass spectrometer calibration
|
|
|
1985
|
35 |
12 |
p. 635-
1 p.
|
artikel
|
| 50 |
Use of quadrupole RGA's in standard leak calibrations
|
|
|
1985
|
35 |
12 |
p. 632-
1 p.
|
artikel
|
| 51 |
Vacuum and thin films—seeing the wood for the trees!
|
Holland, L.
|
|
1985
|
35 |
12 |
p. 517-518
2 p.
|
artikel
|
| 52 |
Vacuum compatibility criteria used at SURF-II, the NBS Electron Storage Ring
|
|
|
1985
|
35 |
12 |
p. 633-634
2 p.
|
artikel
|
| 53 |
Vacuum measurement calibration system at PPPL
|
|
|
1985
|
35 |
12 |
p. 630-
1 p.
|
artikel
|
| 54 |
Volume contents and author index, volume 35, 185
|
|
|
1985
|
35 |
12 |
p. iii-xi
nvt p.
|
artikel
|
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