| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
557. Accuracy of unit pressure reproduction in the range of high and ultrahigh vacuum by the absolute method of pressure reduction
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 2 |
657. Analyzer of electron beam structure
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 3 |
521. Anomalies in the dependence of average charge of heavy ions in helium and air, on nuclear charge
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 4 |
621. Apparatus for assembling the fittings of receiving and amplifying valves
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 5 |
672. Apparatus for fatigue testing of materials under conditions of vacuum and low temperature
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 6 |
662. Apparatus for heat treatment in vacuo
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 7 |
578. Apparatus for investigation of the back scattering of electrons from film materials
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 8 |
577. Apparatus for measurement of the dielectric properties of a film during deformation at a broad range of rates and temperatures
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 9 |
647. Apparatus for regulating the temperature of electrical vacuum apparatus
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 10 |
652. Apparatus for studying electron flows
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 11 |
563. Application of ion heating in electron device manufacturing
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 12 |
658. Approximative calculation of electron impact energy on the anode of magnetron
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 13 |
623. A production valve panel
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 14 |
518. Arc discharge in vacuum and the prospect of its utilization in electron device manufacturing
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 15 |
602. Arrangement for depositing electrodes in investigations of the electro-physical properties of dielectrics
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 16 |
547. Arrangement for forced cooling of diffusion pumps
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 17 |
A simple vacuum cut-out
|
Kelk, J.E.
|
|
1971
|
21 |
7 |
p. 275-
1 p.
|
artikel
|
| 18 |
532. Assessment of spherical cathodes
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 19 |
570. A surface resistance thermometer for measuring temperatures in vacuo
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 20 |
Author index of abstracts
|
|
|
1971
|
21 |
7 |
p. 300-
1 p.
|
artikel
|
| 21 |
567. A vacuum trap
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 22 |
566. A valve for vacuum systems
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 23 |
Balzers new vacuum gauge
|
|
|
1971
|
21 |
7 |
p. 277-
1 p.
|
artikel
|
| 24 |
Biological specimen preparation equipment
|
|
|
1971
|
21 |
7 |
p. 278-
1 p.
|
artikel
|
| 25 |
Brazing and welding equipment
|
|
|
1971
|
21 |
7 |
p. 282-283
2 p.
|
artikel
|
| 26 |
667. Carbon determination in niobium and tantalum by oxidation melting in vacuum
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 27 |
649. Cathode
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 28 |
511. Cathodoluminescence of ion implanted SiC
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 29 |
588. Causes of temperature changes of films during condensation in vacuum
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 30 |
527. Causes of variation in the glow discharge characteristic with decrease of the anode-cathode distance
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 31 |
593. Chromatographic determination of carbon in metallic films
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 32 |
606. Computer simulation of epitaxial nucleation
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 33 |
653. Continous secondary electron multiplier for measurement of small electron currents of low energy
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 34 |
Contrôle industriel de la metallisation par un procédé de mesure sans contact de la résistance électrique des couches métalliques minces Application au dépôt en continu, sous vide, d'aluminium sur un support synthétique
|
Berthier, G.
|
|
1971
|
21 |
7 |
p. 261-264
4 p.
|
artikel
|
| 35 |
599. Crystallization of vitreous selenium and chalcogenide glass films under the influence of organic medium
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 36 |
Deoxidizing gas-sensing semiconductor
|
|
|
1971
|
21 |
7 |
p. 279-
1 p.
|
artikel
|
| 37 |
680. Determination of hydrogen in gases by proton recoil
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 38 |
549. Development and construction of a system based on the dynamic expansion method for calibration of vacuum gauges in the pressure range of 10−3 to 10−8 torr
|
|
|
1971
|
21 |
7 |
p. 288-
1 p.
|
artikel
|
| 39 |
574. Device for depositing thin coating in vacuo
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 40 |
573.Device for film deposition
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 41 |
504. Diffusion coefficients for CO2CH
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 42 |
523. Effective cross sections for electron excitation of transitions between excited states in Ba+ and Sr+ ions
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 43 |
537. Effective cross-sections for excited cadmium ion formation in case of cadmium atom ionization by electron impact
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 44 |
568. Effect of technological factors in the preparation of metalloceramic parts on the development of small leaks
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 45 |
665. Electrical conductivity of pyrolysed polyacrylonitrile in the temperature range 1.7 to 700°K
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 46 |
558. Electro-acoustical converter for gas analysis
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 47 |
Electron beam deposition
|
|
|
1971
|
21 |
7 |
p. 283-
1 p.
|
artikel
|
| 48 |
670. Electron spectroscopy—a new method of material investigation
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 49 |
603. Ensuring uniqueness in film thickness measurements
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 50 |
600. Epitaxial growth of GaAs in an open system
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 51 |
607. Epitaxial layers of gallium phosphide on silicon
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 52 |
508. Equilibrium cosine law and scattering symmetry at the gas-surface interface
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 53 |
632. Equipment and technology of the stem-less evacuation of medium-power transmitting tubes
|
|
|
1971
|
21 |
7 |
p. 295-
1 p.
|
artikel
|
| 54 |
ERA in Sweden
|
|
|
1971
|
21 |
7 |
p. 281-
1 p.
|
artikel
|
| 55 |
505. Estimates of error bounds of gas transport properties
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 56 |
642. Evaporation rates of metals and temperature tolerances of electro-vacuum device components. Part II
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 57 |
575. Evaporator for vacuum installations
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 58 |
539. Excitation of carbon atom and carbon-like ions by electron impact
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 59 |
598. Excitonic electroabsorption of CdTe
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 60 |
572. Experience with high-temperature Vacutherm vacuum chamber
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 61 |
633. Experimental equipment for sealing vacuum devices after stem-less evacuation
|
|
|
1971
|
21 |
7 |
p. 295-
1 p.
|
artikel
|
| 62 |
646. Experimental investigations on a wall-stabilized, high-current argon laser
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 63 |
517. Experimental relative Franck-Condon factors for the ionization of methane, ethane and propane
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 64 |
660. Fatigue of oxygen-caesium photocathodes in pulsed operation
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 65 |
512. F-centre saturation phenomena in KCl during low-energy electron irradiation
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 66 |
587. Filamentary crystals and nonferromagnetic films
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 67 |
Fluctuations of vacuum microbalance readings
|
Robens, E.
|
|
1971
|
21 |
7 |
p. 265-267
3 p.
|
artikel
|
| 68 |
520. Formation of slow atomic negative oxygen ions in collisions between fast protons or hydrogen atoms and O2 molecules
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 69 |
610. Formation of thin ZnS films in vacuum on cleaved NaCl single crystals
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 70 |
525. Gallium arsenide structure manifestation by external photoeffect in x-ray spectrum region
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 71 |
571. High-temperature equipment for heating graphite components in vacuum
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 72 |
High temperature vacuum furnaces
|
|
|
1971
|
21 |
7 |
p. 278-
1 p.
|
artikel
|
| 73 |
High voltage insulation
|
|
|
1971
|
21 |
7 |
p. 283-
1 p.
|
artikel
|
| 74 |
592. Improved CdS thin film Schottky diodes
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 75 |
656. Increased life of heaters for high-temperature cathodes
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 76 |
629. Influence of anode preparation on the gas ambient formed in an experimental diode
|
|
|
1971
|
21 |
7 |
p. 295-
1 p.
|
artikel
|
| 77 |
634. Influence of anode treatment and electrode separation during evacuation on characteristics of oxide cathode devices
|
|
|
1971
|
21 |
7 |
p. 295-
1 p.
|
artikel
|
| 78 |
565. Influence of diffusion brazing conditions on mechanical strength of graphite-to-metal seal
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 79 |
540. Influence of gas pressure on exoelectron emission from aluminium
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 80 |
536. Influence of inelastic electron-atom collisions on distribution of electrons in the hollow-cathode discharge
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 81 |
618. Influence of polymerisation of silicone layers on the contrast in the electron mirror microscope
|
|
|
1971
|
21 |
7 |
p. 293-294
2 p.
|
artikel
|
| 82 |
569. Influence of technological factors in the manufacture of metal-ceramic assemblies on the formation of small leaks
|
|
|
1971
|
21 |
7 |
p. 290-
1 p.
|
artikel
|
| 83 |
519. Influence of the inter-electrode distance on the formation of diode characteristics during pumping
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 84 |
637. Initiation of electrical discharge by a foreign particle in pulsed modulator devices
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 85 |
534. Interaction phenomena in ionization processes
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 86 |
585. Investigation of angular distribution of high photo-voltage in polycrystalline films of lead sulphide
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 87 |
654. Investigation of channel electron multipliers of reduced lead glass
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 88 |
580. Investigation of current carrier lifetime in PbS single crystal films
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 89 |
614. Investigation of dielectric films obtained in low-voltage Penning discharge
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 90 |
678. Investigation of gas composition in the pumping system—device pumped by oil diffusion pump with a chracoal adsorption trao or magnetic electrical-discharge pump
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 91 |
562. Investigation of glass-metal compounds obtained by diffusion welding
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 92 |
676. Investigation of mechanism of active soldering of metal to ceramics with the aid of x-ray structural analysis. Part IV. Influence of sintering time and repeated sintering on interaction of titanium with aluminium oxide
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 93 |
533. Investigation of secondary electron emission from single crystal tungsten
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 94 |
611. Investigation of the breaktown of thin film capacitors on based silicon monoxide
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 95 |
613. Investigation of the dielectric properties of silicon nitride films
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 96 |
626. Investigation of the heat exchange in diathermal bodies of electro-vacuum glass during heating by infrared radiation
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 97 |
630. Investigation of the influence of hermetization temperature on the vacuum characteristics of devices
|
|
|
1971
|
21 |
7 |
p. 295-
1 p.
|
artikel
|
| 98 |
679. Investigation of the vapour pressure of copper telluride at various temperatures
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 99 |
615. Investigations on the multilayer systems NiFe-metal-Nife
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 100 |
543. Ionization instability of a self-sustained low-pressure discharge in a strong transverse magnetic field
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 101 |
524. Ionization relaxation behind strong shock waves in gases
|
|
|
1971
|
21 |
7 |
p. 285-286
2 p.
|
artikel
|
| 102 |
Largest ever helium consignment
|
|
|
1971
|
21 |
7 |
p. 281-
1 p.
|
artikel
|
| 103 |
579. Magnetic resonance in epitaxial iron films
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 104 |
516. Many-body aspects of physical adsorption
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 105 |
595. Measurement of thickness of thin oil films on polished metallic surfaces with the aid of spectrophotometer VSU-1
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 106 |
612. Mechanical properties of condensed copper films in the micro-defromation region
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 107 |
583. Mechanism and thermodynamics of aluminium oxide layer removal from an aluminium surface, by vacuum distillation through subhalides
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 108 |
529. Mechanism of γ-radiation interaction with impregnated cathodes
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 109 |
554. Mechanotron converters and their application in measuring technique
|
|
|
1971
|
21 |
7 |
p. 288-
1 p.
|
artikel
|
| 110 |
622. Method of cleaning the parts of metalloceramic radio valves
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 111 |
560. Method of connecting flexible tubes hermetically to a vacuum-tight chamber
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 112 |
559. Method of creating a vacuum-tight joint
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 113 |
544. Method of degassing the walls and internal fittings of high-vacuum chambers
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 114 |
561. Method of determining the resistance of glass in glass/metal seals to electrolysis
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 115 |
597. Method of hydrogen determination in thin metallic films
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 116 |
625. Method of installing vacuum-tight electrical leads in an insulator
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 117 |
624. Method of preparing a lanthanum hexaboride cathode
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 118 |
651. Method of studying the structure of an electron beam
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 119 |
576. Method of testing the thickness of a film during actual deposition
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 120 |
New Washington, DC Office
|
|
|
1971
|
21 |
7 |
p. 281-
1 p.
|
artikel
|
| 121 |
Notes for contributors
|
|
|
1971
|
21 |
7 |
p. 276-
1 p.
|
artikel
|
| 122 |
514. Observation of β-SiC formation on reconstructed Si surfaces
|
|
|
1971
|
21 |
7 |
p. 284-285
2 p.
|
artikel
|
| 123 |
664. Obtaining oriented single crystals of molybdenum and their properties
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 124 |
619. On the elastoresistance effect in evaporated tellurium films
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 125 |
605. On the I–V characteristics of nAuCdSTe thin film diodes
|
|
|
1971
|
21 |
7 |
p. 292-293
2 p.
|
artikel
|
| 126 |
531. Oxide cathodes with dense coatings based on a polymer binder
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 127 |
668. Oxygen determination in titanium hydride
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 128 |
620. Packaging for the storage of electrical vacuum apparatus in vacuo
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 129 |
586. Phase diagrams of cadmium chalcogenide condensation
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 130 |
608. Photoconductance in evaporated carbon films
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 131 |
538. Photoelectron energy distribution of barium films with different thickness
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 132 |
675. Photo-electron spectra of bicyclic and exo-cyclic olefins
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 133 |
591. Photovoltage properties of CdSe-Ge heterojunctions
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 134 |
513. Plasma effects in the interaction of power electron beams with solids
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 135 |
522. Plasma expansion in vacuum and the flow of a collisionless plasma stream around a plate
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 136 |
645. Possibilities of increasing the level and stability of emission characteristics of electro-vacuum devices in batch manufacturing
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 137 |
584. Preparation of emission coatings of refractory metals
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 138 |
617. Pressure dependent switching in AlAl2O3Au structures
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 139 |
644. Principles of design of equipment for stem-less evacuation of electro-vacuum devices with diffusion welding hermetization
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 140 |
526. Probe measurements in caesium plasma obtained by surface ionization
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 141 |
556. Problems of metrology in mass-spectrometry
|
|
|
1971
|
21 |
7 |
p. 288-289
2 p.
|
artikel
|
| 142 |
582. Problems of the effective reliability of vacuum evaporators
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 143 |
601. Production and properties of thin films of carbidized chromium
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 144 |
528. Production of vacuum-melted NiWZr alloys for oxide cathode cores and their investigation in experimental devices
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 145 |
673. Properties of nickel-rhenium alloys
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 146 |
507. Quantitative comparison of gas-surface theory with molecular beam data
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 147 |
594. Radioisotopic determination of impurities in vacuum condensed iron films
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 148 |
Refractory metals
|
|
|
1971
|
21 |
7 |
p. 278-
1 p.
|
artikel
|
| 149 |
546. Replacement of titanium by zirconium or scandium in electrical-discharge pumps
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 150 |
Representation in Israel
|
|
|
1971
|
21 |
7 |
p. 281-
1 p.
|
artikel
|
| 151 |
677. Saturation vapour pressure of silicon selenide
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 152 |
509. Scattering of the rare gases (He, Ne, Ar, Kr and Xe) from platinum (111) surfaces
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 153 |
Scientific advances forms new subsidiary
|
|
|
1971
|
21 |
7 |
p. 281-
1 p.
|
artikel
|
| 154 |
581. Secondary electron emission of sodium and potassium films
|
|
|
1971
|
21 |
7 |
p. 291-
1 p.
|
artikel
|
| 155 |
555. Secondary etalon of absolute pressure
|
|
|
1971
|
21 |
7 |
p. 288-
1 p.
|
artikel
|
| 156 |
639. Selection of vacuum systems with optimum parameters for different types of electro-vacuum devices
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 157 |
Simple rotary motion drive
|
|
|
1971
|
21 |
7 |
p. 277-
1 p.
|
artikel
|
| 158 |
635. Smoothing of the parameter fluctuations in electro-vacuum devices caused by evacuation equipment
|
|
|
1971
|
21 |
7 |
p. 295-
1 p.
|
artikel
|
| 159 |
627. Solder for soldering electrical vacuum apparatus
|
|
|
1971
|
21 |
7 |
p. 294-
1 p.
|
artikel
|
| 160 |
Solid-state coulometer cell
|
|
|
1971
|
21 |
7 |
p. 279-
1 p.
|
artikel
|
| 161 |
Solid state devices conference
|
|
|
1971
|
21 |
7 |
p. 283-
1 p.
|
artikel
|
| 162 |
604. Some electrical and photoelectric properties of pSiCdSe heterojunctions
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 163 |
640. Some problems in the stability analysis of the manufacturing processes for electro-vacuum devices
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 164 |
596. Spectral analysis of thin films
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 165 |
671. Spectroscopic determination of oxygen in niobium
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 166 |
636. Speed of stem-less evacuation of electro-vacuum devices
|
|
|
1971
|
21 |
7 |
p. 295-296
2 p.
|
artikel
|
| 167 |
638. State-of-the-art and development trends in the spot welding of internal components in receiver tubes
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 168 |
506. Study of the interaction of ammonia with tungsten surfaces by thermal desorption spectroscopy
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 169 |
510. Surface conductivity and recombination on germanium in chlorine and carbon oxide atmosphere
|
|
|
1971
|
21 |
7 |
p. 284-
1 p.
|
artikel
|
| 170 |
515. Surface effects on the diffusion release rate of rare gases
|
|
|
1971
|
21 |
7 |
p. 285-
1 p.
|
artikel
|
| 171 |
659. Switching properties and photoconduction in GaSe
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 172 |
641. Technology for the automated assembly of the cathode sections of cathode ray tubes
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 173 |
669. The Debye temperature of nickel, with different hydrogen contents, between 20 and 320°K
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 174 |
The distribution of the molecular incidence rate in the inside of a cylindrical space simulation chamber with a spherical gas source
|
Haefer, R.A.
|
|
1971
|
21 |
7 |
p. 269-273
5 p.
|
artikel
|
| 175 |
616. The drift of charge carriers in Se-As layers
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 176 |
631. The evacuation of composite electro-vacuum devices
|
|
|
1971
|
21 |
7 |
p. 295-
1 p.
|
artikel
|
| 177 |
530. The expediency of introducing γ-irradiation into the manufacturing technology of devices with impregnated cathodes
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 178 |
541. The influence of an external electric field in exoelectron emission
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 179 |
609. The influence of electric-field penetration upon electron distribution M-I-M structures
|
|
|
1971
|
21 |
7 |
p. 293-
1 p.
|
artikel
|
| 180 |
666. The interaction of tin telluride with GaTe
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 181 |
663. The ion current characteristics of molybdenum electron beam zone melting
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 182 |
628. Theory of calculation for the thermal distribution in the cathode assembly of a travelling wave tube
|
|
|
1971
|
21 |
7 |
p. 294-295
2 p.
|
artikel
|
| 183 |
674. The preparation of alloys with high mechanical strength and high electrical conductivity on the basis of vacuum melted copper
|
|
|
1971
|
21 |
7 |
p. 299-
1 p.
|
artikel
|
| 184 |
590. Thermally activated magnetic wall motion in oblique incidence films at liquid helium temperature
|
|
|
1971
|
21 |
7 |
p. 292-
1 p.
|
artikel
|
| 185 |
542. Thermally and optically stimulated exo-emission from ZnO
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
| 186 |
Thermal release of hydrogen isotopes from cryogenic surfaces
|
Erents, K.
|
|
1971
|
21 |
7 |
p. 257-260
4 p.
|
artikel
|
| 187 |
650. Thermionic cathode
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 188 |
535. Thermionic properties of clean and caesium covered (111) faces of single crystal tantalum
|
|
|
1971
|
21 |
7 |
p. 286-
1 p.
|
artikel
|
| 189 |
648. Thermocouple for precision measurement of high temperatures in vacuum in the presence of reactor radiation
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 190 |
550. Ultrahigh vacuum quadrupole mass spectrometer, KM-1, with high scanning velocity
|
|
|
1971
|
21 |
7 |
p. 288-
1 p.
|
artikel
|
| 191 |
589. Use of electron microprobe analysis to determine film thickness down to the monolayer range
|
|
|
1971
|
21 |
7 |
p. 291-292
2 p.
|
artikel
|
| 192 |
564. Utilization of contact melting in soldering processes
|
|
|
1971
|
21 |
7 |
p. 289-
1 p.
|
artikel
|
| 193 |
552. Utilization of electro-mechanical modulation converters for calibration of variable pressure measuring instruments
|
|
|
1971
|
21 |
7 |
p. 288-
1 p.
|
artikel
|
| 194 |
551. Utilization of VMB-4 manometer for automatic control of vacuum systems
|
|
|
1971
|
21 |
7 |
p. 288-
1 p.
|
artikel
|
| 195 |
548. UVM 1105—a new transistorized ultrahigh vacuum gauge
|
|
|
1971
|
21 |
7 |
p. 287-288
2 p.
|
artikel
|
| 196 |
643. Vacuum electrodynamic current measuring instrument for high frequencies
|
|
|
1971
|
21 |
7 |
p. 296-
1 p.
|
artikel
|
| 197 |
Vacuum/heat thawing system
|
|
|
1971
|
21 |
7 |
p. 280-
1 p.
|
artikel
|
| 198 |
Vacuum metallurgy
|
|
|
1971
|
21 |
7 |
p. 283-
1 p.
|
artikel
|
| 199 |
655. Vacuum monochromator MV-4 with differential pumping
|
|
|
1971
|
21 |
7 |
p. 297-
1 p.
|
artikel
|
| 200 |
Vacuum ovens
|
|
|
1971
|
21 |
7 |
p. 283-
1 p.
|
artikel
|
| 201 |
Vacuum pick-up pencil
|
|
|
1971
|
21 |
7 |
p. 280-
1 p.
|
artikel
|
| 202 |
Vacuum pump fluid
|
|
|
1971
|
21 |
7 |
p. 277-
1 p.
|
artikel
|
| 203 |
Vacuum pumps and equipment
|
|
|
1971
|
21 |
7 |
p. 282-
1 p.
|
artikel
|
| 204 |
553. Vapour pressure measurement in the range 10−3–100 torr by the effusion method
|
|
|
1971
|
21 |
7 |
p. 288-
1 p.
|
artikel
|
| 205 |
661. Welding of vacuum-tight constructions in X18N10T steel and AMg6 alloy
|
|
|
1971
|
21 |
7 |
p. 298-
1 p.
|
artikel
|
| 206 |
545. Working system of a turbomolecular vacuum pump
|
|
|
1971
|
21 |
7 |
p. 287-
1 p.
|
artikel
|
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