| nr |
titel |
auteur |
tijdschrift |
jaar |
jaarg. |
afl. |
pagina('s) |
type |
| 1 |
1188. A cathode for electrical-vacuum devices
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 2 |
1051. Adsorption of gases at low pressures on X-type zeolites
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 3 |
1053. Adsorption of oxygen on nickel powders for cathodes of transmitter tubes
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 4 |
1099. A fine-displacement mechanism
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 5 |
1079. A laser beam method for the examination of cathode spaces
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 6 |
1185. A long-lived radio-frequency ion source of low consumption for pressurized accelarators
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 7 |
A miniature time of flight mass spectrometer
|
Bailey, C.A.
|
|
1971
|
21 |
10 |
p. 461-464
4 p.
|
artikel
|
| 8 |
1086. A molecular vacuum pump
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 9 |
An apparatus for preparing frozen-etched specimens for electron microscopy
|
Robards, A.W.
|
|
1971
|
21 |
10 |
p. 465-471
7 p.
|
artikel
|
| 10 |
1105. An automatic vacuum tap
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 11 |
1224. An investigation of heat flow in undirectional solidification of vacuum-cast airfoils
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 12 |
1091. An ionization gauge with plane electrode system and emission current modulation
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 13 |
1196. Anomalous angular characteristics of the shadows on bismuth proton micrographs
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 14 |
Another EB welder
|
Cambridge, Vacuum Engineering
|
|
1971
|
21 |
10 |
p. 488-
1 p.
|
artikel
|
| 15 |
1118. Apparatus for vacuum-depositing coatings
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 16 |
1219. Application of static metallic adhesion data to friction
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 17 |
1114. A priming vacuum trap
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 18 |
1134. Arrangement for checking of thichness of films, deposited by vacuum evaporation, by means of the reflection coefficient
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 19 |
1182. Arrangement for continuous pumping of gas through a proportional counter at various pressures
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 20 |
1181. A source of polarized negative deuterium ions for a charge exchange electrostatic accelerator
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 21 |
Author index of abstracts
|
|
|
1971
|
21 |
10 |
p. 507-
1 p.
|
artikel
|
| 22 |
1085. Automated pumping system and control of apparatus for vacuum deposition of thin films
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 23 |
1090. A vacuum gauge
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 24 |
1201. A vacuum-melting installation
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 25 |
1102. A vacuum plug tag
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 26 |
1101. A vacuum seal
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 27 |
1103. A vacuum seal
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 28 |
1234. A vacuum sealing grease
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 29 |
1109. A valve system for vacuum installations
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 30 |
1153. Basic requirements for manufacturing thin-film elements by ion sputtering
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 31 |
1220. Behaviour of refractory metal surfaces in ultrahigh vacuum as observed by LEED and Auger electron spectroscopy
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 32 |
1163. Caesium diode with ion and electron generation on anode
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 33 |
Calculation of density distributions in steady-state effusive flows
|
Colgate, S.O.
|
|
1971
|
21 |
10 |
p. 483-
1 p.
|
artikel
|
| 34 |
1173. Calculation of thermal regime of some components of electro-vacuum devices
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 35 |
1095. Calibration of vacuum gauges
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 36 |
1187. Cathode
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 37 |
1064. Cathodes used in the guns of linear accelerators
|
|
|
1971
|
21 |
10 |
p. 492-493
2 p.
|
artikel
|
| 38 |
1082. Cathodic sputtering of MgO and AgMg alloy by residual gas ions
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 39 |
1195. Channelling effects in blocking phenomena
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 40 |
1192. Chemisorptive luminescence: oxygen on Si (111) surfaces
|
|
|
1971
|
21 |
10 |
p. 502-503
2 p.
|
artikel
|
| 41 |
1094. Chromatograph coupling to mass spectrometer
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 42 |
1120. Classification of photoemission films
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 43 |
Co-axial foreline traps
|
Vacuum Technology Associates,
|
|
1971
|
21 |
10 |
p. 486-
1 p.
|
artikel
|
| 44 |
1148. Complex investigation of silicon nitride films deposited on silicon by pyrolysis in vacuum
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 45 |
1155. Composition gradients in NiFe alloys films produced by vapour deposition from a tungsten boat
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 46 |
1210. Computer simulation in metals research
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 47 |
1167. Conditions for tangential secondary electron ultrahigh frequency discharge formation
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 48 |
1223. Creep-rupture properties of C-129Y in vacuum
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 49 |
Current proportions controllers available from Varian Vacuum Division
|
Varian Associates,
|
|
1971
|
21 |
10 |
p. 487-
1 p.
|
artikel
|
| 50 |
1208. Degassing kinetics of molten metals in vacuum
|
|
|
1971
|
21 |
10 |
p. 503-504
2 p.
|
artikel
|
| 51 |
1227. Deoxidation of stainless steel by carbon in laboratory-scale vacuum induction melting
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 52 |
1078. Dependence of cathode properties on neon doping and discharge current
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 53 |
1179. Dependence of transport coefficients on plasma parameters in the Tohamak installation
|
|
|
1971
|
21 |
10 |
p. 501-502
2 p.
|
artikel
|
| 54 |
1145. Deposition of high-ohmic films in a three-electrode system
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 55 |
1043. Design and construction of vacuum systems
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 56 |
1231. Design and operation of a one-chamber vacuum furnace for dewax, presinter, and sinter of cemented carbide
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 57 |
1108. Design of elements with annular ceramic-to-metal seals
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 58 |
1107. Design of non-compressed metal-to-ceramic seals with defined resistance against temperature variations
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 59 |
1125. Design of shutter windows in multi-chambers lines with container transport of substrates
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 60 |
1084. Design problems of vacuum systems in equipment for ion sputtering of materials
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 61 |
1135. Determination of hardness of thin films deposited in vacuum
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 62 |
1072. Determination of work function of the alloys NiSr, NiBa and NiSrBa
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 63 |
1161. Development of secondary electron UHF discharge
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 64 |
1119. Device for the vacuum-evaporation of metals
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 65 |
Dual seal bakeable sector valves of the CERN intersecting storage ring
|
Bächler, W.
|
|
1971
|
21 |
10 |
p. 457-459
3 p.
|
artikel
|
| 66 |
1131. Effect of thickness of supercritical permalloy films on their domain structure
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 67 |
1190. Effects of surface disorder, various surface structures of chemisorbed gases and carbon on helium atomic beam scattering from the (100) surface of platinum
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 68 |
1171. Electrical strenght of pulsed modulator tetrodes with copper chamber anodes
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 69 |
1049. Electric field influence on adsorbed silicon atoms
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 70 |
1160. Electrodes for high-current switches
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 71 |
1206. Electrodynamic levitation of solid particles
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 72 |
1222. Electron-beam float zone and vacuum purification of vanadium
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 73 |
Electron beam welder
|
Wentgate Engineers Ldt,
|
|
1971
|
21 |
10 |
p. 486-487
2 p.
|
artikel
|
| 74 |
Electron-orbit ion gauge—an ultra-high vacuum gauge
|
Fitch, R.K.
|
|
1971
|
21 |
10 |
p. 453-455
3 p.
|
artikel
|
| 75 |
1054. Energy distribution in field emission from krypton covered tungsten
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 76 |
1132. Epitaxial growth of LiF layers on ionic crystals
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 77 |
1089. Evaluation of equipment for ion-plasma sputtering by electrical discharge pumps
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 78 |
1149. Evaluation of molecular weight of thin layer polymerized in the gas phase
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 79 |
Evaporation systems
|
Davis & Wilder Inc,
|
|
1971
|
21 |
10 |
p. 490-
1 p.
|
artikel
|
| 80 |
1057. Evidence for F-band in the electron emission spectrum of MgF2
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 81 |
1059. Excitation of atoms in slow ion-atom collisions 18. Gaseous Electronics
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 82 |
1065. Experimental evidences of the angular dependence of electron excitation in photoemission.
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 83 |
1061. Experimental investigation of efficient retardation of an ion beam in a plasma at ion-acoustic instability
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 84 |
1166. Experimental investigation of the arc regime of a thermionic energy converter at low caesium pressures
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 85 |
1164. Experimental investigation of the Knudsen mode of operation of a thermionic energy converter
|
|
|
1971
|
21 |
10 |
p. 500-501
2 p.
|
artikel
|
| 86 |
1075. Experimental investigation of ultrahigh frequency electromagnetic wave radiation from a beam-plasma in strong magnetic field
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 87 |
1174. Features of construction and technology of envelope manufacture for electro-vacuum devices with high mechanical stability
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 88 |
1184. Field electron gun for linear electron accelator
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 89 |
1063. Field emission from high-ohmic n-type silicon
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 90 |
1067. Field emission studies on ZnO (0001) and (0001)
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 91 |
Fifth helium refrigerator
|
BOC Ltd,
|
|
1971
|
21 |
10 |
p. 489-
1 p.
|
artikel
|
| 92 |
First half loos by Tenney
|
Tenney Engineering Inc,
|
|
1971
|
21 |
10 |
p. 489-
1 p.
|
artikel
|
| 93 |
Formation of Electrotech Associates
|
Electrotech Associates,
|
|
1971
|
21 |
10 |
p. 489-
1 p.
|
artikel
|
| 94 |
1216. Formation of superconducting Nb3Al and Nb3AlGe films
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 95 |
1221. Gas-metal reactions of refractory metals at high temperature in high vacuum
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 96 |
1233. Glass stable with respect to caesium vapour at temperatures up to 650°C
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 97 |
1137. Growth of selenium single crystal films
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 98 |
1045. Heat- and mass transport phenomena at low temperatures
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 99 |
1076. Heating of the cold cathode of an electric arc
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 100 |
1180. Helium negative ion source for a change exchange electrostatic accelerator
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 101 |
1042. High and ultrahigh vacuum technique in the Industrial Electronics Institute
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 102 |
1199. High-frequency source of ions of heavy elements
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 103 |
1111. High-speed gas valve
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 104 |
Ignition characteristics of vacuum system components
|
Williams, W.
|
|
1971
|
21 |
10 |
p. 473-477
5 p.
|
artikel
|
| 105 |
Industrial vacuum ovens
|
Barlow-Whitney Ltd,
|
|
1971
|
21 |
10 |
p. 487-488
2 p.
|
artikel
|
| 106 |
1100. Insertion piece for sealing off vacuum apparatus
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 107 |
1127. In-situ-observations of the sputtering process in electron microscope
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 108 |
1197. Interaction of slow electrons with adsorbed organic molecules
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 109 |
1113. Introduction of water vapour into vacuum systems and the adsorption by the walls
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 110 |
1123. Investigation of porosity of silicon films obtained by thermal oxidations of silicon
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 111 |
1047. Investigation of the anomalous Senftleben electric effect
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 112 |
1073. Investigation of the defect structure of a real crystal surface by the thermionic emission method
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 113 |
1237. Investigation of the temperature dependence of the outgassing rates of molybdenum and yttrium with different degrees of cleanliness in ultrahigh vacuum
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 114 |
1147. Investigations of processes of manufacture and application of dielectric films on the basis of aluminim nitride in MIS transistors
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 115 |
1060. Ionization constants in the Penning process
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 116 |
1074. Ionization waves in nitrogen
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 117 |
1156. Isothermal effusion for vacuum deposition of solid solutions
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 118 |
1209. Kinetics and thermodynamics in continuous electron-beam evaporation of binary alloys
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 119 |
1169. Large metal-ceramic group for high-power transmitting tubes
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 120 |
1106. Large-size high-vacuum joints
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 121 |
1198. Layer titanium hydride injector
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 122 |
1162. Long life anode materials for power pulsed electron devices
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 123 |
1077. Low-pressure high-frequency discharge in combined high-frequency and static magnetic field close to electron cyclotron resonance
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 124 |
1157. Low TCR Kanthal resistive films for hybrids IC's
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 125 |
1176. Low-voltage arc in a thermionic converter at low caesium pressure
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 126 |
1088. Magnetic discharge pumps with cathodes of porous titanium
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 127 |
1193. Magnetic properties of CeB6, PrB6, EuB6 and GdB6
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 128 |
1081. Mass-spectrometric investigation of the degassing of polycrystalline tantalum carbide cathodes
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 129 |
1146. Measuring and analytical methods for ferromagnetic films
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 130 |
1071. Mechanism of the thermionic emission in the ion-radical model of an oxide cathode
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 131 |
Metallizer order
|
Pennwalt Ltd,
|
|
1971
|
21 |
10 |
p. 489-
1 p.
|
artikel
|
| 132 |
1214. Metallurgical characteristics of titanium-alloy foil prepared by electron-beam evaporation
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 133 |
1110. Method of admitting hydrogen to a vacuum system
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 134 |
1048. Method of making a non-sputtering gas absorber
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 135 |
1117. Method of measuring and regulating temperature
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 136 |
1186. Method of measuring the rigidity of the tubular cores of heated electronic-valve cathodes
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 137 |
1236. Method of obtaining low and very low partial oxygen pressures
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 138 |
1189. Method of preparing electronic devices
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 139 |
1158. Method of preparing indirectly-heated cathodes
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 140 |
1122. Methods for checking defect structure of silicon dioxide films on silicon plates
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 141 |
1178. Miniature channel photoelectron multipliers
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 142 |
1116. Miniature equipment for liquid nitrogen manufacture
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 143 |
1194. Modification of the mass spectrometer type MI-1305 for operation as a chromatograph detector
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 144 |
1138. Molecular composition of vapours in silicon epitaxial processes
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 145 |
1104. Motion feedthrough
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 146 |
1191. New method for the detection of atomic oxygen beams
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 147 |
1202. Nickel alloys with calcium and reduced carbon content for oxide cathode cores
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 148 |
1115. Nitrogen-free crystals for liquid helium with high-vacuum insulation
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 149 |
1133. Non-destructive determination of film thickness on silicon substrate
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 150 |
1070. Non-stationary thermionic emission from semiconducting cathodes in weak electric fields
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 151 |
1142. Nucleation, growth and texture of luminescent thin films of cadmium tungstate prepared by vacuum evaporation
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 152 |
1121. Nucleation of epitaxial films by gas-transport technique
|
|
|
1971
|
21 |
10 |
p. 497-498
2 p.
|
artikel
|
| 153 |
1150. On the maximum evaporation rate from metal surfaces
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 154 |
1175. Operation of a thermionic converter with elongated cathode
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 155 |
1044. Optical electronics and vacuum technique
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 156 |
1056. Optically stimulated electron emission from LiF with thermal bleaching
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 157 |
1087. Orbitron getter-ion pump
|
|
|
1971
|
21 |
10 |
p. 494-495
2 p.
|
artikel
|
| 158 |
1238. Outgassing of nuclear rocket fuel elements
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 159 |
Overpressure protection valve for high-vacuum apparatus
|
Robens, E.
|
|
1971
|
21 |
10 |
p. 484-
1 p.
|
artikel
|
| 160 |
1097. Performance of a modified buried collector gauge
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 161 |
1177. Photoelectron multiplier for recording coherent radiation
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 162 |
1066. Photoemission studies of V3Si and Cr3Si
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 163 |
1128. Point defect annealing in uniaxial permalloy thin films irradiated with 2 MeV electrons
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 164 |
1204. Preparation of LiF crystals for ultraviolet optics
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 165 |
1096. Prism mass spectrometer with energy focusing
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 166 |
1159. Problems of development of emission electronics in the USSR
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 167 |
1124. Properties of silicon nitride thin films prepared by cathodic sputtering
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 168 |
1218. Purification of vanadium by vacuum melting
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 169 |
1225. Quench atomization of iron-base alloys into metal powders
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 170 |
1136. Recystallization of thin films of semiconducting compounds typeA II B VI deposited in vacuum
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 171 |
1226. Refining and decarburizing steel-degassing process in the melting practice of alloys steels
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 172 |
1129. Reflection and adsorption spectra of GaAs x Sb1−x solid solutions
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 173 |
1141. Reflection high energy electron diffraction patterns of twinned fcc films
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 174 |
1230. Removal of hydrogen by pouring molten steel in vacuum
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 175 |
1170. Residual gases in vacuum tube with cold cathodes
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 176 |
1232. Rheological properties of electro-vacuum glass S 88-1
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 177 |
Rolls-Royce order
|
Wentgate Engineers Ltd,
|
|
1971
|
21 |
10 |
p. 488-
1 p.
|
artikel
|
| 178 |
Satellite planetary deposition fixture
|
Electrotech Associates,
|
|
1971
|
21 |
10 |
p. 487-
1 p.
|
artikel
|
| 179 |
1062. Schlieren method and its application to plasma diagnostics
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 180 |
1092. Semiconductor electrometer amplifiers
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 181 |
1203. Size checking of LiF crystals grown in vacuum by the Kiropulos method
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 182 |
1058. Slowing down of an intense electron beam in a dense plasma 18. Gaseous Electronics
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 183 |
1154. Solid solution effects in thin aluminium films
|
|
|
1971
|
21 |
10 |
p. 500-
1 p.
|
artikel
|
| 184 |
1130. Some factors of the temperature dependence of the resistance of thin bismuth films
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 185 |
1165. Some features of caesium discharge plasma caused by near electrode phenomena
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 186 |
1151. Some problems of performance in the film deposition by evaporation and condensation in vacuum
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 187 |
Sputtering accessories
|
Balzers High Vacuum Ltd,
|
|
1971
|
21 |
10 |
p. 485-
1 p.
|
artikel
|
| 188 |
1213. Superconducting transition temperatures of vapour-deposited niobium nitride
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 189 |
1052. Surface oxidation phenomena on the faces of germanium single crystals. 4. On the mechanism of the oxidation process
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 190 |
1050. Tertiary Bragg scattering in the specular electron reflectivity for the clean, oxygen, and sodium covered nickel (001) surface.
|
|
|
1971
|
21 |
10 |
p. 491-492
2 p.
|
artikel
|
| 191 |
1172. Test methods in receiver tube manufacture
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 192 |
1080. The cathode-plasma interaction of low-pressure arc discharges with oxide cathodes
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 193 |
1143. The effect of antimony in magneto-optic films on manganese bismuth base. II. Measurement of some magnetic and magneto-optic properties
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 194 |
1144. The effect of antimony in magneto-optic thin films on manganese bismuth base. I. Film preparation and studies on the formation process
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 195 |
1055. The negative resistance region in the V-A characteristics of Al-Al2O3-Au systems
|
|
|
1971
|
21 |
10 |
p. 492-
1 p.
|
artikel
|
| 196 |
1235. Theoretical investigation of the relationship between size of elements of glass- and ceramic-to-metal seals and the magnitude of isothermal stresses
|
|
|
1971
|
21 |
10 |
p. 506-
1 p.
|
artikel
|
| 197 |
1217. Theory and practice of electroslag melting
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 198 |
1200. Theory for the energy distribution of secondary electrons
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 199 |
1068. The performance of chamber anodes as mechanical suppressors of secondary electron emission
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 200 |
The performance of the twin wire electrostatic charged particle oscillator
|
Rushton, G.J.
|
|
1971
|
21 |
10 |
p. 449-452
4 p.
|
artikel
|
| 201 |
1205. The relation between the grain and subgrain size in nickel
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 202 |
1069. The relationship between oxide structure and the secondary emission properties of emitters
|
|
|
1971
|
21 |
10 |
p. 493-
1 p.
|
artikel
|
| 203 |
1207. Thermochemistry of liquid metal-gas crucible reactions in vacuum
|
|
|
1971
|
21 |
10 |
p. 503-
1 p.
|
artikel
|
| 204 |
The use of perfluoroalkyl polyether fluids in vacuum pumps
|
Baker, M.A.
|
|
1971
|
21 |
10 |
p. 479-481
3 p.
|
artikel
|
| 205 |
Third-second annual physical electronics conference
|
|
|
1971
|
21 |
10 |
p. 490-
1 p.
|
artikel
|
| 206 |
1093. Three-dimensional quadrupole mass spectrometer with ion storage
|
|
|
1971
|
21 |
10 |
p. 495-
1 p.
|
artikel
|
| 207 |
1098. Trap
|
|
|
1971
|
21 |
10 |
p. 496-
1 p.
|
artikel
|
| 208 |
1126. Trap distribution in a copper phthalocyanine thin film from SCLC-measurements
|
|
|
1971
|
21 |
10 |
p. 498-
1 p.
|
artikel
|
| 209 |
1140. TSEE spectra of different produced SiO2 films
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 210 |
1112. Two constructions of load lock arrangements for industrial high vacuum evaporators
|
|
|
1971
|
21 |
10 |
p. 497-
1 p.
|
artikel
|
| 211 |
1083. Ultrahigh vacuum apparatus for evaporation of semiconductors and metals by electron beam
|
|
|
1971
|
21 |
10 |
p. 494-
1 p.
|
artikel
|
| 212 |
1183. Utilization of thin organic layers in nuclear physics experiments
|
|
|
1971
|
21 |
10 |
p. 502-
1 p.
|
artikel
|
| 213 |
1152. Utilization of thin silicon polymer films in the manufacture of cryoton circuiits
|
|
|
1971
|
21 |
10 |
p. 499-500
2 p.
|
artikel
|
| 214 |
Vacuum accessories for electron microscopy
|
Nanotech (Thin Films) Ltd,
|
|
1971
|
21 |
10 |
p. 486-
1 p.
|
artikel
|
| 215 |
1228. Vacuum-carbon deoxidation of iron melts in a 70 per cent alumina brick crucible
|
|
|
1971
|
21 |
10 |
p. 505-
1 p.
|
artikel
|
| 216 |
1168. Vacuum-discharge initiation by a micro-particle
|
|
|
1971
|
21 |
10 |
p. 501-
1 p.
|
artikel
|
| 217 |
1046. Vacuum electronics
|
|
|
1971
|
21 |
10 |
p. 491-
1 p.
|
artikel
|
| 218 |
Vacuum fluids and lubricants
|
Edwards High Vacuum Ltd,
|
|
1971
|
21 |
10 |
p. 490-
1 p.
|
artikel
|
| 219 |
Vacuum furnaces
|
Edwards High Vacuum Int,
|
|
1971
|
21 |
10 |
p. 487-
1 p.
|
artikel
|
| 220 |
Vacuum gauges
|
Precision Scientific Company,
|
|
1971
|
21 |
10 |
p. 485-486
2 p.
|
artikel
|
| 221 |
1211. Vacuum heat treating using plasma EB
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 222 |
1229. Vacuum stream degassing of molten aluminium
|
|
|
1971
|
21 |
10 |
p. 505-506
2 p.
|
artikel
|
| 223 |
1212. Vapour deposition by liquid phase sputtering
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 224 |
1215. Vapour generation and deposition of zinc at high rates
|
|
|
1971
|
21 |
10 |
p. 504-
1 p.
|
artikel
|
| 225 |
Varian data
|
Varian Associates,
|
|
1971
|
21 |
10 |
p. 490-
1 p.
|
artikel
|
| 226 |
V A Tolomasov et al, kristalogr, 15 (6), 1970, 1233–1238 (in Russian).
|
|
|
1971
|
21 |
10 |
p. 499-
1 p.
|
artikel
|
| 227 |
Veeco furnace
|
Veeco Instrum Inc,
|
|
1971
|
21 |
10 |
p. 489-
1 p.
|
artikel
|
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