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                             243 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Absolute measurement of low-energy H0 fluxes by a secondary emission detector 1980
 30 8-9 p. 337-
1 p.
 artikel
2 A convenient method for the measurement of species composition from an intense neutral beam 1980
 30 8-9 p. 349-350
2 p.
 artikel
3 Adatom bonding effects from coverage-dependent angle-resolved Photoemission: Ag(001) + Cl 1980
 30 8-9 p. 336-
1 p.
 artikel
4 Additions to Edwards' freeze dryer range follow German firm joining Edwards group 1980
 30 8-9 p. 358-359
2 p.
 artikel
5 Adhesion of copper films on ABS polymers deposited in an internal magnet magnetron sputtering system 1980
 30 8-9 p. 348-
1 p.
 artikel
6 Adhesion of thin films of evaporated titanium-copper after electroplating 1980
 30 8-9 p. 342-
1 p.
 artikel
7 Adhesive bonding of ion-beam-textured metals and fluoropolymers 1980
 30 8-9 p. 351-
1 p.
 artikel
8 A differentially pumped low-energy ion beam system for an ultra-high vacuum atom-probe field-ion microscope 1980
 30 8-9 p. 338-
1 p.
 artikel
9 Adlayer-induced LEED beams near order-disorder transitions 1980
 30 8-9 p. 354-
1 p.
 artikel
10 AES study of oxidation of surface and bulk sulfides of Ni 1980
 30 8-9 p. 336-
1 p.
 artikel
11 AES study of the adsorption of O2, CO, CO2, and H2O on indium 1980
 30 8-9 p. 335-336
2 p.
 artikel
12 A miniaturized electron gun for measurements of work function variations by the method of retarding potential in an axial magnetic field 1980
 30 8-9 p. 339-
1 p.
 artikel
13 A miniaturized turbo-molecular pump of 16 l s−1 for space applications 1980
 30 8-9 p. 342-
1 p.
 artikel
14 Analysis of ELEED intensities from ZnTe(110) 1980
 30 8-9 p. 354-
1 p.
 artikel
15 A nanosecond surface discharge study in low pressures 1980
 30 8-9 p. 340-
1 p.
 artikel
16 Angular-dependent ultra-violet photoemission spectroscopy of polycrystalline films: a probe of surface electronic structure 1980
 30 8-9 p. 354-
1 p.
 artikel
17 An X-ray diffraction study on the microstructure of vapour-deposited fcc lead films: normal and oblique incidences 1980
 30 8-9 p. 343-
1 p.
 artikel
18 Apparatus for simultaneous measurement of mass change, optical transmittance and reflectance of thin films 1980
 30 8-9 p. 344-
1 p.
 artikel
19 Application of matrix isolation spectroscopy to the measurement of sputtering yields 1980
 30 8-9 p. 347-
1 p.
 artikel
20 Application of surface analysis to lubrication problems 1980
 30 8-9 p. 355-
1 p.
 artikel
21 A simple system for inserting samples into an ultra-high vacuum system through a vacuum lock 1980
 30 8-9 p. 342-
1 p.
 artikel
22 A statistical model of sputtering 1980
 30 8-9 p. 345-
1 p.
 artikel
23 A study of amorphous superconducting transition metalmetalloid alloys produced by co-evaporation 1980
 30 8-9 p. 344-
1 p.
 artikel
24 A summer school on Formation Processes of Thin Films 1980
 30 8-9 p. 369-
1 p.
 artikel
25 Automatic analysis of materials 1980
 30 8-9 p. 359-
1 p.
 artikel
26 Automatic torque magnetometer for vacuum-to-high-pressure hydrogen environments 1980
 30 8-9 p. 342-
1 p.
 artikel
27 1979–80 AVS Award winners announced 1980
 30 8-9 p. 370-
1 p.
 artikel
28 AVS presents 1979 shop note awards 1980
 30 8-9 p. 370-
1 p.
 artikel
29 Balzers valves incorporate throttle 1980
 30 8-9 p. 359-
1 p.
 artikel
30 British Standards Institution: BS5914: 1980 and ISO 3530–1979 1980
 30 8-9 p. 367-
1 p.
 artikel
31 Call for papers 1980
 30 8-9 p. 370-
1 p.
 artikel
32 Characteristics and contraction of oxygen glow discharge 1980
 30 8-9 p. 339-
1 p.
 artikel
33 Characteristics of ion-beam-sputtered thin films 1980
 30 8-9 p. 346-347
2 p.
 artikel
34 Characterization of amorphous barium titanate films prepared by rf sputtering 1980
 30 8-9 p. 348-
1 p.
 artikel
35 Cold traps 1980
 30 8-9 p. 367-
1 p.
 artikel
36 Comark Electronics sets up export marketing group 1980
 30 8-9 p. 366-
1 p.
 artikel
37 Comark's 1980 shortform catalogue now available 1980
 30 8-9 p. 367-368
2 p.
 artikel
38 Committee report 1979/80 1980
 30 8-9 p. 373-
1 p.
 artikel
39 Complex impedance of copper films 1980
 30 8-9 p. 343-
1 p.
 artikel
40 Conduction processes and threshold switching in amorphous Si films 1980
 30 8-9 p. 344-
1 p.
 artikel
41 Contact resistance response surface of sintered Al films on (100) silicon 1980
 30 8-9 p. 352-
1 p.
 artikel
42 Copper-polyvinyl alcohol interface: A study with XPS 1980
 30 8-9 p. 354-
1 p.
 artikel
43 Copper sulfide films deposited by cylindrical magnetron reactive sputtering 1980
 30 8-9 p. 347-348
2 p.
 artikel
44 Correlation of short-range order and sputter dose in GaAs(110) using a vidicon-based LEED system 1980
 30 8-9 p. 355-
1 p.
 artikel
45 Corrosion inhibition in sputter-deposited thin-film systems using an intermediary layer of palladium 1980
 30 8-9 p. 348-
1 p.
 artikel
46 Cryogenic pumping of helium, hydrogen and a 90 % hydrogen-10% helium mixture 1980
 30 8-9 p. 341-
1 p.
 artikel
47 Cryogenic versus turbomolecular pumping in a sputtering application 1980
 30 8-9 p. 341-
1 p.
 artikel
48 Current-voltage characteristics of glow discharges in narrow capillaries 1980
 30 8-9 p. 338-
1 p.
 artikel
49 Dependence of time of breakdown on electrode temperatures in nitrogen filled diodes 1980
 30 8-9 p. 338-
1 p.
 artikel
50 Deposited profiles and homogeneous alloys from a hexagonal array of point sources 1980
 30 8-9 p. 345-
1 p.
 artikel
51 Deposition of crystals from the plasmas of ZrO2, HfO2, ThO2 and CeO2 1980
 30 8-9 p. 340-
1 p.
 artikel
52 Diffraction features in secondary electron emission 1980
 30 8-9 p. 337-
1 p.
 artikel
53 Direct-current glow discharge furnace for high-rate carburizing 1980
 30 8-9 p. 352-
1 p.
 artikel
54 Direct-molecular-beam method for mass selective outgassing rate measurement 1980
 30 8-9 p. 353-
1 p.
 artikel
55 Double epitaxy and the growth of polymorphic films of thallium iodide (TlI) on potassium chloride (KCl) 1980
 30 8-9 p. 343-
1 p.
 artikel
56 Edwards' school of vacuum: course programme 1979–80 1980
 30 8-9 p. 367-
1 p.
 artikel
57 Effect of diffusion pump oil contamination on diffraction grating efficiency in the vuv spectral region 1980
 30 8-9 p. 350-
1 p.
 artikel
58 Effect of high-temperature, post-oxidation annealing on the electrical properties of the Si-SiO2 interface 1980
 30 8-9 p. 343-
1 p.
 artikel
59 Effects of deposition parameters on optical loss for rf-sputtered Ta2O5 and Si3N4 waveguides 1980
 30 8-9 p. 348-
1 p.
 artikel
60 Effects of oxygen ion implantation on the structure and properties of aluminum thin films 1980
 30 8-9 p. 335-
1 p.
 artikel
61 Effects of sputter etching and process techniques on the properties of sputtered aluminum films 1980
 30 8-9 p. 352-
1 p.
 artikel
62 Effects of substrate orientation and rotation on internal stresses in sputtered metal films 1980
 30 8-9 p. 347-
1 p.
 artikel
63 Effects of thermal spikes on the characteristics of cryosorption pumps with condensed carbon dioxide layers 1980
 30 8-9 p. 341-
1 p.
 artikel
64 Effects of vacuum processing erbium dideuteride/ditritide films deposited on chromium underlays on copper substrates 1980
 30 8-9 p. 344-345
2 p.
 artikel
65 Efficient electron-beam-deposited ITO/n-Si solar cells 1980
 30 8-9 p. 343-
1 p.
 artikel
66 Ejecting action of a high-pressure low-density free jet Kosov, A.V.
 1980
 30 8-9 p. 301-305
5 p.
 artikel
67 Ejection of molecular clusters from ion-bombarded surfaces 1980
 30 8-9 p. 337-
1 p.
 artikel
68 Electrical properties of evaporated CdSe films 1980
 30 8-9 p. 343-
1 p.
 artikel
69 Electrical properties of sputtered epitaxial films of GaAs 1980
 30 8-9 p. 347-
1 p.
 artikel
70 Electron-beam-induced diffusion during thin-film depth profiling 1980
 30 8-9 p. 353-
1 p.
 artikel
71 Emission of energetic electrons from a Nd-laser-produced plasma 1980
 30 8-9 p. 337-
1 p.
 artikel
72 Emission of neutral particles from anodized aluminum surfaces during tensile deformation 1980
 30 8-9 p. 351-
1 p.
 artikel
73 End-point determination of aluminum reactive ion etching by discharge impedance monitoring 1980
 30 8-9 p. 351-
1 p.
 artikel
74 Energetic binary collisions in rare gas plasmas 1980
 30 8-9 p. 339-
1 p.
 artikel
75 Energy exchange between free electrons and light in vacuum 1980
 30 8-9 p. 340-
1 p.
 artikel
76 Erosion structures on cathodes arced in vacuum 1980
 30 8-9 p. 338-
1 p.
 artikel
77 ESSDERC '80 1980
 30 8-9 p. 369-370
2 p.
 artikel
78 Evaluation of impurities in reactive sputtered tin film 1980
 30 8-9 p. 347-
1 p.
 artikel
79 Fast ion beam-plasma interaction system 1980
 30 8-9 p. 350-
1 p.
 artikel
80 4f core threshold effects in photoemission from Pt 1980
 30 8-9 p. 337-
1 p.
 artikel
81 Formation of thin Cu2S (chalcocite) films using reactive sputtering techniques 1980
 30 8-9 p. 347-
1 p.
 artikel
82 Function stress testing in large-scale optical multifilm manufacturing 1980
 30 8-9 p. 342-
1 p.
 artikel
83 Gallium-field-ion emission from liquid point anodes 1980
 30 8-9 p. 338-
1 p.
 artikel
84 Gas analysis applications 1980
 30 8-9 p. 365-
1 p.
 artikel
85 Gas discharge response to light: dependence of linearity on space charge for optogalvanic and excited-state photoionization signals 1980
 30 8-9 p. 339-340
2 p.
 artikel
86 Gert Ehrlich wins the 1979 Welch Award 1980
 30 8-9 p. 370-371
2 p.
 artikel
87 Grease lubrication of turbomolecular vacuum pump bearings 1980
 30 8-9 p. 355-
1 p.
 artikel
88 Growth and electrical properties of sputter-deposited single-crystal GaSb films on GaAs substrates (USA) 1980
 30 8-9 p. 345-
1 p.
 artikel
89 Growth of CuInSe2 films using molecular beam epitaxy 1980
 30 8-9 p. 344-
1 p.
 artikel
90 H+ and D+ sputtering of thin tantalum films in the energy range of 0.6 to 15 keV 1980
 30 8-9 p. 347-
1 p.
 artikel
91 Heat of vaporization spectrometer 1980
 30 8-9 p. 336-
1 p.
 artikel
92 High coercivity and high hysteresis loop squareness of sputtered Co-Re thin film 1980
 30 8-9 p. 346-
1 p.
 artikel
93 High-intensity laser-matter coupling in a vacuum 1980
 30 8-9 p. 339-
1 p.
 artikel
94 Highly reliable temperature sensor using rf-sputtered SiC thin film 1980
 30 8-9 p. 346-
1 p.
 artikel
95 High-repetition-rate short-pulse gas discharge 1980
 30 8-9 p. 338-
1 p.
 artikel
96 High-resolution LMM Auger spectra from argon implanted in Be and Si 1980
 30 8-9 p. 335-
1 p.
 artikel
97 Hydraulic swaging unit simplifies installation of large Swagelok tube fittings 1980
 30 8-9 p. 365-
1 p.
 artikel
98 Important new products introduced—90 kV EBW and M & J-Torvac furnaces 1980
 30 8-9 p. 360-
1 p.
 artikel
99 Improved version of an electron optical demountable system to study image tube designs 1980
 30 8-9 p. 350-
1 p.
 artikel
100 Induced interface interactions in Ti/Si systems by ion implantation 1980
 30 8-9 p. 335-
1 p.
 artikel
101 Influence of atomic mixing and preferential sputtering on depth profiles and interfaces 1980
 30 8-9 p. 347-
1 p.
 artikel
102 Influence of the way in which atmospheric pressure is restored upon the fall of pressure in a vessel. (France) 1980
 30 8-9 p. 341-
1 p.
 artikel
103 In situ Auger electron spectroscopy of Si and SiO2 surfaces plasma etched in CF4-H2 glow discharges 1980
 30 8-9 p. 353-
1 p.
 artikel
104 Interdiffusion of Al and Cr thin films 1980
 30 8-9 p. 343-
1 p.
 artikel
105 Interface composition and adhesion of glow-discharge-formed organo-tin polymers 1980
 30 8-9 p. 337-
1 p.
 artikel
106 Investigation of the Ag-In-Ge system used for alloyed contacts to GaAs 1980
 30 8-9 p. 353-
1 p.
 artikel
107 Ion-accelaration mechanisms in vacuum diodes 1980
 30 8-9 p. 349-
1 p.
 artikel
108 Ion and electron desorption of neutral molecules from stainless steel (304) 1980
 30 8-9 p. 349-
1 p.
 artikel
109 Ion-beam deposition of thin films of ferroelectric lead zirconate titanate (PZT) 1980
 30 8-9 p. 346-
1 p.
 artikel
110 Ion beam sputtering of fluoropolymers 1980
 30 8-9 p. 347-
1 p.
 artikel
111 Ion beam texturing of surfaces 1980
 30 8-9 p. 351-
1 p.
 artikel
112 Ion bombardment effects on elemental incorporation probabilities during sputter deposition of GaSb and InSb 1980
 30 8-9 p. 348-349
2 p.
 artikel
113 Ion bombardment of materials containing alkali metals or alkaline earths 1980
 30 8-9 p. 337-
1 p.
 artikel
114 ISS study of the oxidation of Au on Cu (300 A) thin films 1980
 30 8-9 p. 353-
1 p.
 artikel
115 Issues in fabricating electron devices with submicrometer dimensions 1980
 30 8-9 p. 351-
1 p.
 artikel
116 Journals and other publications received by the editor 1980
 30 8-9 p. 368-
1 p.
 artikel
117 LEED analysis of the reconstructed Au(110) surface 1980
 30 8-9 p. 354-
1 p.
 artikel
118 Liquid crystal quasihomeotropic orientation induced by a polymer deposited on a SiO surface 1980
 30 8-9 p. 339-
1 p.
 artikel
119 Magnetron sputter coating of microspherical substrates 1980
 30 8-9 p. 346-
1 p.
 artikel
120 MBE-grown insulating oxide films on GaAs 1980
 30 8-9 p. 343-
1 p.
 artikel
121 Measurement of channel electron multiplier efficiency using a photoemission electron source 1980
 30 8-9 p. 339-
1 p.
 artikel
122 Measurement of Townsend ionization coeffifficients and the breakdown potentials for the Penning mixtures of Ne and Kr 1980
 30 8-9 p. 340-
1 p.
 artikel
123 Mechanisms of the reactive- and chemical-sputter deposition of TiO2 from Ti and TiC targets in mixed Ar + O2 discharges 1980
 30 8-9 p. 345-346
2 p.
 artikel
124 Medical equipment: a ventilator-resuscitator instant action set 1980
 30 8-9 p. 360-361
2 p.
 artikel
125 Medical equipment: Mini-Wright peak-flow meter 1980
 30 8-9 p. 361-362
2 p.
 artikel
126 Medical equipment: oxoid anaerobic system 1980
 30 8-9 p. 362-
1 p.
 artikel
127 Medical equipment: stretcher transit isolator 1980
 30 8-9 p. 361-
1 p.
 artikel
128 Microfabrication and evaluation of diffractive optical filters prepared by reactive sputter etching 1980
 30 8-9 p. 350-351
2 p.
 artikel
129 Microfabrication by ion-beam etching 1980
 30 8-9 p. 351-
1 p.
 artikel
130 Microhardness and electrical resistivity of Au/TiC multilayer structures prepared by rf sputtering 1980
 30 8-9 p. 346-
1 p.
 artikel
131 Micromass 6, for precision gas analysis 1980
 30 8-9 p. 367-
1 p.
 artikel
132 Microwave discharge source for the production of supersonic atom and free radical beams 1980
 30 8-9 p. 350-
1 p.
 artikel
133 Model of ion knock-on mixing with application to Si-SiO2 interface studies 1980
 30 8-9 p. 355-
1 p.
 artikel
134 Moisture measurement in solids and gases: available techniques and applications 1980
 30 8-9 p. 369-
1 p.
 artikel
135 2nd International Conference on Solid Films and Surfaces 1980
 30 8-9 p. 368-
1 p.
 artikel
136 New bromine crystalline modifications obtained by vapour-quenching Reale, C
 1980
 30 8-9 p. 315-317
3 p.
 artikel
137 New DC tachometer generator from Neco 1980
 30 8-9 p. 366-
1 p.
 artikel
138 New development in uhv gate valves 1980
 30 8-9 p. 359-
1 p.
 artikel
139 New, high performance two-stage direct drive pumps from Edwards 1980
 30 8-9 p. 357-
1 p.
 artikel
140 New high-torque, low-current, single-phase motors 1980
 30 8-9 p. 364-
1 p.
 artikel
141 New London premises for Leybold-Heraeus 1980
 30 8-9 p. 364-
1 p.
 artikel
142 New low-cost, stable pumping fluid from Edwards 1980
 30 8-9 p. 357-358
2 p.
 artikel
143 New oil-free Edwards rotary pumps 1980
 30 8-9 p. 357-
1 p.
 artikel
144 New pipe fittings for adapting national pipe threads (NPT) to international pipe threads (ISO) 1980
 30 8-9 p. 366-
1 p.
 artikel
145 New publication: leak detectors 1980
 30 8-9 p. 367-
1 p.
 artikel
146 New range of rotary vane vacuum pumps from Leybold-Heraeus 1980
 30 8-9 p. 359-
1 p.
 artikel
147 Note on mhd gas movement near anode spots in glow discharges 1980
 30 8-9 p. 338-
1 p.
 artikel
148 [No title] Baker, M.A.
 1980
 30 8-9 p. 375-
1 p.
 artikel
149 [No title] 1980
 30 8-9 p. 368-
1 p.
 artikel
150 Observations of changes in residual gas and surface composition with discharge cleaning in PLT 1980
 30 8-9 p. 349-
1 p.
 artikel
151 1980 officers selected for AVS 1980
 30 8-9 p. 370-
1 p.
 artikel
152 Oil backstreaming in turbomolecular and oil diffusion pumps 1980
 30 8-9 p. 341-342
2 p.
 artikel
153 Order-disorder transition of oxygen on (111) nickel 1980
 30 8-9 p. 336-
1 p.
 artikel
154 Oxide formation on ruthenium observed by TDS and ESCA 1980
 30 8-9 p. 336-
1 p.
 artikel
155 Oxygen chemisorption on Bi (0001): LEED/Auger/loss study 1980
 30 8-9 p. 335-
1 p.
 artikel
156 Oxygen interaction with Ni/Fe surfaces (1) LEED and XPS studies of Ni 76%/Fe 24%(100) 1980
 30 8-9 p. 336-
1 p.
 artikel
157 Performance of a directional detector of molecular density 1980
 30 8-9 p. 336-337
2 p.
 artikel
158 Performance of vacuum components operating at 1 × 10−11 torr 1980
 30 8-9 p. 341-
1 p.
 artikel
159 Pioneer Venus large probe neutral mass spectrometer 1980
 30 8-9 p. 350-
1 p.
 artikel
160 Plasma chemistry 1980
 30 8-9 p. 337-
1 p.
 artikel
161 Plasma etching—A discussion of mechanisms 1980
 30 8-9 p. 352-
1 p.
 artikel
162 Pneumatic control equipment 1980
 30 8-9 p. 367-
1 p.
 artikel
163 Polarization reversal and film structure in ferroelectric Bi4Ti3O12 films deposited on silicon 1980
 30 8-9 p. 346-
1 p.
 artikel
164 Precise diode method for recording contact potential changes caused by gas adsorption 1980
 30 8-9 p. 353-
1 p.
 artikel
165 Preferential lateral chemical etching in reactive ion etching of aluminum and aluminum alloys 1980
 30 8-9 p. 352-
1 p.
 artikel
166 Preferential sputtering in gold-nickel and gold-copper alloys 1980
 30 8-9 p. 355-
1 p.
 artikel
167 Preferential sputtering in oxides as metals and revealed by X-ray photoelectron spectroscopy 1980
 30 8-9 p. 355-
1 p.
 artikel
168 Preferential sputtering of Ta2O5 by argon ions 1980
 30 8-9 p. 355-
1 p.
 artikel
169 Preparation and properties of transparent conducting indium films 1980
 30 8-9 p. 345-
1 p.
 artikel
170 Properties and applications of saddle-field ion sources 1980
 30 8-9 p. 339-
1 p.
 artikel
171 Radiation damage in silicon dioxide films exposed to reactive ion etching 1980
 30 8-9 p. 353-
1 p.
 artikel
172 Radio-frequency-sputtered tetragonal barium titanate films on silicon 1980
 30 8-9 p. 348-
1 p.
 artikel
173 Range-energy measurements of intense electron beams Anna, E.D.
 1980
 30 8-9 p. 319-320
2 p.
 artikel
174 Reactant supply in reactive ion etching 1980
 30 8-9 p. 352-
1 p.
 artikel
175 Reactions of vacuum-deposited thin Schottky barrier metallizations on gallium arsenide 1980
 30 8-9 p. 353-
1 p.
 artikel
176 Reactive ion etching of silicon 1980
 30 8-9 p. 352-
1 p.
 artikel
177 Reactive sputtering of carbon and carbide targets in nitrogen 1980
 30 8-9 p. 348-
1 p.
 artikel
178 Recent developments in molecular beam epitaxy (MBE) 1980
 30 8-9 p. 344-
1 p.
 artikel
179 Recombination structures and their effects in depleted low-pressure gas discharges 1980
 30 8-9 p. 337-338
2 p.
 artikel
180 Relationship of optical degradation to surface morphology changes in solar absorbers 1980
 30 8-9 p. 354-
1 p.
 artikel
181 Repetitive vacuum ultraviolet xenon excimer laser 1980
 30 8-9 p. 338-
1 p.
 artikel
182 Reports from industry 1980
 30 8-9 p. 368-
1 p.
 artikel
183 Residual gas analysis in the ISX-A tokamak 1980
 30 8-9 p. 349-
1 p.
 artikel
184 Resistance stabilization of Ni-Cr films by surface oxide formation 1980
 30 8-9 p. 335-
1 p.
 artikel
185 Rotary motion feedthroughs 1980
 30 8-9 p. 367-
1 p.
 artikel
186 Safety note—‘RT’ series foreline traps 1980
 30 8-9 p. 367-
1 p.
 artikel
187 Schrader Bellows announce launch of Scottish depot 1980
 30 8-9 p. 366-
1 p.
 artikel
188 Semidynamical RFS technique for LEED analysis, with an application to GaAs(110) 1980
 30 8-9 p. 354-
1 p.
 artikel
189 Shiva and Argus target diagnostics vacuum systems 1980
 30 8-9 p. 340-
1 p.
 artikel
190 Silicon nitride layers on gallium arsenide by low-energy ion beam sputtering 1980
 30 8-9 p. 346-
1 p.
 artikel
191 Simulation of plasma-etched lithographic structures 1980
 30 8-9 p. 351-
1 p.
 artikel
192 Simultaneous RHEED-AES-QMS study on epitaxial Si film growth on Si(111) and sapphire (1102) surfaces by partially ionized vapor deposition 1980
 30 8-9 p. 354-
1 p.
 artikel
193 Snoop makes gas detection easy 1980
 30 8-9 p. 365-
1 p.
 artikel
194 Soft X-ray emission and Auger electron spectroscopic study of FeS, Fe0.9S, Fe0.875S, and Fe0.5S 1980
 30 8-9 p. 353-
1 p.
 artikel
195 SOLAR-X 40/80: an insulating and sun-shading reflective film 1980
 30 8-9 p. 362-364
3 p.
 artikel
196 Some limitations on electron beam lithography 1980
 30 8-9 p. 351-
1 p.
 artikel
197 Specular reflectance of unprotected and protected evaporated metallic front-surface mirrors at various angles of incidence 1980
 30 8-9 p. 344-
1 p.
 artikel
198 Sputter etching in an argon-oxygen plasma and its implications to device fabrication 1980
 30 8-9 p. 351-352
2 p.
 artikel
199 Sputter etching studies of Fe-Ni and Fe-Pd films 1980
 30 8-9 p. 352-
1 p.
 artikel
200 Sputtering of two-phase polycrystalline metals 1980
 30 8-9 p. 354-
1 p.
 artikel
201 Stable gases for accurate calibration 1980
 30 8-9 p. 358-
1 p.
 artikel
202 Stoichiometry measurements of GaAs by means of 15 MeV He ++ backscattering 1980
 30 8-9 p. 350-
1 p.
 artikel
203 Structure and epitaxy of evaporated cadmium selenide films 1980
 30 8-9 p. 345-
1 p.
 artikel
204 Substrate effect on the lattice constants of the MBE-grown In1 − x Ga xAs and GaSb1 − yAsy 1980
 30 8-9 p. 344-
1 p.
 artikel
205 Super-sensitive needle valve from Edwards 1980
 30 8-9 p. 358-
1 p.
 artikel
206 Surface cesium concentrations in cesium-ion-bombarded elemental and compound targets 1980
 30 8-9 p. 343-
1 p.
 artikel
207 Surface impurity studies in the ISX-A tokamak 1980
 30 8-9 p. 349-
1 p.
 artikel
208 Swing-out ball valves now available in sizes up to 1½ in. 1980
 30 8-9 p. 367-
1 p.
 artikel
209 Synchrotron-radiation-induced heating effects in the PEP storage ring vacuum system 1980
 30 8-9 p. 349-
1 p.
 artikel
210 Technique to determine the growth rate and resistivity of evaporated CdS thin films 1980
 30 8-9 p. 345-
1 p.
 artikel
211 TEM study of the two-step annealing of arsenic-implanted ť100〉 silicon 1980
 30 8-9 p. 336-
1 p.
 artikel
212 The Anavac–2 cracking pattern calculator 1980
 30 8-9 p. 365-
1 p.
 artikel
213 The conversion of leak rates Sigmond, R.S.
 1980
 30 8-9 p. 329-334
6 p.
 artikel
214 The effect of electron bombardment on the secondary electron emission from Na3AlF6 1980
 30 8-9 p. 338-
1 p.
 artikel
215 The effect of the rate of deposition on superconductive properties and structure of tin films (GB) 1980
 30 8-9 p. 343-344
2 p.
 artikel
216 The examination of crystal surfaces by metal decoration. Part I: theoretical background Reichelt, K
 1980
 30 8-9 p. 307-313
7 p.
 artikel
217 The ratio of lateral diffusion coefficient to mobility for electrons in oxygen and dry air 1980
 30 8-9 p. 339-
1 p.
 artikel
218 Thermocouple sensor reference guide just published by Comark 1980
 30 8-9 p. 368-369
2 p.
 artikel
219 The tesla discharge as a spectroscopic source for the study of excimer laser transitions 1980
 30 8-9 p. 338-339
2 p.
 artikel
220 7th European Congress on Electron Microscopy; EUREM '80 1980
 30 8-9 p. 370-
1 p.
 artikel
221 The vacuum arc subjected to an axial magnetic field 1980
 30 8-9 p. 339-
1 p.
 artikel
222 Tracer slug leak detection 1980
 30 8-9 p. 342-
1 p.
 artikel
223 Turbomolecular pumps for high gas flow applications 1980
 30 8-9 p. 341-
1 p.
 artikel
224 Twenty-kelvin cryopumping in magnetron sputtering systems 1980
 30 8-9 p. 341-
1 p.
 artikel
225 Two major contracts recently awarded to Titanium Fabricators Ltd 1980
 30 8-9 p. 365-
1 p.
 artikel
226 Ultra-high vacuum compatibility of two possible fusion reactor materials: K-ramic® and ATJ graphite 1980
 30 8-9 p. 349-
1 p.
 artikel
227 Ultra-high vacuum rotary drives 1980
 30 8-9 p. 359-
1 p.
 artikel
228 Ultra-high vacuum system for the ultramicrogravimetric study of samples loaded in a controlled environment 1980
 30 8-9 p. 340-341
2 p.
 artikel
229 Ultra-high vacuum technique for intervacuum sample transfer 1980
 30 8-9 p. 340-
1 p.
 artikel
230 Ultra-high vacuum wobble sticks 1980
 30 8-9 p. 360-
1 p.
 artikel
231 Ultra-thin metal oxide layers by reactive sputtering: their controlled deposition and characterization 1980
 30 8-9 p. 348-
1 p.
 artikel
232 Unbacked aluminium windows for helium discharge lamps directly mountable as part of the copper seal between uhv flanges 1980
 30 8-9 p. 342-
1 p.
 artikel
233 UPS Studies of H2, O2 and CO adsorption on ordered carbon overlayers on W(100) 1980
 30 8-9 p. 335-
1 p.
 artikel
234 Use of SIMS for studies of adsorption on well-defined metal surfaces (1) Combined XPS/LEED/SIMS studies of O2, CO, H2O, and H2 on Ni (100) 1980
 30 8-9 p. 336-
1 p.
 artikel
235 Vacuum coating plants and all plant for vacuum metallurgy and chemistry 1980
 30 8-9 p. 364-
1 p.
 artikel
236 Vacuum Generators' new systems division 1980
 30 8-9 p. 365-
1 p.
 artikel
237 Vacuum photodiode detector array for broadband uv detection in a tokamak plasma 1980
 30 8-9 p. 350-
1 p.
 artikel
238 Vacuum system for national synchrotron light source 1980
 30 8-9 p. 341-
1 p.
 artikel
239 Vacuum ultra-violet spectroscopic apparatus for space- and time-resolved measurements on a single tokamak plasma discharge 1980
 30 8-9 p. 350-
1 p.
 artikel
240 Validity of mass spectrometric measurements at pressures exceeding 10−4 mbar 1980
 30 8-9 p. 342-
1 p.
 artikel
241 Vapour pumping groups Colwell, B.H.
 1980
 30 8-9 p. 321-327
7 p.
 artikel
242 Versatile temperature-measuring ‘laboratory’, housed in a handy carrying case 1980
 30 8-9 p. 366-
1 p.
 artikel
243 Versatile uhv sample transfer system 1980
 30 8-9 p. 340-
1 p.
 artikel
                             243 gevonden resultaten
 
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