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                             66 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 A comparison of the construction of old and new turbomolecular pumps Henning, J
 1980
 30 4-5 p. 183-187
5 p.
 artikel
2 A counterbalanced pushrod vacuum dilatometer for low-strength materials 1980
 30 4-5 p. 202-
1 p.
 artikel
3 AES studies of chemical shift and beam effect on molybdenum oxides 1980
 30 4-5 p. 202-
1 p.
 artikel
4 A low-energy electron spectrometer using concentric hemispheres and a grid retarding field 1980
 30 4-5 p. 201-
1 p.
 artikel
5 An uhv system for in siru preparation and analysis of thin films and surfaces 1980
 30 4-5 p. 202-
1 p.
 artikel
6 An XPS/AES study of films on electroplated Co-Sn alloy 1980
 30 4-5 p. 203-
1 p.
 artikel
7 An XPS study of the adherence of refractory carbide, silicide and boride rf sputtered wear-resistant coatings 1980
 30 4-5 p. 200-
1 p.
 artikel
8 Application of vacuum processes in engineering including electron beam welding, vacuum furnaces and metallizing Saunders, Christopher
 1980
 30 4-5 p. 167-173
7 p.
 artikel
9 A specimen-exchange device for an ultra-high vacuum atom-probe field-ion microscope 1980
 30 4-5 p. 198-
1 p.
 artikel
10 Bakeable aluminium vacuum chamber and bellows with an aluminium flange and metal seal for ultra-high vacuum 1980
 30 4-5 p. 198-
1 p.
 artikel
11 Breakdown of nitrogen in long uniform field gaps stressed with high voltage 1980
 30 4-5 p. 197-
1 p.
 artikel
12 Cadmium selenide thin-film transistors 1980
 30 4-5 p. 200-
1 p.
 artikel
13 Conductivity effects in amorphous chalcogenide films 1980
 30 4-5 p. 199-
1 p.
 artikel
14 Controlled deposition of protective aluminium films on aircraft steels 1980
 30 4-5 p. 199-
1 p.
 artikel
15 Desorption spectrometric results of the adsorption of deuterium on pyrocarbon, silicon and boron carbide surfaces 1980
 30 4-5 p. 197-
1 p.
 artikel
16 Determination of the critical magnetic field of a superconducting A1-type As, Sb and Bi phase 1980
 30 4-5 p. 199-
1 p.
 artikel
17 Diffusion studies of Au through electroplated Pt films by Auger electron spectroscopy 1980
 30 4-5 p. 202-203
2 p.
 artikel
18 Effect of substrate temperature on the thickness of evaporated Se-36.7 at.% As alloy films 1980
 30 4-5 p. 199-200
2 p.
 artikel
19 Electron scattering by gas in the scanning electron microscope 1980
 30 4-5 p. 201-
1 p.
 artikel
20 End-effects in cylindrical magnetron sputtering sources 1980
 30 4-5 p. 200-
1 p.
 artikel
21 Further developments with single structure vapour pumping groups 1980
 30 4-5 p. 198-
1 p.
 artikel
22 Gas evolution and gettering in high pressure discharge lamps 1980
 30 4-5 p. 200-
1 p.
 artikel
23 Hall effect measurements on flash evaporated cadmium sulphide thin films 1980
 30 4-5 p. 199-
1 p.
 artikel
24 Heat exchanges and columnar growth in electron-beam evaporation of silicon films for solar cell applications 1980
 30 4-5 p. 199-
1 p.
 artikel
25 Improvement of electron gun brightness in conventional scanning electron microscope (SEM) by coating its tungsten filament with a zirconium carbide (ZrC) thin film 1980
 30 4-5 p. 199-
1 p.
 artikel
26 Influence of sample inclination and rotation during ion-beam etching on ion-etched structures 1980
 30 4-5 p. 201-
1 p.
 artikel
27 Ion-excited Auger electron emission from silicon 1980
 30 4-5 p. 203-
1 p.
 artikel
28 Kinetics data for diffusion of outgassing species from RTV 560 silicone rubber 1980
 30 4-5 p. 201-
1 p.
 artikel
29 Limits of composition achievable by ion implantation 1980
 30 4-5 p. 197-
1 p.
 artikel
30 Local regions of high-pressure plasma in a vacuum spark 1980
 30 4-5 p. 197-
1 p.
 artikel
31 Low work function electron emitter hexaborides 1980
 30 4-5 p. 198-
1 p.
 artikel
32 Magnetic multipole line-cusp plasma generator for neutral beam injectors 1980
 30 4-5 p. 200-
1 p.
 artikel
33 Magnetic sector atom-probe field ion microscopy with a retarding potential analyzer 1980
 30 4-5 p. 201-
1 p.
 artikel
34 Measurement of the lattice constant of Si-Ge heteroepitaxial layers grown on a silicon substrate 1980
 30 4-5 p. 202-
1 p.
 artikel
35 Mechanism of silicon etching by a CF4 plasma 1980
 30 4-5 p. 201-
1 p.
 artikel
36 Method of continuously measuring work function changes 1980
 30 4-5 p. 198-
1 p.
 artikel
37 Microprocessor control of a small vacuum system Lucas, J
 1980
 30 4-5 p. 160-166
7 p.
 artikel
38 Modem diffusion pump vs turbomolecular pump systems Harris, N.S.
 1980
 30 4-5 p. 175-181
7 p.
 artikel
39 Multilayer thermal desorption Edwards Jr, D
 1980
 30 4-5 p. 189-192
4 p.
 artikel
40 [No title] Colligon, J
 1980
 30 4-5 p. 206-
1 p.
 artikel
41 [No title] Castle, J.E.
 1980
 30 4-5 p. 205-
1 p.
 artikel
42 On the difference between true and net outgassing rates 1980
 30 4-5 p. 201-
1 p.
 artikel
43 Optical spectroscopy for diagnostics and process control during glow discharge etching and sputter deposition 1980
 30 4-5 p. 202-
1 p.
 artikel
44 Oxygen adsorption on polycrystalline cu films studied by means of gravimetric uptake and work function change 1980
 30 4-5 p. 197-
1 p.
 artikel
45 Photoconduction in Si3N4 deposited on tungsten-coated silicon wafers 1980
 30 4-5 p. 199-
1 p.
 artikel
46 Plasma polymerization of ethylene by magnetron discharge. (USA) 1980
 30 4-5 p. 198-
1 p.
 artikel
47 Plasma stream transport method. (2) Use of charge exchange plasma source 1980
 30 4-5 p. 198-
1 p.
 artikel
48 Pressure-operated shutter for thin-film monitor 1980
 30 4-5 p. 200-
1 p.
 artikel
49 Quantitative AES analysis of coevaporated Cu/Ni films and the effects of ion sputtering on them: experiments at liquid nitrogen and room temperature 1980
 30 4-5 p. 200-
1 p.
 artikel
50 Resolution factors in the use of a double-pass CMA for ISS 1980
 30 4-5 p. 202-
1 p.
 artikel
51 Response of a quartz crystal microbalance to a liquid deposit. (USA) 1980
 30 4-5 p. 201-
1 p.
 artikel
52 Synchronous modulation in scanning Auger electron microscopy. (USA) 1980
 30 4-5 p. 203-
1 p.
 artikel
53 System for transferring samples between chambers in uhv 1980
 30 4-5 p. 198-
1 p.
 artikel
54 Temperature dependence of electron spin polarization in low-energy electron diffraction from W(001) 1980
 30 4-5 p. 202-
1 p.
 artikel
55 The afterglow at intermediate pressures. I. Helium 1980
 30 4-5 p. 197-
1 p.
 artikel
56 The application of ionization vacuum gauges to measurements in vacuum chambers provided with cryo-pumping surfaces Haefer, R.A.
 1980
 30 4-5 p. 193-195
3 p.
 artikel
57 The effect of bakeout temperature on the electron and ion induced gas desorption coefficients of some technological materials 1980
 30 4-5 p. 197-
1 p.
 artikel
58 The lateral spread of short glow discharges 1980
 30 4-5 p. 198-
1 p.
 artikel
59 The modern cryopump Bentley, P.D.
 1980
 30 4-5 p. 145-158
14 p.
 artikel
60 Thermal outgassing behaviour of Inconel 600 after different methods of surface preparation 1980
 30 4-5 p. 201-
1 p.
 artikel
61 Thermal transpiration: a comparison of experiment and theory 1980
 30 4-5 p. 197-
1 p.
 artikel
62 Ultra-high vacuum systems for surface research 1980
 30 4-5 p. 202-
1 p.
 artikel
63 Vacuum-sealed specimen stage for scanning microscopy of air-sensitive materials 1980
 30 4-5 p. 198-199
2 p.
 artikel
64 VCNR type characteristic in thin film amorphous Te-Ge-As-Si films 1980
 30 4-5 p. 199-
1 p.
 artikel
65 Vertical electrode configuration to avoid contaminating particles in sputtered ZnO thin films 1980
 30 4-5 p. 200-
1 p.
 artikel
66 Visual aids project 1980
 30 4-5 p. 207-
1 p.
 artikel
                             66 gevonden resultaten
 
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