| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
An overview of pattern delineation technology in the semiconductor industry
|
Charman, PA
|
|
1985
|
35 |
10-11 |
p. 459-465
7 p.
|
artikel
|
| 2 |
Application of dynamic recoil mixing to surface modification
|
Colligon, JS
|
|
1985
|
35 |
10-11 |
p. 508-509
2 p.
|
artikel
|
| 3 |
Author index of articles
|
|
|
1985
|
35 |
10-11 |
p. i-
1 p.
|
artikel
|
| 4 |
Borophosphosilicate glass for VLSI device fabrication
|
C Sharp, A
|
|
1985
|
35 |
10-11 |
p. 441-443
3 p.
|
artikel
|
| 5 |
Carbon and composite carbon-metal films deposited in an rf glow discharge operated in organic gases
|
Biederman, H
|
|
1985
|
35 |
10-11 |
p. 447-453
7 p.
|
artikel
|
| 6 |
Chemical vapour deposition of metal silicides from organometallic compounds with silicon-metal bonds
|
Aylett, BJ
|
|
1985
|
35 |
10-11 |
p. 435-439
5 p.
|
artikel
|
| 7 |
Clean room technology: the concept of total environmental control for advanced industries
|
Schicht, HH
|
|
1985
|
35 |
10-11 |
p. 485-491
7 p.
|
artikel
|
| 8 |
Editorial
|
|
|
1985
|
35 |
10-11 |
p. 415-
1 p.
|
artikel
|
| 9 |
Editorial: software survey section
|
Colligon, John S
|
|
1985
|
35 |
10-11 |
p. I-IV
nvt p.
|
artikel
|
| 10 |
ESCA studies of the modification of polymeric materials by plasma techniques
|
Munro, HS
|
|
1985
|
35 |
10-11 |
p. 509-510
2 p.
|
artikel
|
| 11 |
Evaporated metal film magnetic recording tape
|
Clow, H
|
|
1985
|
35 |
10-11 |
p. 508-
1 p.
|
artikel
|
| 12 |
Impurity analysis in thin film structures using SIMS
|
Parker, EHC
|
|
1985
|
35 |
10-11 |
p. 514-
1 p.
|
artikel
|
| 13 |
Introductory address
|
Holland, L
|
|
1985
|
35 |
10-11 |
p. 417-
1 p.
|
artikel
|
| 14 |
Ion beam analysis of thin films
|
Sofield, CJ
|
|
1985
|
35 |
10-11 |
p. 513-
1 p.
|
artikel
|
| 15 |
Ion implantation and ion beam mixing in thin films
|
Dearnaley, G
|
|
1985
|
35 |
10-11 |
p. 509-
1 p.
|
artikel
|
| 16 |
Ion-surface interactions in dry etching
|
|
|
1985
|
35 |
10-11 |
p. 503-504
2 p.
|
artikel
|
| 17 |
Microfabrication with ion beams
|
Murray, AJ
|
|
1985
|
35 |
10-11 |
p. 467-477
11 p.
|
artikel
|
| 18 |
Particle control in VLSI
|
Patel, J
|
|
1985
|
35 |
10-11 |
p. 512-
1 p.
|
artikel
|
| 19 |
Perfluoropolyether vacuum fluids for safety in semiconductor processing
|
Valente, M
|
|
1985
|
35 |
10-11 |
p. 511-512
2 p.
|
artikel
|
| 20 |
Pumping systems
|
Weston, GF
|
|
1985
|
35 |
10-11 |
p. 493-497
5 p.
|
artikel
|
| 21 |
Reactive ion etching of GaAs and related materials for electro-optic and other devices
|
|
|
1985
|
35 |
10-11 |
p. 504-506
3 p.
|
artikel
|
| 22 |
Resists used in plasma processing
|
Roberts, ED
|
|
1985
|
35 |
10-11 |
p. 479-483
5 p.
|
artikel
|
| 23 |
Selective chemical vapour deposition of refractory metals
|
|
|
1985
|
35 |
10-11 |
p. 507-
1 p.
|
artikel
|
| 24 |
Silicides for VLSI interconnects
|
Rosser, P
|
|
1985
|
35 |
10-11 |
p. 419-434
16 p.
|
artikel
|
| 25 |
Silicon on insulator structures formed by ion implantation
|
Hemment, PLF
|
|
1985
|
35 |
10-11 |
p. 509-
1 p.
|
artikel
|
| 26 |
The application of ion beams in semi-conductor processing
|
Singh, SP
|
|
1985
|
35 |
10-11 |
p. 510-511
2 p.
|
artikel
|
| 27 |
The application of laser photochemical techniques to microcircuit fabrication
|
Adams, AE
|
|
1985
|
35 |
10-11 |
p. 507-508
2 p.
|
artikel
|
| 28 |
The assessment of ultra-smooth substrates and overcoatings
|
Lindsey, Kevin
|
|
1985
|
35 |
10-11 |
p. 499-502
4 p.
|
artikel
|
| 29 |
The gaseous anodization of silicon and its application
|
Eccleston, W
|
|
1985
|
35 |
10-11 |
p. 455-458
4 p.
|
artikel
|
| 30 |
The non-destructive characterization of silicon-on-sapphire films
|
Pitt, MG
|
|
1985
|
35 |
10-11 |
p. 512-513
2 p.
|
artikel
|
| 31 |
Thin film requirements for optical recording
|
Jacobs, BAJ
|
|
1985
|
35 |
10-11 |
p. 445-446
2 p.
|
artikel
|
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