nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
1 |
A two-stage solution to the anisotropic polysilicon etching problem
|
Armstrong, NP |
|
1983 |
33 |
5 |
p. 291-294 4 p. |
artikel |
2 |
Changes in the chemical reactivity of metals exposed to an inert gas glow discharge
|
Klemperer, DF |
|
1983 |
33 |
5 |
p. 301-305 5 p. |
artikel |
3 |
Electroformed states in an AuNaFAu thin film structure
|
Babulanam, SM |
|
1983 |
33 |
5 |
p. 307-309 3 p. |
artikel |
4 |
Investigations on pumping speed and compression work of liquid ring vacuum pumps
|
Powle, Usha S |
|
1983 |
33 |
5 |
p. 255-263 9 p. |
artikel |
5 |
Ion energy distribution in ion plating
|
Machet, J. |
|
1983 |
33 |
5 |
p. 279-284 6 p. |
artikel |
6 |
Modulating ion current pressure gauge
|
Watanabe, F |
|
1983 |
33 |
5 |
p. 271-278 8 p. |
artikel |
7 |
Planar plasma etching of chromium
|
Naguib, H.M. |
|
1983 |
33 |
5 |
p. 285-290 6 p. |
artikel |
8 |
Sorption of active gases by non-evaporable getter
|
Parkash, Surya |
|
1983 |
33 |
5 |
p. 295-299 5 p. |
artikel |
9 |
The role of surface phenomena in the interactions of reactive metals with gases
|
Hörz, G |
|
1983 |
33 |
5 |
p. 265-270 6 p. |
artikel |
10 |
Thin films prepared by plasma polymerization of methyl-methacrylate and their properties as an electron beam resist
|
MartinŮ, L |
|
1983 |
33 |
5 |
p. 253-254 2 p. |
artikel |