| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Access to uncombined titanium through an inhibiting film in sublimation pumping of deuterium
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 2 |
A comparative experimental study of electron and positive-ion current collection by a cylindrical Langmuir probe under orbital-limited conditions
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 3 |
A. discussion of some techniques for obtaining elemental composition profiles
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 4 |
Adsorbate-induced changes inoptical reflectance of metal surface in ultrahigh vacuum
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 5 |
Adsorption and solution of H2 and N2 by Ta and Nb
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 6 |
Advanced thin-film metallurgy for beam-leaded integrated circuits
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 7 |
Advances in diffusion pump technology
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 8 |
A large area substrate heater for ultra high vacuum
|
Unvala, B.A.
|
|
1973
|
23 |
9 |
p. 327-329
3 p.
|
artikel
|
| 9 |
An apparatus to study the optical absorption of transition metal thin films at normal and oblique incidence in high vacuum
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 10 |
A new approach to the delayed dc ramp in the quadrupole mass filter
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 11 |
A new technique for high speed anodization in a dc oxygen glow discharge
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 12 |
An ultrasensitive hydrogen detector and its applications
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 13 |
Apparatus for the controlled co-deposition on MnBi thin films
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 14 |
Application of thermal desorption methods in studies of catalysis: the oxidation of carbon monoxide on platinum
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 15 |
A simple triggered vacuum gap
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 16 |
A spectroscopic monitor for sputter-etching processes
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 17 |
Atomic arrangement in ion inplanted thin films of Ge
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 18 |
Auger and other characteristic energies in secondary electron spectra from thin evaporated phosphorous films
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
|
| 19 |
Auger line shape comparison of N and S in two different chemical environments
|
|
|
1973
|
23 |
9 |
p. 335-
1 p.
|
artikel
|
| 20 |
A vacuum lock facility for the rapid insertion of specimens to UHV
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 21 |
A versatile vacuum induction furnace for unidirectional solidification studies
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 22 |
Bulklike films of bismuth-antimony alloys
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 23 |
Carbon monoxide adsorption on Ni(110)
|
|
|
1973
|
23 |
9 |
p. 335-
1 p.
|
artikel
|
| 24 |
Characterization of thin films by X-ray diffractometry
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 25 |
Chromium deposition in a rotatary drum evaporator
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 26 |
Comparison of theory and expriment in LEED
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 27 |
Consideration of L-shell ionization cross sections in Auger electron spectroscopy
|
|
|
1973
|
23 |
9 |
p. 344-
1 p.
|
artikel
|
| 28 |
Cryogenic installation for the opticalk study of thin films at 5°K to 300°K
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 29 |
Cryopumping
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 30 |
Current applications of low pressure rf plasma to thin and thick film technologies
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 31 |
Current limitation in mercury vapour discharges—II. Experiment
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 32 |
Cylindrical diode continous vacuum sputtering equipment for laboratory and high volume production
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 33 |
dc bias-sputtered aluminium films
|
|
|
1973
|
23 |
9 |
p. 341-
1 p.
|
artikel
|
| 34 |
Depolarization fields and phenomena in ferroelectric thin films
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 35 |
Design and operational of a large scale semicontinous electron beam evaporator
|
|
|
1973
|
23 |
9 |
p. 340-
1 p.
|
artikel
|
| 36 |
Design of elastomer O-ring vacuum seals
|
Sessink, B.W.L.M.
|
|
1973
|
23 |
9 |
p. 319-325
7 p.
|
artikel
|
| 37 |
Detachable (111) Cu films formed in ultrahigh vacuum
|
|
|
1973
|
23 |
9 |
p. 341-
1 p.
|
artikel
|
| 38 |
Development of continuous sputtering machines
|
|
|
1973
|
23 |
9 |
p. 341-
1 p.
|
artikel
|
| 39 |
Direct comparison of ion-neutralization and ultraviolet-photoemission spectroscopies
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 40 |
Distribution and apparent source geometry of electron-beam-heated evaporation sources
|
|
|
1973
|
23 |
9 |
p. 340-
1 p.
|
artikel
|
| 41 |
Double beam VUV spectrometer and logarithmic ratiometer
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 42 |
Effect of steps on low-energy electron diffraction intensity profiles
|
|
|
1973
|
23 |
9 |
p. 344-
1 p.
|
artikel
|
| 43 |
Effects of deposition temperatures on Ta thin film resistors reactively sputtered in oxygen
|
|
|
1973
|
23 |
9 |
p. 341-342
2 p.
|
artikel
|
| 44 |
Effects of impurities on the tunneling characteristics of superconducting junctions
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 45 |
Electrical properties of evaporated tellurium films and TFT's
|
|
|
1973
|
23 |
9 |
p. 341-
1 p.
|
artikel
|
| 46 |
Electrode and substrate consideration in discontinuous thin film resistance
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 47 |
Electron irradiation effects on thin CaF2 films
|
|
|
1973
|
23 |
9 |
p. 344-345
2 p.
|
artikel
|
| 48 |
Electrostatic getter-ion pump performance
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 49 |
Evacuating to 0.5–10 torr through long tubes
|
Heap, R.D.
|
|
1973
|
23 |
9 |
p. 317-318
2 p.
|
artikel
|
| 50 |
Fabrication of framed beryllium windows by high rate physical vapour deposition processes
|
|
|
1973
|
23 |
9 |
p. 340-
1 p.
|
artikel
|
| 51 |
FEM studies of oxygen on silver
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 52 |
Ferroelectrics properties of Tri-glycine sulphate thin films
|
|
|
1973
|
23 |
9 |
p. 341-
1 p.
|
artikel
|
| 53 |
Field emission and photoemission surface studies
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 54 |
Field ion microscope study of anisotropic binding forces in Mo3Ga
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 55 |
Fluorescence of tetraphenyl-butadiene in the vacuum ultraviolet
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 56 |
Fundamentals of ion plating
|
|
|
1973
|
23 |
9 |
p. 340-
1 p.
|
artikel
|
| 57 |
Further development of the planetary piston pump
|
Sadler, Peter
|
|
1973
|
23 |
9 |
p. 333-334
2 p.
|
artikel
|
| 58 |
Further measurements on physical factors influencing accomodation pumps
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 59 |
Growth effects on stress in nickel films
|
|
|
1973
|
23 |
9 |
p. 344-
1 p.
|
artikel
|
| 60 |
Guidelines for pump selection
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 61 |
High energy fine structure in the Auger spectra of silicon and silicon carbide
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 62 |
High spatial resolution, Auger electron spectroscopy
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 63 |
High speed cryosorption pumping from atmosphere to 10−6 torr
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 64 |
High-voltage conditioning at large gap in industrial vacuum
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
|
| 65 |
Impedance probe and dc probe studies on the plasma of a glow discharge
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 66 |
Important new properties of an rf coaxial diode sputtering apparatus
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 67 |
Impurity induced dielectric breakdown in SiO2
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 68 |
In-depth profiles by Auger spectroscopy and secondary ion emission
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 69 |
Influence of electric fields on the agglomeration of discontinuous films
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 70 |
In situ cleaning of thin film metal substrates for UHV-TEM corrosion studies
|
|
|
1973
|
23 |
9 |
p. 340-
1 p.
|
artikel
|
| 71 |
Interaction of carbon monoxide with (110) nickel
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 72 |
Investigation of tantalum-oxy-nitride thin-film resistor
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 73 |
Kinetics of dissociative adsorption at a metal surface
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 74 |
Laser excitation processes in the cathode region of a glow discharge through metal-vapour-rare-gas mixtures
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 75 |
Lateral interaction in adsorption and desorption kinetics
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 76 |
Linearity of a heavily loaded quartz crystal microbalance
|
|
|
1973
|
23 |
9 |
p. 341-
1 p.
|
artikel
|
| 77 |
Liquid phase Epitaxy—techniques and applications
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 78 |
Magnetric bubble thin film technology
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 79 |
Measuring hydrocarbon gas pressure with an ionization gauge
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 80 |
Melting furnace with the rotarode nonconsumable electrode
|
|
|
1973
|
23 |
9 |
p. 347-
1 p.
|
artikel
|
| 81 |
Membranes foir separation processes
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 82 |
Metals films for semiconductor apllications
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 83 |
Molecular beam studies of the kinetics of condensation of solids on surfaces
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 84 |
New developments in plasmare melting of metals and alloys
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 85 |
New device for measuring film thickness by a quartz oscillator
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 86 |
New methods for the arc fusion of titanium
|
|
|
1973
|
23 |
9 |
p. 347-
1 p.
|
artikel
|
| 87 |
Observations of sputtered thin film growth
|
|
|
1973
|
23 |
9 |
p. 341-
1 p.
|
artikel
|
| 88 |
On the calculation of effective path lengths through beam scattering chambers
|
Colgate, S.O.
|
|
1973
|
23 |
9 |
p. 313-316
4 p.
|
artikel
|
| 89 |
Optical and photoelectric properties of phosphor-nickel thin films in relation to their structure
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 90 |
Orbital energy spectra of CO and Hg adsorbed on Ni(100)
|
|
|
1973
|
23 |
9 |
p. 335-
1 p.
|
artikel
|
| 91 |
Ordered adsorbed phases and heterogeneous catalysis
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 92 |
Oxidation of (011) iron at room temperature: mainly LEED aspects
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 93 |
Partial pressure analysis using a two-chamber gauge together with an ion-electron converter
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 94 |
Permentation and outgassing of vacuum materials
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 95 |
Photoemission from ultrathin films of Cu, Ni and Pd on Ag substrates
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 96 |
Photoemission spectra from adsorbed O on W(110) and CO on W(100)
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 97 |
Physical vapour deposition processes for thick films of metals and compounds
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 98 |
Physics of ion plating and ion beam deposition
|
|
|
1973
|
23 |
9 |
p. 340-
1 p.
|
artikel
|
| 99 |
Piezoresistance in evaporated nickel films
|
|
|
1973
|
23 |
9 |
p. 344-
1 p.
|
artikel
|
| 100 |
Plasma silicon nitriding and iron boirding
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 101 |
Pneumatic logic controls for automatic vacuum systems
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 102 |
Positive ion bombardment of substrates in rf glow discharge sputtering
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 103 |
Precision determination of surface plasmon dispersion on Al(111) films via inelastic low-energy electron diffraction
|
|
|
1973
|
23 |
9 |
p. 344-
1 p.
|
artikel
|
| 104 |
Preflashover anode species in an ultralight vacuum diode
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 105 |
Pressure measurement with a hot cathode ionisation gauge in the pressure range above 10−3 torr
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 106 |
Quantitative AES and LEED study of alkali metal overlayers on W (100)
|
|
|
1973
|
23 |
9 |
p. 344-
1 p.
|
artikel
|
| 107 |
Quartz-crystal microbalance detection of mercury atomic beams for optical absorption studies
|
Abjean, R
|
|
1973
|
23 |
9 |
p. 331-
1 p.
|
artikel
|
| 108 |
Reaction kinetics of gas-solid reactions at elevated temperatures
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 109 |
Recent advances in composition profiling by simultaneous sputtering and Auger analysis
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 110 |
Recent advances in the chemical capour growth of electronic materials
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 111 |
Retarding-field-cylindrical-mirror analyzer
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
|
| 112 |
Scaling up from research and development to production of Ta2NMAu hybrids
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 113 |
Scattering of diatomic and polyatomic molecules from the (100) crystal face of platinum
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 114 |
Scattering of metastable molecules from a gas-covered (100) surface of germanium
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 115 |
Signal to noise relationhip in a quadrupole mass analyzer
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
|
| 116 |
Silicon-chromium thin-film resistor reliability
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 117 |
Silicon device surface protection with dielectric films and coatings
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 118 |
Single-crystal films and development of active integrated optics
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 119 |
Some causes for nonbulk properties in vacuum deposited films
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 120 |
Some special pumping problems associated with the sputtering application
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 121 |
Sources materials for batch coating
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 122 |
Spatial distribution of CO2 and H2O molecules on reflection an sublimation from a cold surface
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 123 |
Sputtering
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 124 |
Stability of photocathodes
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
|
| 125 |
Sticking coefficient of CO2 on solid H2O films
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 126 |
Studies of adsorption kinetics by means of molecular flow experiments
|
|
|
1973
|
23 |
9 |
p. 335-
1 p.
|
artikel
|
| 127 |
Study of aluminium oxide films by ion induced x-rays and Rutherford back-scattering
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 128 |
Superconducting properties and structure of reactively sputtered niobium carbide thin films
|
|
|
1973
|
23 |
9 |
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1 p.
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artikel
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| 129 |
Surface blistering of polycrystalline niobium by helium-ion implantation
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1973
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23 |
9 |
p. 346-
1 p.
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artikel
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| 130 |
Surface ionization mass spectroscopy of airbone particulates
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1973
|
23 |
9 |
p. 345-
1 p.
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artikel
|
| 131 |
Surface photovoltage spectroscopy— new approach to the study of high-gap semiconductor surfaces
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1973
|
23 |
9 |
p. 343-
1 p.
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artikel
|
| 132 |
Surface self diffusion at cryogenic temperatures: Rh on Rh
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1973
|
23 |
9 |
p. 336-
1 p.
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artikel
|
| 133 |
Test results of vacuum fusion using the durarc nonconsumable electrode
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1973
|
23 |
9 |
p. 347-
1 p.
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artikel
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| 134 |
The adsorption and decomposition of CO on Pt(111)
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1973
|
23 |
9 |
p. 335-
1 p.
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artikel
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| 135 |
The bond-energy bond-order (LEBO) model of chemisorption
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1973
|
23 |
9 |
p. 335-
1 p.
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artikel
|
| 136 |
The breakdown potential and first ionization coefficient in a townsend discharge in caesium vapour
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1973
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23 |
9 |
p. 337-
1 p.
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artikel
|
| 137 |
The effect of water vapour on the sticking coefficient of lead on silicon monoxide
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1973
|
23 |
9 |
p. 341-
1 p.
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artikel
|
| 138 |
The electronic structure of solid surfaces: core level excitation techniques
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1973
|
23 |
9 |
p. 343-344
2 p.
|
artikel
|
| 139 |
The fabrication of an implantable blood irradiator by electrodeposition and sputtering
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1973
|
23 |
9 |
p. 342-
1 p.
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artikel
|
| 140 |
The formation and orientation of carbon on platinum single crystal surfaces
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1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 141 |
The growth of a GaAs-GaAlAs superlattice
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1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 142 |
The high pressure sensitivity extension of thermal conductivity gauges
|
Steckelmacher, W
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1973
|
23 |
9 |
p. 307-311
5 p.
|
artikel
|
| 143 |
The initation of electrical breakdown in vacuum—a review
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1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 144 |
The many facets of vacuum safety
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1973
|
23 |
9 |
p. 335-
1 p.
|
artikel
|
| 145 |
The preparation of thin films of B-1 structure superconducting ternary compounds
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|
1973
|
23 |
9 |
p. 339-340
2 p.
|
artikel
|
| 146 |
The production of vacuum via ion and sublimation pumping
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|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 147 |
Thermal diffuse of low-energy electrons at low temperature
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|
1973
|
23 |
9 |
p. 344-
1 p.
|
artikel
|
| 148 |
Thermal load of liquid pool cryopumps
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|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 149 |
Thermal transpiration error in absolute measurement with capacitance manometers
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|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 150 |
The use of ion beams in surface physics studies
|
|
|
1973
|
23 |
9 |
p. 336-
1 p.
|
artikel
|
| 151 |
The use of scanning Auger microscopy in molecular beam epitaxy of GaAs and GaP
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
|
| 152 |
Thin film characterization by nuclear microanalysis
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
|
| 153 |
Thin-film IV–VI compound diode lasers
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 154 |
Thin film manufacturing by computer control
|
|
|
1973
|
23 |
9 |
p. 340-
1 p.
|
artikel
|
| 155 |
Thin film preparation by chemical vapour deposition
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 156 |
Thin films applications in high-frequency devices
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 157 |
Time-of-flight analysis of ions and excited neutrals released by ESD of CO on (100) W
|
|
|
1973
|
23 |
9 |
p. 335-
1 p.
|
artikel
|
| 158 |
Transport properties and switching mechanisms in NiO, NiO(Li), Nb2O5 and TiO2 thin films
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 159 |
Tubomolecular pumps: theory and operating characteristics
|
|
|
1973
|
23 |
9 |
p. 338-
1 p.
|
artikel
|
| 160 |
UHV opening technique for analyzing metal ceramic vacuum tubes
|
|
|
1973
|
23 |
9 |
p. 338-339
2 p.
|
artikel
|
| 161 |
UHV outgassing measurements on various carbons
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 162 |
Ultrasmall planar superconductor devices
|
|
|
1973
|
23 |
9 |
p. 345-
1 p.
|
artikel
|
| 163 |
Ultratrace analyses of mixtures such as air/breath as biomedical tools
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 164 |
Unusual growth morphology in vacuum evaporation synthesized compounds
|
|
|
1973
|
23 |
9 |
p. 342-
1 p.
|
artikel
|
| 165 |
Use of an automated (RGA) for thin film processes
|
|
|
1973
|
23 |
9 |
p. 346-
1 p.
|
artikel
|
| 166 |
Use of stabilized zirconia as a selective oxygen leak source
|
|
|
1973
|
23 |
9 |
p. 339-
1 p.
|
artikel
|
| 167 |
Vacuum system for an infrared calibration facility
|
|
|
1973
|
23 |
9 |
p. 337-
1 p.
|
artikel
|
| 168 |
Variable bandwidth transmission filter for the vacuum ultraviolet: La1−xCexF3
|
|
|
1973
|
23 |
9 |
p. 343-
1 p.
|
artikel
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