| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
An evaporation rate meter for use in the control of Ti sublimation pumps
|
Słówko, W
|
|
1984
|
34 |
7 |
p. 699-703
5 p.
|
artikel
|
| 2 |
A study of the electron emission characteristics of a triggered vacuum switch
|
Bayliss, KH
|
|
1984
|
34 |
7 |
p. 705-708
4 p.
|
artikel
|
| 3 |
A throttle valve for automatic pressure control in sputtering and reactive sputter etching
|
Lehmann, HW
|
|
1984
|
34 |
7 |
p. 679-681
3 p.
|
artikel
|
| 4 |
Editorial
|
|
|
1984
|
34 |
7 |
p. 677-
1 p.
|
artikel
|
| 5 |
Erratum
|
|
|
1984
|
34 |
7 |
p. 717-
1 p.
|
artikel
|
| 6 |
New patents
|
|
|
1984
|
34 |
7 |
p. 719-727
9 p.
|
artikel
|
| 7 |
Permanent magnet scanning for E-beam sources
|
Andrew, Rod
|
|
1984
|
34 |
7 |
p. 711-
1 p.
|
artikel
|
| 8 |
Physics of thin films—Advances in research and development vol. 12
|
Hitchman, Michael L
|
|
1984
|
34 |
7 |
p. 715-
1 p.
|
artikel
|
| 9 |
Prediction of substrate temperature in dc ion-plating systems
|
Fancey, KS
|
|
1984
|
34 |
7 |
p. 683-685
3 p.
|
artikel
|
| 10 |
Properties of nickel oxide films grown by sputter oxidation
|
Inoue, Narumi
|
|
1984
|
34 |
7 |
p. 687-691
5 p.
|
artikel
|
| 11 |
The behaviour of secondary electrons from Ni (110) upon oxygen adsorption
|
Hanekamp, LJ
|
|
1984
|
34 |
7 |
p. 709-710
2 p.
|
artikel
|
| 12 |
The Kelvin probe method for work function topographies: technical problems and solutions
|
Bonnet, J
|
|
1984
|
34 |
7 |
p. 693-698
6 p.
|
artikel
|
| 13 |
Vacuum physics
|
Yarwood, J.
|
|
1984
|
34 |
7 |
p. 713-715
3 p.
|
artikel
|
| 14 |
Vacuum technology, thin films and sputtering: An introduction
|
Colligon, JS
|
|
1984
|
34 |
7 |
p. 715-
1 p.
|
artikel
|
| 15 |
Warning device for continuous wire feed evaporation source
|
Ahmed, NAG
|
|
1984
|
34 |
7 |
p. 711-712
2 p.
|
artikel
|
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