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                             25 gevonden resultaten
nr titel auteur tijdschrift jaar jaarg. afl. pagina('s) type
1 1.7 AES investigations of the interface between substrate and chromium films prepared by evaporation and ion plating Martinson, CWB
1977
27 3 p. 119-123
5 p.
artikel
2 1.3 An evaporation cryostat for electrical and optical measurements on ultrathin metal film under ultra high vacuum conditions Norrman, SH
1977
27 3 p. 97-98
2 p.
artikel
3 1.18 A versatile cryopump for industrial vacuum systems Visser, J
1977
27 3 p. 175-180
6 p.
artikel
4 2.5 Behaviour of amorphous Ge contacts to monocrystalline silicon Norde, H
1977
27 3 p. 201-208
8 p.
artikel
5 1.6 Composition and stress state of thin films deposited by ion beam sputtering Castellano, RN
1977
27 3 p. 109-117
9 p.
artikel
6 1.15 Deposition of thin chromium films on substrates heated between room temperature and 300°C in the uhv chamber of an annular cryopump Sánchez, H
1977
27 3 p. 163-165
3 p.
artikel
7 1.9 Depth chemical profiles of MNOS structures measured by AES Liday, J
1977
27 3 p. 129-139
11 p.
artikel
8 1.5 Effects in Auger electron spectroscopy due to the probing electrons and sputtering Braun, P
1977
27 3 p. 103-108
6 p.
artikel
9 1.14 Energy distribution of the ions produced by saddle field ion sources Khorossany, M
1977
27 3 p. 159-162
4 p.
artikel
10 1.16 Extremely uniform thin films by vacuum deposition from a ‘tube source’ Schwarz, H
1977
27 3 p. 167-169
3 p.
artikel
11 1.4 Fast volume determination using a differential capacitance manometer Norström, H
1977
27 3 p. 99-101
3 p.
artikel
12 2.4 Formation of various metal semiconductor junctions by means of ion evaporation Glaser, P
1977
27 3 p. 197-199
3 p.
artikel
13 1.10 Growth and composition of Al clusters on NaCl Veljković, SR
1977
27 3 p. 141-144
4 p.
artikel
14 1.8 Influence of defects in the silicon wafer on the properties of silicon oxide films formed by reactive sputtering Kropman, D
1977
27 3 p. 125-127
3 p.
artikel
15 1.12 Inline production magnetron sputtering Aronson, A
1977
27 3 p. 151-153
3 p.
artikel
16 1.1 International vacuum standardisation Yarwood, J
1977
27 3 p. 87-92
6 p.
artikel
17 2.3 Investigations of metal contacts to amorphous evaporated Ge films Hafiz, M
1977
27 3 p. 193-195
3 p.
artikel
18 1.2 Measuring technique for partial hydrogen pressures in nitrogen-neon atmospheres Kuus, G
1977
27 3 p. 93-95
3 p.
artikel
19 2.1 Metal-semiconductor junctions—related to deposition of thin films Eisele, K
1977
27 3 p. 181-188
8 p.
artikel
20 1.13 Plating with ion accelerators Sørensen, G
1977
27 3 p. 155-157
3 p.
artikel
21 Preface 1977
27 3 p. 85-
1 p.
artikel
22 1.11 Silicon films growth in vacuum by pyrolysis of silane Alexandrov, LN
1977
27 3 p. 145-150
6 p.
artikel
23 2.2 Substrate surface damages by rf-sputtering Berg, S
1977
27 3 p. 189-191
3 p.
artikel
24 2.6 Surface resistance measurement as an aid in controlling the fabrication of silicides Mgbenu, E
1977
27 3 p. 209-211
3 p.
artikel
25 1.17 Turbomolecular pumps with corrosion-resistant oil for the lubrication and cooling of the rotor bearings Henning, J
1977
27 3 p. 171-173
3 p.
artikel
                             25 gevonden resultaten
 
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