no |
title |
author |
magazine |
year |
volume |
issue |
page(s) |
type |
1 |
263. A baffle-stator vacuum pump
|
|
|
1971 |
21 |
5 |
p. 190- 1 p. |
article |
2 |
Abstract from the statutes
|
|
|
1971 |
21 |
5 |
p. 183- 1 p. |
article |
3 |
334. A cathode
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
4 |
337. A cathode unit
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
5 |
293. Accumulation of charged vacancies in natural rock salt single crystals
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
6 |
264. A cooled diode-type magnetic-discharge pump of the NMDO-01-1 class (NORD-100) with a BP-150 supply unit. Production quality standard
|
|
|
1971 |
21 |
5 |
p. 190- 1 p. |
article |
7 |
318. Adaptation of the far infrared spectrometer FS-620 for measurement on small samples
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
8 |
361. Adhesion of graphite to glass
|
|
|
1971 |
21 |
5 |
p. 198- 1 p. |
article |
9 |
251. A diagnostic system for the cathode-side examination of oxide cathode arc discharges
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
10 |
243. Adsorption and nucleation of silver on tungsten
|
|
|
1971 |
21 |
5 |
p. 188- 1 p. |
article |
11 |
265. A fluid-flow vacuum pump
|
|
|
1971 |
21 |
5 |
p. 190- 1 p. |
article |
12 |
Airco temescal
|
|
|
1971 |
21 |
5 |
p. 182- 1 p. |
article |
13 |
A material loading device for use in the production of thick films
|
McCormick, AK |
|
1971 |
21 |
5 |
p. 177- 1 p. |
article |
14 |
342. A metallic type of cathode
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
15 |
262. A molecular vacuum pump
|
|
|
1971 |
21 |
5 |
p. 190- 1 p. |
article |
16 |
300. Amorphous analogues of selenium crystal structures and their spectral photoelectric properties
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
17 |
276. Analyzer of a quadrupole mass spectrometer
|
|
|
1971 |
21 |
5 |
p. 191- 1 p. |
article |
18 |
312. An apparatus for evaporational cooling
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
19 |
358. An electrical ceramic material
|
|
|
1971 |
21 |
5 |
p. 197- 1 p. |
article |
20 |
329. Angular dependence of external x-ray photoeffect in perfect germanium and silicon single crystals
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
21 |
257. Angular regularities in ion-electron emission from niobium single crystals
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
22 |
268. An inbuilt magnetic discharge pump for powerful transmitting valves
|
|
|
1971 |
21 |
5 |
p. 191- 1 p. |
article |
23 |
327. Anisotropy of the space distribution of ions scattered by a single crystal
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
24 |
321. Annealing processes in n-Ge irradiated by high-energy protons
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
25 |
294. Anomalous electrical properties and structure of island metal condensates
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
26 |
339. A plane grid for electrical-vacuum devices
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
27 |
278. Apparatus for detecting leaks in high-vacuum devices
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
28 |
279. Apparatus for testing materials in vacuo
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
29 |
340. Apparatus for the pulse conditioning of electrical-vacuum devices
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
30 |
247. Application of alumina to adsorption problems
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
31 |
A proposal for the inverted magnetron gauge
|
Miyagawa, N |
|
1971 |
21 |
5 |
p. 176- 1 p. |
article |
32 |
A simple apparatus for DC bias sputtering
|
Beck, AH |
|
1971 |
21 |
5 |
p. 178- 1 p. |
article |
33 |
360. A solder for joining electrical-vacuum parts
|
|
|
1971 |
21 |
5 |
p. 198- 1 p. |
article |
34 |
359. A solder for joining parts of electrical vacuum apparatus
|
|
|
1971 |
21 |
5 |
p. 198- 1 p. |
article |
35 |
356. A suspension for depositing an oxide coating
|
|
|
1971 |
21 |
5 |
p. 197- 1 p. |
article |
36 |
335. A titanium-base alloy
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
37 |
Author index of abstracts
|
|
|
1971 |
21 |
5 |
p. 198- 1 p. |
article |
38 |
Automatic bulk titanium sublimation pump
|
|
|
1971 |
21 |
5 |
p. 179- 1 p. |
article |
39 |
280. A vacuum chamber for studying the properties of materials when acted upon by ultraviolet radiation
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
40 |
313. A vacuum insulator
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
41 |
363. A vacuum-tight, heat-resistant mica/metal joint
|
|
|
1971 |
21 |
5 |
p. 198- 1 p. |
article |
42 |
266. A vapour-jet vacuum pump
|
|
|
1971 |
21 |
5 |
p. 190- 1 p. |
article |
43 |
AVISEM 71
|
|
|
1971 |
21 |
5 |
p. 184- 1 p. |
article |
44 |
314. Beam withdrawal by the charge exchange method in the two-metre isochronous heavy ion cyclotron 01YAI
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
45 |
292. Breakdown mechanism of thin dielectric films
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
46 |
Calculation of cryopumping speeds by the Monte Carlo method
|
Akiyama, Yoshitane |
|
1971 |
21 |
5 |
p. 167-173 7 p. |
article |
47 |
Call for papers for the Fifth International Vacuum Congress and the 1971 International Conference on solid surfaces
|
|
|
1971 |
21 |
5 |
p. 182- 1 p. |
article |
48 |
341. Cathode
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
49 |
311. Characteristics of thin film photoelements based on magnesium phthalocyanine
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
50 |
Characterization of SiO using fine features of X-ray K emission spectra
|
Baun, William L |
|
1971 |
21 |
5 |
p. 165-166 2 p. |
article |
51 |
254. Charge exchange of protons in caesium to negative ions
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
52 |
357. Composition for obtaining conducting coatings on a ceramic
|
|
|
1971 |
21 |
5 |
p. 197- 1 p. |
article |
53 |
244. Crystallographic anisotropy of electron reflection from tungsten single crystals
|
|
|
1971 |
21 |
5 |
p. 188- 1 p. |
article |
54 |
Design and performance characteristics of sorption pumps
|
Vijendran, P |
|
1971 |
21 |
5 |
p. 159-164 6 p. |
article |
55 |
301. Design and technology of Gunn ideas
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
56 |
282. Determination of epitaxial film thickness with the aid of an infrared interference method
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
57 |
252. Determination of the absolute value of the emission ion current with a time-of-flight mass spectrometer
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
58 |
272. Determination of the dimensions of the ion generation region
|
|
|
1971 |
21 |
5 |
p. 191- 1 p. |
article |
59 |
261. Device for working in a dust-free atmosphere
|
|
|
1971 |
21 |
5 |
p. 190- 1 p. |
article |
60 |
353. Dislocation structure of nickel after load switching at low and ultrasonic frequencies
|
|
|
1971 |
21 |
5 |
p. 197- 1 p. |
article |
61 |
306. Domain boundary movement on repolarization of single crystal films of barium titanate
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
62 |
Editorial changes
|
|
|
1971 |
21 |
5 |
p. 185- 1 p. |
article |
63 |
284. Electrical conductivity studies on film-like single crystals of hexagonal selenium
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
64 |
344. Electrical properties of single crystal nickel ferrites
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
65 |
291. Electro-absorption of zinc selenide
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
66 |
258. Electron inelastic scattering and secondary electron emission of magnesium and magnesium oxide
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
67 |
242. Excitation probability for surface plasmons at oblique electron incidence with account of retardation
|
|
|
1971 |
21 |
5 |
p. 188- 1 p. |
article |
68 |
346. Exciton induced colour centre growth in KBr and KI crystals at 5 K
|
|
|
1971 |
21 |
5 |
p. 197- 1 p. |
article |
69 |
250. Experimental study of positive ion emission from tungsten. 1.
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
70 |
£130,000 export order for ScotVac
|
|
|
1971 |
21 |
5 |
p. 181- 1 p. |
article |
71 |
285. Faraday rotation due to excitons in evaporated CuCl films
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
72 |
Fast response flowmeter for leak tesing
|
|
|
1971 |
21 |
5 |
p. 179- 1 p. |
article |
73 |
Fast response flowmeter for leak tesing
|
|
|
1971 |
21 |
5 |
p. 179- 1 p. |
article |
74 |
304. Fine structure in angular distributions during single crystal sputtering
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
75 |
253. Functional parameters of oxide cathodes in arc discharges and their correlation
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
76 |
296. Galvanomagnetic characteristics of dimension quantized bismuth films in a transversal quantizing magnetic field
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
77 |
255. General threshold theory of electron emission from the surface of a metal
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
78 |
Granville-Phillips acquires Kronos Inc
|
|
|
1971 |
21 |
5 |
p. 182- 1 p. |
article |
79 |
338. High-temperature resonator for studying dielectrics in an inert medium
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
80 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
81 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
82 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
83 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
84 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
85 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
86 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
87 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
88 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
89 |
I. General vacuum science and engineering
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
90 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
91 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
92 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
93 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
94 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
95 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
96 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
97 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
98 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
99 |
III. Vacuum applications
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
100 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
101 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
102 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
103 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
104 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
105 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
106 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
107 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
108 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
109 |
II. Vacuum apparatus and auxiliaries
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
110 |
239. Improvement in the sensitivity of the shadow and interference methods in the study of low density gas flow
|
|
|
1971 |
21 |
5 |
p. 188- 1 p. |
article |
111 |
326. Inelastic scattering of slow electrons in germanium and silicon
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
112 |
323. Influence of electron irradiation on drift velocity of lithium ions in p-type germanium
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
113 |
322. Influence of irradiation on the basic characteristics of a semiconductor quantum generator. Gallium arsenide excited by electron beam
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
114 |
290. Infrared reflection of highly doped In2O3 films
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
115 |
316. Injector of lithium hydride particles for experiments with laser plasma
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
116 |
308. Installation for the vacuum deposition of coatings
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
117 |
281. Investigation of faults in epitaxial films with the aid of a phase-contrast microscope
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
118 |
325. Investigation of oxygen precipitation in germanium by the method of anomalous x-ray transmission
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
119 |
249. Investigation of positive ion emission from tungsten filaments with the aid of a time-of-flight mass spectrometer
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
120 |
343. Investigation of the hydrogen content in steel
|
|
|
1971 |
21 |
5 |
p. 196- 1 p. |
article |
121 |
299. Investigation of the profiles of thin condensed films of various materials
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
122 |
303. Investigation of thin film CdS piezoelectric transducers
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
123 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
124 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
125 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
126 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
127 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
128 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
129 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
130 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
131 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
132 |
IV. Materials and techniques used in vacuum technology
|
|
|
1971 |
21 |
5 |
p. 187- 1 p. |
article |
133 |
245. Joint adsorption of yttrium and oxygen atoms on faces of tungsten single crystal
|
|
|
1971 |
21 |
5 |
p. 188- 1 p. |
article |
134 |
Letter to the editor
|
Groszkowski, J |
|
1971 |
21 |
5 |
p. 175- 1 p. |
article |
135 |
List of laboratories
|
|
|
1971 |
21 |
5 |
p. 183- 1 p. |
article |
136 |
287. Low temperature motion of Néel and Bloch walls
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
137 |
288. Magnetic domain wall motion and increase of coercive field
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
138 |
271. Mass spectrometer ion source with ionization by electric field and electron bombardment
|
|
|
1971 |
21 |
5 |
p. 191- 1 p. |
article |
139 |
302. Mathematical expression of coil impedance change caused by the measured object
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
140 |
324. Mean square displacement of atoms on the (100) surface of GaAs
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
141 |
273. Measurement of small currents by a secondary electron multiplier with continuous dynodes
|
|
|
1971 |
21 |
5 |
p. 191- 1 p. |
article |
142 |
362. Metallizing alumina ceramics and sealing them to metals
|
|
|
1971 |
21 |
5 |
p. 198- 1 p. |
article |
143 |
307. Method of depositing thin films on spherical surfaces
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
144 |
277. Method of detecting leaks in high-vacuum apparatus
|
|
|
1971 |
21 |
5 |
p. 192- 1 p. |
article |
145 |
355. Method of preparing a cermet heater
|
|
|
1971 |
21 |
5 |
p. 197- 1 p. |
article |
146 |
333. Method of preparing thin-walled cathode bases
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
147 |
309. Modern thermal radiation detectors and possibilities of their application
|
|
|
1971 |
21 |
5 |
p. 194- 1 p. |
article |
148 |
New appointments in Torvac
|
|
|
1971 |
21 |
5 |
p. 184- 1 p. |
article |
149 |
New 6-inch gold seal gate valve
|
|
|
1971 |
21 |
5 |
p. 179- 1 p. |
article |
150 |
New stoptester
|
|
|
1971 |
21 |
5 |
p. 181- 1 p. |
article |
151 |
New vacuum metallurgical service company
|
|
|
1971 |
21 |
5 |
p. 182- 1 p. |
article |
152 |
Notes for contributors
|
|
|
1971 |
21 |
5 |
p. 174- 1 p. |
article |
153 |
328. On photoelectric phenomena in silicon surface layers
|
|
|
1971 |
21 |
5 |
p. 195- 1 p. |
article |
154 |
256. On the mechanism of establishment of the electron energy distribution in the plasma of a negative glow discharge
|
|
|
1971 |
21 |
5 |
p. 189- 1 p. |
article |
155 |
295. Peculiarities of active epitaxial centres in the surface layer of KI cleaved single crystals
|
|
|
1971 |
21 |
5 |
p. 193- 1 p. |
article |
156 |
319. Photoelectric properties of SbSI single crystals
|
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157 |
331. Photoemission from germanium with Al2O3 coverage
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p. 195- 1 p. |
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158 |
332. Photoemission from silicon and germanium at barium coverage
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p. 195- 1 p. |
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159 |
310. Photoionization gas-discharge counters of radiation in the region 1050–2000 Å
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p. 194- 1 p. |
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160 |
347. Plastic deformation of corundum single crystals
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p. 197- 1 p. |
article |
161 |
283. Preparation and physical properties of ferrite films
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p. 192- 1 p. |
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162 |
352. Principles of alloying semiconducting compounds with deviation from stoiochiometry
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p. 197- 1 p. |
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163 |
275. Probability method of estimating pressure
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1971 |
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article |
164 |
289. Production of a photographic image by oxidizing-reducing reactions on thin films of lead sulphide and selenide
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p. 193- 1 p. |
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165 |
354. Properties of krypton 85 labelled metals used in industry
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p. 197- 1 p. |
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166 |
248. Properties of non-sputtered gas absorbers
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1971 |
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p. 189- 1 p. |
article |
167 |
320. Recombination properties of n- and p-germanium irridiated by protons with energy of 660 MeV
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p. 195- 1 p. |
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168 |
298. Residual conductivity in CdSe films
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p. 193- 1 p. |
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169 |
R F ion-source and ion-accelerator components
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1971 |
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p. 180- 1 p. |
article |
170 |
R F ion-source and ion-accelerator components
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1971 |
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p. 180- 1 p. |
article |
171 |
Rules of procedure
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1971 |
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p. 183- 1 p. |
article |
172 |
Science and technology of superconductivity
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1971 |
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p. 184- 1 p. |
article |
173 |
260. Self-maintained thermionic emission of an oxide cathode
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1971 |
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p. 190- 1 p. |
article |
174 |
336. Semi-automatic device for making frame-type grids
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1971 |
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p. 196- 1 p. |
article |
175 |
269. Small-scale getter-ion pumps
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1971 |
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p. 191- 1 p. |
article |
176 |
330. Spatial distribution of diffuse electron fluxes released in vacuum
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1971 |
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p. 195- 1 p. |
article |
177 |
246. Structure and work function of lanthanum films on the (110) face of molybdenum single crystal
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p. 188- 1 p. |
article |
178 |
286. Structure of thin metal films
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1971 |
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p. 192- 1 p. |
article |
179 |
240. Surface states on clean and on caesium covered cleaved silicon surfaces
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1971 |
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p. 188- 1 p. |
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180 |
315. Synchronous detector with vacuum thermocouples
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1971 |
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p. 194- 1 p. |
article |
181 |
Tenney engineering names president of subsidiary
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1971 |
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p. 185- 1 p. |
article |
182 |
5th Annual Solid State Devices Conference
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1971 |
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p. 183- 1 p. |
article |
183 |
297. The dependence of sputtering in the close-packing directions on the angle of ion incidence
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1971 |
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p. 193- 1 p. |
article |
184 |
241. The diffusion of H and D in Pd between 50 and 300 K
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p. 188- 1 p. |
article |
185 |
345. The electrical conductivity of magnesium and manganese ferrites
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p. 196- 1 p. |
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186 |
348. The establishment of long-range order in Ni2Cr using electron microscopy
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1971 |
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p. 197- 1 p. |
article |
187 |
The institute of physics and the physica1 society
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1971 |
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p. 183- 1 p. |
article |
188 |
274. Theoretical possibilities of a solenoid as a mass filter
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1971 |
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p. 191- 1 p. |
article |
189 |
351. The γ-ray induced electric conductivity of fused silica as dependent on field strength, temperature and irradiation time
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p. 197- 1 p. |
article |
190 |
259. Thermionic emission of an yttrium oxide cathode
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1971 |
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p. 190- 1 p. |
article |
191 |
267. The “TIS” titanium ion-sorption pump
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1971 |
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p. 191- 1 p. |
article |
192 |
Titatnium evaporation pumps
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1971 |
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p. 179- 1 p. |
article |
193 |
349. Transmission electron microscopy of point-defect clusters in neutron-irradiated metals. I. Copper
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p. 197- 1 p. |
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194 |
350. Transmission electron microscopy of point defect clusters in neutron-irradiated metals. II. Platinum
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p. 197- 1 p. |
article |
195 |
305. Trapping levels in cadmium sulphide photosensitive films deposited in vacuum
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1971 |
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p. 194- 1 p. |
article |
196 |
317. Vacuum chamber of an x-ray diffractometer for investigation of
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1971 |
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p. 195- 1 p. |
article |
197 |
Valves for low, medium and high vacuum applications
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1971 |
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p. 180- 1 p. |
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198 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
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199 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
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200 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
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201 |
V. Basic science and engineering
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1971 |
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202 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
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203 |
V. Basic science and engineering
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1971 |
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204 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
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205 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
article |
206 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
article |
207 |
V. Basic science and engineering
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1971 |
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p. 187- 1 p. |
article |
208 |
Veeco sales and earnings
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1971 |
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p. 182- 1 p. |
article |
209 |
VI. Miscellaneous
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1971 |
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p. 187- 1 p. |
article |
210 |
VI. Miscellaneous
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1971 |
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p. 187- 1 p. |
article |
211 |
VI. Miscellaneous
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1971 |
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p. 187- 1 p. |
article |
212 |
VI. Miscellaneous
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1971 |
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p. 187- 1 p. |
article |
213 |
VI. Miscellaneous
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1971 |
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p. 187- 1 p. |
article |
214 |
VI. Miscellaneous
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1971 |
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p. 187- 1 p. |
article |
215 |
Welch Foundation Scholarship announcement
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1971 |
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p. 183- 1 p. |
article |