| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Aberrations and tolerances in a double-deflection electron-beam scanning system
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 2 |
A comparison of the gertering quality of zirconium silicide, zirconium and the alloy Zr84 A116 for various gases
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 3 |
A contribution to explain the deep penetration of high-power density electron beams in metals
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 4 |
Activation of filamentary field emitters by growing microneedles of tungsten
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 5 |
Advances in matrix-lens technology
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 6 |
Air pollution monitoring by negative-ion mass spectrometry
|
Gleitman, Y
|
|
1976
|
26 |
4-5 |
p. 163-166
4 p.
|
artikel
|
| 7 |
An atmospheric pressure ionization (api) source for a magnetic sector mass spectrometer
|
Yinon, J
|
|
1976
|
26 |
4-5 |
p. 159-161
3 p.
|
artikel
|
| 8 |
An atom-probe field ion microscope
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 9 |
An investigation of ion etching
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 10 |
Antireflection coating prepared by plasma polymerization of perfluorobutene-2
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 11 |
A pattern generation technique for serial electron-beam microfabrication systems
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 12 |
Application of moiré techniques in scanning-electron-beam lithography and microscopy
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 13 |
A study of the catalytic activity of platinum. examination of surface oxygen species by photoelectron spectroscopy
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 14 |
Atri—a tesla-transformer-type electron-beam accelerator
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 15 |
A uhv bakeable diverter valve
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 16 |
Automatic stabilization of an electron-probe forming system
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 17 |
Axial variations in the characteristics of the magnesium hollow cathode discharge with helium and argon gases
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 18 |
Ceramic-to-metal bonding with sputtering as a metallization technique
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 19 |
Channeling ion implantation through palladium films
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 20 |
Comparative study of the zirconiated and built-up W thermal-field cathode
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 21 |
Comparison of the properties of different materials used as masks for ion-beam etching
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 22 |
Composition and detection of alignment marks for electron-beam lithography
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 23 |
Control system design and alignment methods for electron lithography
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 24 |
Cross-section profiles of single-scan negative electron-resist lines
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 25 |
Current amplification in a d.c. glow discharge in the presence of a transverse magnetic field
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 26 |
Current emission from sandwich metal layers al-al2o3-au
|
Friedman, N
|
|
1976
|
26 |
4-5 |
p. 189-191
3 p.
|
artikel
|
| 27 |
Deep uv lithography
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 28 |
Design and optimization of magnetic lenses and deflection systems for electron beams
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 29 |
Design of fast deflection coils for an electron-beam microfabrication system
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 30 |
Detection of atomic oxygen and atomic hydrogen beams by semi-conductors
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 31 |
Direct current cataphoretic effects on hg 2537-« radiation from hg + ar discharges (dc fluorescent lamps)
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 32 |
Distortion measurements in an electron image projector
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 33 |
Educational systems for training in vacuum
|
Shteiner, M
|
|
1976
|
26 |
4-5 |
p. 193-195
3 p.
|
artikel
|
| 34 |
Effectiveness and plasma parameters of double cathode discharges
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 35 |
Effects of magnetically induced hall currents on a static argon glow discharge
|
|
|
1976
|
26 |
4-5 |
p. 212-213
2 p.
|
artikel
|
| 36 |
Electron-beam fabrication of chromium master masks
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 37 |
Electron-beam lithography using vector-scan techniques
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 38 |
Electron-beam projection systems with compensated chromatic field aberrations
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 39 |
Electron-dispersion technique for observation of fast transient signals
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 40 |
Electron microprobe analysis of thin films with reference to “semi-thin” deposits (0.5–1 μm) of Cdx Hg1−x Te
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 41 |
Electron-projection microfabrication system
|
|
|
1976
|
26 |
4-5 |
p. 216-217
2 p.
|
artikel
|
| 42 |
Electron scattering and line profiles in negative electron resists
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 43 |
Evaluation of a lab6 cathode electron gun
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 44 |
Evaluation of metal-film adhesion to flexible substrates
|
|
|
1976
|
26 |
4-5 |
p. 213-214
2 p.
|
artikel
|
| 45 |
Evaporation of metal from a covered source
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 46 |
Experimental scanning electron-beam automatic registration system
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 47 |
Extension of rate of rise method for calibrating vacuum gauges
|
Sar-El, HZ
|
|
1976
|
26 |
4-5 |
p. 137-141
5 p.
|
artikel
|
| 48 |
Fabrication of a miniature 8K-bit memory chip using electron-beam exposure
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 49 |
Faraday dark space-positive column transition in magnetized low-current low-pressure argon discharges
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 50 |
Flatness, contrast, and resolution considerations of cathode projection microfabrication systems
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 51 |
Formative time lags and ionization processes in He + 0.1% Armixture
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 52 |
Generation and extraction of microsecond intense relativistic electron beams
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 53 |
Helium discharges in continuous metal tubes
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 54 |
High-spatial-resolution scanning auger spectroscopy applied to analysis of x-band diode burnout
|
|
|
1976
|
26 |
4-5 |
p. 221-
1 p.
|
artikel
|
| 55 |
Ho laser with 50-W output and 6.5% slope efficiency
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 56 |
Improvements in the use of a field emission microscope to measure hydrogen pressures in the ultra high vacuum region
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 57 |
Investigation of very long faraday dark space
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 58 |
Ionized-cluster beam deposition
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 59 |
Ion milling (ion-beam etching), 1954–1975: a bibliography
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 60 |
Kitt peak 60-cm vacuum telescope
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 61 |
15-kj lc generator: low inductance device for a 100-ω pulsed electron accelerator
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 62 |
Lampf experimental-area beam current monitors
|
|
|
1976
|
26 |
4-5 |
p. 214-215
2 p.
|
artikel
|
| 63 |
Large diameter cryogenic seals
|
Pundak, N
|
|
1976
|
26 |
4-5 |
p. 197-201
5 p.
|
artikel
|
| 64 |
Laser technique for the divestment of a lost leonardo da vinci mural
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 65 |
Light fluctuations in a quiet low-current low-pressure argon discharge column under the influence of a local transversal magnetic field
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 66 |
Low pressure hollow cathode discharge and its properties
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 67 |
Mini magnetic lenses for microfocus x-ray applications
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 68 |
Molecular-beam study of oxygen and c2 hydrocarbon chemisorption and reactions on pt(111)
|
|
|
1976
|
26 |
4-5 |
p. 220-221
2 p.
|
artikel
|
| 69 |
Molecular parameters and lithographic performance of poly (glycidyl methacrylate-co-ethyl acrylate): a negative electron resist
|
|
|
1976
|
26 |
4-5 |
p. 218-219
2 p.
|
artikel
|
| 70 |
Monte carlo simulation of spatially distributed beams in electron-beam lithography
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 71 |
New imaging and deflecting concept for probe-forming microfabrication systems
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 72 |
Novel microfabrication process
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 73 |
Observations on hollow cathode discharges in laval nozzles
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 74 |
On the energy distribution of fast electrons and the intensities of lines in the hollow cathode discharge
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 75 |
On the high voltage and low voltage modes of the hollow cathode discharge in a magnetic field
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 76 |
On the high voltage mode in a hollow cathode discharge
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 77 |
Optimized source for x-ray lithography of small area devices
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 78 |
Owl ii pulsed-electron-beam generator
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 79 |
Penning source for ion implanation
|
|
|
1976
|
26 |
4-5 |
p. 211-
1 p.
|
artikel
|
| 80 |
Performance of a cryogenic pump at 20 K
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 81 |
Photoluminescence measurement of ion-etched gaas surface
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 82 |
Poly(butene-1 sulfone)—a highly sensitive positive resist
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 83 |
Potential profiling across semiconductor junctions by auger electron spectroscopy in the scanning electron microscopy
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 84 |
Power dependence of reflectivity of metallic films
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 85 |
Progress in computer simulation of electron guns for machining
|
|
|
1976
|
26 |
4-5 |
p. 218-
1 p.
|
artikel
|
| 86 |
Progress in intense pulsed ion sources
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 87 |
Prospects for x-ray fabrication of si ic devices
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 88 |
Radial variations in the characteristics of the magnesium hollow cathode discharge with helium and argon gases
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 89 |
Recent developments in electron-resist evaluation techniques
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 90 |
Replication of 0.1 μm geometries with x-ray lithography
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 91 |
Rotating variable leak valve
|
Chavet, I
|
|
1976
|
26 |
4-5 |
p. 203-209
7 p.
|
artikel
|
| 92 |
Secondary emission electron gun for high pressure molecular lasers
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 93 |
Secondary ionization processes in argon discharges
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 94 |
Size characterisation of small metal particles
|
|
|
1976
|
26 |
4-5 |
p. 221-
1 p.
|
artikel
|
| 95 |
Some aspects of high-current relativistic electron-beam generation
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 96 |
Spurious effects caused by the continuous radiation and ejected electrons in x-ray lithography
|
|
|
1976
|
26 |
4-5 |
p. 219-
1 p.
|
artikel
|
| 97 |
Stacking faults in silicon epitaxial layers
|
Aharoni, H
|
|
1976
|
26 |
4-5 |
p. 167-180
14 p.
|
artikel
|
| 98 |
Study of a field-ionization source for microprobe applications
|
|
|
1976
|
26 |
4-5 |
p. 215-
1 p.
|
artikel
|
| 99 |
Surface contamination of active electrodes in plasmas: distortion of conventional langmuir probe measurements
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 100 |
Synchroton radiation as a new tool within photon-beam technology
|
|
|
1976
|
26 |
4-5 |
p. 217-
1 p.
|
artikel
|
| 101 |
Temperature control system for small mo, w, and ta samples under vacuum
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 102 |
The applicability of similarity to the breakdown of hydrogen at low gas pressure
|
|
|
1976
|
26 |
4-5 |
p. 212-
1 p.
|
artikel
|
| 103 |
The calibration of vacuum measuring instruments for industrial processes
|
Buckingham, JD
|
|
1976
|
26 |
4-5 |
p. 143-147
5 p.
|
artikel
|
| 104 |
The influence of inappropriate processes on the growth of silicon epitaxial layers
|
Aharoni, H
|
|
1976
|
26 |
4-5 |
p. 149-157
9 p.
|
artikel
|
| 105 |
Theoretical and experimental photovoltaic energy conversion in an organic film system
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 106 |
Thickness determination of ultrathin films by auger electron spectroscopy.
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 107 |
Thickness of the cathode fall space in the glow discharge
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
| 108 |
Tri-pyramids in silicon epitaxial layers
|
Aharoni, H
|
|
1976
|
26 |
4-5 |
p. 181-187
7 p.
|
artikel
|
| 109 |
Two-dimensional ion effects in relativistic diodes
|
|
|
1976
|
26 |
4-5 |
p. 214-
1 p.
|
artikel
|
| 110 |
Ultraviolet reflectivity and electron-energy-loss spectra of aggas2 and cugas2
|
|
|
1976
|
26 |
4-5 |
p. 220-
1 p.
|
artikel
|
| 111 |
Unipotential lens with electron-transparent electrodes
|
|
|
1976
|
26 |
4-5 |
p. 216-
1 p.
|
artikel
|
| 112 |
Unusual failure mode of a liquid nitrogen feedthrough
|
|
|
1976
|
26 |
4-5 |
p. 213-
1 p.
|
artikel
|
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