| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
Accurate, wide range ultrahigh-vacuum calibration system. (USA)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 2 |
A continous industrial gas density meter with frequency output signal. (Hungary)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 3 |
Adsorption of oxygen on tungsten and its application to the measurement of oxygen partial pressure. (France)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 4 |
A high speed rotating vacuum seal
|
Hammond, DP
|
|
1971
|
21 |
6 |
p. 233-
1 p.
|
artikel
|
| 5 |
Airco Temescal subsidiary
|
|
|
1971
|
21 |
6 |
p. 236-
1 p.
|
artikel
|
| 6 |
Air-lock for the introduction of samples into a high vacuum chamber. (France)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 7 |
Aluminium sorption roughing pump for small vacuum systems (USA)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 8 |
Analysis of a ring cavity thin-film deposition source
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 9 |
Analysis of leakage sources in sealed electro-vacuum devices
|
|
|
1971
|
21 |
6 |
p. 244-245
2 p.
|
artikel
|
| 10 |
Analysis of strain change in frame grids of electrovacuum devices on change of temperature
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 11 |
Analysis of the transitional region of the heating characteristic of a nonuniform cathode
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 12 |
Apparatus for the study of the electron impact desorption of ions and neutrals from solid surfaces. (USA)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 13 |
Application of ultrasonic vibration for ceramic metallization
|
|
|
1971
|
21 |
6 |
p. 251-
1 p.
|
artikel
|
| 14 |
Argon as medium for annealing and soldering parts of electro-vacuum devices
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 15 |
Arrangement for slow mass scanning in a mass spectrometer type KM—1. (USSR)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 16 |
A stroboscopic electron microscope with time resolution of 2 nsec
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 17 |
Author index of abstracts
|
|
|
1971
|
21 |
6 |
p. 252-
1 p.
|
artikel
|
| 18 |
Bendix vacuum managing director
|
|
|
1971
|
21 |
6 |
p. 237-
1 p.
|
artikel
|
| 19 |
Channelling of protons in silicon at different temperatures. (USSR)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 20 |
Characteristic energy loss studies of V2O5 and vanadium. (Germany)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 21 |
Clamps in the technique of vacuum joints (USSR)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 22 |
Classification system
|
|
|
1971
|
21 |
6 |
p. 238-
1 p.
|
artikel
|
| 23 |
Comparison of technical and economic efficiency of self-heating tubes and their analogues
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 24 |
Conductance of a glass exhaust tubulation with overlap, for flow of highly rarefied gases
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 25 |
Criteria for the design and construction of a compact high gain Tem00 HeNe laser
|
Redaelli, G
|
|
1971
|
21 |
6 |
p. 207-209
3 p.
|
artikel
|
| 26 |
Dependence of the silicon monoxide distribution in vacuum on the incidence angle of the molecular beam
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 27 |
Determination of the internal stress in thin films on substrates
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 28 |
Determination of thicknesses of different layers of a multilayer thin film with the aid of total external and mirror reflection of X-rays
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 29 |
Determining the thickness of epitaxial films by an infra-red interference method
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 30 |
Device for precision measurement of electron beam parameters
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 31 |
Direct-current electrical breakdown of thin titania films in high vacuum
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 32 |
Dynamic pinning induced by nickel layers on permalloy films
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 33 |
Effect of the tube-wall potential on ion collection in the Bayard-Alpert gauge. (France)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 34 |
Electron microscopic investigation of the oxide layer formed on the surface of chemically treated germanium single crystals. Effects of some corrosive agents on morphology of the surface oxide layer
|
|
|
1971
|
21 |
6 |
p. 248-249
2 p.
|
artikel
|
| 35 |
Electron microscopic technique of investigation of gas-discharge device cathodes. (USSR)
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 36 |
Electro-vacuum devices for thermal investigation
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 37 |
Energy distribution of true secondary electrons at oblique incidence of the primary electron beam. (USSR)
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 38 |
Energy loss and energy dispersion of highly collimated hydrogen, helium and lithium ions in gold. (Germany)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 39 |
Energy release and electrical resistivity recovery in nickel and nickel containing silicon impurity following electron irradiation at 20 K. (Germany)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 40 |
Equipment for argon-arc welding of large-scale electro-vacuum devices
|
|
|
1971
|
21 |
6 |
p. 251-
1 p.
|
artikel
|
| 41 |
Estimation of the reliability and life of self-heating devices
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 42 |
Experimental introduction to plasma welding
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 43 |
Experimental investigation of a thin electron beam with high specific power in crossover
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 44 |
Experimental studies of a low-pressure air-water vapour-ice system
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 45 |
Field emission from Sb2S3. (Germany)
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 46 |
Field ion microscope
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 47 |
Formation of amorphous films
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 48 |
Gas discharge cleanning of vacuum surfaces. (USA)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 49 |
Growth of Fe single crystal films on NaCl crystals
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 50 |
Heat regime of a cylindrical electrode system
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 51 |
HgSe thin film structure
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 52 |
Highly insulated seal for motion transmission in vacuum
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 53 |
Highly oriented thin oxide films on single crystals of Fe-Si alloys I. The (001) surface of the substrate
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 54 |
High-rate production equipment UVN72R-1 for ion sputtering of materials
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 55 |
High vacuum croygenic pump with autonomous refrigerator. (USSR)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 56 |
Improved evaporator for the EG-100M electrongraph
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 57 |
Influence of basic parameters of reactive sputtering process on SiO2 film structure
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 58 |
Influence of split type electrodes upon the electrical breakdown voltage for a small gap in high vacuum
|
Mitsui, H.
|
|
1971
|
21 |
6 |
p. 231-232
2 p.
|
artikel
|
| 59 |
Influence of the vacuum thermal treatment of selenium on the formation of hetero-junctions in the Se-CdSe system
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 60 |
Inner sputter-ion pump for powerful travelling wave tubes. (USSR)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 61 |
International standards and development trends in measurement of total pressure. (Germany)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 62 |
Investigation of charge exchange in a dense plasma flow from a magnesium target. (USSR)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 63 |
Investigation of electrometer tube noise
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 64 |
Investigation of gasket coating materials for ultrahigh-vacuum seals (USA)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 65 |
Investigation of mechanical stress in tantalum films
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 66 |
Investigation of non-evaporating getter properties
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 67 |
Investigation of solid surfaces with the aid of low energy electron diffraction and Auger spectroscopy. (Germany)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 68 |
Investigation of the life of a spiral of single crystal molybdenum in a vacuum device
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 69 |
Investigation of the thermionic properties of tungsten single crystals by means of electron and ion emission methods. (USSR)
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 70 |
Investigation of water vapour adsorption on a clean germanium surface. (USSR)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 71 |
Investigations of ion induced re-emission using the thermal desorption technique
|
Erents, SK
|
|
1971
|
21 |
6 |
p. 203-206
4 p.
|
artikel
|
| 72 |
Ion beam etching equipment
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 73 |
Ion gun for ultrahigh frequency devices
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 74 |
Ionization gauge controller
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 75 |
Kinetics of elEctron impact desorption of ions and neutrals from polycrystalline tungsten. (USA)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 76 |
Laboratory electron gun
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 77 |
Linear actuator
|
|
|
1971
|
21 |
6 |
p. 237-
1 p.
|
artikel
|
| 78 |
Linearity and reproducibility of a sector field mass spectrometer utilizing an electron impact ion source. (France)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 79 |
Liquid-level manometer with high sensitivity. (in Russian)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 80 |
Magnetic thin film stores
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 81 |
Mass spectrometers
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 82 |
Mass spectrometric analysis of residual gases in electron tubes with magnesium oxide cathodes, while drawing current
|
|
|
1971
|
21 |
6 |
p. 251-
1 p.
|
artikel
|
| 83 |
Measurement of the residual partial flux of outgassing from molybdenum and tungsten at 200°K
|
|
|
1971
|
21 |
6 |
p. 251-
1 p.
|
artikel
|
| 84 |
Measurement of variable micro-fields in an emission microscope
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 85 |
Memory effect of a sputter-ion pump. (Japan)
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 86 |
Metal-ceramic vacuum-tight construction. (USSR)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 87 |
Metallurgical method of preparation of highly active source for Mossbauer spectroscopy of iron
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 88 |
Metal tips produced by electron bombardment
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 89 |
Methods of preparation of ferrite films
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 90 |
Microminiaturization of hot cathodes for electrovacuum devices
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 91 |
Microphotography camera system
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 92 |
Microstructure of sputter-deposited 304L stainless steel
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 93 |
Miniature ion source for the MCX-3A mass spectrometer. (USSR)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 94 |
Minimizing the image retention on image orthicon targets
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 95 |
More accurate calculation of the orientation composition of α-solid solutions of oxygen and aluminum in titanium
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 96 |
Multiple collision method of measuring sticking coefficients and studying reflections on oxide surfaces. (USA)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 97 |
New aspect of formation mechanism of the transverse cathode resistance
|
|
|
1971
|
21 |
6 |
p. 247-248
2 p.
|
artikel
|
| 98 |
New rapid method of measurement for very small surface areas of solids. (Japan)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 99 |
Non-rectifying contacts for ZnSiP2 crystals
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 100 |
Nucleation and oriented growth of chemically formed sulphide and oxide films
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 101 |
Ohmic contacts for power semiconductor devices
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 102 |
On image formation in the field ion microscope
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 103 |
Optical coating system
|
|
|
1971
|
21 |
6 |
p. 236-
1 p.
|
artikel
|
| 104 |
Organisation of statistical checks in the electro-vacuum industry
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 105 |
Outgassing rates of refractory and electrical insulating materials used in high vacuum furnaces
|
|
|
1971
|
21 |
6 |
p. 251-
1 p.
|
artikel
|
| 106 |
Panoramic partial pressure analyzer APDP-2. (USSR)
|
|
|
1971
|
21 |
6 |
p. 243-244
2 p.
|
artikel
|
| 107 |
Pennwalt appointment
|
|
|
1971
|
21 |
6 |
p. 237-
1 p.
|
artikel
|
| 108 |
Performance assessment for cryopumping
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 109 |
Photoemission from the potassium halides in the photon energy range 7 to 30 eV. (Germany)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 110 |
Photopulsed system for automated measurement of geometry faults in grids of electro-vacuum devices
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 111 |
Physisorption of nitrogen on 304 stainless steel at very low pressures. (USA)
|
|
|
1971
|
21 |
6 |
p. 240-
1 p.
|
artikel
|
| 112 |
Prebreakdown conduction between vacuum insulated electrodes
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 113 |
Precision of standard equipment for calibrating vacuum gauges by the absolute dynamic pressure reduction method. (France)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 114 |
Preparation and epitaxy of sputtered films of ferroelectric Bi4Ti3O12
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 115 |
Preparation and structure of germanium telluride and selenide thin films
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 116 |
Preparation and superconducting properties of niobium-zirconium thin films
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 117 |
Preparation of homogeneous layers of solid solutions in the InAs-GaAs system
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 118 |
Preparation of thin nickel foils
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 119 |
Pressure sensing switches
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 120 |
Probability method of pressure estimation. (USSR)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 121 |
Producing thin tungsten foils for nuclear experiments
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 122 |
Properties of the extractor gauge in ultrahigh vacuum. (France)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 123 |
Prospective technological trends in semiconductor device manufacturing
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 124 |
Pulsed gas-discharge device for material machining
|
|
|
1971
|
21 |
6 |
p. 250-251
2 p.
|
artikel
|
| 125 |
Quadrupole mass filter: circular rods and peak shapes
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 126 |
Quadrupole mass spectrometers. (USSR)
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
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artikel
|
| 127 |
Quartz crystal microbalance applicable to the chemical reactions of thin metal films
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 128 |
Residual gases in metal-ceramic electro-vacuum devices
|
|
|
1971
|
21 |
6 |
p. 251-
1 p.
|
artikel
|
| 129 |
Restoration of optical properties of surfaces by radiofrequency-excited oxygen
|
|
|
1971
|
21 |
6 |
p. 250-
1 p.
|
artikel
|
| 130 |
Scanning electron microscope-microanalyzer, REMMA
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 131 |
Secondary electron emission from diffusion pump oils: DC-704 and Octoil-S. (Japan)
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 132 |
Seminar on surface physics of semiconductors
|
|
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1971
|
21 |
6 |
p. 237-
1 p.
|
artikel
|
| 133 |
Small-size getter-ion pump. (USSR)
|
|
|
1971
|
21 |
6 |
p. 242-243
2 p.
|
artikel
|
| 134 |
Some parameters of impregnated cathodes covered by osmium. (USSR)
|
|
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1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 135 |
Spectrum analysis of deposits on components of gas-discharge and electro-vacuum devices
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 136 |
Spray-on leak sealant
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 137 |
Structure investigation of gallium arsenide films obtained by the three-temperature method
|
|
|
1971
|
21 |
6 |
p. 246-
1 p.
|
artikel
|
| 138 |
Structure of evaporated PtSi on Si
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 139 |
Structure of selenium epitaxial films and some effects of dynamic electron diffraction
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 140 |
Study of the mercury vapour drag effect in vacuum measurement.
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 141 |
Study of the operation of gauges with hidden collector. (France)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 142 |
The application of hydrokinetic drives to high vacuum mechanical boosters (Roots pumps)
|
Wycliffe, H
|
|
1971
|
21 |
6 |
p. 223-229
7 p.
|
artikel
|
| 143 |
The diffusion coefficient of hydrogen and deuterium in vanadium, niobium and tantalum by Gorsky-effect measurements. (Germany)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 144 |
The impossibility of eliminating contamination in vacuum systems by a flow of cleaning gas. (USSR)
|
|
|
1971
|
21 |
6 |
p. 242-
1 p.
|
artikel
|
| 145 |
Thermochemical equilibria of residual gases in vacuum devices
|
Perdijk, HJR
|
|
1971
|
21 |
6 |
p. 211-221
11 p.
|
artikel
|
| 146 |
Thermochemical equilibria of residual gases in vacuum devices. Part I: Methane formation
|
|
|
1971
|
21 |
6 |
p. 222-
1 p.
|
artikel
|
| 147 |
Thickness measurement of thin films, foils and coatings by means of reflected β-radiation
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 148 |
Ultrahigh vacuum pumping system for the VEPP-2 accelerator
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 149 |
Universal device for obtaining and investigating multialkali photocathodes
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 150 |
Utilization of a diode current signal in a scanning electron microscope
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 151 |
Utilization of an electric arc for evaporation of refractory metals in vacuum
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 152 |
Utilization of the self-heating principle for improvement of electron tube efficiency
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 153 |
Vacuum alarm
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 154 |
Vacuum cuvette for investigation of infrared absorption spectra
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
| 155 |
Vacuum evaporation by electron beam
|
|
|
1971
|
21 |
6 |
p. 247-
1 p.
|
artikel
|
| 156 |
Vacuum measurement in sealed M-type devices with the aid of an electric gas discharge in a transverse magnetic field. (USSR)
|
|
|
1971
|
21 |
6 |
p. 243-
1 p.
|
artikel
|
| 157 |
Vacuum melted refractory metals
|
|
|
1971
|
21 |
6 |
p. 234-
1 p.
|
artikel
|
| 158 |
Vacuum system of an accelerator with a small aperture chamber
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 159 |
Vacuum system of the Jerevan synchrotron
|
|
|
1971
|
21 |
6 |
p. 248-
1 p.
|
artikel
|
| 160 |
Vacuum systems for sputtering
|
|
|
1971
|
21 |
6 |
p. 245-
1 p.
|
artikel
|
| 161 |
Vacuum technology consultation service
|
|
|
1971
|
21 |
6 |
p. 236-
1 p.
|
artikel
|
| 162 |
Vacuum-tight heat-resistant mica-to-metal seal
|
|
|
1971
|
21 |
6 |
p. 244-
1 p.
|
artikel
|
| 163 |
Variation of silicon surface properties under the action of nitrogen ions. (USSR)
|
|
|
1971
|
21 |
6 |
p. 241-
1 p.
|
artikel
|
| 164 |
X-ray diffraction investigation of diamonds treated by ion bombardment
|
|
|
1971
|
21 |
6 |
p. 249-
1 p.
|
artikel
|
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