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                             94 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 Activities in vacuum science and technology in the USSR and in Eastern Europe Colligon, J
1980
30 6 p. 229-234
6 p.
artikel
2 Addition theorem for the resistance to flow of composite systems and its relationship with the pumping speed in the region of molecular flow Haefer, R.A.
1980
30 6 p. 217-223
7 p.
artikel
3 A double-acting mercury-piston gas pump (GB) 1980
30 6 p. 240-
1 p.
artikel
4 Adsorption, surface migration and thermal desorption of LaB6 on tungsten surface using field emission microscopy. (GB) 1980
30 6 p. 245-
1 p.
artikel
5 Affect of annealing on uniform and non-uniform strains in a sputtered Mo film on Si. (USA) 1980
30 6 p. 243-
1 p.
artikel
6 Antireflection coatings on plastic substrates. (Germany) 1980
30 6 p. 242-
1 p.
artikel
7 Application of the Boltzmann equation to electron transmission and to secondary electron emission. (France) 1980
30 6 p. 240-
1 p.
artikel
8 A simple radiant heater-shutter for vacuum deposition of thin film Rawat, S.D.
1980
30 6 p. 227-
1 p.
artikel
9 Assignment at the photoconductor-metal interface of the level of photoexcitation in the volume of the MIM structure. (France) 1980
30 6 p. 244-
1 p.
artikel
10 A study of surface stoichiometry and thermionic emission using LaB6. 1980
30 6 p. 238-
1 p.
artikel
11 Atomic diffusion in amorphous Gd-Fe thin films. (USA) 1980
30 6 p. 243-
1 p.
artikel
12 Avalanche breakdown in n-hexane 1980
30 6 p. 239-
1 p.
artikel
13 Capillary array: a new type of window for the vacuum ultraviolet 1980
30 6 p. 241-
1 p.
artikel
14 Coherent non-linear coupling of ionization waves in a neon discharge. 1980
30 6 p. 239-
1 p.
artikel
15 Copper diffusion in CdS thin films between 20 and 200°C. (France) 1980
30 6 p. 243-
1 p.
artikel
16 Design of a vacuum ultraviolet spectrofluorimeter. (GB) 1980
30 6 p. 245-
1 p.
artikel
17 Deuterium-ion-beam impurities produced by a gas-discharge ion source (duopigatron). (USA) 1980
30 6 p. 244-
1 p.
artikel
18 Diffusivity and permeability of oxygen in niobium, copper, nickel and Cu-Ni alloys 1980
30 6 p. 237-
1 p.
artikel
19 Direct measurement of diffusion coefficients of sputtered atoms in Ar. (USA) 1980
30 6 p. 243-
1 p.
artikel
20 Electrical profiles of magnesium-ion-implanted GaP 1980
30 6 p. 237-
1 p.
artikel
21 Electrode heating by the cathode spot of a vacuum arc 1980
30 6 p. 239-
1 p.
artikel
22 Electron energy distributions in a sputtering discharge. (GB) 1980
30 6 p. 244-
1 p.
artikel
23 Electron swarm characteristics in an argon discharge 1980
30 6 p. 239-
1 p.
artikel
24 Energy and fluence dependence of the sputtering yield of silicon bombarded with argon and xenon. (USA.) 1980
30 6 p. 243-
1 p.
artikel
25 Energy dependence of excitation in sputtering 1980
30 6 p. 239-
1 p.
artikel
26 Energy loss and escape depth of hot electrons from shallow p-n junctions in silicon. 1980
30 6 p. 238-
1 p.
artikel
27 Energy spectra of secondary ions and secondary ion emission (SIE) mechanisms. (GB) 1980
30 6 p. 240-
1 p.
artikel
28 Formation of iridium silicides from Ir thin films on Si substrates. (USA) 1980
30 6 p. 242-
1 p.
artikel
29 Fourier transform spectroscopy in the vacuum ultraviolet. (GB) 1980
30 6 p. 245-
1 p.
artikel
30 Gas discharges in planar, low-pressure thermionic diodes. II. Plasma regime 1980
30 6 p. 237-238
2 p.
artikel
31 Gas discharges in planar low-pressure thermionic diodes. I. Space charge regime 1980
30 6 p. 237-
1 p.
artikel
32 He-Cd hollow-cathode oscillations in an axial magnetic field 1980
30 6 p. 239-
1 p.
artikel
33 Hydrogen content and density of plasma-deposited amorphous silicon-hydrogen 1980
30 6 p. 238-
1 p.
artikel
34 Information about a new book on vacuum from the USSR Saksagansky, G.L.
1980
30 6 p. 235-
1 p.
artikel
35 Infrared quenching of photocapacitance in evaporated ZnS:Ag thin films. (USA) 1980
30 6 p. 242-
1 p.
artikel
36 Inhomogeneities and FMR spectra in some dc sputtered amorphous Gd-Co films 1980
30 6 p. 243-244
2 p.
artikel
37 71. Interpretation of the diffusion pump mechanism by gas-dynamic methods. Part 2. (Germany) 1980
30 6 p. 240-
1 p.
artikel
38 Interpretation of the diffusion pump mechanism by gas-dynamic methods. Part 1. (Germany) 1980
30 6 p. 240-
1 p.
artikel
39 Ion- and electron-assisted gas-surface chemistry—an important effect in plasma etching. (USA) 1980
30 6 p. 244-
1 p.
artikel
40 Magnetic aftereffect due to domain wall motion in amorphous Tb-Fe sputtered films (USA) 1980
30 6 p. 244-
1 p.
artikel
41 Magnetic domain structures in multilayered NiFe films. (USA) 1980
30 6 p. 243-
1 p.
artikel
42 Measurement of grain-boundary diffusion at low temperature by the surface-accumulation method. II. Results for gold-silver system. (USA) 1980
30 6 p. 241-242
2 p.
artikel
43 Microcomputer-based multiplexer for performing depth profiling with an Auger electron spectrometer. (USA) 1980
30 6 p. 244-245
2 p.
artikel
44 Negative surface ionization hysteresis phenomena 1980
30 6 p. 237-
1 p.
artikel
45 Neutral density filters by co-evaporated Ag and Si02 films for near ir radiation 1980
30 6 p. 241-
1 p.
artikel
46 New products and developments 1980
30 6 p. 247-
1 p.
artikel
47 Normal conductivity and superconductivity of an A1-type iodine phase. (GB) 1980
30 6 p. 241-
1 p.
artikel
48 [No title] 1980
30 6 p. 239-
1 p.
artikel
49 Obtaining pure boron in bulk form or as thin films. Physical properties of boron. (France) 1980
30 6 p. 244-
1 p.
artikel
50 On sputtering in vacuum arcs 1980
30 6 p. 239-
1 p.
artikel
51 On the correlation of blister diameter and blister skin thickness in helium-ion-irradiated Nb 1980
30 6 p. 237-
1 p.
artikel
52 On the influence of magnetic fields on turbomolecular pumps. (Germany) 1980
30 6 p. 240-
1 p.
artikel
53 On the nature of perpendicular anisotropy in sputtered GdCo thin films. (USA) 1980
30 6 p. 243-
1 p.
artikel
54 On the role of the electron impact ionization and electron scattering cross-section in the breakdown strength of dielectric gases. 1980
30 6 p. 239-
1 p.
artikel
55 Optical and electrical properties of evaporated amorphous silicon with hydrogen. (USA) 1980
30 6 p. 242-
1 p.
artikel
56 Photographic observations of impulse breakdown in short vacuum gaps. 1980
30 6 p. 239-
1 p.
artikel
57 Plasma oxidation of silicon in a microwave discharge and its specificity. 1980
30 6 p. 238-239
2 p.
artikel
58 Plasma-wall interaction in flashtubes 1980
30 6 p. 239-
1 p.
artikel
59 Positive-ion drift velocities and Townsend primary ionization coefficients in ethane. 1980
30 6 p. 238-
1 p.
artikel
60 Prebreakdown discharges in mercury-rare-gas mixtures 1980
30 6 p. 238-
1 p.
artikel
61 Pressure-made soft-metal vacuum seals for glass and ceramics. (GB) 1980
30 6 p. 241-
1 p.
artikel
62 Propagation of power pulses in magnetically insulated vacuum transmission lines 1980
30 6 p. 238-
1 p.
artikel
63 Properties of high sensitivity GaP/InxGa1 − xP/GaAs:(Cs-O) transmission photocathodes. (USA) 1980
30 6 p. 242-
1 p.
artikel
64 Properties of Ti2N layers produced by ion-plating. (Germany) 1980
30 6 p. 242-
1 p.
artikel
65 Prototype vacuum test section for the CERN large storage ring project. (Germany) 1980
30 6 p. 240-
1 p.
artikel
66 Secondary-electron emission by energetic ions incident on metal surfaces. 1980
30 6 p. 237-
1 p.
artikel
67 Secondary electron emission from vanadate-phosphate glasses 1980
30 6 p. 238-
1 p.
artikel
68 Simultaneous measurement of the temperature and the hydrodynamic speed of a thin foil submitted to an intense electronic energy deposition 1980
30 6 p. 242-
1 p.
artikel
69 Some characteristics of tungsten filaments operated as cathodes in a gas discharge. 1980
30 6 p. 239-240
2 p.
artikel
70 Sputter etching of polymer fibres. (GB) 1980
30 6 p. 244-
1 p.
artikel
71 Studies of dynamic effects at non-metal surfaces with incident low energy electrons Buhl, R
1980
30 6 p. 209-211
3 p.
artikel
72 Studies of the plasma resonance radiation and determination of the optical constants of thin silver films. (Germany) 1980
30 6 p. 245-
1 p.
artikel
73 Study of collective ion acceleration in vacuum 1980
30 6 p. 238-
1 p.
artikel
74 Surface-treatment effect on photoluminescence of InP. (USA) 1980
30 6 p. 245-
1 p.
artikel
75 Temperature measurements on thin vapour-deposited films. (GB) 1980
30 6 p. 241-
1 p.
artikel
76 The adsorption of lanthanum hexaboride on tantalum. (GB) 1980
30 6 p. 240-
1 p.
artikel
77 The effect of alumina inclusions on the breakdown and emission properties of copper surfaces in vacuum. 1980
30 6 p. 238-
1 p.
artikel
78 The effect of ambient and other pretreatment on the outgassing of certain materials in a vacuum. (GB) 1980
30 6 p. 244-
1 p.
artikel
79 The electrical characteristics of rf magnetron and non-magnetron planar systems Norström, H
1980
30 6 p. 225-226
2 p.
artikel
80 The influence of virtual leaks on the pressure in high and ultra-high vacuum systems. (GB) 1980
30 6 p. 241-
1 p.
artikel
81 Theoretical model of thin-film deposition profile with shadow effect. (USA) 1980
30 6 p. 242-
1 p.
artikel
82 Thermal effects on hot-cathode ionization gauges. (GB) 1980
30 6 p. 240-241
2 p.
artikel
83 The use of an oscillating vane gauge to determine gas composition of binary gas mixtures. (GB) 1980
30 6 p. 241-
1 p.
artikel
84 Thick metallic films obtained by ion-plating. (France) 1980
30 6 p. 242-
1 p.
artikel
85 Thickness monitoring of optical thin films. (GB) 1980
30 6 p. 243-
1 p.
artikel
86 Thin film coatings: algorithms for the determination of reflectance and transmittance, and their derivatives. (USA) 1980
30 6 p. 241-
1 p.
artikel
87 Thin film optical coatings. 7. Two-layer coatings close to antireflection 1980
30 6 p. 241-
1 p.
artikel
88 Ultra-high vacuum tight transition joints of titanium-stainless steel produced by explosive tube to tube welding. (Germany) 1980
30 6 p. 245-
1 p.
artikel
89 Utilization of Roots type pumps for obtaining clean vacuum. (France) 1980
30 6 p. 240-
1 p.
artikel
90 Vacuum coating of reflectors of small radius of curvature aided by gas scattering. (Germany) 1980
30 6 p. 242-
1 p.
artikel
91 Vacuum ultraviolet scintillators: sodium salicylate and p-terphenyl 1980
30 6 p. 245-
1 p.
artikel
92 Versatile electron spectrometer for surface studies. (USA) 1980
30 6 p. 244-
1 p.
artikel
93 VUV radiometry below 100 nm: the high-power hydrogen arc as a standard source of continuum radiation between 53 and 92 nm. (USA) 1980
30 6 p. 237-
1 p.
artikel
94 Zirconium-nickel selective hydrogen getters for high pressure gas discharge lamps Kuus, G
1980
30 6 p. 213-216
4 p.
artikel
                             94 gevonden resultaten
 
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