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                             228 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 5210. A compact ion source with high brightness 1982
32 7 p. 457-
1 p.
artikel
2 5114. A Fabry Perot interferometer for plasma diagnostics 1982
32 7 p. 447-
1 p.
artikel
3 5225. A goniometer head for an atom-probe field ion microscope 1982
32 7 p. 458-
1 p.
artikel
4 5125. A hollow-cathode discharge as a cold uniform plasma source 1982
32 7 p. 448-
1 p.
artikel
5 5102. A molecular dynamics simulation study of the influence of the ionatom potential function upon sputtering 1982
32 7 p. 446-
1 p.
artikel
6 5122. An alpha particle range spectrometer using solid state nuclear track detectors 1982
32 7 p. 448-
1 p.
artikel
7 5039. An apparatus for measuring the adsorption of gases at high and low pressures 1982
32 7 p. 439-
1 p.
artikel
8 5053. An approach to the non-linearity of an ionization vacuum gauge at the upper limit of the measured pressure 1982
32 7 p. 441-
1 p.
artikel
9 5243. An atom probe study of the anomalous field evaporation of alloys containing silicon 1982
32 7 p. 460-
1 p.
artikel
10 5051. A new development of refrigerators of high operational reliability for use in cryopumps 1982
32 7 p. 440-441
2 p.
artikel
11 5063. A new simple universal leak-detector with air-cooled turbo-pump 1982
32 7 p. 442-
1 p.
artikel
12 5252. A new theory of electronic surface states 1982
32 7 p. 461-462
2 p.
artikel
13 5231. An extended X-ray absorption fine structure study of amorphous and crystalline germanium 1982
32 7 p. 459-
1 p.
artikel
14 5246. Angle-resolved and -integrated photoemission from a ZnSe (110) surface 1982
32 7 p. 461-
1 p.
artikel
15 5216. Angle-resolved electron spectrometer with multidetection 1982
32 7 p. 457-
1 p.
artikel
16 5040. A nitrogen ion laser pumped by a rapid discharge 1982
32 7 p. 439-
1 p.
artikel
17 Announcement 1982
32 7 p. 467-
1 p.
artikel
18 5052. Application of cryopumps in industrial vacuum technology 1982
32 7 p. 441-
1 p.
artikel
19 5054. Application of low temperature calorimetry for the measurement of impingement rate of gas molecules 1982
32 7 p. 441-
1 p.
artikel
20 5065. A self-latching electromechanical shutter for use in vacuum evaporators 1982
32 7 p. 442-
1 p.
artikel
21 5043. A semi-empirical formula to describe the net emission coefficient of self-absorbed spectral lines for use in modelling high-pressure discharge lamps 1982
32 7 p. 440-
1 p.
artikel
22 5047. A simple understanding of net outgassing rate as a function of pumping speed 1982
32 7 p. 440-
1 p.
artikel
23 5172. A strain monitor for ion implantation 1982
32 7 p. 453-
1 p.
artikel
24 5150. A study of Ge GaAs interfaces grown by molecular beam epitaxy 1982
32 7 p. 451-
1 p.
artikel
25 5219. A study of secondary molecular ion formation in rare earth and rare earth oxides 1982
32 7 p. 458-
1 p.
artikel
26 5253. A study of surface potentials of GaAs using the Kelvin probe method and the variations of the photoemission threshold 1982
32 7 p. 462-
1 p.
artikel
27 5238. A study of the SiAuAg interface by surface techniques 1982
32 7 p. 460-
1 p.
artikel
28 5104. Asymmetric triangular grating profiles with 90 groove angles produced by ion-beam erosion 1982
32 7 p. 446-
1 p.
artikel
29 5249. Atomic geometry of AlGaAs interfaces: GaAs (110)-p (1 × 1)-Al(θ), 0 ≤ θ ≤ 8.5 monolayers 1982
32 7 p. 461-
1 p.
artikel
30 5245. Atomic structure of GaP (110) and (111) faces 1982
32 7 p. 460-461
2 p.
artikel
31 5066. Automatic shutter controller for molecular beam epitaxy 1982
32 7 p. 442-
1 p.
artikel
32 [bd5078. Thin film preparation by plasma and low pressure CVD in a horizontal reactor 1982
32 7 p. 443-
1 p.
artikel
33 5143. Beam-intensity fluctuations in atmospheric turbulence 1982
32 7 p. 450-
1 p.
artikel
34 5145. Calculation and observation of thermal electrostatic noise in solar wind plasma 1982
32 7 p. 450-
1 p.
artikel
35 5197. Changes in the viscoelastic and electrical properties of polyethylene by the effect of gamma irradiation 1982
32 7 p. 455-456
2 p.
artikel
36 5141. Channeling analysis of MBE InAlAs InGaAs interfaces 1982
32 7 p. 450-
1 p.
artikel
37 5213. Chemical composition of the SiO 2 InSb interface as determined by X-ray photoelectron spectroscopy 1982
32 7 p. 457-
1 p.
artikel
38 5089. Coating of preformed pieces with TiN by high rate sputtering 1982
32 7 p. 444-445
2 p.
artikel
39 5148. Compounds in the PdSi and PtSi system obtained by electron bombardment and post-thermal annealing 1982
32 7 p. 450-451
2 p.
artikel
40 5139. Computer studies on radiation of axially-channeled electrons 1982
32 7 p. 450-
1 p.
artikel
41 5041. Contact charge-transfer lasers 1982
32 7 p. 439-
1 p.
artikel
42 5117. Continuous slowing-down approximation range of 50 KeV 100 MeV electrons 1982
32 7 p. 448-
1 p.
artikel
43 5096. Contribution of anisotropic velocity distribution of recoil atoms to sputtering yields and angular distributions of sputtered atoms 1982
32 7 p. 445-
1 p.
artikel
44 5132. Cross sections for the 16O(16O,8Beg,s)24Mg reaction and mechanisms of α-rearrangement reactions 1982
32 7 p. 449-
1 p.
artikel
45 5057. Cryostat for the production and acceleration of deuterium pellets for use in nuclear fusion plants 1982
32 7 p. 441-
1 p.
artikel
46 5196. Deep levels in electron irradiated edge-defined film-fed growth ribbon silicon 1982
32 7 p. 455-
1 p.
artikel
47 5135. Dependence of the radiation spectra from channeled electrons on their energy 1982
32 7 p. 449-
1 p.
artikel
48 5230. Depth profile composition studies of thin film CdS:Cu2S solar cells using XPS and AES 1982
32 7 p. 459-
1 p.
artikel
49 5240. Design of a molecular beam surface scattering apparatus for velocity and angular distribution measurements 1982
32 7 p. 460-
1 p.
artikel
50 5059. Detecting leaks in small parts 1982
32 7 p. 441-
1 p.
artikel
51 5224. Determination of the multiplier gain of a photomultiplier 1982
32 7 p. 458-
1 p.
artikel
52 5142. Developments and trends in vacuum metrology 1982
32 7 p. 450-
1 p.
artikel
53 5058. Developments of helium-leak-detection-techniques for UHVsystems of large accelerators and storage rings 1982
32 7 p. 441-
1 p.
artikel
54 5124. Diagnostics of high-pressure arc plasmas from laser-induced fluorescence 1982
32 7 p. 448-
1 p.
artikel
55 5077. Differences in nickel—aluminium films prepared by different evaporation methods 1982
32 7 p. 443-
1 p.
artikel
56 5092. Differential sputtering and surface segregation: The role of enhanced diffusion 1982
32 7 p. 445-
1 p.
artikel
57 5177. Diffusion of zinc in gallium arsenide: A new model 1982
32 7 p. 453-
1 p.
artikel
58 5179. Directional reactive-ion-etching of InP with Cl2 containing gases 1982
32 7 p. 454-
1 p.
artikel
59 5129. Double layer formation in a magnetized laboratory plasma 1982
32 7 p. 449-
1 p.
artikel
60 Editorial 1982
32 7 p. 397-
1 p.
artikel
61 5080. Effect of atmospheric oxygen on evaporated chromium films 1982
32 7 p. 443-444
2 p.
artikel
62 5140. Effect of ion current in the collisionless theory of floating ac probe measurements 1982
32 7 p. 450-
1 p.
artikel
63 5165. Effect of particle size on the chemisorption and decomposition of carbon monoxide by palladium and nickel clusters 1982
32 7 p. 452-
1 p.
artikel
64 5167. Effect of silicon dioxide surface-layer thickness on boron profiles for directly aligned implants into (100) silicon 1982
32 7 p. 452-
1 p.
artikel
65 5144. Effect of the turbulent atmosphere on the autocovariance function for a speckle field generated by a laser beam with random pointing error 1982
32 7 p. 450-
1 p.
artikel
66 5034. Effect of turbulence on pressure probes 1982
32 7 p. 439-
1 p.
artikel
67 5091. Effects of argon pressure and substrate temperature on the structure and properties of sputtered copper films 1982
32 7 p. 445-
1 p.
artikel
68 5075. Effects of oxygen and chlorine on the interfacial crystallization of amorphous selenium films 1982
32 7 p. 443-
1 p.
artikel
69 5251. Effects of surface relaxation on the electronic structure of ZnO (1010) 1982
32 7 p. 461-
1 p.
artikel
70 5086. Electrical properties of SiO2 and Si3N4 dielectric layers on InP 1982
32 7 p. 444-
1 p.
artikel
71 5073. Electrical transport properties of p-type Pb1—xCdxTe thin films 1982
32 7 p. 443-
1 p.
artikel
72 5220. Electron damage in ZnSe using transmission electron microscopy 1982
32 7 p. 458-
1 p.
artikel
73 5229. Electron emission from molybdenum under ion bombardment 1982
32 7 p. 459-
1 p.
artikel
74 5088. Electron spectroscopy of ion beam and hydrocarbon plasma generated diamondlike carbon films 1982
32 7 p. 444-
1 p.
artikel
75 5069. Electron transport studies in SiO2 films excited by a pulsed electron beam. (GB) 1982
32 7 p. 442-
1 p.
artikel
76 5087. Emission of electrons and positive ions upon fracture of oxide films 1982
32 7 p. 444-
1 p.
artikel
77 5046. Evaluation of ISABELLE full cell ultra-high vacuum system 1982
32 7 p. 440-
1 p.
artikel
78 5158. Experimental and calculated depth distribution of damage and projected ranges of 20 keV 4He ions in nickel 1982
32 7 p. 451-452
2 p.
artikel
79 5175. Fabrication of P+-N-N+ silicon solar cells by simultaneous diffusion of boron and phosphorus into silicon through silicon dioxide 1982
32 7 p. 453-
1 p.
artikel
80 5157. Factors influencing the formation and growth of faulted loops in BF2 +-implanted silicon 1982
32 7 p. 451-
1 p.
artikel
81 5207. Faraday cup analysis of ion beams produced by a dense plasma focus 1982
32 7 p. 456-
1 p.
artikel
82 5084. Film thickness uniformity of sputter deposited layers-comparison between calculation and practical results 1982
32 7 p. 444-
1 p.
artikel
83 5118. Flux-limited heat flow in a double plasma device 1982
32 7 p. 448-
1 p.
artikel
84 5044. Formation time and heating mechanism of arc cathode craters in vacuum 1982
32 7 p. 440-
1 p.
artikel
85 5241. GaAs-oxide interface states: Gigantic photoionization via Augerlike process 1982
32 7 p. 460-
1 p.
artikel
86 5038. Gauge calibration system based on piston manometer 1982
32 7 p. 439-
1 p.
artikel
87 5211. Geometrical effects on the beamlet optics of a two-stage ion accelerator 1982
32 7 p. 457-
1 p.
artikel
88 5074. Gold-aluminium thin-film interactions and compound formation 1982
32 7 p. 443-
1 p.
artikel
89 5168. Gold gettering in silicon by phosphorous diffusion and argon implantation: Mechanisms and limitations 1982
32 7 p. 452-453
2 p.
artikel
90 5223. Grain boundary potential determination in polycrystalline silicon by the scanning light spot technique 1982
32 7 p. 458-
1 p.
artikel
91 5067. Growth and thermal stability of single crystal metastable semiconducting (GaSb)1-x Ge x films. (GB) 1982
32 7 p. 442-
1 p.
artikel
92 5184. Growth of dislocation-free silicon films by molecular beam epitaxy (MBE) 1982
32 7 p. 454-
1 p.
artikel
93 5189. Heteroepitaxial silicon growth on polycrystalline MoSi2 1982
32 7 p. 455-
1 p.
artikel
94 5200. High density cascade effects 1982
32 7 p. 456-
1 p.
artikel
95 5121. High power heating in the ion cyclotron range of frequencies in the Wisconsin Tokapole II 1982
32 7 p. 448-
1 p.
artikel
96 5202. H− ion formation from a surface conversion type ion source 1982
32 7 p. 456-
1 p.
artikel
97 5126. Hollow cathode startup using a microplasma discharge 1982
32 7 p. 448-
1 p.
artikel
98 5186. Improved properties of In x Ga1 x As layers grown by molecular-beam epitaxy on InP substrates 1982
32 7 p. 454-
1 p.
artikel
99 5115. Impurity studies in fusion devices using laser-fluorescence spectroscopy 1982
32 7 p. 447-
1 p.
artikel
100 5155. In-depth profiles of deep-trap concentration in Fe-implanted n-type silicon 1982
32 7 p. 451-
1 p.
artikel
101 5094. Influence of bias sputtered glass on avalanche breakdown 1982
32 7 p. 445-
1 p.
artikel
102 5192. Influence of ion radiation on surface reactivity 1982
32 7 p. 455-
1 p.
artikel
103 5208. Influence of spherical and chromatic aberrations on the half-radius of an electron beam 1982
32 7 p. 456-
1 p.
artikel
104 5097. Influence of the bombarding angle on the sputtering yield of heavy atomic and molecular ion bombardment of Ag and Au 1982
32 7 p. 445-
1 p.
artikel
105 5161. Interference enhanced Raman scattering study of the interfacial reaction of PD on a-Si:H 1982
32 7 p. 452-
1 p.
artikel
106 5131. Intermolecular potentials from proton spin-lattice relaxation time in H2 AR and H2-N2 gas mixtures 1982
32 7 p. 449-
1 p.
artikel
107 5218. Intrinsic and defect surface states on single-crystal metal oxides 1982
32 7 p. 457-458
2 p.
artikel
108 5201. Ion beam characteristics of a gas-filled accelerator tube 1982
32 7 p. 456-
1 p.
artikel
109 5159. Ion beam characterization of the GaAs-GaAs oxide interface for plasma and anodic oxides 1982
32 7 p. 452-
1 p.
artikel
110 5206. Ion beam extraction from a plasma with aberration reduction by method of mutual exclusion 1982
32 7 p. 456-
1 p.
artikel
111 5147. Ion beam oxidation 1982
32 7 p. 450-
1 p.
artikel
112 5239. Ion channeling and Auger electron spectroscopy study of Sb-diffused Pb1 x Sn x Te crystals 1982
32 7 p. 460-
1 p.
artikel
113 5181. Ion implantation and low-temperature epitaxial regrowth of GaAs 1982
32 7 p. 454-
1 p.
artikel
114 5103. Ion implantation and sputtering in the presence of reactive gases: Bombardment-induced incorporation of oxygen and related phenomena 1982
32 7 p. 446-
1 p.
artikel
115 5082. Ion plating and ionization 1982
32 7 p. 444-
1 p.
artikel
116 5153. Laser annealing to produce ferroelectric-phase PbTiO3 thin films 1982
32 7 p. 451-
1 p.
artikel
117 5205. Laser cooling of heavy-ion beams 1982
32 7 p. 456-
1 p.
artikel
118 5060. Leak-detection in chemical plants 1982
32 7 p. 441-
1 p.
artikel
119 5061. Leak-detection in chemical plants with helium mass-spectrometer detectors 1982
32 7 p. 441-442
2 p.
artikel
120 LEED intensity measurements by an improved Faraday cup collector Bechtold, HJ
1982
32 7 p. 425-431
7 p.
artikel
121 5248. LEED investigation of extended defects at the surface of Ge films grown epitaxially on GaAs(110) 1982
32 7 p. 461-
1 p.
artikel
122 5134. Levels in 149Nd studied with the (d,t) reaction 1982
32 7 p. 449-
1 p.
artikel
123 5233. Low energy ion scattering (LEIS) and the compositional and structural analysis of solid surfaces. Part I 1982
32 7 p. 459-
1 p.
artikel
124 5191. Low-temperature annealing and hydrogenation of defects at the SiSiO2 interface 1982
32 7 p. 455-
1 p.
artikel
125 5188. Low-temperature redistribution and gettering of oxygen in silicon 1982
32 7 p. 454-455
2 p.
artikel
126 5203. Magnetic effects in high current ion beams 1982
32 7 p. 456-
1 p.
artikel
127 5108. Magnetron sputtering of solar coatings inside tubes 1982
32 7 p. 447-
1 p.
artikel
128 5056. Mass spectrometric analyser for individual aerosol particles 1982
32 7 p. 441-
1 p.
artikel
129 5209. Mass transport in liquid gallium ion beam sources 1982
32 7 p. 456-457
2 p.
artikel
130 5081. Mechanical and tribological behaviour of ion plated soft metallic coatings 1982
32 7 p. 444-
1 p.
artikel
131 5236. Metal/silicon interface formation: The Ni Si and Pd Si systems 1982
32 7 p. 459-
1 p.
artikel
132 5100. Microstructure and properties of rf-sputtered amorphous hydrogenated silicon films 1982
32 7 p. 446-
1 p.
artikel
133 Models of single crystal sputtering Yurasova, VE
1982
32 7 p. 399-424
26 p.
artikel
134 5171. Modification of a surface oxide due to 4He ion bombardment 1982
32 7 p. 453-
1 p.
artikel
135 5185. Molecular beam epitaxy of Ge-GaAs superlattices 1982
32 7 p. 454-
1 p.
artikel
136 5204. Molecular beam facility for studying mass spectrometer performance 1982
32 7 p. 456-
1 p.
artikel
137 5106. Molecular beam levitator for sputter coating of microspheres 1982
32 7 p. 446-447
2 p.
artikel
138 5036. Monte Carlo calculations for free molecular and near-free molecular flow through axially symmetric tubes 1982
32 7 p. 439-
1 p.
artikel
139 5068. Morphology of thin superconducting Nb films 1982
32 7 p. 442-
1 p.
artikel
140 5195. Neutron transmutation doping of silicon and other semiconducting materials 1982
32 7 p. 455-
1 p.
artikel
141 5215. New fluorescence detection system for X-ray absorption spectroscopy 1982
32 7 p. 457-
1 p.
artikel
142 5170. New ion implant technique for low-cost solar cell fabrication 1982
32 7 p. 453-
1 p.
artikel
143 5048. New series of air-cooled turbomolecular pumps for industry and research to be mounted in any position 1982
32 7 p. 440-
1 p.
artikel
144 5227. Novel charged particle analyser for momentum determination in the multichanneling mode. II. Physical realization, performance tests, and sample spectra 1982
32 7 p. 458-
1 p.
artikel
145 5119. Numerical simulation of a system for ion temperature measurement by Thomson scattering in a tokamak 1982
32 7 p. 448-
1 p.
artikel
146 5127. O5 ions in a low pressure glow discharge of oxygen 1982
32 7 p. 448-449
2 p.
artikel
147 5247. On the electronic structure of clean, 2 × 1 reconstructed silicon (001) surfaces 1982
32 7 p. 461-
1 p.
artikel
148 5154. On the formation of binary compounds in Au InP system 1982
32 7 p. 451-
1 p.
artikel
149 5085. On the properties of ion-beam sputtered CulnSe2 thin films 1982
32 7 p. 444-
1 p.
artikel
150 Oxidation of silicon surfaces 1982
32 7 p. 452-
1 p.
artikel
151 5163. Oxygen adsorption on the disordered silicon surface 1982
32 7 p. 452-
1 p.
artikel
152 5160. Oxygen impurity effects at metal/silicide interfaces: Formation of silicon oxide and suboxides in the Ni Si system 1982
32 7 p. 452-
1 p.
artikel
153 5110. Oxygen plasma etching of thick polymer layers 1982
32 7 p. 447-
1 p.
artikel
154 5045. Performance of mechanical vacuum pumps in the molecular flow range 1982
32 7 p. 440-
1 p.
artikel
155 5071. Positive-ion emission from α-AGI films 1982
32 7 p. 442-443
2 p.
artikel
156 5162. Possible oxygen chemisorption configurations on the Si(111) 2 × 1 surface 1982
32 7 p. 452-
1 p.
artikel
157 5232. Potentiometric nondestructive testing of surface-hardened materials 1982
32 7 p. 459-
1 p.
artikel
158 5098. Preferential sputtering and surface segregation in tungsten—molybdenum alloys 1982
32 7 p. 445-446
2 p.
artikel
159 5093. Properties of solar absorbing films produced by an in-line sputter coating plant 1982
32 7 p. 445-
1 p.
artikel
160 5049. Pumping of dry air and of saturated air-water vapour mixture with liquid ring vacuum pumps 1982
32 7 p. 440-
1 p.
artikel
161 5055. Pyrolysis mass spectrometer for direct sampling of primary products of thermolysis reactions 1982
32 7 p. 441-
1 p.
artikel
162 5137. Radiation and spin separation of high energy positrons channeled in bent crystals 1982
32 7 p. 449-
1 p.
artikel
163 5190. Radiation effects in crystalline SiO2: The role of aluminium 1982
32 7 p. 455-
1 p.
artikel
164 5166. Radiation enhanced diffusion of bromine in sodium chloride crystal 1982
32 7 p. 452-
1 p.
artikel
165 5136. Radiation from high energy positrons in a potential of crystal planes 1982
32 7 p. 449-
1 p.
artikel
166 5090. Reactive dc high-rate sputtering with the magnetron/plasmatron for industrial applications 1982
32 7 p. 445-
1 p.
artikel
167 5183. Recent European developments in MBE 1982
32 7 p. 454-
1 p.
artikel
168 5250. Reconstructions of GaAs and AlAs surfaces as a function of metal m As ratio 1982
32 7 p. 461-
1 p.
artikel
169 5105. Relations between the orientations of ion bombarded single crystals, resulting surface structures and sputtered spot patterns 1982
32 7 p. 446-
1 p.
artikel
170 5076. Reproductibility of vacuum deposited films of amorphous ZnTe 1982
32 7 p. 443-
1 p.
artikel
171 5222. Secondary ion emission from binary alloy systems. Part II: Ar+ bombardment with O2 absorption 1982
32 7 p. 458-
1 p.
artikel
172 5221. Secondary ion emission from binary alloy systems. Part I: O2 + bombardment 1982
32 7 p. 458-
1 p.
artikel
173 5174. Selenium implantation in indium phosphide 1982
32 7 p. 453-
1 p.
artikel
174 5187. Shallow PtSi-Si Schottky barrier contacts formed by a multilayer metallization technique 1982
32 7 p. 454-
1 p.
artikel
175 5214. Silicide interface stoichiometry 1982
32 7 p. 457-
1 p.
artikel
176 5111. Simulation of ion-beam etched pattern profiles 1982
32 7 p. 447-
1 p.
artikel
177 Solar selective surfaces Hill, R.
1982
32 7 p. 463-
1 p.
artikel
178 5212. Some experimental facts that indicate the elimination of astigmatism in ion beams with separators using crossed electric and magnetic fields 1982
32 7 p. 457-
1 p.
artikel
179 5120. Spectroscopic observations of impurities in Tokapole II discharges 1982
32 7 p. 448-
1 p.
artikel
180 5123. Spectrum and energy levels of four-times-ionized niobium 1982
32 7 p. 448-
1 p.
artikel
181 5128. Stationary striations in a glow discharge 1982
32 7 p. 449-
1 p.
artikel
182 5152. Stoichiometric disturbances in ion implanted compound semiconductors 1982
32 7 p. 451-
1 p.
artikel
183 5113. Stopping power measurements in the 20 150 KeV region using thick target backscattering: 1H and 4He on carbon, silicon and gold 1982
32 7 p. 447-
1 p.
artikel
184 5112. Strains and photovoltaic response in Ta-sputtered Si metal-insulator-semiconductor solar cells 1982
32 7 p. 447-
1 p.
artikel
185 5235. Study of stability of MIS polycryslalline silicon solar cells by Auger electron spectroscopy 1982
32 7 p. 459-
1 p.
artikel
186 5217. Surface and interface properties of Zn3P2 solar cells 1982
32 7 p. 457-
1 p.
artikel
187 5099. Surface recoil atoms in the angular distribution of sputtered gold under bombardment of monocrystals with ions 1982
32 7 p. 446-
1 p.
artikel
188 5244. Surface reconstruction and interface formation in Si and GaAs 1982
32 7 p. 460-
1 p.
artikel
189 5242. Surface topography and alignment of liquid crystals on rubbed oxide surfaces 1982
32 7 p. 460-
1 p.
artikel
190 5095. The dependence of deposition rate on power input for dc and rf magnetron sputtering 1982
32 7 p. 445-
1 p.
artikel
191 5194. The effect of phosphorus ion implantation on molybdenum/silicon contacts 1982
32 7 p. 455-
1 p.
artikel
192 5062. The effect of the cold water pressure test on the leakage detection with test gases on a test heat exchanger 1982
32 7 p. 442-
1 p.
artikel
193 5176. The electrical properties of sulphur in silicon 1982
32 7 p. 453-
1 p.
artikel
194 5178. The influence of tin implantation on the oxidation of iron 1982
32 7 p. 453-
1 p.
artikel
195 5133. The level structure of 142Pr deduced from the 141Pr(n,γ)142Pr reaction 1982
32 7 p. 449-
1 p.
artikel
196 The new editorial management board 1982
32 7 p. 395-
1 p.
artikel
197 5169. Theoretical and experimental investigation of the dynamics of pulsed laser annealing of amorphous silicon 1982
32 7 p. 453-
1 p.
artikel
198 Theoretical and experimental study of high fluence germanium implantation into silicon. Contribution of atomic mixing Gras-Marti, A
1982
32 7 p. 433-437
5 p.
artikel
199 5050. Theoretical investigation of the effect of the pump contour on the pumping speed of diffusion pumps 1982
32 7 p. 440-
1 p.
artikel
200 5199. Theory of the spatial distribution of defects in radiation cascades in crystals. II. The structure of the cascade region 1982
32 7 p. 456-
1 p.
artikel
201 5198. Theory of the spatial distribution of defects in radiation cascades in crystals. I. The cascade of moving atoms 1982
32 7 p. 456-
1 p.
artikel
202 5037. The problem of the approximate calculation for molecular conductance 1982
32 7 p. 439-
1 p.
artikel
203 5107. The properties of films prepared by the rf sputtering of PTFE and plasma polymerization of some freons 1982
32 7 p. 447-
1 p.
artikel
204 5156. The reaction of fluorine atoms with silicon 1982
32 7 p. 451-
1 p.
artikel
205 5072. Thermionic emission and atom vaporization of the Gd-B system 1982
32 7 p. 443-
1 p.
artikel
206 5070. Thermoelectric effect in ytterbium and samarium films 1982
32 7 p. 442-
1 p.
artikel
207 5149. The role of plasma diffusion in heat dissipation during laser annealing 1982
32 7 p. 451-
1 p.
artikel
208 5237. The surface energy of Si, GaAs, and GaP 1982
32 7 p. 460-
1 p.
artikel
209 5101. The work function of sputter-formed Re-1% Pt 1982
32 7 p. 446-
1 p.
artikel
210 5083. Thickness uniformity of evaporated layers in theory and practice 1982
32 7 p. 444-
1 p.
artikel
211 5109. Thick zone plate fabrication using reactive sputter etching 1982
32 7 p. 447-
1 p.
artikel
212 5138. Total intensity of Kumakhov radiation of channeled positrons and electrons for high energy particles 1982
32 7 p. 449-
1 p.
artikel
213 5234. Trace detection in surface microanalysis 1982
32 7 p. 459-
1 p.
artikel
214 5116. Transition from diffusion-convection to shealth-convection of a cold Langmuir probe in a moving compressible plasma 1982
32 7 p. 447-448
2 p.
artikel
215 5226. Transmission electron microscope study of ion beam annealing effects of ion-implanted and evaporated amorphous silicon 1982
32 7 p. 458-
1 p.
artikel
216 5151. Trapping of Sb by TaC and Cu precipitates in ion-implanted Fe 1982
32 7 p. 451-
1 p.
artikel
217 5130. Tst of an electronic distribution model with macroscopic measurements performed on a proton-beam-induced neon plasma containing nitrogen impurities 1982
32 7 p. 449-
1 p.
artikel
218 5064. Twin Knudsen cell for evaporation investigations 1982
32 7 p. 442-
1 p.
artikel
219 5228. Ultrahigh vacuum multipurpose offset manipulator for surface and thin film reaction studies 1982
32 7 p. 458-459
2 p.
artikel
220 5042. Ultrashort pulse generation by Nd3+: glass and Nd3+: YAG lasers 1982
32 7 p. 440-
1 p.
artikel
221 5079. Uniform evaporated coatings on rotating conical workholders 1982
32 7 p. 443-
1 p.
artikel
222 5182. Use of molecular beam epitaxy for the achievement of low resistance intercell contacts in multiband gap solar cells 1982
32 7 p. 454-
1 p.
artikel
223 Vacuum group committee report 1981/2 Grossart, GS
1982
32 7 p. 465-
1 p.
artikel
224 5193. Vapour phase epitaxy of Cd x Hg1-x Te using organumetallics 1982
32 7 p. 455-
1 p.
artikel
225 5146. Variance of intensity for a discrete-spectrum, polychromatic speckle field after propagation through the turbulent atmosphere 1982
32 7 p. 450-
1 p.
artikel
226 5035. Viscosity measurements in the presence of electric fields 1982
32 7 p. 439-
1 p.
artikel
227 5173. Void formation and denudation in ion-irradiated nickel 1982
32 7 p. 453-
1 p.
artikel
228 5180. Volatile metal oxide incorporation in layers of GaAs and Ga1-x Al xAs grown by molecular beam epitaxy 1982
32 7 p. 454-
1 p.
artikel
                             228 gevonden resultaten
 
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